• Title/Summary/Keyword: Removal device

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Hardware implementation of automated haze removal method capable of real-time processing based on Hazy Particle Map (Hazy Particle Map 기반 실시간 처리 가능한 자동화 안개 제거방법의 하드웨어 구현)

  • Sim, Hwi-Bo;Kang, Bong-Soon
    • Journal of IKEEE
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    • v.26 no.3
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    • pp.401-407
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    • 2022
  • Recently, image processing technology for autonomous driving by recognizing objects and lanes through camera images to realize autonomous vehicles is being studied. Haze reduces the visibility of images captured by the camera and causes malfunctions of autonomous vehicles. To solve this, it is necessary to apply the haze removal function that can be processed in real time to the camera. Therefore, in this paper, the fog removal method of Sim with excellent performance is implemented with hardware capable of real-time processing. The proposed hardware was designed using Verilog HDL, and FPGA was implemented by setting Xilinx's xc7z045-2ffg900 as the target device. As a result of logic synthesis using Xilinx Vivado program, it has a maximum operating frequency of 276.932MHz and a maximum processing speed of 31.279fps in a 4K (4096×2160) high-resolution environment, thus satisfying the real-time processing standard.

Removal Characteristics of Soot and NO by Nonthermal Plasma and Radical in a Diesel Engine (비열플라즈마와 라디칼을 이용한 디젤엔진의 매연 및 NO 제거 특성)

  • Jang, Yeong-Jun;Choe, Seung-Hwan;Kim, Gyu-Bo;Jeon, Chung-Hwan
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.26 no.4
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    • pp.547-554
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    • 2002
  • We are facing the serious environmental pollution difficulties such as acid rain, green house effects, etc. The gaseous matter NOx, SOx, VOCs which are regarded as main factors for these current pollutions are mainly emitted from power plants and vehicles. Therefore several leading countries are regulating the emissions strictly, especially the exhaust emissions from a Diesel engine without an aftertreatment device. The objective of this study is to find out soot and NO removal characteristics focused on the emissions of a Diesel engine by using nonthermal plasma for each engine speeds and loads. Electrostatic precipitator(wire-to-plate type reactor) is used for soot removal. Radicals generated from outer air and put into a mixing chamber in the end of exhaust line are used for NO removal. Concentration of exhaust emissions is analyzed from the gas analyzer(KaneMay) and FTIR to estimate by-products.

Delayed Left Atrial Perforation Associated with Erosion After Device Closure of an Atrial Septal Defect

  • Kim, Ji Seong;Yeom, Sang Yoon;Kim, Sue Hyun;Choi, Jae Woong;Kim, Kyung Hwan
    • Journal of Chest Surgery
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    • v.50 no.2
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    • pp.110-113
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    • 2017
  • A 43-year-old man who had had a history of atrial septal defect (ASD) device closure 31 months previously presented with abrupt chest and back pain along with progressive cardiogenic shock and cardiac arrest. After resuscitation, he was diagnosed with cardiac tamponade. Diagnostic and therapeutic surgical exploration revealed left atrium (LA) perforation due to LA roof erosion from a deficient aortic rim. Device removal, primary repair of the LA perforation site, and ASD patch closure were performed successfully. The postoperative course was uneventful. The patient was discharged after 6 weeks of empirical antibiotic therapy without any other significant complications.

Lisfranc Injury Repair with the TightRope$^{TM}$ Device (A Case Report) (TightRope$^{TM}$ Device를 이용한 족근 중족 관절 손상의 치료(1예 보고))

  • Cho, Jae-Ho;Oh, In-Suk
    • Journal of Korean Foot and Ankle Society
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    • v.15 no.4
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    • pp.243-246
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    • 2011
  • Lisfranc injury is complex and difficult to treat. Making the correct diagnosis and achieving an anatomical reduction are important factors in regard to achieving a favorable outcome with this injury. We describe a new technique that we have found to be useful for stabilizing Lisfranc injury. This method is relatively fast and simple, and it provides non-rigid fixation. Also, it eliminates the need for implant removal. To date, we have achieved predictable results for stabilizing and treating this injury with the use of a $TightRope^{TM}$ Device, instead of traditional interfragmental screw fixation. In this report, we describe a case in which this method was used with satisfactory short-term results.

Research on Variable Constant Current Efficiency Measuring Device for Solar Panel to Reuse (태양광 패널 재사용을 위한 가변 정전류 기반의 효율 측정장치에 관한 연구)

  • Sang-Jin Woo;Dae-Heon Kim;Jae-Jin Lee;Oh-Min Kwon
    • IEMEK Journal of Embedded Systems and Applications
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    • v.18 no.1
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    • pp.9-17
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    • 2023
  • This paper relates to the development of a device for measuring the efficiency of a solar panel based on a variable constant current, and proposed a standard for reuse of the solar panel. By applying a variable constant current circuit to a solar panel efficiency measuring device, it was easy to apply a maximum power point tracking (MPPT) algorithm. In addition, a load dispersion method was applied to measure the efficiency of a high-capacity solar panel. and it is possible to solve a problematic thermal runaway during a MOSFET parallel operation by applying the load dispersion method. As a result of the experiment, the solar panel efficiency measuring device was able to accommodate a large solar panel of 350W, which is the maximum measurement goal. In this paper, the validity was confirmed through the 310W solar panel efficiency measurement experiment collected after removal.

