• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.484-485
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• 2011

반사방지(Anti-Reflection, AR) 특성은 태양전지, LED, 광검출기 등의 광전소자와 디스플레이의 효율과 투과도를 향상시키기 위해 적용되고 있다. 또한 최근에 네비게이션, 스마트폰의 보급 증가로 인해 소형 디스플레이에 지문방지와 동시에 반사방지 기능을 갖는 필름이 사용되고 있다. 현재 적용되고 있는 반사방지 필름은 다층박막 코팅으로 형성된 필름[1]으로 생산단가와 박막의 내구성 및 신뢰성에 문제점을 가지고 있다. 이런 문제점을 해결하기 위해 나노구조로 제작 되는 반사방지 필름에 관한 연구가 활발히 진행되고 있다[2]. 나노구조로 형성된 반사방지 구조는 moth-eye 구조라고 하며, 기본 원리는 원뿔 형태를 형성된 나노 구조를 통해 공기와 나노구조 사이의 유효 굴절률을 서서히 변화시켜 반사를 줄이는 것이다. 그러므로 moth-eye 나노구조는 파장 이하의 pitch와 파장 크기의 높이를 갖도록 구조가 제작되어야 한다[3]. Photo-lithography[4], e-beam lithography[5], interference lithography[6], dip-pen nanolithography[7], hybrid nano-patterning lithography[8] 등 여러 가지 방법으로 나노 구조를 제작하고 있으나, 네비게이션이나 스마트폰 등에 적용될 수 있는 대면적으로 제작하기 위해서는 roll-to-roll printing과 같은 대면적 공정을 이용하여 제작하는 것이 필요하다. 본 논문에서는 원통형 알루미늄 rod에 양극산화를 통해 다공성 AAO(anode aluminium oxide) template를 제작하고, roll-to-roll printing 기술을 사용하여 moth-eye 나노구조를 갖는 반사방지 필름을 제작하는 것에 대해 기술하였다.

• 한국정보전자통신기술학회논문지
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• 제8권2호
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• pp.101-106
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• 2015

본 논문은 인접 심볼 간의 간섭이 발생하지 않는 최대 데이터 전송률인 Nyquist rate 보다 빠르게 데이터를 전송하여 전송량을 증가시키는 FTN(Faster than Nyquist) 기법을 이용하여 최적의 필터 roll-off 값과 탭 수를 설정한다. FTN 신호 전송 시 발생하는 ISI(Inter-Symbol Interference)를 최소화하기 위해 LDPC부호를 기반으로 하는 터보 등화 모델을 적용하였으며, FTN 신호의 필터 roll-off 값과 탭 수에 따라 시뮬레이션하여 성능을 향상시키고 최적의 값을 설정하였다.

• ETRI Journal
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• 제23권4호
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• pp.177-189
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• 2001

Multicarrier DS-CDMA is an effective approach to combat fading and various kinds of interference. In this paper, we present an overlapped multicarrier DS-CDMA system, wherein each of the rate 1/M convolutionally-encoded symbols is also repetition coded and transmitted using overlapped multicarriers. However, since the frequency spectrums of successive carriers are allowed to overlap, the transmission bandwidth is more efficiently utilized. The effect of the overlapping percentage between successive carriers of a multicarrier DS-CDMA system on the performance is investigated to determine the overlapping percentage showing the best performance. We suggest two methods for sub-band overlapping variation. One is to allow variation of sub-band overlapping percentage when the total number of subcarriers is fixed. The other is to increase the number of sub-bands (the number of repetitions R) with fixed sub-band bandwidth. Given a total number of subcarriers MR, we show that the BER variation is highly dependent on the roll-off factor ${\beta}$ of a raised-cosine chip wave-shaping filter irrespective of convolutional encoding rate 1/M and repetition coding rate 1/R. We also analyze the possibility of reduction in total multi-user interference by considering the variation of both the roll-off factor ($0<{\beta}{\leq}1$) and the sub-band overlapping factor ($0<{\lambda}{\leq}2$), and show that the proposed system may outperform the multicarrier DS-CDMA system in [3].

• 한국추진공학회지
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• 제2권1호
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• pp.88-94
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• 1998

이 연구에서는 100인승 항공기 급의 저익-주익장착나셀(wing mounted nacelle)의 추진기관 장착설계 방법을 제시하였다. 장착설계 방법을 구체적으로 설명하기 위해 세부적인 설계제한조건(design constraint)과 설계요구조건(design requirement and objectives)을 정의하고, 그러한 기준을 근거로 실례의 항공기(K100)를 사용하여 주익장착방식의 장착설계를 수행하였다. 장착설계는 간섭항력(interference drag), roll clearance, ground clearance, nose gear collapse margin, rotor burst, 연료탱크용량 등의 설계제한사항들을 고려하여 엔진성능을 만족시킬 수 있는 최적의 나셀 장착위치(spanwise, FS, WL)와 장착각도(toe-in, incidence, droop angle), wing dry bay의 위치와 크기를 결정하여 향후에 개발될 주익장착방식의 추진기관 장착설계에 활용될 수 있는 설계절차를 구축하였다.

