• 제목/요약/키워드: Reflow Process

검색결과 174건 처리시간 0.022초

수소분리용 Pd-Cu 합금 분리막의 Cu Reflow 영향 (The Effect of Cu Reflow on the Pd-Cu Alloy Membrane Formation for Hydrogen Separation)

  • 문진욱;김동원
    • 한국표면공학회지
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    • 제39권6호
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    • pp.255-262
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    • 2006
  • Pd-Cu alloy membrane for hydrogen separation was fabricated by sputtering and Cu reflow process. At first, the Pd and Cu was continuously deposited by sputtering method on oxidized Si support, the Cu reflow process was followed. Microstructure of the surface and permeability of the membrane was investigated depending on various reflow temperature, time, Pd/cu composition and supports. With respect to our result, Pd-Cu thin film (90 wt.% Pd/10 wt.% Cu) deposited by sputtering process with thickness of $2{\mu}m$ was heat-treated for Cu reflow The voids of the membrane surface were completely filled and the dense crystal surface was formed by Cu reflow behavior at $700^{\circ}C$ for 1 hour. Cu reflow process, which is adopted for our work, could be applied to fabrication of dense Pd-alloy membrane for hydrogen separation regardless of supports. Ceramic or metal support could be easily used for the membrane fabricated by reflow process. The Cu reflow process must result in void-free surface and dense crystalline of Pd-alloy membrane, which is responsible for improved selectivity oi the membrane.

금속 배선 공정에서의 reflow 현상 (Reflow in Metallization Process)

  • 이승윤;박종욱
    • 한국재료학회지
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    • 제9권5호
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    • pp.538-543
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    • 1999
  • 금속 배선 공정에서 응용되고 있는 reflow에 관한 이론올 살펴보고, 금속 박막 reflow에 영향을 미치는 인자 및 re­flow와 grain growth의 관계를 고찰하였다. 금속 박막 reflow의 구동력은 표연 위치에 따른 chemical potential의 차이이며, 이러 한 구동력에 의하여 원자가 이동하게 된다. 반도체 소자의 금속 배선을 제작하는 조건에서 원자의 이동은 주로 surface diffusion에 의하여 이루어진다. 금속 박막의 reflow에 영향율 미치는 인자로는 reflow 온도, reflow 시간, reflow 분위기, 박막 두께, 박막 재료, underlayer 재료, 패턴 size, aspect ratio가 있으며, 박막을 reflow시키는 동안에 발생하는 grain growth에 의하여 reflow 특성이 변할 것으로 예상되므로 reflow 시 grain growth의 영향을 고려하여야 하리라 생각된다.

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Reflow Profiling The Benefits of Implementing a Ramp-to-Spike Profile

  • AIM
    • 한국마이크로전자및패키징학회:학술대회논문집
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    • 한국마이크로전자및패키징학회 2000년도 Proceedings of 5th International Joint Symposium on Microeletronics and Packaging
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    • pp.17-17
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    • 2000
  • The issue of reflow profiling continues to be a complex topic. The pains often associated with profiling can be reduced greatly if certain guidelines are followed and if there is a strong understanding of the variables that can be encountered during the reflow process. This paper shall discuss the appropriate guidelines and trouble shooting methods for reflow profiling, and in particular shall focus upon the benefits of implementing the linear ramp-to-spike profile. Delta T(T) is defined as the variation of temperature found on an assembly during the reflow process. Too large of a T can result in soldering defects, so to combat T a Ramp-Soak-Spike(RSS) reflow profile often is utilized. However, when using a newer-style reflow oven, the T often is minimized or eliminated, thus, the soak zone of the reflow profile becomes an unnecessary step. Because of this, the implementation of a linear Ramp-To-Spike(RTS) reflow profile should be considered. Benefits such as reduced energy costs, reduced solder defects, increased efficiency, improved wetting, and a simplification of the reflow profile process may be experienced when using the RTS profile. Included in this paper are the suggested process parameters for setting up the RSS and RTS profiles and the chemical and metallurgical reactions that occur at each set point of these profiles. The paper concludes with a discussion and pictures of several profile-related defects. Each of these defects is described, analyzed, and instructions are given for troublshooting these defects.

