• Title/Summary/Keyword: Si/O-doped

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무반사 특성향상을 위한 tapered 산화아연 나노로드 구조의 제작

  • Cheon, Gwang-Il;Go, Yeong-Hwan;Yu, Jae-Su
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.98-98
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    • 2011
  • 수직으로 정렬된 1차원 나노구조는 입사되는 빛에 대하여 반사율을 줄일 수 있는 유효 굴절률 profile을 갖고 있어, 태양광소자 및 광전자소자의 성능을 향상시키기 위해 널리 응용되어 왔으며, 이러한 수직으로 정렬된 1차원 나노구조를 제작하는 연구가 매우 활발하게 이루어지고 있다. 그 중 화학적 방법으로 성장시킨 산화아연 나노로드(ZnO nanorod)는 비교적 간단하고 저렴한 제작공정을 통해서 높은 결정성을 갖는 수직형 1차원 나노구조체로 이용 할 수 있다. 한편, 효과적인 무반사(antireflection) 층을 제작하기 위해서는 표면에서 발생되는 Fresnel 반사율을 낮춰야 하는데, 이를 위해서 입사되는 매질에서 기판 사이의 유효 굴절률이 연속적이고, 점진적인 변화가 필요하다. 이에 본 연구에서는 무반사 특성향상을 위해서 실리콘 (Si) 기판위에 tapered 산화아연 나노로드를 화학적으로 성장시켜 반사율 특성을 분석하였다. 실험을 위해, 먼저 Si 기판에 AZO (Al doped ZnO) seed 층을 RF magnetron 스퍼터를 사용해 증착한 후, zinc nitrate $Zn(NO_3)_2{\cdot}6H_2O$과 hexamethylentetramines으로 혼합된 용액에 담가두어 산화아연 나노로드를 성장시켰다. Tapered 산화아연 나노로드를 형성하기 위해 용액의 온도를 서서히 낮춤으로 산화아연나노로드의 끝을 뾰족하게 제작할 수 있었다. 한편, 이론적으로 AZO seed 층의 두께에 대한 반사 스펙트럼을 rigorous coupled wave analysis (RCWA) 계산법을 통해서 시뮬레이션을 수행하였으며, 최적화된 AZO seed 층의 두께를 결정하여, 그 위에 tapered 산화아연 나노로드를 성장시켜 반사율을 측정하여 무반사 특성 향상을 확인 할 수 있었다. 또한, 태양광소자 응용을 위해, 표준 AM1.5G 태양광 스펙트럼을 고려한 solar weighted reflection을 계산하였다.

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Characteristics of Low Dielectric Constant SiOF Thin Films with Post Plasma Treatment Time (플라즈마 후처리 시간에 따른 저유전율 SiOF 박막의 특성)

  • Lee, Seok Hyeong;Park, Jong Wan
    • Journal of the Korean Vacuum Society
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    • v.7 no.3
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    • pp.267-267
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    • 1998
  • The fluorine doped silicon oxide (SiOF) intermetal dielectric (IMD) films have been of interest due to their lower dielectric constant and compatibility with existing process tools. However instability issues related to bond and increasing dielectric constant to water absorption when the SiOF films was exposured to atmospheric ambient. Therefore, the purpose of this research is to study the effect of post oxygen plasma treatment on the resistance of moisture absorption and reliability of SiOF film. Improvement of moisture absorption resistance of SiOF film is due to the forming of thin SiO₂layer at the SiOF film surface. It is thought that the main effect of the improvement of moisture absorption resistance was densification of the top layer and reduction in the number of Si-F bonds that tend to associate with OH bonds. However, the dielectric constant was increased when plasma treatment time is above 5 min. In this study, therefore, it is thought that the proper plasma treatment time is 3 min when plasma treatment condition is 700 W of microwave power, 3 mTorr of process pressure and 300℃ of substrate temperature.

