• Title/Summary/Keyword: Reaction diffusion equation

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A study on the design of boron diffusion simulator applicable for shallow $p^+-n$ junction formation (박막 $p^+-n$ 접합 형성을 위한 보론 확산 시뮬레이터의 제작에 관한 연구)

  • Kim, Jae-Young;Kim, Bo-Ra;Hong, Shin-Nam
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.04b
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    • pp.30-33
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    • 2004
  • Shallow p+-n junctions were formed by low-energy ion implantation and dual-step annealing processes The dopant implantation was performed into the crystalline substrates using $BF_2$ ions. The annealing was performed with a rapid thermal processor and a furnace. FA+RTA annealing sequence exhibited better junction characteristics than RTA+FA thermal cycle from the viewpoint of junction depth. A new simulator is designed to model boron diffusion in silicon, which is especially useful for analyzing the annealing process subsequent to ion implantation. The model which is used in this simulator takes into account nonequilibrium diffusion, reactions of point defects, and defect-dopant pairs considering their charge states, and the dopant inactivation by introducing a boron clustering reaction. Using a resonable parameter values, the simulator covers not only the equilibrium diffusion conditions but also the nonequilibrium post-implantation diffusion. Using initial conditions and boundary conditions, coupled diffusion equation is solved successfully. The simulator reproduced experimental data successfully.

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A Study on the Shallow $p^+-n$ Junction Formation and the Design of Diffusion Simulator for Predicting the Annealing Results ($p^+-n$ 박막접합 형성방법과 열처리 모의 실험을 위한 시뮬레이터 개발에 관한 연구)

  • Kim, Bo-Ra;Lee, Jae-Young;Lee, Jeong-Min;Hong, Shin-Nam
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.115-117
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    • 2005
  • In this paper, we formed the shallow junction by preamorphization and low energy ion implantation. And a simulator is designed for predicting the annealing process results. Especially, if considered the applicable to single step annealing process(RTA, FA) and dual step annealing process(RTA+FA, FA+RTA). In this simulation, the ion implantation model and the boron diffusion model are used. The Monte Carlo model is used for the ion implantation. Boron diffusion model is based on pair diffusion at nonequilibrium condition. And we considered that the BI-pairs lead the diffusion and the boron activation and clustering reaction. Using the boundary condition and initial condition, the diffusion equation is solved successfully. The simulator is made ofC language and reappear the experimental data successfully.

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A CELL BOUNDARY ELEMENT METHOD FOR A FLUX CONTROL PROBLEM

  • Jeon, Youngmok;Lee, Hyung-Chun
    • Journal of the Korean Mathematical Society
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    • v.50 no.1
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    • pp.81-93
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    • 2013
  • We consider a distributed optimal flux control problem: finding the potential of which gradient approximates the target vector field under an elliptic constraint. Introducing the Lagrange multiplier and a change of variables the Euler-Lagrange equation turns into a coupled equation of an elliptic equation and a reaction diffusion equation. The change of variables reduces iteration steps dramatically when the Gauss-Seidel iteration is considered as a solution method. For the elliptic equation solver we consider the Cell Boundary Element (CBE) method, which is the finite element type flux preserving methods.

Theoretical Analysis on the Synthesis of Ultrafine TiO2 Particles by Combustion Reaction (연소반응을 이용한 TiO2 초미립자 제조 공정에 대한 이론적 연구)

  • Chae, Bum-San;Kim, Kyo-Seon
    • Journal of Industrial Technology
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    • v.17
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    • pp.241-247
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    • 1997
  • A numerical model has been proposed for a diffusion flame reactor to manufacture ultrafine $TiO_2$ powders. The model equations such as mass balance equation, the 0th, 1st, and 2nd moment equations of aerosols were considered. The phenomena such as $TiCl_4$ reaction rate, $TiO_2$ nucleation rate and the coagulation of $TiO_2$ powders were included in the aerosol dynamic equation. It is found that the $TiO_2$ particle concentration becomes higher, as the inlet $TiCl_4$ concentration and the total gas flow rate increase, and also as the flame temperature decreases. The $TiO_2$ particle size increases, as the flame temperature and the inlet $TiCl_4$ concentration increase and the total gas flow rate decreases.

