• Title/Summary/Keyword: Reactive surface

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Surface energy change and hydrophilic formation of PE, PS and PTFE films modification by hydrogen ion assisted reaction

  • Jung Cho;Ki Hyun;Koh, Seok-Keun
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.202-202
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    • 1999
  • The Polyethylene (PE), Polystyrene (PS) and Polytetrafluoroethylene (PTFE) surface modification was investigated by hydrogen io assisted reaction (H-IAR) in oxygen environment. The IAR is a kind of surface modification techniques using ion beam irradiation in reactive gas environment. The energy of hydrogen ion beam was fixed at 1keV, io dose was varied from 5$\times$1014 to 1$\times$1017 ions/$\textrm{cm}^2$, and amount of oxygen blowing gas was fixed 4ml/min. Wettability was measured by water contact angles measurement, and the surface functionality was analyzed by x-ray photoelectron spectroscopy. The contact angle of water on PE modified by argon ion beam only decrease from 95$^{\circ}$ to 52$^{\circ}$, and surface energy was not changed significantly. But, the contact angle using hydrogen ion beam with flowing 4ml/min oxygen stiffly decreased to 8$^{\circ}$ and surface energy to 65 ergs/cm. In case of PS, the contact angle and surface energy changes were similar results of PE, but the contact angle of PTEE samples decreased with ion dose up to 1$\times$1015 ions/$\textrm{cm}^2$, increased at higher dose, and finally increased to the extent that no wetting was appeared at 1$\times$1017 ions/$\textrm{cm}^2$. These results must be due to the hydrogen ion beam that cleans the surface removing the impurities on polymer surfaces, then hydrogen ion beam was activated with C-H bonding to make some functional groups in order to react with the oxygen gases. Finally, unstable polymer surface can be changed from hydrophobic to hydrophilic formation such as C-O and C=O that were confirmed by the XPS analysis, conclusionally, the ion assisted reaction is very effective tools to attach reactive ion species to form functional groups on C-C bond chains of PE, PS and PTFE.

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A study on TCR characteristic of $TaN/Al_{2}O_{3}$ thin film resistors ($TaN/Al_{2}O_{3}$ 박막 저항소자 개발에 관한 연구)

  • Kim, I.S.;Cho, Y.R.;Min, B.K.;Song, J.S.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.05b
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    • pp.82-85
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    • 2002
  • In recent years, the tantalum nitride(TaN) thin-film has been developed for the electronic resistor and capacitor. In this papers, this study presents the surface profile and sheet-resistance property relationship of reactive-sputtered TaN thin film resistor processed by buffer of Ti and Cr on alumina substrate. The TCR properties of the TaN films were discussed in terms of reactive gas ratio, ratio of nitrogen, crystallization and thin films surface morphology due to annealing temperature. It is clear that the TaN thin-films resistor electrical properties are low TCR related with it's buffer layer condition. Ti buffer layer thin film resistor having a good thermal stability and lower TCR properties then Cr buffer expected for the application to the dielectric material of passive component.

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A Compact Microstrip Patch Antenna Based on Metamaterials for Wi-Fi and WiMAX Applications

  • Nelaturi, Suman;Sarma, Nookala Venkata Satya Narasimha
    • Journal of electromagnetic engineering and science
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    • v.18 no.3
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    • pp.182-187
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    • 2018
  • A low profile asymmetrical fractal boundary patch antenna based on reactive impedance surface (RIS) and a mushroom unit cell (MUC) is proposed and studied for dual band operation. The sides of the square patch antenna are replaced with asymmetrical half circled fractal curves for circular polarization operation at patch mode band. The fractal patch antenna is loaded with MUC for dual band operation. The antenna radiation characteristics are investigated and illustrated with both simulated and experimental results in detail. The 10-dB return loss bandwidth are 8.48% (3.21-3.49 GHz) and 2.59% (2.30-2.36 GHz) at upper and lower resonance frequencies, respectively. The 3-dB axial ratio bandwidth is 4.26% (3.21-3.35 GHz). A close agreement between simulation data with experimental results is observed.

A Comparative Study on the Characteristics of TiN Films Deposited by Plasma-Assisted CVD, Ion Plating and Reactive Sputtering (플라즈마 화학증착법, 이온 플레이팅법 및 반응성 스퍼터링법에 의해 증착된 TiN 박막의 특성 비교 연구)

  • 안치범;정병진;이원종;천성순
    • Journal of the Korean Ceramic Society
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    • v.31 no.7
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    • pp.731-738
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    • 1994
  • TiN films were deposited on high speed steels by plasma assisted chemical vapor deposition (PACVD), cathode arc ion plating (CAIP) and reactive magnetron sputtering (RMS). The properties of the films deposited by the three different methods were compared. The preferred oriented plane of PACVD-TiN is (200) and those of CAIP-TiN and RMS-TiN are (111). PACVD-TiN shows a dome surface and a microstructure having small grains. CAIP-TiN shows the highest microhardness and the best adhesion strength of the three because it has a dense microstructure and an ill-defined interface. But is shows the greatest surface roughness due to the Ti droplet created by the arc. RMS-TiN shows a microstructure having large voids so that its properties in microhardness and adhesion are the worst of the three.