Effect of Annealing Time on Electrical Performance of SiZnSnO Thin Film Transistor Fabricated by RF Magnetron Sputtering

  • Ko, Kyung Min;Lee, Sang Yeol
    • Transactions on Electrical and Electronic Materials
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    • v.16 no.2
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    • pp.99-102
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    • 2015
  • Thin film transistors (TFTs) with amorphous 2 wt% silicon-doped zinc tin oxide (a-2SZTO) channel layer were fabricated using an RF magnetron sputtering system, and the effect of post-annealing treatment time on the structural and electrical properties of a-2SZTO systems was investigated. It is well known that Si can effectively reduce the generation of oxygen vacancies. However, it is interesting to note that prolonged annealing could have a bad effect on the roughness of a-2SZTO systems, since the roughness of a-2SZTO thin films increases in proportion to the thermal annealing treatment time. Thermal annealing can control the electrical characteristics of amorphous oxide semiconductor (AOS) TFTs. It was observed herein that prolonged annealing treatment can cause bumpy roughness, which led to increase of the contact resistance between the electrode and channel. Thus, it was confirmed that deterioration of the electrical characteristics could occur due to prolonged annealing. The longer annealing time also decreased the field effect mobility. The a-2SZTO TFTs annealed at 500℃ for 2 hours displayed the mobility of 2.17 cm2/Vs. As the electrical characteristics of a-2SZTO annealed at a fixed temperature for long periods were deteriorated, careful optimization of the annealing conditions for a-2SZTO, in terms of time, should be carried out to achieve better performance.

비정질 실리콘 태양전지 후면 반사막 적용을 위한 저온 증착된 AZO 박막 특성에 관한 연구

  • Kang, Junyoung;Park, Hyeongsik;Yi, Junsin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.315-315
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    • 2016
  • The hydrogenated amorphous silicon (a-Si:H) thin film solar cells using n/Al or n/Ag/Al back reflector have low short circuit current (Jsc) due to high absorption coefficients of Al or work function difference between n-layer and the metal. In this article, we utilized aluminum doped zinc oxide (AZO) to raise the internal reflectance for the improvement of short current density (Jsc) in a-Si:H thin film solar cells. It was found that there was a slight increase in the reflectance in the long wavelength range at the process temperature of 125oC due to improved crystalline quality of the AZO back reflector. The optical band gap (Eg) and work function were affected by the temperature and so did the internal reflectance. The increased internal reflectance within the solar cell resulted in Jsc of 14.94 mA/cm2 and the efficiency of 8.84%. Jsc for the cell without back reflector was 12.29 mA/cm2.

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Characterization of Electrical Properties and Gating Effect of Single Wall Carbon Nanotube Field Effect Transistor

  • Heo, Jin-Hee;Kim, Kyo-Hyeok;Chung, Il-Sub
    • Transactions on Electrical and Electronic Materials
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    • v.9 no.4
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    • pp.169-172
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    • 2008
  • We attempted to fabricate carbon nanotube field effect transistor (CNT-FET) using single walled carbon nanotube(SWNT) on the heavily doped Si substrate used as a bottom gate, source and drain electrode were fabricated bye-beam lithography on the 500 nm thick $SiO_2$ gate dielectric layer. We investigated electrical and physical properties of this CNT-FET using Scanning Probe Microscope(SPM) and conventional method based on tungsten probe tip technique. The gate length of CNT-FET was 600 nm and the diameter of identified SWNT was about 4 nm. We could observed gating effect and typical p-MOS property from the obtained $V_G-I_{DS}$ curve. The threshold voltage of CNT-FET is about -4.6V and transconductance is 47 nS. In the physical aspect, we could identified SWNT with phase mode of SPM which detecting phase shift by force gradient between cantilever tip and sample surface.

Characteristics of a-IGZO TFTs with Oxygen Ratio

  • Lee, Cho;Park, Ji-Yong;Mun, Je-Yong;Kim, Bo-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.341.1-341.1
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    • 2014
  • In the advanced material for the next generation display device, transparent amorphous oxide semiconductors (TAOS) are promising materials as a channel layer in thin film transistor (TFT). The TAOS have many advantages for large-area application compared with hydrogenated amorphous silicon TFT (a-Si:H) and organic semiconductor TFT. For the reasonable characteristics of TAOS, The a-IGZO has the excellent performances such as low temperature fabrication (R.T~), high mobility, visible region transparent, and reasonable on-off ratio. In this study, we investigated how the electric characteristics and physical properties are changed as various oxygen ratio when magnetron sputtering. we analysis a-IGZO film by AFM, EDS and I-V measurement. decreasing the oxygen ratio, the threshold voltage is shifted negatively and mobility is increasing. Through this correlation, we confirm the effect of oxygen ratio. We fabricated the bottom-gate a-IGZO TFTs. The gate insulator, SiO2 film was grown on heavily doped silicon wafer by thermal oxidation method. a-IGZO channel layer was deposited by RF magnetron sputtering. and the annealing condition is $350^{\circ}C$. Electrode were patterned Al deposition through a shadow mask(160/1000 um).

