• Title/Summary/Keyword: Saturated vapor density

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Modeling of Thermodynamic Properties of Saturated state Hydrogen using Equation of State (상태방정식을 이용한 포화상태 수소의 열역학적 물성 모델링)

  • Bong-Seop Lee;Hun Yong Shin;Choong Hee Joe
    • Korean Chemical Engineering Research
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    • v.61 no.4
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    • pp.550-554
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    • 2023
  • Fossil energy sources are limited in their sustainable use and expansion due to global warming caused by carbon dioxide emissions. Hydrogen is considered as a promising alternative to traditional fossil fuels. To ensure the stable long-term storage, it is necessary to accurately predict its thermodynamic properties at cryogenic temperatures. Therefore, this study aimed to investigate thermodynamic properties, such as saturated vapor pressure and density, enthalpy, and entropy of liquid and gas, using cubic equations of state that demonstrate relatively simple relationships. Among the three types of equations of state (Redlich-Kwong (RK), Soave-Redlich-Kwong (SRK), and Peng-Robinson (PR)), the SRK model exhibited relatively accurate prediction results for various physical properties.

Hydro-mechanical behavior of compacted silt over a wide suction range

  • Chen, Bo;Ding, Xiuheng;Gao, You;Sun, De'an;Yu, Haihao
    • Geomechanics and Engineering
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    • v.22 no.3
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    • pp.237-244
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    • 2020
  • To achieve a wide suction range, the low suction was imposed on compacted silt specimens by the axis translation technique and the high suction was imposed by the vapor equilibrium technique with saturated salt solutions. Firstly, the results of soil water retention tests on compacted silt show that the soil water retention curves in terms of gravimetric water content versus suction relation are independent of the dry density or void ratio in a high suction range. Therefore, triaxial tests on compacted silt with constant water content at high suctions can be considered as that with constant suction. Secondly, the results of triaxial shear tests on unsaturated compacted silt with the initial void ratio of about 0.75 show a strain-hardening behavior with a slightly shear contraction and then strain-softening behavior with an obviously dilation. As the imposed suction increases, the shear strength increases up to a peak value and then decreases when the suction is beyond a special value corresponding to the peak shear strength. The residual strength increases to fair value and those at high suctions are almost independent of imposed suctions. In addition, the contribution of suction to the strength of compacted silt would not diminish even in a high suction range.

A study on the nonvolatile memory characteristics of MNOS structures with double nitride layer (2층 질하막 MNOS구조의 비휘발성 기억특성에 관한 연구)

  • 이형욱
    • Electrical & Electronic Materials
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    • v.9 no.8
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    • pp.789-798
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    • 1996
  • The double nitride layer Metal Nitride Oxide Semiconductor(MNOS) structures were fabricated by variating both gas ratio and nitride thickness, and by duplicating nitride deposited and one nitride layer MNOS structure to improve nonvolatile memory characteristics of MNOS structures by Low Pressure Chemical Vapor Deposition(LPCVD) method. The nonvolatile memory characteristics of write-in, erase, memory retention and degradation of Bias Temperature Stress(BTS) were investigated by the homemade automatic .DELTA. $V_{FB}$ measuring system. In the trap density double nitride layer structures were higher by 0.85*10$^{16}$ $m^{-2}$ than one nitride layer structure, and the AVFB with oxide field was linearly increased. However, one nitride layer structure was linearly increased and saturated above 9.07*10$^{8}$ V/m in oxide field. In the erase behavior, the hole injection from silicon instead of the trapped electron emission was observed, and also it was highly dependent upon the pulse amplitude and the pulse width. In the memory retentivity, double nitrite layer structures were superior to one nitride layer structure, and the decay rate of the trapped electron with increasing temperature was low. At increasing the number on BTS, the variance of AVFB of the double nitride layer structures was smaller than that of one nitride layer structure, and the trapped electron retention rate was high. In this paper, the double nitride layer structures were turned out to be useful in improving the nonvolatile memory characteristics.

