• The Journal of Korean Medicine Ophthalmology and Otolaryngology and Dermatology
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• v.24 no.3
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• pp.84-107
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• 2011

Purposes : The purpose of present study is to detect the effects of ointment contained Takrisodok-Eum on the skin barrier's recovery of the Atopic dermatitis. Methods : A total of 44 patients who visited Semyung Oriental Medical Center from April 27th, 2011 to September 20th, 2011 were included in the study. In this study, the patients were treated with Takrisodok-Eum (experimental group) and positive control group. For 8 weeks of gross examination, hematological examination and instrumental asessment were made before and after the study to examine how well the products for experimental group with those for control group in recovering the damaged skin barriers by Atopic dermatitis. Results : 1. In the primary endpoint, SCORAD Index showed a statistically significant decline in experimental group. 2. In the secondary endpoint index of skin hydration, both the experimental group and the control group showed statistical significance. 3. In the secondary endpoint index of TEWL, the experimental group showed greater statistical significance than the control group. 4. In the secondary endpoint index of skin pH, skin pH showed a statistically significant decline in both the control group and the experimental group within the normal range. 5. In the secondary endpoint index of Total IgE, Eosinophil count, IL-10, IL-13, both the experimental group and the control group showed no statistical significance. 6. To evaluate the safety of the products for the human body, hematological examination and hematological biochemical examination, vital sign check were conducted; both control group and experimental group showed no abnormal level. And There were no severe adverse events during this study. Therefore, it is suggested that the safety of the products, if used for certain period, should be safe for the human body. Conclusions : According to the above experiments, it is suggested that Takrisodok-Eum should be effective for the Atopic dermatitis.

• Journal of the Korean Society of Radiology
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• v.14 no.5
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• pp.545-552
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• 2020

The purpose of this study is to derive a lead thickness calculation formula for direct-shielded doors based on NCRP Report No.151 and IAEA Safety Report Series N0.47. After deriving the dose rate calculation formula for the direct shielded door, this formula was substituted for the lead shielding thickness calculation formula to derive the shielding thickness calculation formula at the door. The lead shielding thickness calculated from the derived direct shielded door shielding thickness calculation formula was about 6% lower than that calculated by the NCRP and IAEA secondary barrier shielding thickness calculation methods. This result is interpreted as meaning that the thickness calculation is more conservative from the NCRP and IAEA secondary barrier shielding thickness calculation methods and fits well for secondary beam shielding. In conclusion, it is thought that the formula for calculating lead shielding thickness of the direct shielded door derived in this study can be usefully used in the shield design of the door.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.178-178
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• 2010

With the scaling down of ULSI(Ultra Large Scale Integration) circuit of CMOS(Complementary Metal Oxide Semiconductor)based electronic devices, the electronic devices become more faster and smaller size that are promising field of semiconductor market. However, very narrow line width has some disadvantages. For example, because of narrow line width, deposition of conformal and thin barrier is difficult. Besides, proportion of barrier width is large, thus resistance is high. Conventional PVD(Physical Vapor Deposition) thin films are not able to gain a good quality and conformal layer. Hence, in order to get over these side effects, deposition of thin layer used of ALD(Atomic Layer Deposition) is important factor. Furthermore, it is essential that copper atomic diffusion into dielectric layer such as silicon oxide and hafnium oxide. If copper line is not surrounded by diffusion barrier, it cause the leakage current and devices degradation. There are some possible methods for improving the these secondary effects. In this study, TaNx, is used of Tertiarybutylimido tris (ethylamethlamino) tantalum (TBITEMAT), was deposited on the 24nm sized trench silicon oxide/silicon bi-layer substrate with good step coverage and high quality film using plasma enhanced atomic layer deposition (PEALD). And then copper was deposited on TaNx barrier using same deposition method. The thickness of TaNx was 4~5 nm. TaNx film was deposited the condition of under $300^{\circ}C$ and copper deposition temperature was under $120^{\circ}C$, and feeding time of TaNx and copper were 5 seconds and 5 seconds, relatively. Purge time of TaNx and copper films were 10 seconds and 6 seconds, relatively. XRD, TEM, AFM, I-V measurement(for testing leakage current and stability) were used to analyze this work. With this work, thin barrier layer(4~5nm) with deposited PEALD has good step coverage and good thermal stability. So the barrier properties of PEALD TaNx film are desirable for copper interconnection.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.63 no.1
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• pp.80-84
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• 2014

