• Proceedings of the Korea Water Resources Association Conference
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• 2005.05b
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• pp.294-298
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• 2005

신뢰도를 이용하여 댐의 물 공급 안전도를 정의하였다. 그리고 보장 공급량 분석에 의한 댐의 물 공급 안전도 평가 절차를 제안하였고, 소양강댐과 충주댐의 물 공급 안전도를 평가하였다. 여러 묶음의 월 유출 시계열을 모의발생시키기 위하여 SAMS-2000을 사용하였고, 보장공급량 결정을 위한 저수지 모의운영에는 HEC-5가 사용되었다. 50년 계획 기간에 대하여 설계 유출자료에 의한 소양강댐 보장 공급량의 물 공급 안전도는 $80.5\%$로 평가되었고, 준공 후 기록 유입량에 의한 보장 공급량의 물 공급 안전도는 $53.7\%$였다. 기록 유입량 자료의 보장 공급량(15.85억 $M^3/yr$)을 계획 공급량으로 하면 연간 0.94억 $m^3 $의 용수를 추가 공급할 수 있다. 충주댐의 설계 유출자료에 의한 보장 공급량 34.22억 $M^3/yr$를 계획 공급량으로 하면 모든 시계열에 대하여 반드시 물 부족이 발생하였다. 이는 설계 당시 유입량의 과대평가에 기인한다. 제안된 절차를 적용하면 보다 객관적으로 댐의 물 공급 안전도를 평가할 수 있다.

• Journal of Korea Water Resources Association
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• v.39 no.5 s.166
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• pp.467-478
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• 2006

Water supply reliability for a dam is defined with a concept of probabilistic reliability. An evaluation procedure of the water supply reliability is shown with an analysis of long term firm yield reliability. The water supply reliabilities of Soyanggang Dam and Chungju Dam were evaluated. To evaluate the water supply reliability, forty one sets of monthly runoff series were generated by SAMS-2000. HEC-5 model was applied to the reservoir simulation to compute the firm yield from a monthly data of time series. The water supply reliability of the firm yield from the design runoff data of Soyanggang Dam is evaluated by 80.5 % for a planning period of 50 years. The water supply reliability of the firm yield from the historic runoff after the dam construction is evaluated by 53.7 %. The firm yield from the design runoff is 1.491 billion $m^3$/yr and the firm yield from the historic runoff is 1.585 billion $m^3$/yr. If the target draft Is 1.585 billion $m^3$/yr, additional water of 0.094 billion $m^3$ could be supplied every year with its risk. From the similar procedures, the firm yield from the design runoff of Chungju Dam is evaluated 3.377 billion $m^3$/yr and the firm yield from the historic runoff is 2.960 billion $m^3$/yr. If the target draft is 3.377 billion $m^3$/yr, water supply insufficiency occurs for all the sets of time series generated. It may result from overestimation of the spring runoff used for design. The procedure shown can be a more objective method to evaluate water supply reliability of a dam.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.77-77
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• 2000

Titanium oxide (TiO2) thin films have valuable properties such as a high refractive index, excellent transmittance in the visible and near-IR frequency, and high chemical stability. Therefore it is extensively used in anti-reflection coating, sensor, and photocatalysis as electrical and optical applications. Specially, TiO2 have a high dielectric constant of 180 along the c axis and 90 along the a axis, so it is highlighted in fabricating dielectric capacitors in micro electronic devices. A variety of methods have been used to produce patterned self-assembled monolayers (SAMs), including microcontact printing ($\mu$CP), UV-photolithotgraphy, e-beam lithography, scanned-probe based micro-machining, and atom-lithography. Above all, thin film fabrication on $\mu$CP modified surface is a potentially low-cost, high-throughput method, because it does not require expensive photolithographic equipment, and it produce micrometer scale patterns in thin film materials. The patterned SAMs were used as thin resists, to transfer patterns onto thin films either by chemical etching or by selective deposition. In this study, we deposited TiO2 thin films on Si (1000 substrateds using titanium (IV) isopropoxide ([Ti(O(C3H7)4)] ; TIP as a single molecular precursor at deposition temperature in the range of 300-$700^{\circ}C$ without any carrier and bubbler gas. Crack-free, highly oriented TiO2 polycrystalline thin films with anatase phase and stoichimetric ratio of Ti and O were successfully deposited on Si(100) at temperature as low as 50$0^{\circ}C$. XRD and TED data showed that below 50$0^{\circ}C$, the TiO2 thin films were dominantly grown on Si(100) surfaces in the [211] direction, whereas with increasing the deposition temperature to $700^{\circ}C$, the main films growth direction was changed to be [200]. Two distinct growth behaviors were observed from the Arhenius plots. In addition to deposition of THe TiO2 thin films on Si(100) substrates, patterning of TiO2 thin films was also performed at grown temperature in the range of 300-50$0^{\circ}C$ by MOCVD onto the Si(100) substrates of which surface was modified by organic thin film template. The organic thin film of SAm is obtained by the $\mu$CP method. Alpha-step profile and optical microscope images showed that the boundaries between SAMs areas and selectively deposited TiO2 thin film areas are very definite and sharp. Capacitance - Voltage measurements made on TiO2 films gave a dielectric constant of 29, suggesting a possibility of electronic material applications.

• Korean Journal of Materials Research
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• v.22 no.6
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• pp.275-279
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• 2012

(3-mercaptopropyl)trimethoxysilane (MPTMS) was used as a silylation agent, and modified silica nanoparticles were prepared by solution polymerization. 2.0 g of silica nanoparticles, 150 ml of toluene, and 20 ml of MPTMS were put into a 300 ml flask, and these mixtures were dispersed with ultrasonic vibration for 60 min. 0.2 g of hydroquinone as an inhibitor and 1 to 2 drops of 2,6-dimethylpyridine as a catalyst were added into the mixture. The mixture was then stirred with a magnetic stirrer for 8 hrs. at room temperature. After the reaction, the mixture was centrifuged for 1 hr. at 6000rpm. After precipitation, 150 ml of ethanol was added, and ultrasonic vibration was applied for 30 min. After the ultrasonic vibration, centrifugation was carried out again for 1 hr. at 6000rpm. Organo-modification of silica nanoparticles with a ${\gamma}$-methacryloxypropyl functional group was successfully achieved by solution polymerization in the ethanol solution. The characteristics of the ${\gamma}$-mercaptopropyl modified silica nanoparticles (MPSN) were examined using X-ray photoelectron spectroscopy (XPS, THERMO VG SCIENTIFIC, MultiLab 2000), a laser scattering system (LSS, TOPCON Co., GLS-1000), Fourier transform infrared spectroscopy (FTIR, JASCO INTERNATIONL CO., FT/IR-4200), scanning electron microscopy (SEM, HITACHI, S-2400), an elemental analysis (EA, Elementar, Vario macro/micro) and a thermogravimetric analysis (TGA, Perkin Elmer, TGA 7, Pyris 1). From the analysis results, the content of the methacryloxypropyl group was 0.98 mmol/g and the conversion rate of acrylamide monomer was 93%. SEM analysis results showed that the organo-modification of ultra-fine particles effectively prevented their agglomeration and improved their dispensability.