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구리 박막의 Reflow 특성에 관한 연구 (A Study on the Reflow Characteristics of Cu Thin Film)

  • 김동원;권인호
    • 한국재료학회지
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    • 제9권2호
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    • pp.124-131
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    • 1999
  • Copper film, which is expected to be used as interconnection material for 1 giga DRAM integrated circuits was deposited on hole and trench patterns by Metal Organic Chemical Vapor Deposition(MOCVD) method. After a reflow process, contact and L/S patterns were filled by copper and the characteristics of the Cu reflow process were investigated. When deposited Cu films were reflowed, grain growth and agglomeration of Cu have occurred in surfaces and inner parts of patterns as well as complete filling in patterns. Also Cu thin oxide layers were formed on the surface of Cu films reflowed in $O_2$ambient. Agglomeration and oxidation of Cu had bad influence on the electrical properties of Cu films especially, therefore, their removal and prevention were studied simultaneously. As a pattern size is decreased, preferential reflow takes place inside the patterns and this makes advantages in filling patterns of deep submicron size completely. With Cu reflow process, we could fill the patterns with the size of deep sub-micron and it is expected that Cu reflow process could meet the conditions of excellent interconnection for 1 giga DRAM device when it is combined with Cu MOCVD and CMP process.

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이송 모듈을 사용한 리플로우 오븐의 열유동해석 (Thermal design of reflow oven with PCB-module)

  • 정원중;권현구;조형희
    • 반도체디스플레이기술학회지
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    • 제5권3호
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    • pp.29-32
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    • 2006
  • Because of new requirements related to the employment of SMT(Surface Mounting Technology) manufacturing and the diversity of components on high density PCB(Printed Circuit Boards), Thermal control of the reflow process is required in order to achieve acceptable yields and reliability of SMT assemblies. Accurate control of the temperature distribution during the reflow process is one of the major requirements, especially in lead-free assembly. This study has been performed for reflow process using the commercial CFD(Computational Fluid Dynamics) tool for predicting flow and temperature distributions. Porous plate was installed to prevent leakage flow which was one of the major problem of temperature uniformity in the reflow process. There is a separation region where the flow is turned. Outside wall made of porous plate is to prevent and minimize separation region for acquiring uniform temperature during operation. This paper provided design concept from CFD results of the steady state temperature distribution and flow field inside a reflow oven.

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반도체 공정용 수직로 설계를 위한 열유동 제어. (The Third National Congress on Fluids Engineering: Thermal design for the vertical type oven of soldering process.)

  • 정원중;권현구;조형희
    • 유체기계공업학회:학술대회논문집
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    • 유체기계공업학회 2006년 제4회 한국유체공학학술대회 논문집
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    • pp.561-564
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    • 2006
  • Because of new requirements related to the employment of SMT(Surface Mounting Technology) manufacturing and the diversity of components on high density PCB(printed circuit boards), Thermal control of the reflow process is required in oder to achieve acceptable yields and reliability of SMT assemblies. Accurate control of the temperature distribution during the reflow process is one of the major requirements, especially in lead-free assembly. This study has been performed for reflow process using the commercial CFD tool(Fluent) for predicting flow and temperature distributions. There was flow recirculation region that had a weak point in the temperature uniformity. Porous plate was installed to prevent and minimize flow recirculation region for acquiring uniform temperature in oven. This paper provided design concept from CFD results of the steady state temperature distribution and flow field inside a reflow oven.

