• Title/Summary/Keyword: Reactive surface

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Effects of chemistry in Mars entry and Earth re-entry

  • Zuppardi, Gennaro
    • Advances in aircraft and spacecraft science
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    • v.5 no.5
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    • pp.581-594
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    • 2018
  • This paper is the follow-on of a previous paper by the author where it was pointed out that the forthcoming, manned exploration missions to Mars, by means of complex geometry spacecraft, involve the study of phenomena like shock wave-boundary layer interaction and shock wave-shock wave interaction also along the entry path in Mars atmosphere. The present paper focuses the chemical effects both in the shock layer and on the surface of a test body along the Mars orbital entry and compares these effects with those along the Earth orbital re-entry. As well known, the Mars atmosphere is almost made up of Carbon dioxide whose dissociation energy is even lower than that of Oxygen. Therefore, although the Mars entry is less energized than the Earth re-entry, one can expect that the effects of chemistry on aerodynamic quantities, both in the shock layer and on a test body surface, are different from those along the Earth re-entry. The study has been carried out computationally by means of a direct simulation Monte Carlo code, simulating the nose of an aero-space-plane and using, as free stream parameters, those along the Mars entry and Earth re-entry trajectories in the altitude interval 60-90 km. At each altitude, three chemical conditions have been considered: 1) gas non reactive and non-catalytic surface, 2) gas reactive and non-catalytic surface, 3) gas reactive and fully-catalytic surface. The results showed that the number of reactions, both in the flow and on the nose surface, is higher for Earth and, correspondingly, also the effects on the aerodynamic quantities.

HIPIMS Arc-Free Reactive Deposition of Non-conductive Films Using the Applied Material ENDURA 200 mm Cluster Tool

  • Chistyakov, Roman
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.96-97
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    • 2012
  • In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

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Hyperthermal Collision-induced Dissociation of Bromotoluene Radical Cations at Self-Assembled Monolayer Surfaces

  • Jo, Sung-Chan;Augusti, Rodinei;Cooks, R. Graham
    • Mass Spectrometry Letters
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    • v.2 no.1
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    • pp.24-27
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    • 2011
  • Hyperthermal ion/surface collisions of bromotoluene radical cations were studied using perfluorinated (F-SAM) and hydroxyl-terminated (OH-SAM) self-assembled monolayer surfaces in a tandem mass spectrometer with BEEQ geometry. The isomers were differentiated by ion abundance ratios taken from surface-induced dissociation (SID). The dissociation rate followed the order of ortho > meta > para isomers. The peak abundance ratio of m/z 51 to m/z 65 showed the best result to discern the isomers. A dissociation channel leading to tolylium ion was suggested to be responsible for the pronounced isomeric differences. The capability of SID to provide high-energy activation with narrow internal energy distribution may have channeled the reaction into the specific dissociation pathway, also facilitating small differences in reaction rates to be effective in the spectral time window of this experiment. All of the molecular ions experiencing reactive collisions with the F-SAM surface undergo transhalogenation, in which a fluorine atom on the surface replaces the bromine in the incoming ions. This reactive collision was dependent on the laboratory collision energy occurring in ca. 40.75 eV range.

Characterization of vanadium carbide coating deposited by borax salt bath process

  • Aghaie-Khafri, M.;Daemi, N.
    • Advances in materials Research
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    • v.1 no.3
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    • pp.233-243
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    • 2012
  • Thermal reactive diffusion coating of vanadium carbide on DIN 2714 steel substrate was performed in a molten borax bath at $950-1050^{\circ}C$. The coating formed on the surface of the substrate had uniform thickness ($1-12{\mu}m$) all over the surface and the coating layer was hard (2430-2700 HV), dense, smooth and compact. The influence of the kinetics parameters, temperature and time, has been investigated. Vanadium carbide coating was characterized by scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDX) and X-ray diffraction analysis (XRD). The corrosion resistance of the coating was evaluated by potentiodynamic polarization in 3.5% NaCl solution. The results obtained showed that decrease of coating microhardness following increasing time and temperature is owing to the coarsening of carbides and coating grain size.