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Optical Properties of Silicon Oxide (SiOx, x<2) Thin Films Deposited by PECVD Technique (PECVD 방법으로 증착한 SiOx(x<2) 박막의 광학적 특성 규명)

  • Kim, Youngill;Park, Byoung Youl;Kim, Eunkyeom;Han, Munsup;Sok, Junghyun;Park, Kyoungwan
    • Korean Journal of Metals and Materials
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    • v.49 no.9
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    • pp.732-738
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    • 2011
  • Silicon oxide thin films were deposited by using a plasma-enhanced chemical-vapor deposition technique to investigate the light emission properties. The photoluminescence characteristics were divided into two categories along the relative ratio of the flow rates of $SiH_4$ and $N_2O$ source gases, which show light emission in the broad/visible range and a light emission peak at 380 nm. We attribute the broad/visible light emission and the light emission peak to the quantum confinement effect of nanocrystalline silicon and the Si=O defects, respectively. Changes in the photoluminescence spectra were observed after the post-annealing processes. The photoluminescence spectra of the broad light emission in the visible range shifted to the long wavelength and were saturated above an annealing temperature of $900^{\circ}C$ or after 1 hour annealing at $970^{\circ}C$. However, the position of the light emission peak at 380 nm did not change at all after the post-annealing processes. The light emission intensities at 380 nm initially increased, and decreased at annealing temperatures above $700^{\circ}C$ or after 1 hour annealing at $700^{\circ}C$. The photoluminescence behaviors after the annealing processes can be explained bythe size change of the nanocrystalline silicon and the density change of Si=O defect in the films, respectively. These results support the possibility of using a silicon-based light source for Si-optoelectronic integrated circuits and/or display devices.

EFFECTS OF SURFACE ROUGHNESS AND MULTILAYER COATING ON THE CORROSION RESISTANCE OF Ti-6Al-4V ALLOY

  • Ko, Yeong-Mu;Choe, Han-Cheol
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2003.10a
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    • pp.134-135
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    • 2003
  • The dental implant materials required good mechanical properties, such as fatigue strength, combined with a high resistance to corrosion. For increasing fatigue resistance and delaying onset of stress corrosion cracking, shot peening has been used for > 50 years to extend service life of metal components. However, there is no information on the electrochemical behavior of shot peened and hydroxyapatite(HA) coated Ti-6Al-4V alloys. To increase fatigue strength, good corrosion resistance, and biocompatibility, the electrochemical characteristics of Ti/TiN/HA coated and shot peened Ti-6Al-4V alloys by electron beam physical vapor deposition(EB-PVD) have been researched by various electrochemical method in 0.9%NaCl. Ti-6Al-4V alloys were prepared under the condition of hydrogen and vacuum arc furnace. The produced materials were quenched at 1000$^{\circ}C$ under high purity dried Ar atmosphere and were hold at 500$^{\circ}C$ for 2 hrs to achieve the fatigue strength(1140㎫) of materials. Ti-6Al-4V alloys were prepared under the condition of hydrogen and vacuum arc furnace. Shot peening(SP) and sand blasting treatment was carried out for 1, 5, and 10min. On the surface of Ti-6Al-4V alloys using the steel balls of 0.5mm and alumina sand of 40$\mu\textrm{m}$ size. Ti/TiN/HA multilayer coatings were carried out by using electron-beam deposition method(EB-PVD) as shown Fig. 1. Bulk Ti, powder TiN and hydroxyapatite were used as the source of the deposition materials. Electrons were accelerated by high voltage of 4.2kV with 80 - 120mA on the deposition materials at 350$^{\circ}C$ in 2.0 X 10-6 torr vacuum. Ti/TiN/HA multilayer coated surfaces and layers were investigated by SEM and XRD. A saturated calomel electrode as a reference electrode, and high density carbon electrode as a counter electrode, were set according to ASTM GS-87. The potentials were controlled at a scan rate of 100 mV/min. by a potentiostat (EG&G Co.273A) connected to a computer system. Electrochemical tests were used to investigate the electrochemical characteristics of Ti/TiN/HA coated and shot peened materials in 0.9% NaCl solution at 36.5$^{\circ}C$. After each electrochemical measurement, the corrosion surface of each sample was investigated by SEM.

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