• Journal of Advanced Marine Engineering and Technology
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• 제30권8호
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• pp.853-862
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• 2006

The present study is numerically investigated the flame structure of non-premixed counterflow jet flames using the laminar flamelet model Detailed flame structures with the fuel composition of 40% CO, 30% $H_2$. 30% $N_2$ and an oxidizer composition of 79% $N_2$ and 21% $O_2$ in a non-premixed counterflow flame are studied numerically. This study is aimed to investigate the effects of axial velocity gradient and combustion atmosphere pressure on flame structure. The results show that the role of axial velocity gradient on combustion processes is globally opposite to that of combustion atmosphere pressure. That is, chemical nonequilibrium effects become dominant with increasing axial velocity gradient, but are suppressed with increasing ambient pressure. Also, the flame strength is globally weakened by the increase of axial velocity gradient but is augmented by the increase of ambient pressure. However, flame extinction is described better on the basis of only chemical reaction and in this study axial velocity gradient and ambient pressure play a similar role conceptually such that the increase of axial velocity gradient and ambient pressure cause flame not to be extinguished and extend the extinction limit, respectively. Consequently it is suggested that a combustion process like flame extinction is mainly influenced by the competition between the radical formation reaction and the third-body recombination reaction.

• 한국세라믹학회지
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• 제21권2호
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• pp.127-134
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• 1984

Basic research on the formation of monolithic glasses from metal alkoxide has been done concerning gelling of silicon alkoxides and dehydration of those gells. The felling time were increased with increasing of Carbon number of alkyl radical of alkoxide and am-ount of water and the lower pH value of water. Large portions of water and organic materials were rem-oved below 25$0^{\circ}C$ and shrinkage of glass took place above 80$0^{\circ}C$ Therefore heating up to 25$0^{\circ}C$ and above 75$0^{\circ}C$ must be done gradually with rate of 0.5$^{\circ}C$/min.

• 한국환경과학회지
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• 제27권8호
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• pp.621-629
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• 2018

Many chemically active species such as ${\cdot}H$, ${\cdot}OH$, $O_3$, $H_2O_2$, hydrated $e^-$, as well as ultraviolet rays, are produced by Dielectric Barrier Discharge (DBD) plasma in water and are widely use to remove non-biodegradable materials and deactivate microorganisms. As the plasma gas containing chemically active species that is generated from the plasma reaction has a short lifetime and low solubility in water, increasing the dissolution rate of this gas is an important challenge. To this end, the plasma gas and water within reactor were mixed using the air-automizing nozzle, and then, water-gas mixture was injected into water. The dissolving effect of plasma gas was indirectly confirmed by measuring the RNO (N-Dimethyl-4-nitrosoaniline, indicator of the formation of OH radical) solution. The plasma system consisted of an oxygen generator, a high-voltage power supply, a plasma generator and a liquid-gas mixing reactor. Experiments were conducted to examine the effects of location of air-automizing nozzle, flow rate of plasma gas, water circulation rate, and high-voltage on RNO degradation. The experimental results showed that the RNO removal efficiency of the air-automizing nozzle is 29.8% higher than the conventional diffuser. The nozzle position from water surface was not considered to be a major factor in the design and operation of the plasma reactor. The plasma gas flow rate and water circulation rate with the highest RNO removal rate were 3.5 L/min and 1.5 L/min, respectively. The ratio of the plasma gas flow rate to the water circulation rate for obtaining an RNO removal rate of over 95% was 1.67 ~ 4.00.

• Maxillofacial Plastic and Reconstructive Surgery
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• 제17권2호
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• pp.202-207
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• 1995

Chylous fistula is a rare complication occurring after radical neck dissection. Previous reports on neck dissection described an incidence of about 1% to 2%. We report a case of chylous fistula that occurred after radical neck dissection for squamous cell carcinoma of left lower gingiva and mandible in a 52-year-old man. We successfully managed the fistula by the following conservative measures : bed rest with head elevation, continuation of closed suction drainage, and dietary management to decrease the rate of chyle formation.

