• Journal of the Korean Applied Science and Technology
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• v.25 no.4
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• pp.438-445
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• 2008

For recipe prediction of colorant proportion showing nonlinear behavior, we modeled the effects of colorant proportion of basic colors on the target colors and predicted colorant proportion necessary for making target colors. First, colorant proportion of basic colors and color information indicated by the instrument was applied by a linear model and a multi-layer perceptrons model with back-propagation learning method. However, satisfactory results were not obtained because of nonlinear property of colors. Thus, in this study the neuro-fuzzy model with merit of artificial neural networks and fuzzy systems was presented. The proposed model was trained with test data and colorant proportion was predicted. The effectiveness of the proposed model was verified by evaluation of color difference(${\Delta}E$).

• 제어로봇시스템학회:학술대회논문집
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• 1997.10a
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• pp.664-667
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• 1997

For higher component density per chip, it is necessary to identify and control the semiconductor manufacturing process more stringently. Recently, neural networks have been identified as one of the most promising techniques for modeling and control of complicated processes such as plasma etching process. Since wafer states after each run using identical recipe may differ from each other, conventional neural network models utilizing input factors only cannot represent the actual state of process and equipment. In this paper, in addition to the input factors of the recipe, real-time tool data are utilized for modeling of 64M DRAM s-poly plasma etching process to reflect the actual state of process and equipment. For real-time tool data, we collect optical emission spectroscopy (OES) data. Through principal component analysis (PCA), we extract principal components from entire OES data. And then these principal components are included to input parameters of neural network model. Finally neural network model is trained using feed forward error back propagation (FFEBP) algorithm. As a results, simulation results exhibit good wafer state prediction capability after plasma etching process.

• Journal of the Korean Society of Clothing and Textiles
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• v.38 no.3
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• pp.347-354
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• 2014

The color appearance of a yarn-dyed woven fabric depends on the color of the yarn as well as on the weave structure. Predicting the final color appearance or formulating the recipe is a difficult task, considering the interference of colored yarns and structure variations. In a modern fabric design process, the intended color appearance is attained through a digital color methodology based on numerous color data and color mixing recipes (i.e., color prediction models, accumulated in CAD systems). For successful color reproduction, accurate color prediction models should be devised and equipped for the systems. In this study, the final colors of yarn-dyed woven fabrics were predicted using six geometric-color mixing models (i.e., simple K/S model, log K/S model, D-G model, S-N model, modified S-N model, and W-O model). The color differences between the measured and the predicted colors were calculated to evaluate the accuracy of various color models used for different weave structures. The log K/S model, D-G model, and W-O model were found to be more accurate in color prediction of the woven fabrics used. Among these three models, the W-O model was found to be the best one as it gave the least color difference between the measured and the predicted colors.

• Journal of Institute of Control, Robotics and Systems
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• v.6 no.1
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• pp.104-111
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• 2000

A fuzzy logic Run-by-Run(RbR) controller and an in -line wafer characteristics prediction scheme for the rapid thermal processing system have been developed for the study of process repeatability. The fuzzy logic RbR controller provides a framework for controlling a process which is subject to disturbances such as shifts and drifts as a normal part of its operation. The fuzzy logic RbR controller combines the advantages of both fuzzy logic and feedback control. It has two components : fuzzy logic diagnostic system and model modification system. At first, a neural network model is constructed with the I/O data collected during the designed experiments. The wafer state after each run is assessed by the fuzzy logic diagnostic system with featuring step. The model modification system updates the existing neural network process model in case of process shift or drift, and then select a new recipe based on the updated model using genetic algorithm. After this procedure, wafer characteristics are predicted from the in-line wafer characteristics prediction model with principal component analysis. The fuzzy logic RbR controller has been applied to the control of Titanium SALICIDE process. After completing all of the above, it follows that: 1) the fuzzy logic RbR controller can compensate the process draft, and 2) the in-line wafer characteristics prediction scheme can reduce the measurement cost and time.

• Proceedings of the Korean Institute of Intelligent Systems Conference
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• 1996.10a
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• pp.234-238
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• 1996

In this paper, Plasma-Enhanced Chemical Vapor Deposition (PECVD) modeling using Polynomial Neural Networks (PNN) has been introduced. The deposition of SiO2 was characterized via a 25-1 fractional factorial experiment, was used to train PNNs using predicted squared error (PSE). The optimal neural network structure and learning parameters were determined by means of a second fractional factorial experiment. The optimized networks minimized both learning and prediction error. From these PNN process models, the effect of deposition conditions on film properties has been studied. The deposition experiments were carried out in a Plasma Therm 700 series PECVD system. The models obtained will ultimately be used for several other manufacturing applications, including recipe synthesis and process control.

• Journal of the Korean Institute of Intelligent Systems
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• v.11 no.3
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• pp.231-240
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• 2001

Conventional expert systems has been criticized due to its lack of capability to adapt to the changing decision-making environments. In literature, many methods have been proposed to make expert systems more environment-adaptive by incorporating fuzzy logic and neural networks. The objective of this paper is to propose a new approach to building a self-evolving expert system inference mechanism by integrating fuzzy neural network and fuzzy rule extraction technique. The main recipe of our proposed approach is to fuzzify the training data, train them by a fuzzy neural network, extract a set of fuzzy rules from the trained network, organize a knowledge base, and refine the fuzzy rules by applying a pruning algorithm when the decision-making environments are detected to be changed significantly. To prove the validity, we tested our proposed self-evolving expert systems inference mechanism by using the bankruptcy data, and compared its results with the conventional neural network. Non-parametric statistical analysis of the experimental results showed that our proposed approach is valid significantly.

• Journal of the Semiconductor & Display Technology
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• v.22 no.4
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• pp.131-135
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• 2023

Neural network-based time series models called time series neural networks (TSNNs) are trained by the error backpropagation algorithm and used to predict process shifts of parameters such as gas flow, RF power, and chamber pressure in reactive ion etching (RIE). The training data consists of process conditions, as well as principal components (PCs) of optical emission spectroscopy (OES) data collected in-situ. Data are generated during the etching of benzocyclobutene (BCB) in a SF₆/O₂ plasma. Combinations of baseline and faulty responses for each process parameter are simulated, and a moving average of TSNN predictions successfully identifies process shifts in the recipe parameters for various degrees of faults.