• Journal of the Korean Chemical Society
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• v.40 no.10
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• pp.656-662
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• 1996

Using low temperature and atmospheric pressure method, we synthesized Na, TPA-ZSM-5 with Si/Al ratio of about 100. We employed 27Al and 29Si MAS NMR spectroscopy and FT-IR to investigate the crystallization process as a function of time. The chemical shift depends on the initial composition of reactants and changes during the course of synthesis different from those reported by others earlier. However, the chemical shift of our final product showed in the range of typical ZSM-5. And the defect site was removed by the calcine. From XRD and SEM data, the formation of ZSM-5 was also confirmed.

• Bulletin of the Korean Chemical Society
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• v.32 no.12
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• pp.4205-4209
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• 2011

The $Li_2Mn_{0.5}Fe_{0.5}SiO_4$ silicate was prepared by blending of $Li_2MnSiO_4$ and $Li_2FeSiO_4$ precursors with same molar ratio. The one of the silicates of $Li_2FeSiO_4$ is known as high capacitive up to ~330 mAh/g due to 2 mole electron exchange, and the other of $Li_2FeSiO_4$ has identical structure with $Li_2MnSiO_4$ and shows stable cycle with less capacity of ~170 mAh/g. The major drawback of silicate family is low electronic conductivity (3 orders of magnitude lower than $LiFePO_4$). To overcome this disadvantage, carbon composite of the silicate compound was prepared by sucrose mixing with silicate precursors and heat-treated in reducing atmosphere. The crystal structure and physical morphology of $Li_2Mn_{0.5}Fe_{0.5}SiO_4$ was investigated by X-ray diffraction, scanning electron microscopy, and high resolution transmission electron microscopy. The $Li_2Mn_{0.5}Fe_{0.5}SiO_4$/C nanocomposite has a maximum discharge capacity of 200 mAh/g, and 63% of its discharge capacity is retained after the tenth cycles. We have realized that more than 1 mole of electrons are exchanged in $Li_2Mn_{0.5}Fe_{0.5}SiO_4$. We have observed that $Li_2Mn_{0.5}Fe_{0.5}SiO_4$ is unstable structure upon first delithiation with structural collapse. High temperature cell performance result shows high capacity of discharge capacity (244 mAh/g) but it had poor capacity retention (50%) due to the accelerated structural degradation and related reaction.

• Journal of Powder Materials
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• v.4 no.4
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• pp.298-303
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• 1997

The activated sintering behavior of $MoSi_2$ powder compacts with addition of 0.5 and 1.0 wt.%Ni during the sintering under As atmosphere was studied. The shrinkage was measured and the microstructures were observed by SEM (scanning electron microscopy) and BEI (backscattered electron image) along with the phase analysis by EDS during heating up to 155$0^{\circ}C$ and holding for various time at 155$0^{\circ}C$. The most of shrinkage occurred upon heating and 92% of theoretical density was attained after sintering for 1 hr at 155$0^{\circ}C$. However, little shrinkage ensued even for prolonged sintering over 1 hr at 155$0^{\circ}C$. A liquid film formed at about 135$0^{\circ}C$ along necks and grain boundaries. The polyhedral grain structure composed of $(Mo,Ni)_5Si_3$and $Ni_2Si$ across the $MoSi_2$ grain boundary developed at 155$0^{\circ}C$. It was concluded that the activated sintering of $MoSi_2$ powder by Ni led to the diffusion of Si into Ni decreasing the liquidus temperature and the enhanced diffusion of Mo and Si through such a liquid phase and/or interboundary of $(Mo,Ni)_5Si_3$.