A Study on Large Area Black Silicon Solar Cell Using Radio-Frequency Multi-Hollow cathode Plasma System (Radio Frequency Multi-Hollow Cathode 플라즈마 시스템을 이용한 대면적 블랙 실리콘 태양전지에 관한 연구)

  • 유진수;임동건;양계준;이준신
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.52 no.11
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    • pp.496-500
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    • 2003
  • A low-cost, large area, random, maskless texturing scheme independent of crystal orientation is expected to significantly impact terrestrial photovoltaic technology. We investigated silicon surface microstructures formed by reactive ion etching (RIE) in Multi-Hollow cathode system. Desirable texturing effect has been achieved when radio-frequency (rf) power of about 20 Watt per one hollow cathode glow is applied for our RF Multi-Hollow cathode system. The black silicon etched surface shows almost zero reflectance in the visible region as well as in near IR region. The etched silicon surface is covered by columnar microstructures with diameters from 50 to 100 nm and depth of about 500 nm. We have successfully achieved 11.7% efficiency of mono-crystalline silicon solar cell and 10.2% multi-crystalline silicon solar cell.

Study of anti wear resistance of Mo-Cu-N coatings deposited by reactive magnetron sputtering process with single alloying target (윤활조건에 따른 Mo-Cu-N 코팅의 마모특성에 관한 연구)

  • Mun, Gyeong-Il;Park, Hyeon-Jun;Lee, Han-Chan
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2017.05a
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    • pp.95.1-95.1
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    • 2017
  • In this study, it has been tried to make the single Mo-Cu alloying targets with the Cu showing the best surface hardness that was determined by investigation on the coatings with the double target process. The single alloying targets were prepared by powder metallurgy methods such as mechanical alloying and spark plasma sintering. The nanocomposite coatings were prepared by reactive magnetron sputtering process with the single alloying targets in $Ar+N_2$ atmosphere. The microstructure changes of the Mo-Cu-N coatings with diverse Cu contents were investigated by using XRD, SEM and EDS. The mechanical properties of the coatings were evaluated by using nano-indentor, scratch test, and ball on disc methods. Especially, the coated samples were tested by using various lubricating oil to compare the property of anti wear-resistance. In this study, the nano-composite MoN-Cu coatings prepared using an alloying target was eventually compared with the coatings from the multiple targets.

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Vertical Diffusion of Ammonia Into Amorphous Ice Sturcture

  • Kim, Yeong-Sun;Mun, Ui-Seong;Gang, Heon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.280-280
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    • 2012
  • We examined ammonia diffusion on the surface of amorphous ice film through the measurement of decreasing residual quantity of $NH_3$ molecules compared to $H_2O$. The populations of $NH_3$ molecules on the surface of amorphous ice were monitored by using the techniques of temperature programmed reactive ion scattering (TPRIS) method. The ratio of intensity between ammonia and water was examined as a function of time at controlled temperature. When ammonia molecules were externally added onto an ice film at a temperature of 80 K, ammonia coverage with regard to ice was 0.12-0.16 ML. The intensity of ammonia molecules on the surface of ice decreased as time increased and the extent of decreased intensity of ammonia increased as controlled temperature increased. Moreover, energy barrier was estimated to be $51kJmol^{-1}$ on amorphous ice film. The results of the experiment indicate that ammonia molecules have a property of vertical diffusion into amorphous ice and the energy barrier of ammonia diffusion into bulk of ice is higher than that of hydrogen bonding.

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LASER-INDUCED IGNITION OF REACTIVE SOLIDS WITH ROUGH SURFACE

  • Jae-Ou Chae;Gregory N. Mokhin;Nam-Ki Kim
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 1995.05a
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    • pp.157-168
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    • 1995
  • Ignition of a reactive solid with rough surface by constant heat flux is studied. The geometry of surface is represented by a protrusion in shape of cone of infinite length. Ignition time and ignition criterion versus apex angle are determined, with the use of heterogeneous model of ignition. To study the effect of geometry on ignition the results are compared with the known results for the one-dimensional ignition of the semi-infinite body. It is shown, that: a) ignition time depends strongly upon the apex angle and is proportional to the angle to the second power; b) ignition criterion and ignition temperature do not depend strongly on angle. The ignition delay and the energy required for the successful ignition are substantially reduced compared to the one-dimensional case.

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