• Transactions of the Korean Society of Mechanical Engineers A
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• v.30 no.10 s.253
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• pp.1314-1319
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• 2006

This paper describes the novel fabrication method of the high-aspect-ratio nano structure which is impossible by conventional method using a shadow mask and a Deep X-ray Lithography (DXRL). The shadow mask with $1{\mu}m-sized$ apertures is fabricated on the silicon membrane using a conventional UV-lithography. The size of aperture is reduced to 200nm by accumulated low stress silicon nitride using a LPCVD (low pressure chemical vapor deposition) process. The X-ray mask is fabricated by depositing absorber layer (Au, $3{\mu}m$) on the back side of nano shadow mask. The thickness of an absorber layer must deposit dozens micrometers to obtain contrast more than 100 for a conventional DXRL process. The thickness of $3{\mu}m-absorber$ layer can get sufficient contrast using a central beam stop method, blocking high energy X-rays. The nano circle and nano line, 200nm in diameter in width, respectively, were demonstrated 700nm in height with a negative photoresist of SU-8.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.05a
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• pp.275-277
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• 1999

A application possibility of photoresist flexible film for optical waveguide is proposed and described. The optical waveguide dimensions that is consists of Mach-zehnder interferometric and single channel waveguide based on the single-mode conditions in LiNbO$_3$ device was utilized and fabricated by wet etching technique. This Polymer material for core layer is SU-8/5O(Microchem.) and its refractive index from prism couping method was measured about 1.59 thickness about 10${\mu}{\textrm}{m}$ at wavelength 0.6328${\mu}{\textrm}{m}$. From the results, this work can show the possibility of fabricating a flexible optical waveguide in the field of integrated optics.

• Transactions of Materials Processing
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• v.15 no.9 s.90
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• pp.667-672
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• 2006

Agglutination is one of the most commonly employed reactions in clinical diagnosis. In this paper, we have designed and fabricated nickel mold insert for injection molding of a microfluidic lab-on-a-chip for the purpose of the efficient detection of agglutination. In the presented microfluidic lab-on-a-chip, two inlets for sample blood and reagent, flow guiding microchannels, improved serpentine laminating micromixer(ISLM) and reaction microwells are fully integrated. The ISLM, recently developed by our group, can highly improve mixing of the sample blood and reagent in the microchannel, thereby enhancing reaction of agglutinogens and agglutinins. The reaction microwell was designed to contain large volume of about $25{\mu}l$ of the mixture of sample blood and reagent. The result of agglutination in the reaction microwell could be determined by means of the level of the light transmission. To achieve the cost-effectiveness, the microfluidic lab-on-a-chip was realized by the injection molding of COC(cyclic olefin copolymer) and thermal bonding of two injection molded COC substrates. To define microfeatures in the microfluidic lab-on-a-chip precisely, the nickel mold inserts of lab-on-a-chip for the injection molding were fabricated by combining the UV photolithography with a negative photoresist SU-8 and the nickel electroplating process. The microfluidic lab-on-a-chip developed in this study could be applied to various clinical diagnosis based on agglutination.

• Applied Science and Convergence Technology
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• v.26 no.5
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• pp.110-113
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• 2017

The two-dimensional layered $MoS_2$ has high mobility and excellent optical properties, and there has been much research on the methods for using this for next generation electronics. $MoS_2$ is similar to graphene in that there is comparatively weak bonding through Van der Waals covalent bonding in the substrate-$MoS_2$ and $MoS_2-MoS_2$ heteromaterial as well in the layer-by-layer structure. So, on the monatomic level, $MoS_2$ can easily be exfoliated physically or chemically. During the $MoS_2$ field-effect transistor fabrication process of photolithography, when using water, the water infiltrates into the substrate-$MoS_2$ gap, and leads to the problem of a rapid decline in the material's yield. To solve this problem, an epoxy-based, as opposed to a water-based photoresist, was used in the photolithography process. In this research, a hydrophobic $MoS_2$ field effect transistor (FET) was fabricated on a hydrophilic $SiO_2$ substrate via chemical vapor deposition CVD. To solve the problem of $MoS_2$ exfoliation that occurs in water-based photolithography, a PPMA sacrificial layer and SU-8 2002 were used, and a $MoS_2$ film FET was successfully created. To minimize Ohmic contact resistance, rapid thermal annealing was used, and then electronic properties were measured.

