• 한국전기전자재료학회논문지
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• 제19권1호
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• pp.13-17
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• 2006

The one-dimensional ZnO nanostructures prepared through thermal evaporation under various cooling down procedures by changing the flow rates of the carrier gas and the reactive gas were investigated. The nanorod structures were changed into the nanonail types with a broad head through the reduction of the flow rate of the carrier gas. The decrease of the reactive gas reduced the length of the nail heads due to the limited mass transport of reactive gas. The intensity ratio of the ultraviolet emission/green emission of photoluminescence was proportional to the length of the broad head showing a larger surface area. The vertically aligned nanostructures were grown along the [0001] direction of ZnO regardless of the aligned directions. The crystal direction of the nanostructures was determined by that of the initial ZnO crystal.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.123-123
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• 2008

In this work, amorphous carbon thin films were deposited for hard mask applications by a reactive particle beam (RPB) assisted sputtering system at room temperature. The depositing characteristics of the films were investigated as functions of operating parameters such as reflector bias voltage and RF plasma power. It was confirmed that the deposition rate increased with increasing the reflector bias voltage and RF plasma power. By an atomic force microscope (AFM), it was revealed that the surface roughness was also increased. The total stress in films was determined by the use of the substrate curvature and its result will be discussed.

• 한국염색가공학회지
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• 제19권2호
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• pp.7-13
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• 2007

Photopolymerization of 2-hydroxyethyl methacrylate(HEMA), in the presence of ethyleneglycol dimethacrylate(EGDMA) and 1-Hydroxycyclohexyl phenyl ketone as crosslinker and photoinitiator, respectively, produced crosslinked poly-HEMA hydrogels. The hydrogels were colored by the exhaustion of vinylsul-phone-type reactive dyes. Good colorfastness to laundering was achieved when colored with C.I. Reactive Black 5. We investigated that the effect of coloration on the hydrophilicity and swelling properties of the films. More hydrophilic gel-surfaces were generated with in increase in coloration and crosslinking. Higher surface energy was observed with higher crosslinking level. The more rapid and higher water swellability of poly-HEMA gels after coloration may be resulted from a more opened gel structure by the easier hydration of the hydrophilic sulphonic acid groups of the reacted dyes in water.

• 한국재료학회지
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• 제15권6호
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• pp.382-387
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• 2005

Polyvinylidene fluoride (PVDF) surface was irradiated and became superhydrophilic by low energy (180 eV) and high flux $(\~10^{15}/cm{\cdot}s)$ ion beam. As an ion source, a closed electron Hall drift thruster of $\phi=70mm$ outer channel size without grid was adopted. Ar, $O_2$ and $N_2O$ were used for source gases. When $N_2O^+$ and $O_2^+$ reactive gas ion beam were irradiated with the ion fluence of $5\times10^{15}/cm^2$, the wetting angle for deionized water was drastically dropped from $61^{\circ}\;to\;4^{\circ}\;and\;2^{\circ}$, respectively. Surface energy was also increased up to from 44 mN/m to 81 mN/m. Change of chemical component in PVDF surface was analyzed by x-ray photoelectron spectroscopy. Such a great increase of the surface energy was intimately related with the increase of hydrophilic group component in reactive ion irradiated PVDF surfaces. By using an atomic force microscopy, the root-mean-square of surface roughness of ion irradiated PVDF was not much altered compared to that of pristine PVDF.

• 한국재료학회지
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• 제20권12호
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• pp.649-653
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• 2010

In this paper, double texturization of multi crystalline silicon solar cells was studied with laser and reactive ion etching (RIE). In the case of multi crystalline silicon wafers, chemical etching has problems in producing a uniform surface texture. Thus various etching methods such as laser and dry texturization have been studied for multi crystalline silicon wafers. In this study, laser texturization with an Nd:$YVO_4$ green laser was performed first to get the proper hole spacing and $300{\mu}m$ was found to be the most proper value. Laser texturization on crystalline silicon wafers was followed by damage removal in acid solution and RIE to achieve double texturization. This study showed that double texturization on multi crystalline silicon wafers with laser firing and RIE resulted in lower reflectance, higher quantum yield and better efficiency than that process without RIE. However, RIE formed sharp structures on the silicon wafer surfaces, which resulted in 0.8% decrease of fill factor at solar cell characterization. While chemical etching makes it difficult to obtain a uniform surface texture for multi crystalline silicon solar cells, the process of double texturization with laser and RIE yields a uniform surface structure, diminished reflectance, and improved efficiency. This finding lays the foundation for the study of low-cost, high efficiency multi crystalline silicon solar cells.