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Studies on the Polarographic Kinetic Currents for the First Order Reactions at the Droping Mercury Electrode (水銀滴下電極에서 一次反應에 對한 포라로그라프電流에 關한 硏究)

  • Kim, Hwang-Am;Chin, Chang-Hee
    • Journal of the Korean Chemical Society
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    • v.6 no.1
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    • pp.14-18
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    • 1962
  • Solution to the diffusion layer for the first order reaction at a droping mercury electrode (D.M.E.) is presented. Equations are derived for polarographic currents for the reactions at the D.M.E. A factor which is applicable to the D.M.E. is derived, when we use the equations of the polarographic currents for the reactions at a plane electrode(P.E.), and the rate constants of the backward reactions are negligibly small. Polarographic currents from a combination of diffusions and reactions are obtained at the D.M.E. with special approximation. Rate constant for the reaction of ferrous ion with hydrogen-peroxide is determined at the D.M.E.,using the data of Kolthoff and Perry. The agreement of the equation with the data of Kolthoff and Perry for the kinetic current of ferric ion in the presence of hydrogen-peroxide is good. Ratios of diffusion layer at the D.M.E. to the diffusion layer at the P.E. are discussed and show that, when the rate constants of the backward reactions for the first order reactions are larger than 1/0.05 sec-1. and drop-time about 3 sec., these ratioes are about one.

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Adsorption Characteristics of 2,4-Dichlrophenol by Magnetic Activated Carbon Prepared from Waste Citrus Peel (폐감귤박으로 제조한 자성 활성탄을 이용한 2,4-디클로로페놀의 흡착특성)

  • Kam, Sang-Kyu;Lee, Min-Gyu
    • Applied Chemistry for Engineering
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    • v.29 no.4
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    • pp.388-394
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    • 2018
  • The removal of 2,4-dichlorophenol (2,4-dichlorophenol, 2,4-DCP) in aqueous solution was studied using the magnetic activated carbon (MAC) prepared from waste citrus peel. The adsorption characteristics of 2,4-DCP by MAC were investigated by varying the contact time, MAC dose, solution temperature, pH and 2,4-DCP concentration. The isothermal adsorption data were well explained by the Langmuir isotherm model equation and the maximum adsorption capacity calculated from the Langmuir isotherm equation was 312.5 mg/g. The adsorption kinetic data were well described by the pseudo-second-order reaction equation. The intraparticle diffusion model data indicated that both the film and intraparticle diffusion occur simultaneously during the adsorption process. The thermodynamic parameters of ${\Delta}H^o$ and ${\Delta}G^o$ have positive and negative values, respectively, indicating that the adsorption of 2,4-DCP by MAC is a spontaneous endothermic reaction. After the adsorption experiment was completed, the used MAC could be easily separated by an external magnet.

A Study on Reaction Kinetics of PTMG/TDI Prepolymer with MOCA by Non-Isothermal DSC

  • Ahn, WonSool;Eom, Seong-Ho
    • Elastomers and Composites
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    • v.50 no.2
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    • pp.92-97
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    • 2015
  • A study on reaction kinetics for a PTMG/TDI prepolymer with 2,2'-dichloro-4,4'-methylenedianiline (MOCA), of which formulations may be generally used for fabricating high performance polyurethane elastomers, was peformed using non-isothermal differential scanning calorimetry (DSC). A number of thermograms were obtained at several constant heating rates, and analysed using Flynn-Wall-Ozawa (FWO) isoconversional method for activation energy, $E_a$ and extended-Avrami equation for reaction order, n. Urea formation reaction of the present system was observed to occur through the simple exothermic reaction process in the temperature range of $100{\sim}130^{\circ}C$ for the heating rate of $3{\sim}7^{\circ}C/min$. and could be well-fitted with generalized sigmoid function. Though activation energy was nearly constant as $53.0{\pm}0.5kJ/mol$, it tended to increase a little at initial stage, but it decreases at later stage by the transformation into diffusion-controlled reaction due to the increased viscosity. Reaction order was evaluated as about 2.8, which was somewhat higher than the generally well-known $2^{nd}$ order values for the various urea reactions. Both the reaction order and reaction rate explicitly increased with temperature, which was considered as the indication of occurring the side reactions such as allophanate or biuret formation.