• Korean Journal of Optics and Photonics
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• v.18 no.2
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• pp.149-154
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• 2007

Bragg reflecting waveguide devices have been fabricated on a flexible polymer substrate utilizing a post lift-off process which could Provide excellent uniformity of grating Patterns on Plastic film. The 510 m Period Bragg grating pattern is made by two methods. In the first sample the grating is fabricated by exposing the laser interference pattern on a photoresist, and then it is inscribed by $O_2$ plasma etching. The grating pattern of the second sample is formed by a PDMS soft mold imprinting process. The selective adhesion property of SU-8 material for Au and Si surfaces is utilized to prepare a 100-mm thick plastic substrate. Single mode waveguide is fabricated on the plastic substrate using polymer materials with refractive indices of 1.540 and 1.430 for the core and the cladding layers, respectively. The Bragg grating on Plastic substrate does not show any degradation in its spectral response compared to the reference sample made on a silicon wafer.

• Applied Chemistry for Engineering
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• v.17 no.1
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• pp.28-32
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• 2006

This study investigated the variation of flow rates in microchannels that consisted of polydimethyl siloxane (PDMS) and glass using various external voltages. Three different microchannel widths and two different depths. PDMS and negative photoresist (SU-8) were used to make the microchannels by the soft lithographic method. For each depth of microchannel ($50{\mu}m$ and $100{\mu}m$), three different widths ($100{\mu}m$, $200{\mu}m$ and $300{\mu}m$) were made. In each case, several different external voltages were applied (0.3 kV, 0.35 kV, 0.4 kV and 0.45 kV) to examine the flow rates. Our results indicated that flow rate increased with an increase of the external voltage at the same microchannel width. This was because the electrical field was increased as the external voltage increased. For the same external voltage, the flow rate increased as the microchannel's width increased. These results showed that the resistance in the microchannel decreased as the microchannel's width increased. Also, to investigate the effect of microchannel's depth and width, the cross-sectional area of the microchannel was increased to the double in area. As a result, the effect of the microchannel's depth was higher at a low external voltage, and the effect of the microchannel's width was higher at a high external voltage.

• Korean Journal of Optics and Photonics
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• v.35 no.4
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• pp.175-183
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• 2024

Research into optical signal processing using photonic integrated circuits (PICs) has been actively pursued in various fields, including optical communication, optical sensors, and quantum optics. Among the materials used in PIC fabrication, polymers have attracted significant interest due to their unique characteristics. To fabricate polymer-based PICs, establishing an accurate manufacturing process for the cross-sectional structure of an optical waveguide is crucial. For stable device performance and high yield in mass production, a process with high reproducibility and a wide tolerance for variation is necessary. This study proposes an efficient method for fabricating polymer optical-waveguide devices by introducing the atomic layer deposition (ALD) process. Compared to conventional photoresist or metal-film deposition methods, the ALD process enables more precise fabrication of the optical waveguide's core structure. Polyimide optical waveguides with a core size of 1.8 × 1.6 ㎛² are fabricated using the ALD process, and their propagation losses are measured. Additionally, a multimode interference (MMI) optical-waveguide power-splitter device is fabricated and characterized. Throughout the fabrication, no cracking issues are observed in the etching-mask layer, the vertical profiles of the waveguide patterns are excellent, and the propagation loss is below 1.5 dB/cm. These results confirm that the ALD process is a suitable method for the mass production of high-quality polymer photonic devices.

• Korean Chemical Engineering Research
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• v.43 no.1
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• pp.92-97
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• 2005

In this study, the effect of contact angles of PDMS and external voltage has been investigated. SU-8 (Microchem, USA) negative photoresist and PDMS are used to make the microchannel. The contact angle of the native PDMS is $105^{\circ}$. The native PDMS is treated with the oxygen plasma and the contact angle changes $19^{\circ}$, $46^{\circ}$ and $69^{\circ}$. As a result, the rate of increase in flow velocity is not directly proportional to the rate of increase of external voltage. This is because the electrical double layer is condensed and the zeta potential is increased with an increase of the external voltage. The flow velocity is highest for the contact angle of $19^{\circ}$ at the same external voltage. Hence we conclude that the thickness of electrical double layer and flow velocities vary with contact angle at the same external voltage.