The discharge characteristics of Surface Dielectric Barrier Discharge (SDBD) reactor are investigated to find optimal driving condition with adjusting various parameter. When the high voltage with sine wave form is applied to SDBD source, successive pulsed current waveforms are observed owing to multiple ignitions through the long discharge channel and wall charge accumulation on the dielectric surface. The discharge voltage, total charge between dielectrics, mean energy and power are calculated from measured current and voltage according to electrode gap and dielectric thickness. Discharge mode transition from filamentary to diffusive glow is observed for narrow gap and high applied voltage case. However, when the diffusive discharge is occurred with high applied voltage, the actual firing voltage is always lower than that with low driving voltage. The $Si_3N_4$, $MgF_2$, $Al_2O_3$ and $TiO_2$ are considered for dielectric protection and high secondary electron emission coefficient. SDBD with $MgF_2$ shows the lowest breakdown voltage. $MgF_2$ thin film is proposed as a protection layer for low voltage atmospheric dielectric barrier discharge devices.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.176-177
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• 2016

In the last few decades, attention toward atmospheric pressure plasma (APP) has been greatly increased due to the numerous advantages of those applications, such as non-necessity of high vacuum facility, easy setup and operation, and low temperature operation. The practical applications of APP can be found in a wide spectrum of fields from the functionalization of material surfaces to sterilization of medical devices. In the secondary battery industry, separator film has been typically treated by APP to enhance adhesion strength between adjacent films. In this process, the plasma is required to have high stability and uniformity for better performance of the battery. Dielectric barrier discharge (DBD) was usually adopted to limit overcurrent in the plasma, and we developed the pre-discharge technology to overcome the drawbacks of streamer discharge in the conventional DBD source which makes it possible to produce a super-stable plasma at atmospheric pressure. Simulations for the fluid flow and electric field were parametrically performed to find the optimized design for the linear jet plasma source. The developed plasma source (Plasmapp LJPS-200) exhibits spatial non-uniformity of less than 3%, and the adhesion strength between the separator and electrode films was observed to increase 17% by the plasma treatment.

• International Journal of Knowledge Content Development & Technology
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• v.12 no.1
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• pp.35-47
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• 2022

This study adopted the descriptive survey research method. The population of this study comprised of the hearing impaired students in selected government secondary schools in Rivers state. The population of hearing impaired students in Rivers State is 257. A simple random sampling technique was used to select a sample size of 159. A self-developed instrument titled "Availability and Utilization of Library Information Resources Questionnaire (AULIRQ)" was utilized for data collection. 153 responses were collated, indicating a 96.2% response rate. The data collected was arranged and analyzed using frequency count, percentages, and mean and standard deviation. Finding reveals that information resources in the libraries understudied were inadequate and under-utilized. Also, it was established that among other barriers, under-funding is a major barrier to making information resources available for the physically challenged. It was recommended that schools offering special education for the hearing impaired should pace up in their developmental gap by providing such resources and ensure adequate funding by all stakeholders.

