• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.393-393
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• 2012

Optically active nanostructures such as subwavelength moth-eye antireflective structures or surface enhanced Raman spectroscopy (SERS) active structures have been demonstrated to provide the effective suppression of unwanted reflections as in subwavelength structure (SWS) or effective enhancement of selective signals as in SERS. While various nanopatterning techniques such as photolithography, electron-beam lithography, wafer level nanoimprinting lithography, and interference lithography can be employed to fabricate these nanostructures, roll-to-roll (R2R) nanoimprinting is gaining interests due to its low cost, continuous, and scalable process. R2R nanoimprinting requires a master to produce a stamp that can be wrapped around a quartz roller for repeated nanoimprinting process. Among many possibilities, two different types of mask can be employed to fabricate optically active nanostructures. One is self-assembled Au nanoparticles on Si substrate by depositing Au film with sputtering followed by annealing process. The other is monolayer silica particles dissolved in ethanol spread on the wafer by spin-coating method. The process is optimized by considering the density of Au and silica nano particles, depth and shape of the patterns. The depth of the pattern can be controlled with dry etch process using reactive ion etching (RIE) with the mixture of SF6 and CHF3. The resultant nanostructures are characterized for their reflectance using UV-Vis-NIR spectrophotometer (Agilent technology, Cary 5000) and for surface morphology using scanning electron microscope (SEM, JEOL JSM-7100F). Once optimized, these optically active nanostructures can be used to replicate with roll-to-roll process or soft lithography for various applications including displays, solar cells, and biosensors.

• Journal of the Korean Society for Precision Engineering
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• v.30 no.6
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• pp.567-572
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• 2013

In many electro-devices, the vacuum process is used as the manufacturing process. However, the vacuum process has a problem, it is difficult to apply to a continuous process such as a R2R(roll to roll) printing process. In this paper, we propose an ESD (electro static deposition) printing process has been used to apply an organic solar cell of thin film forming. ESD is a method of liquid atomization by electrical forces, an electrostatic atomizer sprays micro-drops from the solution injected into the capillary with electrostatic force generated by electric potential of about several tens kV. The organic solar cell based on a P3HT/PCBM active layer and a PEDOT:PSS electron blocking layer prepared from ESD method shows solar-to-electrical conversion efficiency of 1.42% at AM 1.5G 1sun light illumination, while 1.86% efficiency is observed when the ESD deposition of P3HT/PCBM is performed on a spin-coated PEDOT:PSS layer.

• Textile Coloration and Finishing
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• v.29 no.4
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• pp.202-210
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• 2017

In recent years, the water-based ink have been widely used in various industrial applications due to environmental problems. Dispersibility of the pigment for applications of the water-based ink is the one of the most important technical factors to produce uniform color products. Thus, in this study, the three-roll mill process was used to improve the dispersion of the water-based ink. The results indicated that the three-roll mill reduced the size of pigment particles in the ink more than 50%. In addition, the dispersant showed an important role to maintain the dispersion stability of the pigment in the water-based ink over 120 hours. We also confirmed the optimum contents of the ink stock solution, drying temperature and drying time by the colorimeter and colorfastness tests on produced PET synthetic suedes.

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.05a
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• pp.1.2-1.2
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• 2011

With recent advances in materials and products, materials processing experiences new challenges. More particles and polymers in material side and thinner and faster deformations in processing side. It happens in most emergying industries such as manufacturing of batteries, solar cells, multi-layer chips, displays, printed electronics, to list a few. In most cases, they are manufactured by coating or printing process, which is defined as a process in which gas is replaced by liquid on a substrate. In this sense, casting, inkjet printing, and roll-to-roll printing are all included. The printing process consists of three unit processes. As the materials used in the above mentioned applications typically contain a large amount of particles with polymers and solvents, they continuously change microstructures during preparation, flow, and even drying. However, little is known about the flow characteristics of such complex fluids and less is known about how to design and control the process. Therefore, for better control of the process and for better quality of the product, we need to understand the flow characteristics of these complex fluids under extremely fast flow environment.

• Corrosion Science and Technology
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• v.9 no.2
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• pp.98-103
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• 2010

In order to further reduce the cost without reducing the corrosion resistance, a high-manganese austenitic alloy for sink roll or stabilizer roll in continuous hot-dip coating lines was developed. A systematic study of corrosion behavior of the high-manganese austenitic alloy in pure zinc bath at $490^{\circ}C$ was carried out. The results shows that, the high-manganese austenitic alloy shows better corrosion resistance than 316L steel. The corrosion rate of the high-manganese austenitic alloy in pure zinc bath is calculated to be approximately $6.42{\times}10^{-4}g{\cdot}cm^{-2}{\cdot}h^{-1}$, while the 316L is $1.54{\times}10^{-3}g{\cdot}cm^{-2}{\cdot}h^{-1}$. The high-manganese austenitic alloy forms a three-phase intermetallic compound layer morphology containing ${\Gamma$}, ${\delta}$ and ${\zeta}$ phases, while the 316L is almost ${\zeta}$ phase. The ${\Gamma}$ and ${\delta}$ phases of the high-manganese austenitic alloy contain about 8.5 wt% Cr, the existence of Cr improve the stabilization of phases, which slow down the reaction of Fe and Zn, improve the corrosion resistance of the high-manganese austenitic alloy. So substitute the nickel with the manganese to manufacture the high-manganese austenitic alloy of low cost is feasible.