• Tribology and Lubricants
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• 제18권6호
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• pp.396-401
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• 2002

ln this paper, the fuction of molybdenum dialkyl dithiophosphate (MoDTP) as an oxidation inhibitor of mineral oils was investigated and compared with 2,6-Di-tert-Butyl-4-Methylphenol (DBMP). Oxidation tests were conducted using an oxygen absorption apparatus. MoDTP showed anti-oxidation property, and length of induction time prolonged by increasing MoDTP concentration. However the induction time of DBMP was longer than those of MoDTP. The anti-oxidation property of MoDTP was found to be inferior to that of DBMP The capability of hydroperoxide decomposition ability with MoDTP was much greater than that with DBMP. However the rate constant of radical scavenging with MoDTP was much better than that with DBMP. It was found that the performance of MoDTP is exellent with respect to hydroperoxide decomposition but it is susceptible to chemical decomposition. From the fact that formation of phenol was observed when MoDTP was added to hexane solution of cumene hydroperoxide (CHPO), it is indicated that the decomposition of hydroperoxide with MoDTP occurs by means of ionic mechanism.

• Bulletin of the Korean Chemical Society
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• 제25권12호
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• pp.1889-1892
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• 2004

The peroxidase activity of cytochrome c was studied by using a chromogen, 2,2'-azinobis-(2-ethylbenzthiazoline-6-sulfonate) (ABTS). Initial rate of ABTS oxidation formation was linear with respect to the concentration of cytochrome c between 2.5-10 ${\mu}$M and $H_2O_2$ between 0.1-0.5 mM. The optimal pH for the peroxidase activity of cytochrome c was 7.0-8.5. The peroxidase activity retained about 40% of the maximum activity when exposed at 60 $^{\circ}C$. for 10 min. The peroxidase activity showed a typical Michaelis-Menten kinetics for $H_2O_2$ which Km value was 29.6 mM. Radical scavengers inhibited the peroxidase activity of cytochrome c. The peroxidase activity was significantly inhibited by the low concentration of iron chelator, deferoxamine. The results suggested that the peroxidase activity was associated with iron in the heme of cytochrome c.

• 한국인쇄학회지
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• 제16권3호
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• pp.61-80
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• 1998

To investigate in influence of photosensitizer used with benzophenone(BP) in the curing rate and physical properties of UV curable hard coating on plastic, we prepared UV curable clear and pigmented coatings with DEA, DMA, NPM and TEA as photosensitizer, respectively. The curing rate calculated from the decrease of the absorbance of acrylic double bond measured by FT-IR spectroscopy increased s follows; DEA>DMA>NPM>TEA. this order could be explained by the reactivity of diethylamino group of DEA and the ease of formation of activated complex between BP and photosensitizer during the curing process. In UV curable pigmented coatings, the order of curing rate increased as follows; DEA>DMA>TEA>NPM. It was found that the curing rate of the pigmented coating can be increased by light scattering of TiO$_2$. The hardness of coating film cured by photosensitization of DEA and DMA is higher than other photosensitizers due to the crosslinking reaction of DEA and DMA radical bound to polymer backbone.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.363-363
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• 2008

