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유도결합 플라즈마를 이용한 $YMnO_3$ 박막의 건식 식각 특성 연구 (Dry Etching Characteristics of $YMnO_3$ Thin Films Using Inductively Coupled Plasma)

  • 민병준;김창일;창의구
    • 한국전기전자재료학회논문지
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    • 제14권2호
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    • pp.93-98
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    • 2001
  • YMnO$_3$ films are excellent gate dielectric materials of ferroelectric random access memories (FRAMs) with MFSFET (metal -ferroelectric-semiconductor field effect transistor) structure because YMnO$_3$ films can be deposited directly on Si substrate and have a relatively low permittivity. Although the patterning of YMnO$_3$ thin films is the requisite for the fabrication of FRAMs, the etch mechanism of YMnO$_3$ thin films has not been reported. In this study, YMnO$_3$thin films were etched with Cl$_2$/Ar gas chemistries in inductively coupled plasma (ICP). The maximum etch rate of YMnO$_3$ film is 285$\AA$/min under Cl$_2$/(Cl$_2$+Ar) of 1.0, RF power of 600 W, dc-bias voltage of -200V, chamber pressure of 15 mTorr and substrate temperature of $25^{\circ}C$. The selectivities of YMnO$_3$ over CeO$_2$ and $Y_2$O$_3$ are 2.85, 1.72, respectively. The selectivities of YMnO$_3$ over PR and Pt are quite low. Chemical reaction in surface of the etched YMnO$_3$ thin films was investigated with X-ray photoelectron spectroscopy (XPS) surface of the selected YMnO$_3$ thin films was investigated with X-ray photoelectron spectroscopy(XPS) and secondary ion mass spectrometry (SIMS). The etch profile was also investigated by scaning electron microscopy(SEM)

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사업 포트폴리오의 기술시너지 효과 : 50대 재벌의 패널자료분석

  • 김태유;박경민
    • 기술혁신연구
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    • 제5권1호
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    • pp.15-43
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    • 1997
  • This paper investigates empirically the relationship between various business portfolio properties (particularly technological properties) and chaebol's performance using data on the 50largest chaebols in Korea. In addition to the traditional indexes to measure diversification such as entropy index, we calculated inter-industry technological similarity using R'||'&'||'D expenditure data by industry and 1990 Input-output Table in korea, and obtained chaebol-level technological relatedness and internal transaction proportion from chaebols' business profile, inter-inustry technological similarity and 1990 input-output table. We applied factor analysis on 13 business portfolio property indexes and showed that they could be grouped into 3 dimensions. diversification scope, inter-business relatedness and degree of vertical integration. In this paper, using 50 largest chaebols' financial data (1989-1994), we analyzed empirically the effect of business portfolio properties on ROS(Return On Sales) which is conventional index for firm performance and on TFP(Total Factor Productivity) growth which is a pure measure of firm performance. To utilize the advantage of panel data, FEM(Fixed Effect Model) and REM(Random Effect Model) were used. The empirical result shows that the entropy index as a measurement of inter-business relatedness in not significant but technological relatedness index is significant. OLS estimates on pooled data were considerably different from FEM or REM estimates on panel data. By introducing interaction effect among the three variables for business portfolio properties, we obtained three findings. First, only VI(Vertical integration) has a significant positive correlation with ROS. Second, when using TFP growth as an dependent variable, both TR(Technological Relatedness) and VI are significant and positively related to the dependent variable. Third, the interaction term between TR and VI is significant and negatively affects TFP growth, meaning that TR and VI are substitutes. These results suggest strategic directions on restructuring business portfolio. As VI is increased, chaebols will get more profit. A higher level of either TR or VI will increase TFP growth rate, but increase in both TR and VI will have a negative effect on TFP growth. To summarize, certain business portfolio properties such as VI and TR can be considered "resources" themselves since they can affect profit rate and productivity growth. VI and TR have a synergy effect of change in profit rate and productivity growth. VI increases ROS and productivity growth, while TR increases productivity growth representing a technological synergy effect.t.

