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Enhanced pH Response of Solution-gated Graphene FET by Using Vertically Grown ZnO Nanorods on Graphene Channel

  • Kim, B.Y;Jang, M.;Shin, K.-S.;Sohn, I.Y;Kim, S.-W.;Lee, N.-E
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.434.2-434.2
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    • 2014
  • We observe enhanced pH response of solution-gated field-effect transistors (SG-FET) having 1D-2D hybrid channel of vertical grown ZnO nanorods grown on CVD graphene (Gr). In recent years, SG-FET based on Gr has received a lot of attention for biochemical sensing applications, because Gr has outstanding properties such as high sensitivity, low detection limit, label-free electrical detection, and so on. However, low-defect CVD Gr has hardly pH responsive due to lack of hydroxyl group on Gr surface. On the other hand, ZnO, consists of stable wurtzite structure, has attracted much interest due to its unique properties and wide range of applications in optoelectronics, biosensors, medical sciences, etc. Especially, ZnO were easily grown as vertical nanorods by hydrothermal method and ZnO nanostructures have higher sensitivity to environments than planar structures due to plentiful hydroxyl group on their surface. We prepared for ZnO nanorods vertically grown on CVD Gr (ZnO nanorods/Gr hybrid channel) and to fabricate SG-FET subsequently. We have analyzed hybrid channel FETs showing transfer characteristics similar to that of pristine Gr FETs and charge neutrality point (CNP) shifts along proton concentration in solution, which can determine pH level of solution. Hybrid channel SG-FET sensors led to increase in pH sensitivity up to 500%, compared to pristine Gr SG-FET sensors. We confirmed plentiful hydroxyl groups on ZnO nanorod surface interact with protons in solution, which causes shifts of CNP. The morphology and electrical characteristics of hybrid channel SG-FET were characterized by FE-SEM and semiconductor parameter analyzer, respectively. Sensitivity and sensing mechanism of ZnO nanorods/Gr hybrid channel FET will be discussed in detail.

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Information of Flood Estimation using GIS for Three Dimensional Visualization (GIS를 이용한 2차원 홍수범람정보의 3차원 가시화)

  • Lee, Jin-Woo;Kim, Hyung-Jun;Cho, Yong-Sik
    • Journal of the Korean Society of Hazard Mitigation
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    • v.8 no.2
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    • pp.159-164
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    • 2008
  • This study simulated the flood inundations of the Nakdong River catchment running through Yangsan, a small city located in the south eastern area of Korea by using the depth averaged two-dimensional hydrodynamic numerical model. The numerical model employs the staggered grid system including moving boundary and a finite different method to solve the Saint-Venant equations. A second order upwind scheme is used to discretize the nonlinear convection terms of the momentum equations, whereas linear terms are discretized by a second order Leap-frog scheme(Cho and Yoon, 1998). The numerical model was applied to a real topography to simulate the flood inundation of the Yangsan basin in Yangsan. The numerical result for urban district was visualization for three dimension. These results can be essentially utilized to construct the three dimensional inundation map after building the GIS-based database in local public organizations in order to protect the life and property safely.

Effects of Plasma Treatment on Contact Resistance and Sheet Resistance of Graphene FET

  • Ra, Chang-Ho;Choi, Min Sup;Lee, Daeyeong;Yoo, Won Jong
    • Journal of the Korean institute of surface engineering
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    • v.49 no.2
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    • pp.152-158
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    • 2016
  • We investigated the effect of capacitively coupled Ar plasma treatment on contact resistance ($R_c$) and channel sheet resistance ($R_{sh}$) of graphene field effect transistors (FETs), by varying their channel length in the wide range from 200 nm to $50{\mu}m$ which formed the transfer length method (TLM) patterns. When the Ar plasma treatment was performed on the long channel ($10{\sim}50{\mu}m$) graphene FETs for 20 s, $R_c$ decreased from 2.4 to $1.15k{\Omega}{\cdot}{\mu}m$. It is understood that this improvement in $R_c$ is attributed to the formation of $sp^3$ bonds and dangling bonds by the plasma. However, when the channel length of the FETs decreased down to 200 nm, the drain current ($I_d$) decreased upon the plasma treatment because of the significant increase of channel $R_{sh}$ which was attributed to the atomic structural disorder induced by the plasma across the transfer length at the edge of the channel region. This study suggests a practical guideline to reduce $R_c$ using various plasma treatments for the $R_c$ sensitive graphene and other 2D material devices, where $R_c$ is traded off with $R_{sh}$.