• Journal of Korean Society for Atmospheric Environment
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• v.20 no.5
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• pp.625-632
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• 2004

Perfluorocompounds ($PFC_s$), such as tetrafluoromethane ($CF_4$) and hexafluoroethane ($C_2F_6$), have been widely used as plasma etching and chemical vapor deposition (CVD) gases for semiconductor manufacturing processes. Since these $PFC_s$ are known to cause a greenhouse effect intensively, there has been a growing interest in reducing $PFC_s$ emissions. Among various $CF_4$ decomposing techniques, a dielectric barrier discharge (DBD) is considered as one of a promising candidate because it has been successfully used for generating ozone ($O_3$) and decomposing nitrogen oxide (NO). Firstly, optimal concentration of oxygen for $CF_4$ decomposition was found to figure out how many primary and secondary reactions are associated with DBD process. Secondary, to find effective discharge method for $CF_4$ decomposition, a streamer and a glow mode in DBD are experimentally compared, which includes (i) coaxialcylinder DBD, (ii) DBD reactor packed with glass beads. and (iii) a glow mode operation with a helium gas. The test results showed that optimal concentration of oxygen was ranged 500 ppm~1% for treating 500 ppm of $CF_4$ and helium glow discharge was the most efficient one to decompose $CF_4$.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.24 no.5
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• pp.160-168
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• 2010

This paper tried to find out NO generation and removal mechanisms in the space of the atmospheric pulsed barrier discharge using laser induced fluorescence method, which is a very effective approach to the measurement of spatio-temporal density of specific molecules. The propagation velocity of the primary streamer reaches about $2.7{\times}10^6$[m/s] and the secondary streamer is produced in the vicinity of positive electrode after the primary streamer finished. In this work, pulse Nd:Yag and Dye lasers are used for generating the specific wavelength of 226[nm], which is possible to excite NO molecules into $A^2{\Sigma}^+{\rightarrow}X^2{\prod}$(0,0) and fluorescence signals as the transition of $A^2{\Sigma}^+{\leftarrow}X^2$(0,2) is measured. For the effective removal of NO molecules in the plasma discharge process, the lower oxygen contents are needed and the influence of secondary streamer for the reduction mechanism of NO molecules is important

• Transactions of the Korean Society of Machine Tool Engineers
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• v.14 no.1
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• pp.44-51
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• 2005

Material degradation is a multibillion-dollar problem which affects all the industries amongst others. The last decades have seen the development of newer and more effective techniques such as Focused-ion beam(FIB), Transmission electron microscopy(TEM), Secondary-ion mass spectroscopy(SIMS), auger electron spectroscopy(AES), X-ray Photoelectron spectroscopy(XPS) , Electrochemical impedance spectroscopy(EIS), Photo- stimulated luminescence spectroscopy(PSLS), etc. to study various forms of material degradation. These techniques are now used routinely to obtain information on the chemical state, depth profiling, composition, stress state, etc. to understand the degradation behavior. This paper describes the use of these techniques specifically applied to materials degradation and failure analysis.

• Journal of the Society of Naval Architects of Korea
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• v.58 no.4
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• pp.262-270
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• 2021

Consumption of Liquefied Natural Gas (LNG) has increased due to environmental pollution; therefore, the need for LNG carriers can efficiently transport large quantities of LNG, is increased. In various types of LNG Cargo Containment System (CCS), Membrane-type MARK-III composed of composite materials is generally employed in the construction of an LNG carrier. Among composite materials in a Mark-III system, glass-fiber composites act as a secondary barrier to prevent the inner hull structure from leakage of LNG when the primary barrier is damaged. Nevertheless, several cases of damage to the secondary barriers have been reported and if damage occurs, LNG can flow into the inner hull structure, causing a brittle fracture. To prevent those problems, this study conducted the applicability assessment of composite material manufactured by bonding glass-fiber and aluminum with epoxy resin and increasing layer from three-ply (triplex) to five-ply (pentaplex). Tensile tests were performed in five temperature points (25, -20, -70, -120, and -170℃) considering temperature gradient in CCS. Scanning Electron Microscopy (SEM) and Coefficient of Thermal Expansion (CTE) analyses were carried out to evaluate the microstructure and thermos-mechanical properties of the pentaplex. The results showed epoxy resin and increasing layer number contributed to improving the mechanical properties over the whole temperature range.