• Title/Summary/Keyword: Residual Gas

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A Study on Analysis of Heat Transfer and Residual Stress on the Weld Zone using FEM (유한요소법을 이용한 용접부의 열전달 및 잔류응력 해석에 관한 연구)

  • 김일수
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.9 no.5
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    • pp.96-104
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    • 2000
  • This paper represents to develop a computer software system which is capable to analyze the phase transformation of high strength steel(BV-AH32) and to predict heat transfer and welding residual stress due to phase transformation during Gas Metal Arc(GMA) welding. The developed model was considered temperature dependent properties such as young's modules, coefficient of thermal expansion and yield stress as well as the double ellipsoidal heat distribution by the moving arc. From the results, it was found that the longitudinal and transverse residual stresses calculated by the coupled analysis of heat transfer, residual stress and phase transformation showed good agreement with the experimental data. In addition, the temperature distribution as well as longitudinal and transverse residual stresses of weldment by the 1-pass and 2-pass of welding were also determined.

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Determination of the Residual Ethylene Oxide in Quasi-drugs (의약외품중 산화에칠렌가스의 잔류량 분석)

  • 이정표;김경옥;손경훈;양성준;백옥진
    • YAKHAK HOEJI
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    • v.45 no.5
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    • pp.437-441
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    • 2001
  • The quasi-drugs including nonwoven fabric and gauze were sterilized using ethylene oxide (EO) gas. Residual EO in the quasi-drugs was extracted with water (20 mL of water for 1 g of sample) for 24h at 37$^{\circ}C$. Residual EO was determined using GC. The optimal analytical conditions were as follows : column, Carbowax 20M (1.D. 0.2 mm); mobile phase, helium with 30 mL/min; oven temperature 57$^{\circ}C$, injector temperature 18$0^{\circ}C$, detector temperature 20$0^{\circ}C$. The detection limit for EO was 0.10$\mu$g/mL. When the residual EO extracted from nonwoven fabric and gauze was determined, it took more than 9h to get the lower level than 25 ppm which is the limit value of FDA guideline. When the EO residues, ethylene chlorohydrine (ECH) and ethylene glycol (EG) in the 7 commercially available quasi-drugs were determined, no residual EO, ECH, EG were found from the seven commercially available quasi-drugs analyzed by this method.

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Particle Impact Damage behaviors in silicon Carbide Under Gas Turbine Environments-Effect of Oxide Layer Due to Long-Term Oxidation- (세라믹 가스터빈 환경을 고려한 탄화규소의 입자충격 손상거동-장기간 산화에 따른 산화물층의 영향-)

  • 신형섭
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.19 no.4
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    • pp.1033-1040
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    • 1995
  • To simulate strength reliability and durability of ceramic parts under gas turbine application environments, particle impact damage behaviors in silicon carbide oxidized at 1673 K and 1523 K for 200 hours in atmosphere were investigated. The long-term oxidation produced a slight increase in the static fracture strength. Particle impact caused a spalling of oxide layer. The patterns of spalling and damage induced were dependent upon the property and impact velocity of the particle. Especially, the difference in spalling behaviors induced could be explained by introducing the formation mechanism of lateral crack and elastic-plastic deformation behavior at impact sit. At the low impact velocity regions, the oxidized SiC showed a little increase in the residual strength due to the cushion effect of oxide layer, as compared with the as-received SiC without oxide layer.

Property changes of GDLs and water behaviors in PEFCs (고분자전해질 연료전지 체결조건에서 기체확산층의 특성변화 및 물거동 확인)

  • Park, Gu-Gon;Lim, Nam-Yun;Ahn, Eun-Jin;Park, Jin-Soo;Yoon, Young-Gi;Lee, Won-Yong;Lim, Tae-Won;Kim, Chan-Soo
    • 한국신재생에너지학회:학술대회논문집
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    • 2006.11a
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    • pp.313-315
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    • 2006
  • Proper water management is important to achieve high performance and durability of Polymer electrolyte fuel cell (PEFC). Among various stack components, gas diffusion layer (GDL) is considered as a core part to determine the gas and water transportation in a cell. To optimize the water management, the changes of properties as well as basic properties of GDLs were investigated before and after clamping of colls. Thickness, electric conductivity, porosity, hydroppobicity etc. were characterized by the same criteria. The amount of residual water after cell operation also was compared by direct measuring of weight. Based on the amount of residual water the endurance on the freeze condition was evaluated.

