• 제목/요약/키워드: Scanning photoemission microscopy

검색결과 15건 처리시간 0.044초

Adsorption Structure and Doping Effect of Azidotrimethyltin on Graphene

  • 양세나;최정헌;김기정;김세훈;이한길
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.181-181
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    • 2011
  • The adsorption structure and the electronic property of azidotrimethyltin (ATMT) on monolayer graphene was investigated using scanning tunneling microscopy and core-level photoemission spectroscopy. We also confirmed the n-type doping effect by scanning tunneling spectroscopy and work function measurements. We will systematically demonstrate the variation of characteristic of graphene induced by the chemical functionalized molecule as we confirmed the results using scanning tunneling microscopy in conjunction with core-level photoemission spectroscopy.

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SPEM & PEEM (Scanning Photoelectron Microscopy & PhotoEmission Electron Microscopy)

  • 신현준
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.83-83
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    • 2012
  • 본 강연에서는 방사광 연X-선 분광현미경학(spectro-microscopy) 중에서, 표면에서 방출되는 광전자를 이용하는 SPEM (Scanning Photoelectron Microscopy)과 PEEM (Photoemission Electron Microscopy)을 소개하고자 한다. SPEM은 입사하는 X-선을 작은 크기로 집속하여 특정의 작은 공간에서 광전자분광학(XPS) 데이터를 얻거나 특정 광전자에너지의 공간분포를 얻게 해주며, PEEM은 입사한 X-선에 의해 발생한 광전자를 전자렌즈 원리로 영상을 맺히게 하여 광전자의 발생 분포를 구하게 한다. 이들은 균일하지 아니한 이종의 표면 연구에 매우 유용한 측정기법들이지만, 그 원리 및 구성은 많은 차이점들을 가지고 있다. 예를 들어, SPEM은 시료를 scanning하면서 XPS에 보다 충실한 타입이고 PEEM은 full field imaging 타입으로 표면변화의 동역학 연구에 강점이 있다. 본 강의에서는 이들 각각의 원리, 장점들에 대해서 설명하고, 활용 예를 제시하고자 한다. 활용 분야에 있어서, SPEM의 경우는 포항가속기연구소의 SPEM으로 수행되었던 DMS, graphene, nano-lithography, OLED, 등 반도체 및 나노 소재, 소자에의 활용에 대한 예를 제시할 것이다. PEEM의 경우는 포항가속기연구소의 응용 예와 박막 형태의 magnetic material에 대한 예들을 제시할 것이다.

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Free-standing graphene intercalated nanosheets on Si(111)

  • Pham, Trung T.;Sporken, Robert
    • 전기전자학회논문지
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    • 제21권3호
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    • pp.297-308
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    • 2017
  • By using electron beam evaporation under appropriate conditions, we obtained graphene intercalated sheets on Si(111) with an average crystallite size less than 11nm. The formation of such nanocrystalline graphene was found as a time-dependent function of carbon deposition at a substrate temperature of $1000^{\circ}C$. The structural and electronic properties as well as the surface morphology of such produced materials have been confirmed by reflection high energy electron diffraction, Auger electron spectroscopy, X-ray photoemission spectroscopy, Raman spectroscopy, scanning electron microscopy, atomic force microscopy and scanning tunneling microscopy.

Scanning Photoelectron Microscopy Study on the Chemical State of Locally Oxidized and Hydrogenized Graphene Layer

  • Km, Wondong;Byun, Iksu;Hwang, Inrok;Park, Bae Ho;Baek, Jaeyun;Shin, Hyun-Joon;Shiu, Hung Wei;Chen, Chia-Hao
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.144.1-144.1
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    • 2013
  • Recently, we have developed the local oxidization and hydrogenization method for graphene layer using atomic force microscope(AFM) tip at room temperature and ambient pressure. With this method we could create locally oxidized or hydrogenized area on the graphene layer with various size from nanometer to micrometer scale, by controlling the amplitude and polarity of the voltage supplied between conducting AFM tip and the graphene layer. We investigated the chemical states of functionalized C atoms in the graphene layer using scanning photoelectron microscopy. By measuring C 1s core level X-ray Photoemission Spectra of the C atoms and suitable fitting process carried on the measured spectra, we could obtain the fraction of oxidization and hydrogenization under various condition, and the evolution of each chemical state during thermal annealing process.