• Elastomers and Composites
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• 제36권3호
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• pp.177-187
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• 2001

폴리프로필렌(PP)/폴리우레탄(PU) 블렌드를 compositional quenching으로 제조하여 모폴로지, 인장물성, 표면에너지 그리고 열안정성 등을 조사하였다. 블렌드 제조시, 말레인산 무수물이 그라프트된 PP(MPP)와 히드록시에틸 말레이미드가 그라프트된 PP(HPP)를 반응성 상용화제로 도입하였으며, 이들의 생성 및 PU 조성과의 반응을 FT-IR로 확인하였다. Compositional quenching으로 제조한 블렌드는 용융블렌드에 비해 높은 혼화성을 보였으며, 블렌드내의 상용화제의 함량이 증가함에 따라 모폴로지, 인장물성. 표면특성, 그리고 열안정성 등의 물성이 현저하게 향상되었다. 상용화제로 MPP를 도입한 블렌드는 HPP를 도입한 블렌드에 비해, 높은 표면 에너지를 가졌다.

• 한국정보통신학회논문지
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• 제6권5호
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• pp.696-702
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• 2002

RF magnetron reactive sputtering 법으로 BST(Bal-xSrxTiO$_3$)(50/50) 박막을 제작하여, 박막의 결정화 특성 및 표면상태와 함께 박막의 두께에 따른 전기적 특성을 조사하였다. XRD와 AFM을 이용하여 BST 박막의 결정화 특성과 표면상태를 관찰한 결과, 80$0^{\circ}C$ 에서 2분간 후열처리한 박막은 완전한 perovskite 구조를 가지며 표면거칠기도 16.1$\AA$으로 양호한 값을 나타내었다. 박막의 두께가 80nm에서 240nm으로 증가함에 따라 10KHz에서 비유전률은 199에서 265로 증가하였고, 250㎸/cm의 전기장에서 누설 전류밀도는 $0.779 {\mu}m/{cm^2}에서 0.184 {\mu}A/{cm^2}$으로 감소하였다. 두께 240nm인 BST 박막의 경우, 5V에서의 전하축적 밀도와 누설전류밀도는 각각 50.5 $fC/{{\mu}m^2} 와 0.182 {\mu}A/{cm^2}$로, 이는 DRAM의 캐패시터 절연막 응용에 매우 유망한 물질임을 나타내는 결과이다.

• 공업화학
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• 제30권2호
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• pp.241-246
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• 2019

본 실험에서 반응성 계면활성제는 비이온성 계면활성제인 polyoxyethylene(23) lauryl ether(Brij 35)와 polyoxyethylene(20) stearyl ether(Brij S20)를 acrylic acid 또는 3-butenoic acid를 사용하여 합성하였다. 계면활성제는 FT-IR과 $^1H$-NMR로 확인하였으며, 물성은 임계미셀농도, 유화력, 기포력을 측정하였다. 합성한 반응성 계면활성제의 표면장력과 임계미셀 농도는 35 dyne/cm~41 dyne/cm에서 $1.0{\times}10^{-4}mol/L{\sim}9.7{\times}10^{-5}mol/L$의 값을 가진다. 또한, 계면활성제의 유화력은 대두유, 벤젠, 모노머에서 측정하였으며, 기포의 초기 높이 및 5 min 후의 높이를 측정하여 비교하였다.

• Journal of Microbiology and Biotechnology
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• 제17권6호
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• pp.993-1001
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• 2007

The technique of serological analysis of antigens by recombinant cDNA expression library (SEREX) uses autologous patient sera as a screening probe to isolate tumor-associated antigens for various tumor types. Isolation of tumor-associated antigens that are specifically reactive with patient sera, but not with normal sera, is important to avoid false-positive and autoimmunogenic antigens for the cancer immunotherapy. Here, we describe a selection methodology to isolate patient sera-specific antigens from a yeast surface-expressed cDNA library constructed from 15 patient lung tissues with non-small cell lung cancer (NSCLC). Several rounds of positive selection using patient sera alone as a screening probe isolated clones exhibiting comparable reactivity with both patient and normal sera. However, the combination of negative selection with allogeneic normal sera to remove antigens reactive with normal sera and subsequent positive selection with patient sera efficiently enriched patient sera-specific antigens. Using the selection methodology described here, we isolated 3 known and 5 unknown proteins, which have not been isolated previously, but and potentially associated with NSCLC.

• 한국진공학회지
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• 제8권4B호
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• pp.541-547
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• 1999

Reactive ion etching process for InP using BCl3/O2/Ar high density inductively coupled plasma was investigated. The experimental design method proposed by the Taguchi was utilized to cover the whole parameter range while maintaining reasonable number of actual experiments. Results showed that the ICP power and the chamber pressure were the two dominant parameters affectsing etch results. It was also observed that the etch rate decreased and the surface roughness improved as the ICP power and the bias voltage increased and as the chamber pressure decreased. The Addition of oxygen to the gas mixture drastically improved surface roughness by suppressing the formation of the surface reaction product. The optimum condition was ICP power 600W, bias voltage -100V, 10% $O_2$, 6mTorr, and $180^{\circ}C$, resulting in about 0.15$\mu\textrm{m}$ etch rate with smooth surfaces and vertical mesa sidewalls Also, the maximum etch rate of abut 4.5 $\mu\textrm{m}$/min was obtained at the condition of ICP power 800W, bias voltage -150V, 15% $O_2$, 8mTorr and $160^{\circ}C$.