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Novel Deposition Technique of ZnO:Al Transparent Conduction Oxide Layer on Chemically Etched Glass Substrates for High-haze Textured Surface

  • Park, Hyeongsik;Pak, Jeong-Hyeok;Shin, Myunghoon;Bong, Sungjae;Yi, Junsin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.426.1-426.1
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    • 2014
  • For high performance thin film solar cells, texturing surface, enhancing the optical absorptionpath, is pretty important. Textured ZnO:Al transparent oxide layer of high haze is commonly used in Si thin film solar cells. In this paper, novel deposition method for aluminum doped zinc oxide (ZnO:Al) on glass substrates is presented to improve the haze property. The broccoli structure of ZnO:Al layer was formed on chemically etched glass substrates, which showed high haze value on a wide wavelength range.The etching condition of the glass substrates can change not only the haze values of the ZnO:Al of in-situ growth but alsothe electrical and optical properties of the deposited ZnO:Al films.The etching mechanism of the glass substrate affecting on the surface morphology of the glass will be discussed, which resulted in variation of texture of ZnO:Al layer. The optical properties of substrate morphology were also analyzed with EDS and FTIR results. As a result, the high haze value of 85.4% was obtained in the wavelength range of 300 nm to 1100 nm. Furthermore, low sheet resistance of about 5~18 ohm/sq was achieved for different surface morphologies of the ZnO:Al films.

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Gold-Doped Double Injection Magnetic Sensor (금을 도우핑한 이중 주입 자기 센서)

  • Min, Nam-Ki;Lee, Seong-Jae;Henderson, H.T.
    • Proceedings of the KIEE Conference
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    • 1995.07c
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    • pp.1248-1251
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    • 1995
  • This paper reports some results of an experimental investigation of planar double injection magnetic sensors. The threshold voltage proved to be very sensitive to an applied magnetic field. The magnitude and direction of the threshold voltage variation depends on the field strength and its orientation with respect to the conduction chennel. The positively-directed field pushes the carriers into the bulk causing an increase in the threhold voltage. These results seem to agree with a path modulation due to Lorentz force. The application of a negative field causes a negative variation, which is dependent on the surface recombination velocity of the silicon-$SiO_2$ interface.

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Influence of top AZO electrode deposited in hydrogen ambient on the efficiency of Si based solar cell

  • Chen, Hao;Jeong, Yun-Hwan;Chol, Dai-Seub;Park, Choon-Bae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.321-322
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    • 2009
  • Al doped ZnO films deposited on glass substrate using RF magnetron sputtering in Ar and $Ar+H_2$ gas ambient at $100^{\circ}C$. The films deposited in $Ar+H_2$ were hydrogen-annealed at the temperature of $150\sim300^{\circ}C$ for 1hr. The lowest resistivity of $4.25\times10^{-4}{\Omega}cm$ was obtained for the AZO film deposited in $Ar+H_2$ after hydrogen annealing at $300^{\circ}C$ for 1hr. The average transmittance is above 85% in the range of 400-1000 nm for all films. The absorption efficiency of solar cell was improved by using the optimized AZO films as a top electrode.

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Optical and Structural Characteristics of Europium Doped Organic-Inorganic Hybrid Film by Sol-Gel Process (졸겔 공정을 이용하여 Europium을 doping한 유기-무기 복합막의 광학적 및 구조적 특성)

  • 김진균;오동조;김유항;황진명
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.106-106
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    • 2003
  • 최근 집적형 광소자, 레이저 재료, 자료 저장 또는 통신 기술부문에서 제어된 광학적 성질을 갖는 유기-무기 나노 복합체를 만드는 연구가 많은 관심과 주목을 받고 있다. 유기물인 PEG는 대다수의 금속염을 고정시키는 용매 역할을 하는 polymer로써 액체와 같은 특징을 나타내며 무기물인 silica의 network는 순수한 PEG 시스템보다 좋은 기계적 물성을 나타내며, 투명한 물질을 얻을 수 있게 해 준다. 이에 본 연구에서는 SiO2-PEG의 matrix에 우수한 광학적 성질을 지닌 europium을 doping하여 유기-무기 나노 복합막을 합성하여 europium의 농도와 PEG 분자량에 따른 구조적 및 광학적 성질을 알아보고자 한다.

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