• 한국진공학회지
• /
• 제10권2호
• /
• pp.225-233
• /
• 2001

Oxygen flooding을 이용한 Secondary ion Mass Spectrometry(SIMS) 분석에 있어서 표면에 산화막이 있을 때 발생하는 SIMS depth profile의 왜곡현상에 대한 원인을 분석하고 이를 보정하였다. 이러한 왜곡현상은 표면 산화막에서와 Si 매질에서의 sputter rate이 다른 데서 발생하는 깊이 보정 오류와 상대감도인자(relative sensitivity factor, RSF)가 다른 데서 발생하는 농도보정 오류로부터 발생됨이 밝혀졌다. 깊이보정 오류를 바로잡기 위하여 $N^a+$ 이온을 산화막과 Si 매질의 계면에 대한 marker로 사용하였으며 산화막 두께는 SEM 및 XPS로 측정하였다. 산화막과 Si 매질에서의 sputter rate 및 RSF의 차이는 주로 oxygen flooding이 유발한 산화막 형성시의 부피팽창에 의한 것으로 해석되었으며 이를 보정한 depth profile은 oxygen flooding없이 분석한 경우와 거의 동일한 결과를 보여주었다.

• 한국표면공학회:학술대회논문집
• /
• 한국표면공학회 2007년도 춘계학술발표회 초록집
• /
• pp.61-62
• /
• 2007

low angle forward reflected neutral beam etching system으로 식각한 후 SIMS depth profile을 이용하여 에너지 침투 깊이에 따른 중성빔 에너지를 분석하여 중성화 과정에서 에너지와 flux의 손실이 있었다. 기존의 two-grid 대신에 three-grid를 사용하여 에너지의 변화없이 이온 flux 및 중성빔 flux가 향상됨을 알 수 있었다.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
• /
• pp.275-275
• /
• 2012

The relative composition of $Cu(InGa)Se_2$ solar cells is one of the most important measurement issues. However, quantitative analysis of multi-component alloy films is difficult by surface analysis methods due to severe matrix effect. In this study, quantitative depth profiling analysis of CIGS films was investigated by secondary ion mass spectrometry (SIMS). The compositions were measured by SIMS using the alloy reference relative sensitivity factors derived from the certified compositions and the total counting numbers of each element. The compositions measured by SIMS were linearly proportional to those by inductively coupled plasma-mass spectrometry (ICP-MS) using isotope dilution method. In this study, the quantification measured by ICP-MS method is compared with the composition calculated by SIMS depth profiles with AR-RSFs obtained from the reference. The SIMS depth profile of CIGS thin films according to the manufacturing condition was converted into compositional depth profile.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2011년도 제40회 동계학술대회 초록집
• /
• pp.347-347
• /
• 2011

Secondary ion mass spectrometry (SIMS) was fascinated by a quantitative analysis and a depth profiling and it was convinced of a in-depth analysis of multi-layer films. Precision determination of the interfaces of multi-layer films is important for conversion from the original SIMS depth profiling to the compositional depth profiling and the investigation of structure of multi-layer films. However, the determining of the interface between two kinds of species of the SIMS depth profile is distorted from original structure by the several effects due to sputtering with energetic ions. In this study, the feasibility of 50 atomic % definition for the determination of interface between two kinds of species in SIMS depth profiling of multilayer films was investigated by Si/Ge and Ti/Si multi-layer films. The original SIMS depth profiles were converted into compositional depth profiles by the relative sensitivity factors from Si-Ge and Si-Ti alloy reference films. The atomic compositions of Si-Ge and Si-Ti alloy films determined by Rutherford backscattering spectroscopy (RBS).

• 분석과학
• /
• 제14권6호
• /
• pp.486-493
• /
• 2001

본 연구는 SIMS를 이용한 bismuth titanate 박막의 깊이방향 분석에 있어서 mesh grid를 사용한 경우와 사용하지 않은 경우, offset voltage를 사용한 경우와 사용하지 않은 경우 등 분석조건에 따른 charging effect 그리고 검출한계의 특성을 검토하고자 하였다. 결과에 따르면 -40 V의 offset voltage를 사용하였을 경우는 charging effect의 감소는 물론 검출한계도 낮출 수 있었으나 mesh grid를 사용하였을 경우에는 charging effect는 다소 줄일 수 있었으나 반면 검출 한계는 오히려 높아졌다. O- 일차이온을 적용한 경우는 -40 V의 offset voltage를 사용하였을 때와 동일한 효과를 얻을 수 있었다.

