• 제목/요약/키워드: Reactive surface

검색결과 874건 처리시간 0.026초

Reactive Ion Etching을 이용한 PTFE 발수특성

  • 백철흠;서성보;야오리타오;김화민
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.292-292
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    • 2013
  • 최근, 자연의 기능성 표면을 모사하여 우리 생활에 응용하기 위한 연구가 활발하다. 초-발수 특성을 가지는 대표적인 예인 연꽃잎은 마이크로-나노 크기의 거친 미세돌기(papillae)를 가지고 있으며 그 위에 낮은 표면 에너지를 가지는 왁스(wax)가 발달 되어 항상 깨끗한 상태를 유지한다. 본 실험에서는 이를 모사하여 RIE (Reactive Ion Etching)방법을 이용하여 기판인 Poly silicon wafer를 Sf6가스를 사용하여 Metal mash로 거칠기를 만들어 주었고, RF-magnetron sputtering 장치를 사용하여 $6{\times}10^{-3}$ Torr의 진공도에서 낮은 표면에너지를 가지는 PTFE (polytetrafluoroethylene)를 증착하여 표면 구조와 발수특성에 대하여 조사하였다. SSME(Surface shape measurement equipment)측정결과 0.24~0.36 um RSa 값이 측정되었고, 12 uL의 Di-water로 접촉각을 측정 한 결과 RIE 10분 처리를 한 기판 위에 PTFE를 3분 증착하였을 때 가장 높은 $153^{\circ}$의 초-발수 특성이 나타났으며, 4주의 시간이 지났을 때에도 접촉각이 유지가 되었다. XPS 측정결과 초-발수 표면에서 나타나는 CF2와 CF3 피크 값이 측정되었다. Reactive Ion Etching을 이용한 PTFE 발수 특성은 방수, 스마트 윈도우, 자가세정(Self-Cleaning), 디스플레이 표시장치, 김서림 방지(Anti-Fogging), 대전방지 코팅 등에 다각적으로 응용 가능할 것이라 사료된다.

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Effect of rock mineralogy on mortar expansion

  • Karaman, Kadir;Bakhytzhan, Aknur
    • Geomechanics and Engineering
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    • 제20권3호
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    • pp.233-241
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    • 2020
  • Alkali-silica reaction (ASR) is among one of the most important damaging mechanisms in concrete, depending primarily on aggregates which contain reactive minerals. However, expansion in concrete may not directly relate to the reactive minerals. This study aims to investigate the influence of ASR and the expansion of mortar bars depending on aggregate type containing various components such as quartz, clay minerals (montmorillonite and kaolinite) and micas (muscovite and biotite). In this study, the accelerated mortar bar tests (AMBT) were performed in two conditions (mortar bars in the same and sole NaOH solutions). Petrographic thin section studies, X-ray diffraction (XRD) analysis (Rietveld method), scanning electron microscopy (SEM) and chemical analyses were carried out. This study showed that quartzite bars led to increase in expansion values of mortar bars in diabase-1 and andesite when these were in the same NaOH solution. However, three samples (basalt, quartzite and claystone) were found having ASR expansion based on the AMBT when the special molds were used for each sample. SEM study revealed that samples which exhibit highest expansions according to AMBT had a generally rough surface and acicular microstructures in or around the micro-cracks. Basalt and quartzite showed more variable in major oxides than those of other samples based on the chemical analyses, SEM studies and AMBT. This study revealed that the highest expansions were observed to source not only from reactive aggregates but also from alteration products (silicification, chloritization, sericitization and argillisation), phyllosilicates (muscovite, biotite and vermiculite) and clays (montmorillonite and kaolinite).

Dielectric Characteristics of $Al_2O_3$ Thin Films Deposited by Reactive Sputtering

