• Title/Summary/Keyword: Si doped InO

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UV-Vis Spectra of N, N'-Bis(4′-Aminophenyl)-1,4-quinonenediimine Doped With $H_{4}SiW_{12}O_{40}$

  • Jian Gong;Cui, Xiu-Jun;Chen, Ya-Guang;Xie, Zhong-Wei;Qu, Lun-Yu
    • Macromolecular Research
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    • v.12 no.1
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    • pp.22-25
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    • 2004
  • We have synthesized aniline oligomer composites by using heteropoly acid (H$_4$SiW$_{12}$O$_{40}$ ) as a dopant. The doping and dedoping processes of the aniline oligomer composites were investigated with the aid of UV- Vis spectra. The bands of the aniline oligomer at 572 nm weakened or disappeared, and the bands at 268, 412, and 771 nm appeared, after the aniline oligomer was doped. When the solution of the aniline oligomer doped with H$_4$SiW$_{12}$O$_{40}$ was kept at lower values of pH, the aniline oligomer could not be dedoped by dilution. The turning point of doping and dedoping occurred at pH 5.5. The band at 771 nm shifted towards longer wavelengths when the aniline oligomer composites were synthesized using acetone as the solvent. This observation indicates that the molecular chain became stretched. In addition, we also investigated the change of the electronic absorption spectra of the composites with respect to the time laid up.id up.

Transparent conductive oxide layers-embedding heterojunction Si solar cells (투명접합을 이용한 이종 태양전지)

  • Yun, Ju-Hyung;Kim, Mingeun;Park, Yun Chang;Anderson, Wayne A.;Kim, Joondong
    • 한국신재생에너지학회:학술대회논문집
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    • 2011.11a
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    • pp.47.2-47.2
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    • 2011
  • High-efficient transparent conductive oxide (TCO) film-embedding Si heterojunction solar cells were fabricated. An improved crystalline indium-tin-oxide (ITO) film was grown on an Al-doped ZnO (AZO) template upon hetero-epitaxial growth. This double TCO-layered Si solar cell provided significantly enhanced efficiency of 9.23 % as compared to the single TCO/Si devices. The effective arrangement of TCO films (ITO/AZO) provides a good interface, resulting in the enhanced photovoltaic performances. It discusses TCO film arrangement scheme for efficient TCO-layered heterojunction solar cells.

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Self-textured Al-doped ZnO transparent conducting oxide for p-i-n a-Si:H thin film solar cell

  • Kim, Do-Yeong;Lee, Jun-Sin;Kim, Hyeong-Jun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.11a
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    • pp.50.1-50.1
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    • 2009
  • Transparent conductive oxides (TCOs) play an important role in thin-film solar cells in terms of low cost and performance improvement. Al-doped ZnO (AZO) is a very promising material for thin-film solar cellfabrication because of the wide availability of its constituent raw materials and its low cost. In this study, AZO films were prepared by low pressurechemical vapor deposition (LPCVD) using trimethylaluminum (TMA), diethylzinc(DEZ), and water vapor. In order to improve the absorbance of light, atypical surface texturing method is wet etching of front electrode using chemical solution. Alternatively, LPCVD can create a rough surface during deposition. This "self-texturing" is a very useful technique, which can eliminate additional chemical texturing process. The introduction of a TMA doping source has a strong influence on resistivity and the diffusion of light in a wide wavelength range.The haze factor of AZO up to a value of 43 % at 600 nm was achieved without an additional surface texturing process by simple TMA doping. The use of AZO TCO resulted in energy conversion efficiencies of 7.7 % when it was applied to thep-i-n a-Si:H thin film solar cell, which was comparable to commercially available fluorine doped tin oxide ($SnO_2$:F).

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Doping and Annealing Effect on Luminescent Characteristics of $_2$ Phosphor Thin Films (ZnGa$_2$O$_4$형광박막의 발광특성에 미치는 도핑 및 어닐리의 효과)

  • 정영호;정승묵;김석범;김영진
    • Journal of the Korean Ceramic Society
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    • v.35 no.6
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    • pp.619-625
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    • 1998
  • Mn doped {{{{ {Zn {Ga }_{2 }O }_{4 } }} thin film phosphors were prepared on Si(100) wafers and ITO coated glass substrates by rf magnetron sputtering technique and the effects of the substrates dopant and the sputtering paramet-ers were analyzed, Changes of the oreintation were observed after annealine tratment. The grain size of {{{{ {Zn {Ga }_{2 }O }_{4 } }} : Mn thin film deposited on Si wafer was smaller than that on ITO/glass substrate which resulted in higher PL intensity. The PL spectra of Mn doped {{{{ {Zn {Ga }_{2 }O }_{4 } }} thin films showed sharp green luminescence spec-trum. According to CL spectrum it could be concluded that Mn ions acted as an actuator for green emission by substituting Zn atom sites.