Selective Etching of Magnetic Layer Using CO/$NH_3$ in an ICP Etching System

  • Park, J.Y.;Kang, S.K.;Jeon, M.H.;Yeom, G.Y.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.448-448
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    • 2010
  • Magnetic random access memory (MRAM) has made a prominent progress in memory performance and has brought a bright prospect for the next generation nonvolatile memory technologies due to its excellent advantages. Dry etching process of magnetic thin films is one of the important issues for the magnetic devices such as magnetic tunneling junctions (MTJs) based MRAM. CoFeB is a well-known soft ferromagnetic material, of particular interest for magnetic tunnel junctions (MTJs) and other devices based on tunneling magneto-resistance (TMR), such as spin-transfer-torque MRAM. One particular example is the CoFeB - MgO - CoFeB system, which has already been integrated in MRAM. In all of these applications, knowledge of control over the etching properties of CoFeB is crucial. Recently, transferring the pattern by using milling is a commonly used, although the redeposition of back-sputtered etch products on the sidewalls and the low etch rate of this method are main disadvantages. So the other method which has reported about much higher etch rates of >$50{\AA}/s$ for magnetic multi-layer structures using $Cl_2$/Ar plasmas is proposed. However, the chlorinated etch residues on the sidewalls of the etched features tend to severely corrode the magnetic material. Besides avoiding corrosion, during etching facets format the sidewalls of the mask due to physical sputtering of the mask material. Therefore, in this work, magnetic material such as CoFeB was etched in an ICP etching system using the gases which can be expected to form volatile metallo-organic compounds. As the gases, carbon monoxide (CO) and ammonia ($NH_3$) were used as etching gases to form carbonyl volatiles, and the etched features of CoFeB thin films under by Ta masking material were observed with electron microscopy to confirm etched resolution. And the etch conditions such as bias power, gas combination flow, process pressure, and source power were varied to find out and control the properties of magnetic layer during the process.

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New phenomenological creep model for predicting creep of concrete with silica fume

  • Zgheib, Elise;Sawma, Rodolph;El Khoury, Judith;Raphael, Wassim
    • Advances in concrete construction
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    • v.14 no.1
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    • pp.71-77
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    • 2022
  • Creep phenomenon affects the stability and integrity of concrete structures. An inaccurate prediction of these strains may lead to the appearance of cracks and excessive deflections which may cause in some cases the demolition of structures. In fact, the measured values of these uncontrolled strains appear often to be clearly different and larger than the expected ones. Therefore, an accurate prediction of concrete deformations is a necessity. As a matter of fact, the codified descriptions of this phenomenon are unreliable and don't consider the effect of admixtures. The physical nature of creep is not well understood and almost all creep models are mainly of empirical nature. To overcome this issue, a study of the correlation between different parameters affecting concrete creep is performed and a new model for predicting creep of concrete is elaborated. This new model considers the effect of admixtures, specifically the silica fume, in predicting concrete creep and allows an accurate prediction of this phenomenon. The proposed model is based on the observation of physical behavior of creep phenomenon. It targets at expressing creep compliance in terms of structural and environmental parameters. In fact, the experimental observations show that creep curves follow two kinetic regimes leading to a model called Phenomenological Creep Model. By adequate regressions and substitutions, and according to this model, we can express creep compliance in terms of structural, environmental parameters and admixture types and percentage. The proposed new Phenomenological Creep Model Silica Fume (PCM19SF) calculates accurately creep of concrete by considering the effect of silica fume.

Electrochemical Performance of LiMn2O4 Cathodes in Zn-Containing Aqueous Electrolytes

  • Kamenskii, Mikhail A.;Eliseeva, Svetlana N.;Volkov, Alexey I.;Kondratiev, Veniamin V.
    • Journal of Electrochemical Science and Technology
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    • v.13 no.2
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    • pp.177-185
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    • 2022
  • Electrochemical properties of LiMn2O4 cathode were investigated in three types of Zn-containing electrolytes: lithium-zinc sulfate electrolyte (1M ZnSO4 / 2M Li2SO4), zinc sulfate electrolyte (2MZnSO4) and lithium-zinc-manganese sulfate electrolyte (1MZnSO4 / 2MLi2SO4 / 0.1MMnSO4). Cyclic voltammetry measurements demonstrated that LiMn2O4 is electrochemically inactive in pure ZnSO4 electrolyte after initial oxidation. The effect of manganese (II) additive in the zinc-manganese sulfate electrolyte on the electrochemical performance was analyzed. The initial capacity of LiMn2O4 is higher in presence of MnSO4 (140 mAh g-1 in 1 M ZnSO4 / 2 M Li2SO4 / 0.1 M MnSO4 and 120 mAh g-1 in 1 M ZnSO4 / 2MLi2SO4). The capacity increase can be explained by the electrodeposition of MnOx layer on the electrode surface. Structural characterization of postmortem electrodes with use of XRD and EDX analysis confirmed that partially formed in pure ZnSO4 electrolyte Zn-containing phase leads to fast capacity fading which is probably related to blocked electroactive sites.