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Network Analyses of Gene Expression following Fascin Knockdown in Esophageal Squamous Cell Carcinoma Cells

  • Du, Ze-Peng;Wu, Bing-Li;Xie, Jian-Jun;Lin, Xuan-Hao;Qiu, Xiao-Yang;Zhan, Xiao-Fen;Wang, Shao-Hong;Shen, Jin-Hui;Li, En-Min;Xu, Li-Yan
    • Asian Pacific Journal of Cancer Prevention
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    • 제16권13호
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    • pp.5445-5451
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    • 2015
  • Fascin-1 (FSCN1) is an actin-bundling protein that induces cell membrane protrusions, increases cell motility, and is overexpressed in various human epithelial cancers, including esophageal squamous cell carcinoma (ESCC). We analyzed various protein-protein interactions (PPI) of differentially-expressed genes (DEGs), in fascin knockdown ESCC cells, to explore the role of fascin overexpression. The node-degree distributions indicated these PPI sub-networks to be characterized as scale-free. Subcellular localization analysis revealed DEGs to interact with other proteins directly or indirectly, distributed in multiple layers of extracellular membrane-cytoskeleton/ cytoplasm-nucleus. The functional annotation map revealed hundreds of significant gene ontology (GO) terms, especially those associated with cytoskeleton organization of FSCN1. The Random Walk with Restart algorithm was applied to identify the prioritizations of these DEGs when considering their relationship with FSCN1. These analyses based on PPI network have greatly expanded our comprehension of the mRNA expression profile following fascin knockdown to future examine the roles and mechanisms of fascin action.

Analog active valve control design for non-linear semi-active resetable devices

  • Rodgers, Geoffrey W.;Chase, J. Geoffrey;Corman, Sylvain
    • Smart Structures and Systems
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    • 제19권5호
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    • pp.487-497
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    • 2017
  • Semi-active devices use the building's own motion to produce resistive forces and are thus strictly dissipative and require little power. Devices that independently control the binary open/closed valve state can enable novel device hysteresis loops that were not previously possible. However, some device hysteresis loops cannot be obtained without active analog valve control allowing slower, controlled release of stored energy, and is presents an ongoing limitation in obtaining the full range of possibilities offered by these devices. This in silico study develops a proportional-derivative feedback control law using a validated nonlinear device model to track an ideal diamond-shaped force-displacement response profile using active analog valve control. It is validated by comparison to the ideal shape for both sinusoidal and random seismic input motions. Structural application specific spectral analysis compares the performance for the non-linear, actively controlled case to those obtained with an ideal, linear model to validate that the potential performance will be retained when considering realistic nonlinear behaviour and the designed valve control approach. Results show tracking of the device force-displacement loop to within 3-5% of the desired ideal curve. Valve delay, rather than control law design, is the primary limiting factor, and analysis indicates a ratio of valve delay to structural period must be 1/10 or smaller to ensure adequate tracking, relating valve performance to structural period and overall device performance under control. Overall, the results show that active analog feedback control of energy release in these devices can significantly increase the range of resetable, valve-controlled semi-active device performance and hysteresis loops, in turn increasing their performance envelop and application space.

Utilization of Low Glucosinalate and Conventional Mustard Oilseed Cakes in Commercial Broiler Chicken Diets

