• 마이크로전자및패키징학회지
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• 제14권4호
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• pp.71-77
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• 2007

본 연구에서는 리플로우 횟수를 달리하여 Sn-37Pb, Sn-3.5Ag와 Sn-3.5Ag-0.75Cu (all wt.%) BGA 솔더 접합부들을 OSP가 코팅된 Cu 패드 상에 형성시킨 후, 기계적 전기적 특성을 연구하였다. 주사전자현미경 분석 결과, 접합 계면에 생성된 $Cu_6Sn_5$ 금속간화합물 층의 두께는 리플로우 횟수가 증가함에 따라 증가하였다. Sn-Pb와 Sn-Ag-Cu 솔더 접합부의 경우, 3회 리플로우 후 최대 전단 강도를 나타내었으며, Sn-Ag 솔더 접합부의 경우 4회 리플로우 후 최대 전단 강도를 나타내었다. 이후 리플로우 횟수가 10회까지 증가함에 따라 전단 강도는 점차 감소하였다. 리플로우 횟수가 증가함에 따라 전기적 특성은 점차 감소하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.112-112
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• 2008

박막형 태양전지에 관한 연구는 1954년 D.C. Reynolds 가 단결정 CdS 에서 광기전력을 발견하면서부터 시작되었다. 고효율 단결정 규소 태양전지가 간편하게 제작되고 박막형 태양전지의 수명문제가 대두되어 한때는 연구가 중단되어지기도 하였으나, 에너지 문제가 심각해지면서 값이 저렴하고 넓은 면적에 쉽게 실용화 할 수 있는 박막형 태양전지에 많은 관심을 가지게 되었다. 박막형 태양전지에 사용되는 CdS는 II-VI 족 화합물 반도체로서 에너지금지대폭이 2.42eV인 직접천이형 n-type 반도체로서 대부분의 태양광을 통과시킬 수 있으며 가시광선을 잘 투과시키고 낮은 비저항으로서 광흡수층인 CdTe/$CuInSe_2$ 등과 같이 태양전지의 광투과층(윈도레이어)으로 널리 사용되고 있다. 이러한 이종접합 박막형 태양전지의 효율을 높이기 위해선 윈도레이어 재료인 CdS 박막의 낮은 전기 비저항치와 높은 광 투과도 값이 요구되어지고 있다. CdS 박막의 제작방법으로는 spray pyrolysis법, 스크린프린팅, 소결법, puttering법, 전착법, CBD(chemical bath deposition)법 및 진공증착법 등의 여러 가지 방법들이 보고되었다. 이 중 sputtering의 경우, 다른 방법들에서는 얻기 어려운 매우 얇은 두께의 박막 증착이 가능하며, 균일성 또한 우수하다. 또한 대면적화가 용이하여 양산화 기술로는 다른 제조 방법들에 비해 많은 장점을 가지고 있다. 따라서 본 연구에서는 sputtering에 의해 증착한 CdS의 박막에 광투과도 등의 향상을 위하여 CMP( chemical mechanical polishing) 공정을 적용하여 표면 특성을 개선하고자 하였다. 그 기초적인 자료로서 CdS 박막의 CMP 공정 조건에 따른 연마율과 비균일도, 표면 특성 등을 ellipsometer, AFM(atomic force microscopy) 및 SEM(scanning electron microscope) 등을 활용 하여 분석하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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• pp.204-204
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• 1999

The plasma source ion implantation(PSII) technique which is a method using high negative voltage pulse in plasma system has the potential to change the surface properties of polymer. PSII technique increase the surface free energy by introducing polar functional groups on the surface so that it improves reactivity, hydrophilicity, adhension, biocompatability, etc. However, the mobility of polymer chains enables the modified surface layers to adapt their composition to interfacial force. This hydrophobic recovery interrupts the stability of modified surfaces to keep for the long time. In this study, poly(methyl methacrylate)(PMMA), poly(2-hydroxyethyl methacrylate)(PHEMA), and polu(2-hydroxypropyl methacylate)(PHPMA) for contact lens application, were modified to improve the wettability with PSII technique and were investigated the surface stabilities. Polymer film was prepared with solution casting(3 wt.% solution) and was annealed at 11$0^{\circ}C$ under vacuum oven to remove solvent completely and to eliminate physical ageing. The thickness of the film measured by scanning electron microscopy (SEM) and surface profilometer was about 10${\mu}{\textrm}{m}$. Polymers were treated with different kinds of gases, pulse frequency, pulse with, pulse voltage, and treatment time. Even though PMMA, PHEMA, and PHPMA have similar repeat unit structure, the optimal treatment conditions and the tendency to hydrophobic recovery were different. PHPMA, more hydrophilic polymer than PMMA and PHEMA showd better wettability and stability after mild treatment. Surface tensions were obtained by water and diiodomethane contact angle measurements to monitor the relation between hydrophobic recovery and polymer structure. Different ion species in plasma change the polar component and dispersion component of polymer surface. For better wettability surface, the increase of polar component was a dominant factor. We also characterized modified polymer surfaces using x-ray photoelectron spectroscopy(XPS), secondary ion mass spectrometry(SIMS), Fourier Transform infrared spectroscopy(FT-IR), and SEM.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.197-197
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• 2011