• 한국군사과학기술학회지
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• 제21권5호
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• pp.572-582
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• 2018

In this paper, we have calculated a formular for sabot-trajectory of shipboard projectile including ship motion and generated trajectory-range function for analysing interference with structure of naval ship. We make formula to approximate the ship motion data of naval ship using optimization technique. Through this formula, we calculate the velocities and accelerations of sabot caused by ship motion(surge, sway, heave, roll, pitch, yaw) and then, we produce the formula about the trajectory of sabot including effects of ship motion in addition to previous study which had considered the effects of the pressure of flume, friction force, etc. To investigate interference with ship structures, we make the trajectory-range functions and then extract the nearest or farthest trajectory to ship structure. Through these data, we can conform whether the interference is happened or not.

• 항공우주시스템공학회지
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• 제16권2호
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• pp.39-48
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• 2022

본 논문에서는 항공기가 비행 중 RF 간섭 신호로 인해 전파고도계의 비정상인 고도값이 발생되는 현상에 대한 개선 방안을 연구하였다. 비행 임무 시 수회 이상을 고기동 후 기동 회복을 수행하기 때문에 정확한 고도가 시현되어야 비행 임무를 효과적으로 수행할 수 있다. 따라서, 원인분석, 고장탐구를 통해 RF 간섭 신호를 감쇠시키는 감쇠기 장착 방안을 도출하였다. 또한, 개선사항에 대한 검증 및 적용결과도 함께 기술하였다.

• 대한원격탐사학회:학술대회논문집
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• 대한원격탐사학회 2004년도 Proceedings of ISRS 2004
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• pp.498-500
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• 2004

QPSK (Quaternary Phase Shift Keying) will be adopted as the modulation of HRIT (High Rate Information Transmission) which is transmitted to COMS (Communication, Ocean and Meteorological Satellite) through HPA (High Power Amplifier) in ground segment. Due to the nonlinearity of HPA, IMD (Inter-Modulation Distortion) of multi-carrier signals and PAPR (Peak-to-Average Power Ratio) of modulated HRIT must be considered to estimate the output power of HPA. In this paper, we measured the PAPR to various the roll-off factor of RRC (Root Raised Cosine filter) which is filtering the modulated HRIT signal for reducing ISI (Inter-Symbol Interference) and bandwidth. It was found that the minimum PAPR is 2.78dB at 0.5 of roll-off factor for scrambled data. It's 2.78dB of P APR will be in output power selecting in COMS earth station.

• 한국정보통신학회논문지
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• 제3권4호
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• pp.895-905
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• 1999

This paper identifies a linear time-invariant mathematical model of each stand of a five-stand tandem cold mill to design a robust $H_\infty$ thickness controller by applying input and output data sets to N4SID (Numerical algorithms for Subspace State Space System Identification) method. The input-output data sets describe interstand interference in the process of tandem cold rolling and are obtained from a nonlinear simulator of the tandem cold mill. In result, it is shown that the identified model well approximates the nonlinear model than a Taylor linearized model. Furthermore, uncertainties including roll eccentricity and incoming strip variation are quantitatively analyzed from the plot of maximum singular values.

• 한국CDE학회논문집
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• 제17권1호
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• pp.1-6
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• 2012

The End Coupling is main component of the aluminum hot roll process. The End Coupling is used for transmission of rotational power with heavy-duty load. Fracture of the End Coupling cause serious economic losses because an End Coupling is a very expensive component and it takes a long time to repair it. Therefore, preventing the destruction of the End Coupling is essential for ensuring a long mechanical life cycle. In this paper, the parametric study on the End Coupling was performed in order to minimize maximum stress under operation loads. To verify the interference of spindle assembly with modified End Coupling, kinematics simulation was performed by applying the various combination type and dynamic boundary condition of the spindle assembly. The interference of optimized model was not occurred during combination process and driving process. As a result of an optimum design for life extension on End Coupling, the maximum stress of modified End Coupling was lower than that of the initial model by 26%.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.393-393
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• 2012

Optically active nanostructures such as subwavelength moth-eye antireflective structures or surface enhanced Raman spectroscopy (SERS) active structures have been demonstrated to provide the effective suppression of unwanted reflections as in subwavelength structure (SWS) or effective enhancement of selective signals as in SERS. While various nanopatterning techniques such as photolithography, electron-beam lithography, wafer level nanoimprinting lithography, and interference lithography can be employed to fabricate these nanostructures, roll-to-roll (R2R) nanoimprinting is gaining interests due to its low cost, continuous, and scalable process. R2R nanoimprinting requires a master to produce a stamp that can be wrapped around a quartz roller for repeated nanoimprinting process. Among many possibilities, two different types of mask can be employed to fabricate optically active nanostructures. One is self-assembled Au nanoparticles on Si substrate by depositing Au film with sputtering followed by annealing process. The other is monolayer silica particles dissolved in ethanol spread on the wafer by spin-coating method. The process is optimized by considering the density of Au and silica nano particles, depth and shape of the patterns. The depth of the pattern can be controlled with dry etch process using reactive ion etching (RIE) with the mixture of SF6 and CHF3. The resultant nanostructures are characterized for their reflectance using UV-Vis-NIR spectrophotometer (Agilent technology, Cary 5000) and for surface morphology using scanning electron microscope (SEM, JEOL JSM-7100F). Once optimized, these optically active nanostructures can be used to replicate with roll-to-roll process or soft lithography for various applications including displays, solar cells, and biosensors.