  • Park, Jae-Hoon;Park, Joo-Dong;Oh, Tae-Sung
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.100-100
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    • 2000
  • Aluminium oxide (Al2O3) films have been investigated for many applications such as insulating materials, hard coatings, and diffusion barriers due to their attractive electrical and mechanical properties. In recent years, application of Al2O3 films for dielectric materials in integrated circuits as gates and capacitors has attracted much attention. Various deposition techniques such as sol-gel, metalorganic decomposition (MOD), sputtering, evaporation, metalorganic chemical vapor deposition (MOCVD), and pulsed laser ablation have been used to fabricate Al2O3 thin films. Among these techniques, reactive sputtering has been widely used due to its high deposition rate and easy control of film composition. It has been also reported that the sputtered Al2O3 films exhibit superior chemical stability and mechanical strength compared to the films fabricated by other processes. In this study, Al2O3 thin films were deposited on Pt/Ti/SiO/Si2 and Si substrates by DC reactive sputtering at room temperature with variation of the Ar/O2 ratio in sputtering ambient. Crystalline phase of the reactively sputtered films was characterized using X-ray diffractometry and the surface morphology of the films was observed with Scanning election microscopy. Effects of Th Ar/O2 ratio characteristics of Al2O3 films were investigated with emphasis on the thickness dependence of the dielectric properties. Correlation between the dielectric properties and the microstructure was also studied

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Surface Preparation and Activation Only by Abrasion and Its Effect on Adhesion Strength

  • Ali Gursel;Salih Yildiz
    • 접착 및 계면
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    • 제23권4호
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    • pp.101-107
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    • 2022
  • Adhesive joints have many advantages such as weight savings, corrosion and fatigue resistance and now developed even withstand of high impact and dynamic loads. However, an adhesion has cumbersome and complicated surface preparation processes. The surface preparation step is critical in adhesive joint manufacturing in order to obtain the prescribed strength for adhesive joints. In this study, it was attempted to simplify and reduce the number of surface preparation steps, and abrasion and rapid adhesive application (ARAA) process is developed for an alternative solution. The abrasion processes are performed only for creating surface roughness in standard procedures (SP), although the abrasion processes cause surface activation itself. The results showed that there is no need the long procedures in laboratory or chemical agents for adhesion. After the abrasion process, the attracted and highly reactive fresh surface layer obtained, and its effect on bonding success is observed and analyzed in this research, in light of the essential physic and adhesion theories. Al 6061 aluminum adherends and epoxy-based adhesives were chosen for bonding processes, which is mostly used in light vehicle parts. The adherends were cleaned, treated and activated only with abrasion, and after the adhesive application the specimens were tested under quasi-static loading. The satisfied ARAA results were compared with that of the specimens fabricated by the standard procedure (SP) of adhesion processes of high impact loads.

망간산화물을 이용한 1-Naphthol의 산화-공유결합 반응 속도 연구

  • 임동민;신현상;전병우;강기훈
    • 한국지하수토양환경학회:학술대회논문집
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    • 한국지하수토양환경학회 2005년도 총회 및 춘계학술발표회
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    • pp.49-52
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    • 2005
  • In this study, abiotic transformation of 1-naphthol via oxidative-coupling reaction was evaluated using Mn oxide which is ubiquitous in natural soils. The transformation of 1-naphthol catalyzed by synthetic birnessite $({\delta}-MnO_2)$ followed pseudo-lst order reaction, and the rate constants was in the range of $0.053{\sim}0.13\;min^{-1}$ with birnessite loadings of $12.5{\sim}50\;mg/20\;mL$. Since the oxidation of 1-naphthol was occurred on the reactive surface of the oxide particles, the rate constants with various birnessite loadings were correlated with birnessite surface area concentration. The correlation showed a strong linearity, which confirms the supposition of the surface reaction. From the correlation, therefore, the surface area normalized rate constant, $k_{surf}$, was determined to be 0.032 $L/m^2\;min$.

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비대칭 마크네트론 스퍼터링을 이용한 이리듐 산화물 박막의 합성과 전기 화학적 특성분석 (Electro-Chemical Properties of Iridium Oxide Coated Ti Electrode Synthesized by Unbalanced Magnetron Sputtering Process)

  • 김성대;김상식;송진호
    • 한국표면공학회지
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    • 제40권5호
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    • pp.203-208
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    • 2007
  • Preliminary studies were conducted to develop a dimensionally stable anode (DSA)electrode prepared by reactive sputtering method. The microstructure, surface morphology and electrochemical properties of iridium oxide $(IrO_2)$ coatings synthesized by unbalanced magnetron sputtering (UBMS) and conventional DSA electrode were compared. In addition, the possibilities of $IrO_2$ films synthesized by UMB on a real DSA electrode were investigated by electro-chemical application test. The degree of non-stoichiometry and surface area were closely related to the electro-chemical activity of the $IrO_2$ electrode. The feasibility of making a DSA electrode prepared by PVD technique was demonstrated through the present work.