• Journal of the Korean Society for Precision Engineering
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• v.30 no.6
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• pp.584-588
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• 2013

Studies are using a roll forming bar. A bar coating device available for a variety of coating conditions was developed. It is characterized by the bar forward and reverse rotation, fine-tune coating speed, and stripe coating. To determine the characteristics of the equipment, the coating tests under different coating conditions were carried out. As a result of the coating tests, the equipment was confirmed as one of strong candidates for the production tool of organic solar cells. The further production test of organic solar cells through stripe coating is in progress.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.633-636
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• 2006

GE has developed a plastic substrate technology comprised of a superior high-heat polycarbonate substrate film and a unique transparent coating package that provides the ultrahigh barrier to moisture and oxygen, and chemical resistance to solvents used in device fabrication. This contribution will update recent progresses made at GEFlexible Ultra-high Gas Barrier Substrate for Organic Electronics on ultra-high barrier coated plastic substrate, both in batch mode and in roll-to-roll mode

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07b
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• pp.1075-1078
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• 2005

A UV-cured adhesive with a low $T_g$ below the room temperature was used as a substrate for manufacturing a film-like liquid crystal display. This film-like LCD shows a fully flexibility due to the low $T_g$ property, and the manufacture processes are roll-to-roll compatible due to the coating processes.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.213-213
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• 1999

현재 LCD용 기판재료는 ITO/glass를 전극으로 사용하고 있다. 그러나 유리기판은 무겁고 깨지기 쉽기 때문에 사용상 곤란한 점이 많다. 최근 flexible하고 가공성 및 생산성이 우수한 플라스틱한 ITO를 성막하여 EL용, Touch panel, plastic LCD용 사용하려는 시도로, roll-to-roll 연속 스퍼터링에 의한 ITO성막공정에 대한 연구가 최근 활발하게 이루어지고 있다. 폴리머는 유리에 비해 Tg 온도가 낮고, 기판으로부터의 수분 및 여러 종류의 가스방출이 심하기 때문에 유리와는 달리 ITO막의 제조에 있어 큰 차이점이 있다. 따라서, 폴리머에 반응성 스퍼터링을 하기 위해서는 표면처리가 중요한 변수가 되며, roll to roll sputter로 ITO 필름을 얻기 위해서는 폭과 길이 방향으로 균일한 막을 얻는 것이 중요하다. 두께 75$\mu\textrm{m}$, 폭 190mm, 길이 400m로 권취된 광학용 Polyethylene terephthalate(PET:Tg:8$0^{\circ}C$)위에 In-10%Sn의 합금타겟과 Unipolar pulsed DC power supply를 사용하여 반응성 마그네트론 스퍼터링 방법으로 0.2m/min의 속도로 연속 스퍼터링 하였다. PET를 Ar/O2 혼합가스로 플라즈마 전처리를 한 후, AFM, XPS를 이용하여 효과를 분석을 하였고, 성막전에 가스방출을 막기 위해 TiO를 코팅하였다. Pilot 연속 생산공정에서 재현성을 위해 PEM(Plasma Emission Monitor)의 optical emission spectroscopy를 이용, 금속과 산화물의 천이구역에서 sprtter된 I/Sn 이온과 산소 이온의 반응에 의한 최적의 플라즈마의 강도값을 입력하여 플라즈마의 radiation을 검출하고, 스퍼터링 공정중 실질적인 in-situ 정보로 이용하였다. PEM을 통하여 In/Sn의 플라즈마 강도변화를 조사하였다. 초기 In/Sn의 플라즈마 강도(intensity)는 강도를 100하여, 산소를 주입한 결과, plasma intensity가 35 줄어들었고, 이때 우수한 ITO 박막을 얻을 수 있었다. Pulsed DC power를 사용하여 아크 현상을 방지하였다. PET 상에 coating 된 ITO 박막의 표면저항과 광투과도는 4-point prove와 spectrophotometer를 이용하여 분석하였고, AES로 박막의 두께에 따른 성분비를 확인하였다. ITO 박막의 광투과도는 산소의 유량과 sputter 된 In/Sn ion의 plasma emission peak에 따라 72%-92%까지 변화하였으며, 저항은 37$\Omega$/$\square$ 이상을 나타내었다. 박막의 Sn/In atomic ratio는 0.12, O/In의 비율은 In2O3의 화학양론적 비율인 1.5보다 작은 1.3을 나타내었다.

• Korean Journal of Materials Research
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• v.21 no.5
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• pp.255-262
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• 2011

This paper has relatively high technical standard and experimental skill. The fabrication of TCO film with high transparency, low resistance and low chromaticity require exact control of several competing factors. This paper has resolved these problems reasonably well, thus recommended for publication. Indium tin oxide(ITO) thin films were by D.C. magnetron roll-to-roll sputter system utilizing ITO and $SiO_2$ targets of ITO and $SiO_2$. In this experiment, the effect of D.C. power, winding speed, and oxygen flow rate on electrical and optical properties of ITO thin films were investigated from the view point of sheet resistance, transmittance, and chromaticity($b^*$). The deposition of $SiO_2$ was performed with RF power of 400W, Ar gas of 50 sccm and the deposition of ITO, DC power of 600W, Ar gas of 50 sccm, $O^2$ gas of 0.2 sccm, and winding speed of 0.56m/min. High quality ITO thin films without $SiO_2$ layer had chromaticity of 2.87, sheet resistivity of 400 ohm/square, and transmittance of 88% and $SiO_2$-doped ITO Thin film with chromaticity of 2.01, sheet resistivity of 709 ohm/square, and transmittance of more than 90% were obtained. As a result, $SiO_2$ was coated on PET before deposition of ITO, their chromaticity($b^*$) and transmittance were better than previous results of ITO films. These results show that coating of $SiO_2$ induced arising chromaticity($b^*$) and transmittance. If the thickness of $SiO_2$ is controlled, sheet resistance value of ITO film will be expected to be better for touch screen. A four point probe and spectrophotometer are used to investigate the properties of ITO thin films.