Investigation of bias illumination stress in solution-processed bilayer metal-oxide thin-film transistors

  • Lee, Woobin;Eom, Jimi;Kim, Yong-Hoon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.302.1-302.1
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    • 2016
  • Solution-processed amorphous metal-oxide thin-film transistors (TFTs) are considered as promising candidates for the upcoming transparent and flexible electronics due to their transparent property, good performance uniformity and possibility to fabricate at a low-temperature. In addition, solution processing metal oxide TFTs may allow non-vacuum fabrication of flexible electronic which can be more utilizable for easy and low-cost fabrication. Recently, for high-mobility oxide TFTs, multi-layered oxide channel devices have been introduced such as superlattice channel structure and heterojunction structure. However, only a few studies have been mentioned on the bias illumination stress in the multi- layered oxide TFTs. Therefore, in this research, we investigated the effects of bias illumination stress in solution-processed bilayer oxide TFTs which are fabricated by the deep ultraviolet photochemical activation process. For studying the electrical and stability characteristics, we implemented positive bias stress (PBS) and negative bias illumination stress (NBIS). Also, we studied the electrical properties such as field-effect mobility, threshold voltage ($V_T$) and subthreshold slop (SS) to understand effects of the bilayer channel structure.

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Sr-doped AlOx gate dielectrics enabling high-performance flexible transparent thin film transistors by sol-gel process

  • Kim, Jaeyoung;Choi, Seungbeom;Kim, Yong-Hoon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.301.2-301.2
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    • 2016
  • Metal-oxide thin-film transistors (TFTs) have gained a considerable interest in transparent electronics owing to their high optical transparency and outstanding electrical performance even in an amorphous state. Also, these metal-oxide materials can be solution-processed at a low temperature by using deep ultraviolet (DUV) induced photochemical activation allowing facile integration on flexible substrates [1]. In addition, high-dielectric constant (k) inorganic gate dielectrics are also of a great interest as a key element to lower the operating voltage and as well as the formation of coherent interface with the oxide semiconductors, which may lead to a considerable improvement in the TFT performance. In this study, we investigated the electrical properties of solution-processed high-k strontium-doped AlOx (Sr-AlOx) gate dielectrics. Using the Sr-AlOx as a gate dielectric, indium-gallium-zinc oxide (IGZO) TFTs were fabricated and their electrical properties are analyzed. We demonstrate IGZO TFTs with a 10-nm-thick Sr-AlOx gate dielectric which can be operated at a low voltage (~5 V).

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Middle Cerebral Artery Anomalies Detected by Conventional Angiography and Magnetic Resonance Angiography

  • Kim, Myoung-Soo;Hur, Jin-Woo;Lee, Jong-Won;Lee, Hyun-Koo
    • Journal of Korean Neurosurgical Society
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    • v.37 no.4
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    • pp.263-267
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    • 2005
  • Objective: Middle cerebral artery(MCA) anomalies are found incidentally on conventional cerebral angiography and magnetic resonance angiography(MRA). Our goal is to examine the incidence and types of MCA anomalies. Methods: Cerebral angiography was performed in 448 patients and MRA in 743; the patients had or were suspected to have cerebrovascular disease. The images were retrospectively evaluated for arterial anatomic anomalies. We use Teal's classification for definition of accessory and duplicated MCAs. Results: On cerebral angiography, the following anomalies of the MCA were found in seven patients: fenestration (n = 2, incidence = 0.45%); duplication (n = 2, incidence = 0.45%); accessory MCA (n = 2, incidence = 0.45%); aplasia (n = 1, incidence = 0.22%). On MRA, eight patients had anomalous MCAs : fenestration (n = 1, incidence = 0.14%); duplication (n= 6, incidence = 0.81%); accessory (n = 1, incidence = 0.14%). Conclusion: Although the clinical significance is not great, we find a relatively high incidence of anomalous MCAs. Knowledge and recognition of these MCA anomalies are useful and important in the interpretation of cerebral images and during neurosurgical procedures.

Preparation and Photocatalytic Effect of Brookite Phase TiO2 Colloidal Sol for Thin Film Coating (Brookite TiO2 코팅용 졸의 제조 및 광촉매 효과)

  • Kim, Sun-Jae;Lee, Nam-Hee;Lee, Kang;Choi, Chang-Joo
    • Journal of the Korean Ceramic Society
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    • v.42 no.7 s.278
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    • pp.461-468
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    • 2005
  • Transparent TiO$_{2}$ sols were prepared by hydrothermal synthesis to heat Ti precursor solutions, from Ti hydroxides obtained with neutralizing aqueous TiOCl$_{2}$ solutions having various concentrations of NaCI by aqueous NaOH solution, in the autoclave at 120$^{\circ}C$ The photocatalytic abilities of glass beads coated with the sol for gaseous benzene were evaluated. As a result, it was found that due to the increase of brookite phase in TiO$_{2}$ by controlling the concentration of Na ion the optical absorption of TiO$_{2}$ increases toward long wavelength but that in the area of short wavelength becomes relatively low and consequently the photocatalytic performance of TiO$_{2}$ thin film for benzene gas rather decreases, compared to that of composite film of anatase and brookite phases. These results suggest that in order for coated TiO$_{2}$ thin film to have high dissociation performance for benzene gas it is effective to form anatase and brookite phases compositely in TiO$_{2}$.