  • Rao, S.V.Rama;Raju, M.V.L.N.;Panda, A.K.;Shashibindu, M. Sailaja
    • Asian-Australasian Journal of Animal Sciences
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    • 제18권8호
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    • pp.1157-1163
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    • 2005
  • An experiment was conducted to study the effect of replacing soyabean meal (SBM) at 50 and 100% with conventional (CMC) and low glucosinalate mustard cakes (LGMC) in iso-caloric and iso-nitrogenous diets in broiler chickens. All these diets contained 0.1% choline chloride with a purity of 50% (w/w). Another diet was prepared by replacing SBM in toto with CMC with no supplemental choline to find out the possible role of supplemental choline in mustard cake (MC) based diets. Two hundred and seventy day-old broiler chicks were distributed randomly in 54 stainless steel battery brooder pens of five chicks in each pen. Each experimental diet was allotted at random to nine battery brooders and offered ad-libitum from day 2 through 42 days of age. Body weight gain was significantly depressed by total replacement of SBM with either LGMC or CMC at 21 days of age. Non-supplementation of choline significantly depressed the growth compared to those fed CMC 100% with supplemental choline. However, at 42 days of age, such an effect was seen only with CMC. Replacement of SBM with CMC 100% with or without choline supplementation depressed the body weight gain. The concentrations of cholestorol and tryglicerides in serum and the relative weights of ready to cook yield, giblet and gizzard decreased by incorporation of mustard cakes in broiler diets. The trend in fat and protein contents in breast and thigh muscles and liver was not clearly attributable to the treatment effect. Based on the results, it is concluded that SBM can be replaced in toto with LGMC (535.0 and 466.5 g/kg starter and finisher diets, respectively) or up to 50% (215.0 and 186.7 g/kg starter and finisher diets, respectively) with CMC in commercial broiler chicken diets. Choline supplementation at 0.1% level in broiler diets containing CMC was found to be beneficial during starter phase.

능동형 차량 현가장치의 성능 향상을 위한 구조 최적화 (Structural Optimization of Active Vehicle Suspension Systems)

  • 김창동;정의봉
    • 대한기계학회논문집
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    • 제17권6호
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    • pp.1381-1388
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    • 1993
  • 본 연구에서는 구조계와 제어계가 결합된계에 대하여, 성능 평가함수의 구조 설계변수에 대한 감도를 Riccati방정식으로부터 직접 해석할 수 있는 효율적인 방안을 제시하여 동시최적설계가 가능토록한다. 그리고 유색잡음의 불규칙 노면입력을 받는 차체탄성을 고려한 Hac의 2륜 차량의 모델에 LQG제어를 행한 경우에 대하여, 본 연구 방법을 적용시켜 동시 최적화를 수행한 제어성능 특성을 종래의 최적제어만에 의한 제어성능과 비교, 검토 한다. 구조설계변수로는 현가장치의 강성특성, 감쇠특성 및 현가장치 지지점의 위치로 선정한다.

십자형 용접 시편의 3차원 용접 잔류응력 분포 예측에 관한 연구 (A Study of Predicting 3-dimensional Welding Residual Stresses Distribution for T-joint Fillet Specimen)

  • 유미지;이장현;황세윤;김경수;김성찬
    • Journal of Welding and Joining
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    • 제28권2호
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    • pp.84-90
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    • 2010
  • Fillet welding accounts for about 80% of all constructing process of ship and ocean structure. T-joint is one of the typical shapes which are frequently reported to experience the fatigue damage when the marine structure meets the storm loads. The fatigue damage is affected by the magnitude of residual stresses on the weld. Recently, many shipping registers and design guidances have required that the fatigue strength assessment method should be compensated by the effect of the residual stress in case that the random loading or storm loading is applied to the marine vessels. This study suggests the computational procedure to analyze the residual stresses of T-joint specimen that is frequently reported to get damaged by the storm loading. Experiment by XRD as well as the 3-D computational welding model is presented in order to get the profile of residual stress. Throughout the comparison of experimental result with the computational result, the computational model was validated. Thereafter, characteristics of he residual stresses in the joint are discussed.

곡률 커플링 접촉각에 따른 접촉 강성 및 굽힘 강성해석 (Analysis of Contact Stiffness and Bending Stiffness according to Contact Angle of Curvic Coupling)

