• Title/Summary/Keyword: Residual liquid film

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A Study on Electro-Optical Characteristics of the Ion Beam Aligned TN Cell on the a-C:H Thin Film (a-C:H 박막을 이용한 이온빔 배향 TN 셀의 Electro-Optical 특성에 관한 연구)

  • Park, Chang-Joon;Jo, Yong-Min;Hwang, Jeoung-Yeon;Seo, Dae-Shik;Rho, Soon-Joon;Baik, Hong-Koo;Jeong, Youn-Hak
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.05d
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    • pp.57-60
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    • 2003
  • Electro-Optical (EO) performances for the ion beam (IB) aligned twisted-nematic (TN)-liquid crystal display (LCD) with ion beam exposure on the new of diamond like carbon (DLC) thin film surface were investigated. Voltage-transmittance (V-T) curve and response time without backflow bounce in the ion beam aligned TN-LCD with ion beam exposure for 0.5 and 1min on the DLC thin film was observed. Also. the fast response time of ion beam aligned TN-LCD with ion beam exposure for 1min on the DLC thin film surface can be achieved. The residual DC voltage of the ion beam aligned TN-LCD on the DLC thin film surface was almost the same as that of the rubbing aligned TN-LCD on the polyimide(PI) surface.

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Simulation of Characteristics of Amorphous-Silicon Thin Film Transistor for Liquid Crystal Display Using the Mixed Simulator (혼합시뮬레이터를 사용한 액정 표시기용 비정질 실리콘 박막 트랜지스터의 특성 시뮬레이션)

  • 이상훈;김경호
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.32A no.12
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    • pp.122-129
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    • 1995
  • The most important feature of a-Si TFT is dense localized states such as dangling bonds which exist in tis bandgap. Electrons trapped by localized states dominate the potential distribution in the active a-Si region ,and influence the performance of a-Si TFT. In this paper, we describe the electrical characteristics of a-Si TFT with respect to trap distribution within bandgap, electron mobility and interface states using 2-Dimensional device simulator and compare the result of simulation with measurements. Using the mixed-mode simulator, we can predict the potential variation of pixel which causes residual image problem during the turn-off of a-Si TFT driving circuit. Therefore it is possible to consider trade-off between potential variation of pixel and turn-on current of a-Si TFT for the optimized driving circuit.

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Culture Characteristics of Streptomyces spp. on Improved Polyacrylamide Gel and Agar Media

  • Han, Hong ui;Baek, Ji-Ho;Yang, Moon
    • Journal of Microbiology
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    • v.34 no.4
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    • pp.384-386
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    • 1996
  • Application of polyacrylamide gel (PAG) instead of agar to solid cultures of Streptomyces spp. was studied. The improved media were prepared by 1) gelling 20 ml of 5% acrylamide in a glass petri dish at room temperature, 2) washing by running water for more than 8 hr to remove residual reaction reagents, 3) drying at 5$0^{\circ}C$ for 12 hr to make a gel film, 4) autoclaving at 121$^{\circ}C$ for 15 min, and 5) swelling gel for about 4 hr by adding sterile liquid medium. In PAG media there were no differences from the observation of morphological characteristics showing during the cellular differentiation on agar media, whereas the ability to utilize carbohydrates differed somewhat from agar media. Agar media thus were little favorable for biochemical tests which the growth was determined depending on the formation of colony, but washed PAG was superior to serve as a solidifying agent.

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One-Step Nanoscale Patterning of Silver Ionic Ink via Elastic Mold Deformation (탄성 몰드 변형을 이용한 은 이온 잉크의 원-스텝 나노스케일 패터닝)

  • Yong Suk Oh
    • Journal of Sensor Science and Technology
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    • v.32 no.4
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    • pp.252-256
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    • 2023
  • A one-step method for nanoscale patterning of silver ionic ink on a substrate is developed using a microscale, elastic mold deformation. This method yields unique micro/nanoscale metallic structures that differ from those produced using the original molds. The linewidth of these metallic structures is significantly reduced (approximately 10 times) through the sidewall deformation of the original mold cavity on a thin liquid film, as verified by finite element analysis. The process facilitates the fabrication of various, isolated and complex micro/nanoscale metallic structures with negligible residual layers at low cost and high throughput. These structures can be utilized for various applications, including optoelectronics, wearable sensors, and metaverse-related devices. Our approach offers a promising tool for manipulation and fabrication of micro/nanoscale structures of various functional materials.