In this study, in contrast with cases in which Scanning Tunneling Microscopy (STM) tip-induced reactions were instigated by the tunneling electrons, the local electric field, or the mechanical force between a tip and a surface, we found that the tungsten oxide (WO3) covered tungsten (W) tip of a STM acted as a chemical catalyst for the S-H dissociative adsorption of phenylthiol and 1-octanethiol onto a Ge(100) surface. By varying the distance between the tip and the surface, the degree of the tip-catalyzed adsorption could be controlled. We have found that the thiol head-group is the critical functional group for this catalysis and the catalytic material is the WO3 layer of the tip. After removing the WO3 layer by field emission treatment, the catalytic activity of the tip has been lost. 3-mercapto isobutyric acid is a chiral bi-functional molecule which has two functional groups, carboxylic acid group and thiol group, at each end. 3-Mercapto Isobutyric Acid adsorbs at Ge(100) surface only through carboxylic acid group at room temperature and this adsorption was enhanced by the tunneling electrons between a STM tip and the surface. Using this enhancement, it is possible to make thiol group-terminated surface where we desire. On the other hand, surprisingly, the WO3 covered W tip of STM was found to act as a chemical catalyst to catalyze the adsorption of 3-mercapto isobutyric acid through thiol group at Ge(100) surface. Using this catalysis, it is possible to make carboxylic acid group-terminated surface where we want. This functional group-selective adsorption of bi-functional molecule using the catalysis may be used in positive lithographic methods to produce semiconductor substrate which is terminated by desired functional groups.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.322-322
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• 2013

최근 전자제품들의 소형화, 경량화, 다기능화가 활발히 진행됨에 따라, 고성능의 고출력용 인쇄회로기판(PCB)의 개발이 요구되고 있다. PCB는 전자제품의 각 부품을 전기적으로 연결하는 통로로서 전자제품의 소형화, 다기능화에 따라 고집적화가 요구되고 있다. 하지만 모든 전자장비의 고장의 85% 정도가 발열에 의한 것으로, PCB의 고집적화에 따른 발열문제가 매우 중요한 이슈가 되고 있다. 최근에는 이러한 문제점을 해결하기 위해 PCB의 방열층으로 양극 산화막을 금속 기판 위에 형성하고 이 절연층 위에 금속층을 회로로서 형성하는 방열 PCB 기판에 대한 연구가 활발히 진행되고 있다. 최근까지, 금속층 회로 형성을 위해 무전해 Ni 도금에 대한 연구가 활발히 이루어져 왔다. 하지만 주로 화학적, 전기화학적 관점에서 많은 연구자들에 의해 조사 연구되어 왔다. 본 실험에서는 anodized Al 절연층 위의 회로전극 부분으로 스크린 방법으로 Ag paste를 패턴 인쇄한 뒤, 무전해도금 방식으로 저렴한 Ni 전면 회로전극을 형성하여 전기전도도를 높이고, 저항을 낮출 수 있는 회로로서 기판의 손상을 최소화하고 선택적으로 Ag 패턴에만 Ni 전극회로를 형성시키는 것을 목표로 연구하였다. Ni-B 무전해 도금시 도금조의 온도는 $65^{\circ}C$, 무전해 도금액의 pH는 ~7 (중성)로 유지하였다. Al2O3 기판을 이용한 Ag Paste 패턴 위에 증착된 Ni-B 박막의 특성을 분석하기 위해 X-ray diffraction (XRD), AFM (Atomic Force Microscopy), SEM (Scanning Electron Microscope), XPS (X-ray Photoelectron Spectroscopy)을 이용하여 Ni-B 박막의 특성을 분석하였다.

• 접착 및 계면
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• 제11권2호
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• pp.70-75
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• 2010

본 연구에서는 양친성 빗 모양 고분자인 methyl methacrylate-based polyethylene glycol (PMMA-b-PEG)의 박막을 polydimethylsiloxane (PDMS) 표면에 형성하여 표면 친수성을 증진시키고 고분자 코팅에 따른 세포 독성의 증가 여부를 확인하고자 하였다. PMMA-b-PEG 고분자 용액을 스핀 코팅의 방법으로 PDMS 표면에 도포하였으며, 장기간의 접촉각 측정을 통하여 표면 성질의 변화를 관찰하였고, 박막의 표면 안정성은 전계 방출 주사전자현미경과 원자힘 현미경 분석을 통하여 확인하였다. 안정적으로 형성된 PMMA-b-PEG 박막의 세포 독성여부는 MTT 시험법을 이용하여 확인하였다. 이러한 세포 독성 평가(in vitro)는 생체주입 후에 있을 조직적합성 평가(in vivo)에 앞서 주요한 결과 자료로 활용될 수 있으며, PMMA-b-PEG 박막이 형성된 PDMS의 경우 생체주입이 가능함을 나타내었다.