RF 마그네트론 스퍼터링에 의한 SAW 필터용 ZnO 압전 박막에 관한 연구 (A Study on the ZnO Piezoelectric Thin Films for SAW Filter by RF Magnetron Sputtering)

  • 최형욱;김경환;김상종;강종윤;안병국;윤석진
    • 한국전기전자재료학회논문지
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    • 제15권9호
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    • pp.798-807
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    • 2002
  • ZnO thin films on Si wafer were deposited by RF magnetron reactive sputter with various RF power, chamber pressure, argon/oxygen gas ratios ana substrate temperatures. Crystallinities, surface morphologies, and electrical properties of the films were investigated by XRD, AFM, RBS, and electrometer(keithley 617). ZnO films showed a strong c-axis preferred orientation. Surface roughness and resistivity were changed by the argon/oxygen gas ratio. The minimum surface roughness of 12${\AA}$ and maximum resistivity of $10^8\Omega cm$ were achieved at Ar/O$O_2$=0/100.

동적 표면 제어 기반의 매니퓰레이터 장착 드론의 추종 제어 (Dynamic Surface Control Based Tracking Control for a Drone Equipped with a Manipulator)

  • 이근욱;최윤호
    • 전기학회논문지
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    • 제66권7호
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    • pp.1123-1130
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    • 2017
  • This paper deals with the dynamic surface control based tracking control for a drone equipped with a 2-DOF manipulator. First, the dynamics of drone and 2-DOF manipulator are derived separately. And we obtain the combined model of a drone equipped with a manipulator considering the inertia and the reactive torque generated by a manipulator. Second, a dynamic surface control based attitude and altitude control method is presented. Also, multiple sliding mode control based position control method is presented. The system stability and convergence of tracking errors are proven using Lyapunov stability theory. Finally, the simulation results are given to verify the effectiveness of the proposed control method.

고주파 마그네트론 스퍼터링으로 제조한 SiO$_2$ 절연박막의 구조분석 및 절연저항에 관한 연구 (Insulation Properties and Microstructure of SiO$_2$ Film Prepared by rf Magnetron Sputtering)

  • 박태순;이성래
    • 한국표면공학회지
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    • 제35권2호
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    • pp.113-121
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    • 2002
  • We have investigated insulating properties of $SiO_2$ interlayer for the thin film strain gauge, which were prepared by RF magnetron sputtering method in various deposition conditions, such as Ar pressure, gas flow rates and sputtering gases. SEM, AFM and FT-IR techniques were used to analyze its structures and composition. As the Ar pressure and the flow rate increased, the insulating interlayer showed low insulating resistance due to its porous structure and defects. Oxygen deficiency in $SiO_2$ was decreased as fabricated by hydrogen reactive sputtering. We could enhance the surface mobility of sputtered adatoms by using Ar/$H_2$ sputtering gas and obtain a good surface roughness and insulating property. The optimum insulating resistance of 9.22 G$\Omega$ was obtained in Ar/30% $H_2$ mixed gas, flow rate 10sccm, and 1mTorr.

Reaction of Gae-Phase Atomic Hydrogen with Chemisorbed Hydrogen Atoms on an Iron Surface

  • Kim, M. S.;Ree, J.
    • Bulletin of the Korean Chemical Society
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    • 제18권9호
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    • pp.985-994
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    • 1997
  • The reaction of gas-phase atomic hydrogen with hydrogen atoms chemisorbed on Fe(110) surface is studied by use of classical trajectory procedures. Flow of energy between the reaction zone and bulk solid phase has been treated in the generalized Langevin equation approach. A London-Eyring-Polanyi-Sato energy surface is used for the reaction zone interaction. Most reactive events are found to occur in strong single-impact collisions on a subpicosecond scale via the Eley-Rideal mechanism. The extent of reaction is large and a major fraction of the available energy goes into the vibrational excitation of H2, exhibiting a vibrational population inversion. Dissipation of reaction energy to the heat bath can be adequately described using a seven-atom chain with the chain end bound to the rest of solid. The extent of reaction is not sensitive to the variation of surface temperature in the range of Ts=0-300 K in the fixed gas temperature, but it shows a minimum near 1000 K over the Tg=300-2500 K.