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Al corrosion phenomena on the Al grain boundary after AlCu plasma etching (AlCu 플라즈마 식각후 Al 결정입계에서 Al 부식현상)

  • 김창일;권광호;윤선진;김상기;백규하;남기수
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.33A no.12
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    • pp.47-52
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    • 1996
  • Cl-based gas chemistry is generally used to etching for al alloy metallization. After the etching of Al alloy with Cl-based gas plasma, residual chlorine on Al alloy reacts with H$_{2}$O due to air exposure and results in Al corrosion. In this study, the corrosion phenomena of Al wer examined with XPS(X-ray photoelectron spectroscopy) and SEM (scanning electorn microscopy). It was confirmed that chlorine mainly existed at the grian boundary of Al alloy after plasma etching of Al alloy with cl-based gas chemistry and Al corrosion was largely generated at the grain boundary of Al alloy. And residual chlorine was passivated by sulfur and fluorine which were generated by SF$_{6}$ plasma. These effects of passivation reduced the Al corrosion due to air exposure.

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A Study on Expansion of Back Fire Limit Equivalence Ratio of the Hydrogen Fueled Engine (수소기관의 역화한계당량비 확장에 관한 연구)

  • Paik, Sung Ho;Park, Jae Bum;Kim, Yun Young;Lee, Jong Tae
    • Transactions of the Korean hydrogen and new energy society
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    • v.8 no.3
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    • pp.111-119
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    • 1997
  • In this study, feasibility of expansion of BFL equivalence ratio are examined with change of injection location of hydrogen gas in intake pipe, coolant temperature, spark timing and amount of residual gas. As the results, BFL equivalence ratio is increased when injection location has some distance from intake valve. And it is decreased in accordance with increasing of coolant temperature and advance of spark timing. The amount of residual gas has little effect on BFL equivalence ratio.

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A Comparative Study of Radiation and Gas Sterilization. (방사선항균법과 개스항균법의 비교연구)

  • 정해원;유영수
    • Journal of Environmental Health Sciences
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    • v.8 no.1
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    • pp.81-97
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    • 1982
  • Ethylene oxide gas has been used as a cold sterilant for heat-sensitive medical equipments and as a fumigant for food for more than 30 years, and it is used more widely than radiation although radiation sterilization has made significant inroads in recent years. But according to recent studies of toxicities such as mutagenicity, haemolytic effect and possible carcinogenicity of Ethylene oxide (ETO) and its two main reaction products, Ethylene chlorohydrin (ETCH) and Ethylene glycol (ETG), Environmental Protection Agency in U.S.A. has suggested some regulations on residual gas in drug products and medical devices for human use. The mutagenic activity of ETO compared with that of X-ray has an equivalency of 1 ppm/hr for ETO as compared to 20 mrad for X-ray, and one could suggest the present maximum allowable concentration for ETO (50 ppm) should be 400 times lower than the radiation standard (2.5 mrad/hr). Although radiation sterilization has advantages of simplicity of operation and complete reliability, changes of physico-chemical properties with possible formation of toxic substances may occur. It is therefore necessary to make some regulations of our own for residual toxicities orginated from each sterilization method.

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Surface Micromachining of TEOS Sacrificial Layers by HF Gas Phase Etching (HF 기상식각에 의한 TEOS 희생층의 표면 미세가공)

  • 장원익;이창승;이종현;유형준
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1996.11a
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    • pp.725-730
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    • 1996
  • The key process in silicon surface micromachining is the selective etching of a sacrificial layer to release the silicon microstructure. The newly developed anhydrous HF/$CH_3$OH gas phase etching of TEOS (teraethylorthosilicate) sacrificial layers onto the polysilicon and the nitride substrates was employed to release the polysilicon microstructures. A residual product after TEOS etching onto the nitride substrate was observed on the surface, since a SiOxNy layer is formed on the TEOS/nitride interface. The polysilicon microstructures are stuck to the underlying substrate because SiOxNy layer does not vaporize. We found that the only sacrificial etching without any residual product and stiction is TEOS etching onto the polysilicon substrate.

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The Characteristics of Residual Films on Silicon Surface $CHF_3/C_2F_6$ Reactive Ion Etching ($CHF_3/C_2F_6$ 플라즈마에 의한 실리콘 표면 잔류막의 특성)

  • 권광호;박형호;이수민;강성준;권오준;김보우;성영권
    • Journal of the Korean Vacuum Society
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    • v.1 no.1
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    • pp.145-152
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    • 1992
  • Si surfaces exposed to CHF3/C2F6 gas plasmas ih reactive ion etching (RIE) have been characterized by X-ray photoelectron spectroscopy (XPS). CHF3/C2F6 gas plasma exposure of Si surface leads to the deposition of residual film containing carbon and fluorine. The narrow scan spectra of C 1s show various bonding states of carbon as C-Si, C-F/H, C-CFx(x $\leq$ 3), C-F, C-F2, and C-F3. The chemical bonding states of fluorine are described with F-Si, F-C and F-O. And the oxygen and silicon are also detected. The effects of parameters for reactive ion etching as CHF3/C2F6 gas ratio, RF power, and pressure are investigated.

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