• 대한치과교정학회지
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• 제41권5호
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• pp.361-370
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• 2011

Objective: Speedy surgical orthodontics (SSO), an innovative orthodontic treatment, involves the application of orthopedic forces against temporary skeletal anchorage devices following perisegmental corticotomy to induce movement of specific dental segments. Herein, we report the biological effects of SSO on the teeth and periodontal structures. Methods: Five beagle dogs were divided into 2 groups and their 6 maxillary incisors were retracted $en$ $masse$ by applying 500 g orthopedic force against a single palatal mini-plate. Retraction was performed without and with perisegmental corticotomy in groups I and II, respectively. All animals were killed on the 70th day, and their periodontal structures were processed for histologic analyses and scanning electronic microscopy (SEM). The linear distance between the third maxillary incisor and canine was used as a benchmark to quantify the retraction amount. Results: Retraction was markedly faster and retraction amount greater in group II than in Group I. Surprisingly, Group II did not show any root resorption despite extensive retraction, while Group I showed prominent root surface irregularities. Similarly, SEM showed multiple resorption lacunae in Group I, but not in Group II. Conclusions: SSO is an effective and favorable orthodontic approach for major en masse retraction of the maxillary anterior teeth.

• 한국전기전자재료학회논문지
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• 제26권7호
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• pp.503-509
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• 2013

In this study, $Cu(In_{1-x},Ga_x)Se_2$ (CIGS) thin films were prepared on the Mo coated soda-lime glass by the DC magnetron sputtering and a subsequent selenization process. For the selenization process, selenization rapid thermal process(RTP) with cracker cell, which was helpful to smaller an atomic of Se, was adopted. To make CIGS layer, they were then annealed with the cracked Se. Based on this selenization method, we made several CIGS thin film and investigated the effects of In deposition time, and selenization time. Through x-ray diffraction (XRD), scanning electron microscope (SEM), energy dispersive spectroscopy (EDS), and atomic force microscopy (AFM), it is found that the Mo/In/CuGa structure and the high sputtering power shows the dominant chalcopyrite structure and have a uniform distribution of the grain size. The CIGS films with the In deposition time of 5 min has the best structure due to the smooth surface. And CIGS films with the selenization time of 50 min show good crystalline growth without any voids.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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• pp.74-77
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• 2004

[ $HfO_2$ ] dielectric layers were grown on the p-type Si(100) substrate by metalorganic molecular beam epitaxy(MOMBE). Hafnium $t-butoxide[Hf(O{\cdot}t-C_4H_9)_4]$ was used as a Hf precursor and Argon gas was used as a carrier gas. The thickness of the layers was measured by scanning electron microscopy (SEM) and high-resolution transmission electron measurement(HR-TEM). The properties of the $HfO_2$ layers were evaluated by X-ray diffraction(XRD), high frequency capacitance-voltage measurement(HF C-V), current-voltage measurement(I-V), and atomic force measurement(AFM). HF C-V measurements have shown that $HfO_2$ layer grown by MOMBE has a high dielectric constant(k=19-21). The properties of $HfO_2$ films are affected by various process variables such as substrate temperature, bubbler temperature, Ar, and $O_2$ gas flows. In this paper, we examined the relationship between the $O_2/Ar$ gas ratio and the electrical properties of $HfO_2$.

• 대한치과기공학회지
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• 제41권2호
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• pp.71-80
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• 2019

Purpose: In this study, to evaluate the effect of oxide changes on the shear bond strength according to the composition of Ni-Cr alloys for porcelain fused matal crown, T-4 alloys, Zeroy alloys and Zeroy-X alloys were selected. Methods: 20 specimens were fabricated using selected Ni-Cr alloys and porcelain powders. A Ni-Cr alloy having a diameter of 5 mm and a height of 25 mm was produced and the metal surface was polished. Porcelain powder was fired on the polished metal surface to a diameter of 5 mm and a height of 3 mm. The experiment group consisted of three groups, T-4(TNA), Zeroy(ZNA) and Zeroy-X(ZXA). The fabricated specimens were mounted on a jig of a universal testing machine(UTM) and fracture strength was measured by applying a shear force at a UTM crosshead speed of 0.5 mm/min. The fracture strength was calculated as the bond strength between the porcelain and the alloy. The surface of the fractured alloy was analyzed by X-ray diffraction(XRD) and scanning electron microscopy(SEM), and the components of the oxide were measured by energy dispersive X-ray spectroscopy(EDX) line profile method. Results: In SEM, XRD and EDX analysis, yttrium tended to increase the mechanical and chemical bonding forces. The shear bond strength of ZXA group containing yttrium showed the highest value at 27.53 MPa. Conclusion: Based on the results of this study, it is considered that the yttrium-added Ni-Cr alloy is clinically acceptable in porcelain shear bond strength.