  • 유용훈;조용주;이동현;김영철
    • Tribology and Lubricants
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    • 제34권1호
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    • pp.23-32
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    • 2018
  • Coupling is a mechanical component that transmits rotational force by connecting two shafts. Curvic coupling is widely used in high-performance systems because of its excellent power transmission efficiency and easy machining. However, coupling applications change dynamic behavior by reducing the stiffness of an entire system. Contact surface stiffness is an important parameter that determines the dynamic behavior of a system. In addition, the roughness profile of a contact surface is the most important parameter for obtaining contact stiffness. In this study, we theoretically establish the process of contact and bending stiffness analysis by considering the rough surface contact at Curvic coupling. Surface roughness parameters are obtained from Nayak's random process, and the normal contact stiffness of a contact surface is calculated using the Greenwood and Williamson model in the elastic region and the Jackson and Green model in the elastic-plastic region. The shape of the Curvic coupling contact surface is obtained by modeling a machined shape through an actual machining tool. Based on this modeling, we find the maximum number of gear teeth that can be machined according to the contact angle. Curvic coupling stiffness is calculated by considering the contact angle, and the calculation process is divided into stick and slip conditions. Based on this process, we investigate the stiffness characteristics according to the contact angle.

Investigation on Etch Characteristics of FePt Magnetic Thin Films Using a $CH_4$/Ar Plasma

  • Kim, Eun-Ho;Lee, Hwa-Won;Lee, Tae-Young;Chung, Chee-Won
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.167-167
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    • 2011
  • Magnetic random access memory (MRAM) is one of the prospective semiconductor memories for next generation. It has the excellent features including nonvolatility, fast access time, unlimited read/write endurance, low operating voltage, and high storage density. MRAM consists of magnetic tunnel junction (MTJ) stack and complementary metal-oxide semiconductor (CMOS). The MTJ stack is composed of various magnetic materials, metals, and a tunneling barrier layer. For the successful realization of high density MRAM, the etching process of magnetic materials should be developed. Among various magnetic materials, FePt has been used for pinned layer of MTJ stack. The previous etch study of FePt magnetic thin films was carried out using $CH_4/O_2/NH_3$. It reported only the etch characteristics with respect to the variation of RF bias powers. In this study, the etch characteristics of FePt thin films have been investigated using an inductively coupled plasma reactive ion etcher in various etch chemistries containing $CH_4$/Ar and $CH_4/O_2/Ar$ gas mixes. TiN thin film was employed as a hard mask. FePt thin films are etched by varying the gas concentration. The etch characteristics have been investigated in terms of etch rate, etch selectivity and etch profile. Furthermore, x-ray photoelectron spectroscopy is applied to elucidate the etch mechanism of FePt thin films in $CH_4$/Ar and $CH_4/O_2/Ar$ chemistries.

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The Influence of $O_2$ Gas on the Etch Characteristics of FePt Thin Films in $CH_4/O_2/Ar$ gas

  • Lee, Il-Hoon;Lee, Tea-Young;Chung, Chee-Won
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.408-408
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    • 2012
  • It is well known that magnetic random access memory (MRAM) is nonvolatile memory devices using ferromagnetic materials. MRAM has the merits such as fast access time, unlimited read/write endurance and nonvolatility. Although DRAM has many advantages containing high storage density, fast access time and low power consumption, it becomes volatile when the power is turned off. Owing to the attractive advantages of MRAM, MRAM is being spotlighted as an alternative device in the future. MRAM consists of magnetic tunnel junction (MTJ) stack and complementary metal- oxide semiconductor (CMOS). MTJ stacks are composed of various magnetic materials. FePt thin films are used as a pinned layer of MTJ stack. Up to date, an inductively coupled plasma reactive ion etching (ICPRIE) method of MTJ stacks showed better results in terms of etch rate and etch profile than any other methods such as ion milling, chemical assisted ion etching (CAIE), reactive ion etching (RIE). In order to improve etch profiles without redepositon, a better etching process of MTJ stack needs to be developed by using different etch gases and etch parameters. In this research, influences of $O_2$ gas on the etching characteristics of FePt thin films were investigated. FePt thin films were etched using ICPRIE in $CH_4/O_2/Ar$ gas mix. The etch rate and the etch selectivity were investigated in various $O_2$ concentrations. The etch profiles were studied in varying etch parameters such as coil rf power, dc-bias voltage, and gas pressure. TiN was employed as a hard mask. For observation etch profiles, field emission scanning electron microscopy (FESEM) was used.

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