CMP properties of $SnO_2$ thin film (가스센서 $SnO_2$ 박막의 광역평탄화 특성)

  • Choi, Gwon-Woo;Lee, Woo-Sun;Park, Jeng-Min;Choi, Seok-Jo;Park, Do-Sung;Kim, Nam-Oh
    • Proceedings of the KIEE Conference
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    • 2004.07c
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    • pp.1600-1604
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    • 2004
  • As the integrated circuit device shrinks to the smaller dimension, the chemical mechanical polishing (CMP) process was required for the global planarization of inter-metal dielectric(IMD) layer with free-defect. The effect of alternative commerical slurries pads, and post-CMP cleaning alternatives are discuess, with removal rate, scratch dentisty, surface roughness, dishing, erosion and particulate density used as performance metrics. we investigated the performance of $SnO_2$-CMP process using commonly used silica slurry, ceria slurry, tungsten slurry. This study shows removal rate and nonuniformity of $SnO_2$ thin film used to gas sensor by using Ceria, Silica, W-Slurry after CMP process. This study also shows the relation between partical size and CMP with partical size analysis of used slurry.

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Removal of a Submandibular Duct Calculus with ′SNU Sialoop′ : Technical Report (′SNU Sialoop′를 이용한 악하선 주도관 타석의 제거)

  • Choi Hang-Moon;Lee Sun-Bok;Heo Min-Suk;Lee Sam-Sun;Choi Soon-Chul;Park Tae-Won
    • Imaging Science in Dentistry
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    • v.30 no.4
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    • pp.255-257
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    • 2000
  • Manufacturing method and technical procedure of 'SNU Sialoop', which was a new device designed for removal of sialolith, were introduced. Two cases about removal of Wharton's duct sialolith using SNU Sialoop were presented.

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NOx Removal Characteristics Using Radical In A Diesel Engine (Radical을 이용한 디젤 엔진의 NOx 제거 특성)

  • Jeon, J.H.;Choi, S.H.;Jeon, C.H.;Chang, Y.J.;Lee, K.H.
    • Proceedings of the KSME Conference
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    • 2000.11b
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    • pp.715-719
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    • 2000
  • It is reported that we are facing the serious environment pollution difficulties such as acid rain, green house effects, etc. The gaseous matter CO, NOx, SOx, VOCs which are regarded as main factors for these current pollutions are mainly emitted from power plants and vehicles. Therefore several leading countries are regulating the related laws strictly, especially exhaust emissions from a Diesel engine without an after treatment device. The Objective of this study is to find out NOx removal characteristics focused on emissions of a Diesel engine using radical at each engine speed and load. It is generated from outer air and put into a mixing chamber in the end of exhaust line. In addition, the optimum temperature condition to activate reaction by radical is experimentally carried out. Concentration of exhaust emissions is analyzed from the gas anlayzer(KaneMay) and FTIR to estimate by-products.

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Decontamination of Simulated Test Piece by Dry Ice Pellet Blasting (드라이아이스 펠렛 분사에 의한 모의 시편의 제염)

  • Shin Jin-Myeong;Park Jang-Jin;Yang Myung-Seung
    • Journal of environmental and Sanitary engineering
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    • v.19 no.2
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    • pp.30-36
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    • 2004
  • Dry decontamination technique is required for maintaining nuclear material handling equipment contaminated with highly radioactive material in a hot cell. In order to determine the optimum blasting conditions of dry ice pellet blasting device, the basic experiments have been conducted on the simulated test specimens of four types of metals. The removal efficiency of test piece was evaluated by the XRF analysis and the change of the surface condition before and after blasting. The removal efficiency of cesium on loose contamination was 100% under blasting pressure; 3 kg/$cm^2$, blasting distance; 10 cm, blasting time: 10 sec. In case of fixed contamination, the removal efficiency of cesium was almost 96% under blasting pressure; 4kg/$cm^2$, blasting distance; 10 cm, blasting time; 30 sec.

CMP properties of $SnO_2$ thin film ($SnO_2$ 박막의 CMP 특성)

  • Choi, Gwon-Woo;Lee, Woo-Sun;Ko, Pil-Ju;Kim, Tae-Wan;Seo, Yong-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.04b
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    • pp.93-96
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    • 2004
  • As the integrated circuit device shrinks to the smaller dimension, the chemical mechanical polishing (CMP) process was required for the global planarization of inter-metal dielectric(IMD) layer with free-defect. The effect of alternative commerical slurries pads, and post-CMP cleaning alternatives are discuess, with removal rate, scratch dentisty, surface roughness, dishing, erosion and particulate density used as performance metrics. we investigated the performance of $SnO_2$-CMP process using commonly used silica slurry, ceria slurry, tungsten slurry. This study shows removal rate and nonuniformity of $SnO_2$ thin film used to gas sensor by using Ceria, Silica, W-Slurry after CMP process. This study also shows the relation between partical size and CMP with partical size analysis of used slurry.

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