Effects of chemical reaction on the polishing rate and surface planarity in the copper CMP

  • Kim, Do-Hyun;Bae, Sun-Hyuk;Yang, Seung-Man
    • Korea-Australia Rheology Journal
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    • v.14 no.2
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    • pp.63-70
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    • 2002
  • Chemical mechanical planarization (CMP) is the polishing process enabled by both chemical and mechanical actions. CMP is used in the fabrication process of the integrated circuits to achieve adequate planarity necessary for stringent photolithography depth of focus requirements. And recently copper is preferred in the metallization process because of its low resistivity. We have studied the effects of chemical reaction on the polishing rate and surface planarity in copper CMP by means of numerical simulation solving Navier-Stokes equation and copper diffusion equation. We have performed pore-scale simulation and integrated the results over all the pores underneath the wafer surface to calculate the macroscopic material removal rate. The mechanical abrasion effect was not included in our study and we concentrated our focus on the transport phenomena occurring in a single pore. We have observed the effects of several parameters such as concentration of chemical additives, relative velocity of the wafer, slurry film thickness or ash)tract ratio of the pore on the copper removal rate and the surface planarity. We observed that when the chemical reaction was rate-limiting step, the results of simulation matched well with the experimental data.

Development of a Mechanistic Model for Hydrogen Generation in Fuel-Coolant Interactions

  • Lee, Byung-Chul;Park, Goon-Cherl;Chung, Chang-Hyun
    • Nuclear Engineering and Technology
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    • v.29 no.2
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    • pp.99-109
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    • 1997
  • A dynamic model for hydrogen generation by Fuel-Coolant Interactions(FCI) is developed with separate models for each FCI stage, coarse mixing and stratification. The model includes the physical concept of FCI, semi-empirical heat and mass transfer correlation and the concentration diffusion equation with the general non-zero boundary condition. The calculated amount of hydrogen, which is mainly generated in stratification, is compared with the FITS experiments. The model developed in this study shows a good agreement within a range of 10 % fuel oxidation rate and predicts the controlled mechanism of the chemical reaction very well. And this model predicts more accurately than the previous works. It is shown from the sensitivity study that the higher initial temperature of fuel particle is, the larger the reaction rate is. Up to 2700 K of temperature of the particle, the reaction rate increases rapid, which can lead to metal ignition.

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Kinetics of Thermal Dehydration of Ha-dong Kaolin (하동카오린의 열분해속도에 관한 연구)

  • 박희찬;손명모
    • Journal of the Korean Ceramic Society
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    • v.18 no.1
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    • pp.35-40
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    • 1981
  • The kinetics of the dehydration of Ha-dong kaolin was studied isothermally at various temperatures. Dehydration rate was measured by thermogravimetry method in the temperature range of 440~50$0^{\circ}C$ and the particle size range of 170~325mesh. The general equation f($\alpha$)=kt, where $\alpha$ is the fraction reacted in the time and the function f($\alpha$) depends on the reaction mechanism, was applied to this reaction. The function, f($\alpha$) was obtained by application of reduced-time plot and plot of lnln (1-$\alpha$) vs. ln (time), and expressed as (1-$\alpha$) ln (1-$\alpha$)+$\alpha$=kt. The dehydration followed the diffusion-controlled reaction model and gave activation energy of 30Kcal/mole.

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