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강제대류-적외선 리플로 솔더링시 전자조립품의 열적반응 분석 (Analysis on the Thermal Response of Electronic Assemblies during Forced Convection-Infrared Reflow Soldering)

  • 손영석;신지영
    • Journal of Welding and Joining
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    • 제21권6호
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    • pp.46-54
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    • 2003
  • The thermal response of electronic assemblies during forced convection-infrared reflow soldering is studied. Soldering for attaching electronic components to printed circuit boards is performed in a process oven that is equipped with porous panel heaters, through which air is injected in order to dampen temperature fluctuations in the oven which can be established by thermal buoyancy forces. Forced convection-infrared reflow soldering process with air injection is simulated using a 2-dimensional numerical model. The multimode heat transfer within the reflow oven as well as within the electronic assembly is simulated. Parametric study is also performed to study the effects of various conditions such as conveyor speed, blowing velocity, and electronic assembly emissivity on the thermal response of electronic assemblies. The results of this study can be used in the process oven design and selecting the oven operating conditions to ensure proper solder melting and solidification.

SMT 공정 Nonwet 불량 인자에 대한 연구 (A Study on the Nonwet Defective Factors of the SMT Process)

  • 윤찬형
    • 마이크로전자및패키징학회지
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    • 제27권3호
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    • pp.35-39
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    • 2020
  • Nonwet (Head in Pillow) 불량은 SMT(surface mount technology) 공정 불량 유형 중 하나로 이 불량은 solder paste misalign, reflow 조건, package warpage, package ball size 등과 같은 인자에 따라 불량이 발생을 한다. 이에 본 논문은 Nonwet 발생 인자 중 ① reflow 조건 ② package ball & solder paste misalign ③ package ball 크기 type에 대한 인자를 선정하여 nonwet 실험을 진행하였다. 먼저 reflow 조건의 경우 soldering 시간이 길 경우 nonwet risk가 증가를 하나, reflow 공정에 N2를 적용할 시 solder ball 산화 억제에 따른 nonwet 개선을 확인 할 수 있었다. 또한 package ball과 solder paste misalign 발생 시 ball과 paste의 접촉 깊이가 20 ㎛ 이하의 경우 nonwet에 취약 했으며, package ball 체면적이 작을수록 nonwet 관점 개선됨을 확인 할 수 있었다.

LIGA-reflow 응용 Micro-lens Pattern 도광판 금형 제작 (Micro-lens Patterned LGP Injection Mold Fabrication by LIGA-reflow Process)

  • 황철진;김종덕;정재완;하수용;이규현
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2004년도 춘계학술대회 논문집
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    • pp.241-244
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    • 2004
  • Microlens patterned micro-mold fabrication method for Light Guiding Plate(LGP), kernel part of LCD-BLU(Back Light Unit), was presented. Instead of erosion dot pattern for LCP optical design, microlens pattern, fabricated by LIGA-reflow process, was applied. Optical pattern design method was also developed not only for negative pattern LGP, but also positive pattern LGP. In order to achieve flow balance during the micro-injection molding process and dimensional accuracy, two LGP pattern was made in one micro-mold.

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A study on the fabrication method of middle size LGP using continuous micro-lenses made by LIGA reflow

  • Kim, Jong-Sun;Ko, Young-Bae;Hwang, Chul-Jin;Kim, Jong-Deok;Yoon, Kyung-Hwan
    • Korea-Australia Rheology Journal
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    • 제19권3호
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    • pp.171-176
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    • 2007
  • LCD-BLU (Liquid Crystal Display-Back Light Unit) of medium size is usually manufactured by forming numerous dots with $50{\sim}300\;{\mu}m$ in diameter by etching process and V-grove shape with $50\;{\mu}m$ in height by mechanical cutting process. However, the surface of the etched dots is very rough due to the characteristics of the etching process and V-cutting needs rather high cost. Instead of existing optical pattern made by etching and mechanical cutting, 3-dimensional continuous micro-lens of $200\;{\mu}m$ in diameter was applied in the present study. The continuous micro-lens pattern fabricated by modified LIGA with thermal reflow process was tested to this new optical design of LGP. The manufacturing process using LIGA-reflow is made up of three stages as follows: (i) the stage of lithography, (ii) the stage of thermal reflow process and (iii) the stage of electroplating. The continuous micro-lens patterned LGP was fabricated with injection molding and its test results showed the possibility of commercial use in the future.