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Toward Charge Neutralization of CVD Graphene

  • Kim, Soo Min;Kim, Ki Kang
    • Applied Science and Convergence Technology
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    • v.24 no.6
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    • pp.268-272
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    • 2015
  • We report the systematic study to reduce extrinsic doping in graphene grown by chemical vapor deposition (CVD). To investigate the effect of crystallinity of graphene on the extent of the extrinsic doping, graphene samples with different levels of crystal quality: poly-crystalline and single-crystalline graphene (PCG and SCG), are employed. The graphene suspended in air is almost undoped regardless of its crystallinity, whereas graphene placed on an $SiO_2/Si$ substrate is spontaneously p-doped. The extent of p-doping from the $SiO_2$ substrate in SCG is slightly lower than that in PCG, implying that the defects in graphene play roles in charge transfer. However, after annealing treatment, both PCG and SCG are heavily p-doped due to increased interaction with the underlying substrate. Extrinsic doping dramatically decreases after annealing treatment when PCG and SCG are placed on the top of hexagonal boron nitride (h-BN) substrate, confirming that h-BN is the ideal substrate for reducing extrinsic doping in CVD graphene.

Synthesis and Luminescent Characterization of Eu2+/Dy3+-Doped Sr2MgSi2O7 Powders (Eu2+/Dy3+ 이온이 도핑된 Sr2MgSi2O7 분말 합성 및 발광 특성)

  • Park, Jaehan;Kim, Young Jin
    • Korean Journal of Materials Research
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    • v.24 no.12
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    • pp.658-662
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    • 2014
  • $Eu^{2+}/Dy^{3+}$-doped $Sr_2MgSi_2O_7$ powders were synthesized using a solid-state reaction method with flux ($NH_4Cl$). The broad photoluminescence (PL) excitation spectra of $Sr_2MgSi_2O_7:Eu^{2+}$ were assigned to the $4f^7-4f^65d$ transition of the $Eu^{2+}$ ions, showing strong intensities in the range of 375 to 425 nm. A single emission band was observed at 470 nm, which was the result of two overlapping subbands at 468 and 507 nm owing to Eu(I) and Eu(II) sites. The strongest emission intensity of $Sr_2MgSi_2O_7:Eu^{2+}$ was obtained at the Eu concentration of 3 mol%. This concentration quenching mechanism was attributable to dipole-dipole interaction. The $Ba^{2+}$ substitution for $Sr^{2+}$ caused a blue-shift of the emission band; this behavior was discussed by considering the differences in ionic size and covalence between $Ba^{2+}$ and $Sr^{2+}$. The effects of the Eu/Dy ratios on the phosphorescence of $Sr_2MgSi_2O_7:Eu^{2+}/Dy^{3+}$ were investigated by measuring the decay time; the longest afterglow was obtained for $0.01Eu^{2+}/0.03Dy^{3+}$.

A study on the of Phosphors most suitable a condition of digital FED (디지털전계방출 디스플레이의 형광체 최적조건에 관한 연구)

  • Kim, Soo-Yong
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.11 no.4
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    • pp.754-759
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    • 2007
  • Field emission displays (FED) are currently being explored as a potential flat panel display technology. Specifically, the optimization pf efficient bin emitting phosphors in the $Y_2O_3-Nb_2O_5$ system and influence of particle size of phosphors on the luminescent properties was studied. Under 254 nm excitation, Bi activated $YNbO_4$ phosphors showed a strong and relatively narrow blue omission band, peaking at about 420-450 nm. Especially 0.4 wt% Bi doped yttrium phosphors showed the maximum emission intensity which is almost three times as much as that of $Y_2SiO_5:Ce$ phosphors. Finally, Ce doped $Y_2SiO_5$ phosphors exhibited strong and broad blue emission band, centered at 390-420 nm and maximum emission intensity at the doping concentration of 0.02-0.03 mol.

Deposition Temperature and Annealing Temperature Dependent Structural and Electrical Properties of Ga-doped ZnO on SiC (퇴적 온도와 열처리에 따른 SiC에 퇴적된 Ga 도핑된 ZnO의 구조 및 전기적 특성)

  • Lee, Jung-Ho;Koo, Sang-Mo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.2
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    • pp.121-124
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    • 2012
  • The characteristics of Ga-doped zinc oxide (GZO) thin films deposited at different deposition temperatures (TS~250 to $550^{\circ}C$) on 4H-SiC have been investigated. Structural and electrical properties of GZO thin film on n-type 4H-SiC(0001) were investigated by using x-ray diffraction(XRD), atomic force microscopy(AFM), Hall effect measurement, barrier height from I-V curve and Auger electron spectroscopy(AES). XRD $2\theta$ scan shows GZO thin film has preferential orientation with c-axis perpendicular to SiC substrate surface. The lowest resistivity ($\sim1.9{\times}10^{-4}{\Omega}cm$) was observed for the GZO thin film deposited at $400^{\circ}C$. As deposition temperature increases, barrier height between GZO and SiC was increased. Whereas, resistivity of GZO thin films as well as barrier height between GZO and SiC were increased after annealing process in air atmosphere. It has been found that the c-axis oriented crystalline quality as well as the relative amount of activated Ga3+ ions and oxygen vacancy may affect the electrical properties of GZO films on SiC.