The development of dry etching process for sapphire wafer with plasma has been key issues for the opto-electric devices. The challenges are increasing control and obtaining low plasma induced-damage because an unwanted scattering of radiation is caused by the spatial disorder of pattern and variation of surface roughness. The plasma-induced damages during plasma etching process can be classified as impurity contamination of residual etch products or bonding disruption in lattice due to charged particle bombardment. Therefor, fine pattern technology with low damaged etching process and high etch rate are urgently needed. Until now, there are a lot of reports on the etching of sapphire wafer with using $Cl_2$/Ar, $BCl_3$/Ar, HBr/Ar and so on [1]. However, the etch behavior of sapphire wafer have investigated with variation of only one parameter while other parameters are fixed. In this study, we investigated the effect of pressure and other parameters on the etch rate and the selectivity. We selected $BCl_3$ as an etch ant because $BCl_3$ plasmas are widely used in etching process of oxide materials. In plasma, the $BCl_3$ molecule can be dissociated into B radical, $B^+$ ion, Cl radical and $Cl^+$ ion. However, the $BCl_3$ molecule can be dissociated into B radical or $B^+$ ion easier than Cl radical or $Cl^+$ ion. First, we evaluated the etch behaviors of sapphire wafer in $BCl_3$/additive gases (Ar, $N_2,Cl_2$) gases. The behavior of etch rate of sapphire substrate was monitored as a function of additive gas ratio to $BCl_3$ based plasma, total flow rate, r.f. power, d.c. bias under different pressures of 5 mTorr, 10 mTorr, 20 mTorr and 30 mTorr. The etch rates of sapphire wafer, $SiO_2$ and PR were measured with using alpha step surface profiler. In order to understand the changes of radicals, volume density of Cl, B radical and BCl molecule were investigated with optical emission spectroscopy (OES). The chemical states of $Al_2O_3$ thin films were studied with energy dispersive X-ray (EDX) and depth profile anlysis of auger electron spectroscopy (AES). The enhancement of sapphire substrate can be explained by the reactive ion etching mechanism with the competition of the formation of volatile $AlCl_3$, $Al_2Cl_6$ or $BOCl_3$ and the sputter effect by energetic ions.

• 대한환경공학회지
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• 제35권2호
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• pp.124-130
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• 2013

모든 브롬화난연제 중 가장 많이 사용되고 있는 것은 TBBPA이다(상용화되고 있는 브롬화난연제물질 중 50%를 차지). TBBPA는 환경 중에서 유해하기 때문에 환경 중에서의 그들의 분해반응기전에 대한 연구가 흥미롭다. 본 연구에서는 UV-A (${\lambda}=352nm$) 조사에 의한 TBBPA의 광분해반응속도가 조사세기 의존적으로 증가하였다. 또한 TBBPA의 광분해반응에 의해서 2,6-dibromo-p-benzosemiquinone radical ($a_{2H}=2.36G$, g = 2.0056)이 생성되고 그 생성반응에 singlet oxygen ($^1O_2$)이 주요 반응 인자로서 영향을 미치는 것으로 나타났다. 한편, HA와 TBBPA의 혼합용액을 광조사하면 semiquinone radical의 전형적인 ESR 스펙트럼이 생성되었다. 그리고 HA는 TBBPA의 광분해반응속도를 농도의존적으로 감소시키는 것으로 나타났다. 또한 라디칼 생성과 광분해반응속도는 singlet oxygen ($^1O_2$) 소거제인 sodium azide를 주입하면 감소되었다. 이러한 결과로부터, UV-A 조사에 의한 HA와 $^1O_2$의 반응속도는 TBBPA와 $^1O_2$의 것보다 더 빠르다는 것을 제시한다.

• Asian Journal of Atmospheric Environment
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• 제9권2호
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• pp.158-164
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• 2015

The estimation of the concentration of hydroxyl radical (OH) in the atmosphere is essential to build atmospheric models and to understand the mechanisms of the reactions involved in OH. Although water vapor is one of the most abundant species in the troposphere, only a few studies have been performed for the reaction of OH and water vapor. Here I demonstrate an ab initio study on the complex forming reation of OH with $H_2O$ in the gas phase performed based on density functional theory to calculate the reaction rate and the energy states of the reactant and the OH-$H_2O$ complex. The structure of the complex, which belongs to the Cs point group, was optimized at global minima. The transition state was not found at the B3LYP and MP2 levels of theory. Rate constants of the forward and the reverse reactions were calculated as $1.1{\times}10^{-16}cm^3\;molecule^{-1}\;s^{-1}$ and $5.3{\times}10^9\;s^{-1}$, respectively. The extremely slow rates of complex forming reaction and the resulting hydrogen atom exchange reaction of OH and $H_2O$, which are consistent with experimentally determined values, imply a negligible possibility of a change in OH reactivity through the title reaction.