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Amorphous Carbon Films on Ni using with $CBr_4$ by Thermal Atomic Layer Deposition

  • 최태진;강혜민;윤재홍;정한얼;김형준
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2011년도 추계학술발표대회
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    • pp.28.1-28.1
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    • 2011
  • We deposited the carbon films on Ni substrates by thermal atomic layer deposition (th-ALD), for the first time, using carbon tetrabromide ($CBr_4$) precursors and H2 reactants at two different temperatures (573 K and 673 K). Morphology of carbon films was characterized by scanning electron microscopy (SEM). The carbon films having amorphous carbon structures were analyzed by X-ray photoemission spectroscopy (XPS) and Raman spectroscopy. As the working temperature was increased from 573 K to 673 K, the intensity of C1s spectra was increased while that of O1s core spectra was reduced. That is, the purity of carbon films containing bromine (Br) atoms was increased. Also, the thin amorphous carbon films (ALD 3 cycle) were transformed to multilayer graphene segregated on Ni layer, through the post-annealing and cooling process.

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Selective Catalytic Etching of Graphene by SiOx Layer Depletion

  • 이경재;임규욱;양미현;강태희;정석민
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.163.2-163.2
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    • 2014
  • We report catalytic decomposition of few-layer graphene on an $Au/SiO_x/Si$ surface wherein oxygen is supplied by dissociation of the native $SiO_x$ layer at a relatively low temperature of $400^{\circ}C$. The detailed chemical evolution of the graphene covered $SiO_x/Si$ surface with and without gold during the catalytic process is investigated using a spatially resolved photoelectron emission method. The oxygen atoms from the native $SiO_x$ layer activate the gold-mediated catalytic decomposition of the entire graphene layer, resulting in the formation of direct contact between the Au and the Si substrate. The notably low contact resistivity found in this system suggests that the catalytic depletion of a $SiO_x$ layer could realize a new way to micromanufacture high-quality electrical contact.

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Characterization of functionalized silicon surfaces and graphenes using synchrotron radiation PES

  • 황찬국
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.40-40
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    • 2010
  • Employing synchrotron radiation based photoemission spectroscopy (PES) and scanning tunneling microscopy (STM), our group have investigated Si surfaces, various graphenes and molecular nanolayers. In this talk, I introduce recent results on the surface related systems. All experiments have been performed at the surface science beamlines, 3A2 and 7B1, in Pohang Accelerator Laboratory, where high resolution PES (HRPES) and angle resolved PES (ARPES) are available. Metals or molecules are adsorbed and sometimes extreme ultraviolet is irradiated onto surfaces to give them special functions. I show several examples for surface functionalzation and how to characterize solid surface using the analysis techniques. In particular, lots of ARPES and STM data are provided from graphenes, a strong candidate for replacing Si and conducting oxide currently used in many electronic and optical devices.

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High Crystalline Epitaxial Bi2Se3 Film on Metal and Semiconductor Substrates

  • 전정흠;장원준;윤종건;강세종
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.302-302
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    • 2011
  • The binary chalcogenide semiconductor Bi2Se3 is at the center of intensive research on a new state of matter known as topological insulators. It has Dirac point in their band structures with robust surface states that are protected against external perturbations by strong spin-orbit coupling with broken inversion symmetry. Such unique band configurations were confirmed by recent angle-resolved photoelectron emission spectroscopy experiments with an unwanted n-type doping effect, showing a Fermi level shift of about 0.3 eV caused by atomic defects such as Se vacancies. Since the number of defects can be reduced using the molecular beam epitaxy (MBE) method. We have prepared the Bi2Se3 film on noble metal Au(111) and semiconductor Si(111) substrates by MBE method. To characterize the film, we have introduced several surface sensitive techniques including x-ray photoemission electron spectroscopy (XPS) and micro Raman spectroscopy. Also, crystallinity of the film has been confirmed by x-ray diffraction (XRD). Using home-built scanning tunneling microscope, we observed the atomic structure of quintuple layered Bi2Se3 film on Au(111).

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Binary Compound Formation upon Copper Dissolution: STM and SXPS Results

  • Hai, N.T.M.;Huemann, S.;Hunger, R.;Jaegermann, W.;Broekmann, P.;Wandelt, K.
    • Corrosion Science and Technology
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    • 제6권4호
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    • pp.198-205
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    • 2007
  • The initial stages of electrochemical oxidative CuI film formation on Cu(111), as studied by means of Cyclic Voltammetry (CV), in-situ Scanning Tunneling Microscopy (STM) and ex-situ Synchrotron X-ray Photoemission Spectroscopy (SXPS), indicate a significant acceleration of copper oxidation in the presence of iodide anions in the electrolyte. A surface confined supersaturation with mobile CuI monomers first leads to the formation of a 2D-CuI film via nucleation and growth of a Cu/I-bilayer on-top of a pre-adsorbed iodide monolayer. Structurally, this 2D-CuI film is closely related to the (111) plane of crystalline CuI (zinc blende type). Interestingly, this film causes no significant passivation of the copper surface. In an advanced stage of copper dissolution a transition from the 2D- to a 3D-CuI growth mode can be observed.