• Journal of Korea Foundry Society
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• v.26 no.3
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• pp.123-128
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• 2006

Mechanical and thermal properties of spray-cast hypereutectic Al-20wt.%Si-xwt.%Fe alloys (x=0, 1, 3, 5) were investigated. After the spray-casting, hot extrusion was performed at $400^{\circ}C$. Intermetallic compound (${\beta}-Al_5FeSi$) and primary Si are observed in the spray-cast aluminum alloys. The size of primary Si and intermetallic compound of the spray-aluminum alloys became finer and more uniformly distributed than that of the permanent mold cast ones. Ultimate tensile strength of the spray-cast aluminum alloys increased by increasing Fe contents, but that of the permanent mold cast aluminum alloys decreased by increasing Fe contents possibly due to increased amount of coarse intermatallic compound. The coefficient of thermal expansion (CTEs) of the aluminum alloys became lower with finer primary Si and intermetallic compound, and this is attributed to the increased amount of interfacial area between the aluminum matrix and the phases of finer Si and intermetallic compound.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07b
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• pp.735-738
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• 2002

Single crystal 3C-SiC(cubic silicon carbide) thin-films were deposited on Si(100) substrate up to a thickness of $4.3{\mu}m$ by APCVD method using HMDS(hexamethyildisilane) at $1350^{\circ}C$. The HMDS flow rate was 0.5 sccm and the carrier gas flow rate was 2.5 slm. The HMDS flow rate was important to get a mirror-like crystal surface. The growth rate of the 3C-SiC films was $4.3{\mu}m/hr$. The 3C-SiC epitaxical films grown on Si(100) were characterized by XRD, AFM, RHEED, XPS and raman scattering, respectively. The 3C-SiC distinct phonons of TO(transverse optical) near $796cm^{-1}$ and LO(longitudinal optical) near $974{\pm}1cm^{-1}$ were recorded by raman scattering measurement. The heteroepitaxially grown films were identified as the single crystal 3C-SiC phase by XRD spectra$(2{\theta}=41.5^{\circ})$.

• Journal of the Korean Ceramic Society
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• v.45 no.5
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• pp.285-289
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• 2008

Porous self-bonded silicon carbide (SiC) ceramics were fabricated at temperatures ranging from 1750 to $1850^{\circ}C$ using SiC, silicon (Si), and carbon (C) powders as starting materials. The effect of the Si:C ratio on porosity and strength was investigated as a function of sintering temperature. It was possible to produce self-bonded SiC ceramics with porosities ranging from 36% to 43%. The porous ceramics showed a maximal porosity when the Si:C ratio was 2:1 regardless of the sintering temperature. In contrast, the maximum strength was obtained when the ratio was 5:1.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.135-136
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• 2008

이 실험에서는 비휘발성 메모리에서의 블로킹 층으로 $SiN_x$ 박막을 사용하였다. ELA (poly-Si) 기판위에 $SiO_xN_y$ 박막을 성장하기 전에 BHF를 이용해 자연 산화막을 제거하였다. 터널 층을 위해 2.7nm두께의 $SiO_xN_y$를 ICP-CVD 장비를 이용해 유리기판위에 증착하였다. 다음으로 $SiH_4/H_2$기체를 이용， ICP-CVD장비를 이용해 전하 저장을 위한 a-Si 박막을 증착하고, 마지막으로 a-Si층 위에 $SiN_x$ 층을 형성하였다. $SiN_x$ 박막을 형성하는데 최적의 조건을 찾기 위해 가스의 구성 비율 및 증착시간을 변화시키고 온도와 RF power도 바꿔주었다. 굴절률이 1.79 고 두께가 30 nm 인 $SiN_x$는 블로킹 층으로 사용하기 위한 것이다. 제작된 NSO-NVM 소자의 전기적 메모리 특성은 on current가 약 $10^{-5}$ A 이고 off current가 약 $5\times10^{-13}$ A로 전류 점멸비$(I_{ON}/I_{OFF})$는 약 $1\times10^7$ 이고 Swing 값은 0.53V/decade 이다. 1ms 동안의 programming/erasing 결과 약 3.5 V의 넓은 메모리 윈도우 크기를 가진다는 것을 확인할 수 있다.