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The Effect of Micro Nano Multi-Scale Structures on the Surface Wettability (초소수성 표면 개질에 미치는 마이크로 나노 복합구조의 영향)

  • Lee, Sang-Min;Jung, Im-Deok;Ko, Jong-Soo
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.32 no.5
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    • pp.424-429
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    • 2008
  • Surface wettability in terms of the size of the micro nano structures has been examined. To evaluate the influence of the nano structures on the contact angles, we fabricated two different kinds of structures: squarepillar-type microstructure with nano-protrusions and without nano-protrusions. Microstructure and nanostructure arrays were fabricated by deep reactive ion etching (DRIE) and reactive ion etching (RIE) processes, respectively. And plasma polymerized fluorocarbon (PPFC) was finally deposited onto the fabricated structures. Average value of the measured contact angles from microstructures with nanoprotrusions was $6.37^{\circ}$ higher than that from microstructures without nano-protrusions. This result indicates that the nano-protrusions give a crucial effect to increase the contact angle.

Electrochromic properties of TiO2 deposited by Reactive DC magnetron Sputtering for smart window application (Reactive DC Sputtering으로 증착한 Smart window용 TiO2의 전기변색적 특성)

  • Kim, Seong-Han;Song, Pung-Geun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2015.11a
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    • pp.299-300
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    • 2015
  • $TiO_2$는 내구성이 뛰어난 전기변색재료로 연구가 이루어 지고 있다. 큰 굴절율로 인해 높은 투과율을 보이는 $TiO_2$는 변색시 치밀한 구조를 가지기 때문에 전해질 양이온의 침입이 힘들어 변색효율이 $WO_3$에 비해 좋지 않다. 이를 개선하고자 작업압력을 변화시켜 기판에 입사하는 입자의 에너지를 줄임으로써 확산을 줄이고 Porous한 막을 얻고자 하였다. 작업압력이 높아짐에 따라 표면의 거칠기가 커지는 것을 확인하였고 전기변색시 효율이 커지는 것을 확인하였다.

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HCD Ion Plating of Ti(C, N) Films for Cutting Tools (절삭공구용 Ti(C, N)피막의 HCD식 이온도금시 공정변수의 영향)

  • 강형호;고경현;안재환
    • Journal of the Korean institute of surface engineering
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    • v.27 no.3
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    • pp.143-148
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    • 1994
  • Effects of process variables of HCD ion plating on the film composition of Ti(C, N) were analyzed. The mole ratio of carbon to nitrogen and that of non-metal to titanium in the film primarily depend on the partial pressure ratio of ($C-2H_2$/ $N_2$) and total reactive gas pressure, respectively. The amount of nonmetallic com-ponents increases in nonlinear fashion as the total gas pressure due to the different reactivity of $C-2H_2$ and $N_2$ gases with Ti. The nonmetallic components was saturated dwith nitrogen when the nitrogen gas was more than 60% of total reactive gas. These two process variables could be related systematically using the concept of effective pressure in which the difference of reactivity of each gas was normalized.

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Electrical and Optical Properties of SnO$_2$: F Thin Films by Reactive DC Magnetron Sputtering Method (반응성 DC 마그네트론 스퍼터법에 의한 SnO$_2$ : F 박막의 전기광학적 특성)

  • 정영호;김영진;신재혁;송국현;신성호;박정일;박광자
    • Journal of the Korean institute of surface engineering
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    • v.32 no.2
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    • pp.125-133
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    • 1999
  • Fluorine-doped $SnO_2$ thin films were deposited on soda-lime glass substrates by reactive DC magnetron sputtering method. Crystallinity as well as electrical and optical properties of $SnO_2$ : F thin film were investigated as the variations of deposition conditions such as substrate temperature, DC Power, $O_2$ gas pressure, $SF_6$ gas pressure. $SnO_2$ : F thin film deposited with 5% $SF_6$ gas pressure showed electrical resistivities of $2.5\times10^{-3}$cm with the average optical transparency (about 80%) These electrical and optical properties were found to be related to the crystallinity of $SnO_2$ : F thin films.

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Effect of Chloride-containing Deicer on the Thermal Charateristics and Skid Resistance of Concrete (염화물을 함유한 제설제가 콘크리트의 열 특성과 미끄럼저항성에 미치는 영향에 관한 연구)

  • Lee, Byung-Duck;Yun, Byung-Sung
    • Proceedings of the Korea Concrete Institute Conference
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    • 2004.11a
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    • pp.509-512
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    • 2004
  • This research is targeting that estimate the effect on cement concrete pavement with type of chloride deicers. In order to this study objective, when chloride deicers were spread on road surface, thermal characteristics test was conducted. Also, skid resistance test according to types and concentration of chloride deicier, road surface conditions were investigated. As a test results, thermal characteristics with kind of chloride deicier could know that sodium chloride(NaCl) is exothermic reactive material, calcium chloride$(CaCl_2)$ is endothermic reactive material. And, in case of mixed salt of the calcium and sodium chloride, it could know that can change to the exothermic or endothermic reaction according to dosage ratios. Skid value by British Pendulum Tester(BPT) has shown that it is seldom difference between the types($CaCl_2$, NaCl, mixed salt) and solution concentrations(0.5, 0.8, 1.0, 4.0, $10\%$) of chloride deicier comparing with tap water except mixed salt($10\%$ solution concentration).

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SPUTTER-DEPOSITION OF CARBON NITRIDE FILMS WITH HIGH NITROGEN CONCENTRATION

  • Taki, Yusuke;Takai, Osamu
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.498-504
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    • 1996
  • The synthesis of carbon nitride thin films with high nitrgen concentration was accomplished by reactive supttering at relatively high working pressure. In conventional reactive sputter-deposition of carbon nitride films, working pressure was 0.3-5Pa and the ratio of nitrogen to carbon(N/C ratio) in the films was less than 0.5. In this study, amorphous carbon nitride films with the N/C ratio $\tickapprox$ 1.0 were prepared on Si(100). substrates at higher pressure, 20-60 Pa. Structural analyses with Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy revealed that the films prepared consisted of triazine-like plain network.

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