• 한국결정성장학회지
• /
• 제23권2호
• /
• pp.81-85
• /
• 2013

새로운 표면처리로서 TCF(thermal color fusion) 기술이 적용된 스와로브스키사의 패션 토파즈(passion topaz)의 코팅 층 성분과 적층구조를 파악하기 위해 ED-XRF와 TOF-SIMS 분석을 실시하였다. 더불어 감별특징 관찰을 위한 확대검사와 내구성 평가를 미스틱 토파즈(mystic topaz)와 비교 분석하였다. 그 결과, 패션 토파즈에서도 미스틱 토파즈에서 보이는 유사한 특징들이 확대검사를 통해 관찰되었고, TOF-SIMS에 의한 depth profile 분석 결과에서 토파즈 표면으로의 확산코팅과 다층구조 코팅이 되어있음을 알 수 있었다. 또한 패션 토파즈는 금속 원소간의 화학반응에 의한 코팅처리로 미스틱 토파즈 보다 화학약품에 대한 안정적인 특성과 높은 모스경도를 보였다.

• 전자공학회논문지D
• /
• 제35D권3호
• /
• pp.46-55
• /
• 1998

This stud demonstrates the profiles of heavy ions (As, Sb) in silicon by high energy (1~10 MeV) implantation. Implanted profiles were measured by SIMS (Cameca 4f) and compared with simulation results (TRIM) program and analytical description method using Pearson function). The experimental results have a little bit deviation with simulation data in the case of As high energy implatation. But in the case of Sb, the experimental results are in good agreement with TRIM data. SIMS profiles are perfectly fitted with a analytical description method only using one pearson function in Sb implantation. but in the case of As, fitted profilesshow with a little bit deviations by channeling effects of SIMS profiles. Thermal annealing for electrical activation of implanted ions was carried out by furnace annealing and RTA(Rapid Thermal Annealing). Concentration-depth profile after heat treatement were measured by SR(Spreading Resistance) method.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2002년도 제22회 학술발표회 초록집
• /
• pp.60-60
• /
• 2002

• 한국진공학회지
• /
• 제5권3호
• /
• pp.218-222
• /
• 1996

STrained layers and strain depth profile of high dose As ion implanted (100) si wafer annealed at various temperatures have been investigated by means of X-ray double crystal diffractometry (X-ray DCD). The results obtained by x-ray rocking curve analysis showed a defect layer at the original amorphous /crystalline interface of 1400$\AA$ depth. In addition arsenic ion concentrtion profiles and defect distributions in depth were obtained by the SIMS and TRIM -code simulation . the positive strain depth profile determined from the rocking curve analysis were only presented under 0.14 $\mu$m from the surface for samples ananelaed at $600^{\circ}C$. The results was shown that the thickness of amprphous layer is 0.14 $\mu$m indirectry, and it was good agreement with the TRIM -Code simulation. Additionally, it could be thought that the positive strain have been affected residual intersitial atoms under the amorphous/crystalline interface formed by ion implantation.

• 한국전기전자재료학회논문지
• /
• 제13권3호
• /
• pp.193-199
• /
• 2000

As an energetic focused-ion beam(FIB) is irradiated on an inorganic amorphous thin film a majority of ions without a reflection at surface, is randomly collided with constituent atoms in thin film. but their distribution exhibits generally a systematic form of distribution. In our previous paper we reported the concentration distribution and the transmission per unit depth of Ga$^{+}$ ions penetrated int a-Se$_{75}$ /Ge$_{25}$ thin film using the LSS-based calculation. In this paper these simulated results are compared with those obtained by a conventional profile code(ISC) and a practical SIMS profile. Then the results of LSS-based calculation have only a small difference with those of code and SIMS Especially. in the case of Ga$^{+}$-FIB with an accelerating energy of 15keV. the depth of the maximum ion concentration is coincident with each other in an error range of $\pm$5$\AA$.EX>.