• Korean Journal of Materials Research
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• v.12 no.5
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• pp.375-381
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• 2002

N-type ${\beta}-FeSi_2$ with a nominal composition of $Fe_{0.98}Co_{0.02}Si_2$ powders has been produced by mechanical alloying process and consolidated by vacuum hot pressing. As-milled powders were of metastable state and fully transformed to ${\beta}-FeSi_2$ phase by subsequent isothermal annealing. However, as-consolidated $Fe_{0.98}Co_{0.02}Si_2$ consisted of untransformed mixture of ${\alpha}-Fe_2Si_ 5$ and $\varepsilon$-FeSi phases. Isothermal annealing has been carried out to induce the transformation to a thermoelectric semiconducting ${\beta}-FeSi_2$ phase. The transformation behavior of ${\beta}-FeSi_2$ was investigated by utilizing DTA, a modified TGA under magnetic field, SEM, and XRD analyses. Isothermal annealing at $830^{\circ}C$ in vacuum led to the thermoelectric semiconducting ${\beta}-FeSi_2$ phase transformation, but some residual metallic $\alpha$ and $\varepsilon$ phases were unavoidable even after prolonged annealing. Thermoelectric properties were remarkably improved by isothermal annealing due to the transformation from metallic $\alpha$ and $\varepsilon$ phases to semiconducting phases.

• Journal of the Korean Ceramic Society
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• v.27 no.5
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• pp.583-588
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• 1990

Glass films in the binary system B2O3-SiO2 and Al2O3-SiO2 were prepared on soda-lime-silica slide glass by the dip-coating technique from TEOS and boric acid or aluminum nitrate. Thickness of the films varying with viscosity and withdrawal speed were measured and effect of composition and firing temperature on the properties such as transmittance and refractive index were investigated. nM2O3.(100-n)SiO2(M=B or Al) films containing up to 20mol% B2O3 and 40mol% Al2O3 were transparent. Maximum transmittance at visible range were obtained for the sample containing 15mol% Ba2O3 and 32.5mol% Al2O3 and heat-treated at 50$0^{\circ}C$, respectively. Refractive index of the film containing 15mol% B2O3 was mininum in the B2O3-SiO2 binary system and minimal refractive index was appeared at the film containing 32.5mol% Al2O3. In IP spectra, addition of B2O3 were increased absorption peak intensity of B-O and Si-O-B bond and addition of Al2O3 were decreased absorption peak intensity of Si-O bond, respectively.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.169.2-169.2
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• 2013

본 연구에서는 gas를 이용한 PECVD 공법중 이온화 에너지가 높고 대면적 코팅이 용이한 Hybrid 코팅 장비에서 Linear Ion-Gun 이용하여 탄화수소 계열의 gas인 $C_2H_2$ 와 Si을 함유한 TMS (tetramethylsilane, $Si(CH_3)_4)$ gas를 이용하여 저마찰, 고경도 특성을 갖는 Si-DLC 코팅에 대한 연구를 수행하였다. Si-DLC 코팅에 앞서 전처리 공정으로 Linear Ion-Gun에 Ar gas를 주입하고 고전압의 DC 전원을 인가하여 제품 표면의 건식세정 및 표면 활성화를 진행 후, $C_2H_2$ 와 TMS gas를 Linear Ion-Gun에 주입하여 Si-DLC 코팅 공정을 진행하였다. Si-DLC 코팅시 $C_2H_2$ gas 주입량을 고정하고 TMS 가스 유량을 5~20sccm으로 조절하여 Si 함유량에 따른 Si-DLC 코팅막의 특성을 분석하였다. 이렇게 코팅된 Si-DLC의 박막 특성 분석으로 마찰계수 측정을 위해 ball-on-disk 타입의 tribometer를 사용하였으며, 박막 경도 측정은 Nano-indenter를 이용하여 분석을 진행하였다. 그 결과 Si을 포함하지 않는 DLC의 경우 마찰계수가 ~0.2를 가지는 반면, Si-DLC의 경우 Si 함유량이 약 1.5at%일 때, 마찰계수 ~0.04 저마찰의 우수한 특성을 지니며, 박막의 경도는 22[Gpa]로 고경도의 Si-DLC 코팅을 확인할 수 있었다.