• 제목/요약/키워드: Radiation and Scattering

검색결과 384건 처리시간 0.027초

$BCl_3$ 계열 유도결합 플라즈마를 이용한 사파이어 기판의 식각 특성 (Plasma Etching Characteristics of Sapphire Substrate using $BCl_3$-based Inductively Coupled Plasma)

  • 김동표;우종창;엄두승;양설;김창일
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.363-363
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    • 2008
  • The development of dry etching process for sapphire wafer with plasma has been key issues for the opto-electric devices. The challenges are increasing control and obtaining low plasma induced-damage because an unwanted scattering of radiation is caused by the spatial disorder of pattern and variation of surface roughness. The plasma-induced damages during plasma etching process can be classified as impurity contamination of residual etch products or bonding disruption in lattice due to charged particle bombardment. Therefor, fine pattern technology with low damaged etching process and high etch rate are urgently needed. Until now, there are a lot of reports on the etching of sapphire wafer with using $Cl_2$/Ar, $BCl_3$/Ar, HBr/Ar and so on [1]. However, the etch behavior of sapphire wafer have investigated with variation of only one parameter while other parameters are fixed. In this study, we investigated the effect of pressure and other parameters on the etch rate and the selectivity. We selected $BCl_3$ as an etch ant because $BCl_3$ plasmas are widely used in etching process of oxide materials. In plasma, the $BCl_3$ molecule can be dissociated into B radical, $B^+$ ion, Cl radical and $Cl^+$ ion. However, the $BCl_3$ molecule can be dissociated into B radical or $B^+$ ion easier than Cl radical or $Cl^+$ ion. First, we evaluated the etch behaviors of sapphire wafer in $BCl_3$/additive gases (Ar, $N_2,Cl_2$) gases. The behavior of etch rate of sapphire substrate was monitored as a function of additive gas ratio to $BCl_3$ based plasma, total flow rate, r.f. power, d.c. bias under different pressures of 5 mTorr, 10 mTorr, 20 mTorr and 30 mTorr. The etch rates of sapphire wafer, $SiO_2$ and PR were measured with using alpha step surface profiler. In order to understand the changes of radicals, volume density of Cl, B radical and BCl molecule were investigated with optical emission spectroscopy (OES). The chemical states of $Al_2O_3$ thin films were studied with energy dispersive X-ray (EDX) and depth profile anlysis of auger electron spectroscopy (AES). The enhancement of sapphire substrate can be explained by the reactive ion etching mechanism with the competition of the formation of volatile $AlCl_3$, $Al_2Cl_6$ or $BOCl_3$ and the sputter effect by energetic ions.

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Atmospheric Aerosol Optical Properties in the Korean Peninsula

  • Oh, Sung-Nam;Sohn, Byung-Ju;Chung, Hyo-Sang;Park, Ki-Jun;Park, Sang-Soon;Hyun, Myung-Suk
    • 한국대기환경학회:학술대회논문집
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    • 한국대기환경학회 2003년도 춘계학술대회 논문집
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    • pp.423-423
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    • 2003
  • The radiative properties of atmospheric aerosol are determined by the mass and chemical characteristics, and optical properties such as aerosol optical depth (AOD), ngstr m parameter ( $\alpha$) and single scattering albedo (SSA). In particular these aerosol optical properties also determine surface temperature perturbation that may give some information in understanding the regional atmospheric radiative forcing. For understanding the radiative forcing and regional surce of aerosol, this paper summarizes and compares the aerosol optical properties results from and compares the atmospheric aerosol optical properties results from two different experiments: Anmyeon 2000 and Jeju 2001. Korea Global Atmosphere Watch Observatory (KGAWO) at Anmyeon island and ACE-Asia super-site at Gosan Jeju island have measured the radiations and aerosols since the year of 2000. The sites are located in the mid-west and south of Korea peninsula where it is strongly affected by the Asian dust coming from China region in every spring. Aerosol optical properties over both sites were measured through the ground-based sun and sky radiometers were analyzed for understanding the radiation and climate properties. Number concentration and chemical components of aerosol were additionally analyzed for the source estimation in the transportation. The frequency distributions of aerosol optical depth are rather narrow with a modal vaiue of 0.38 at both sites. However, the distributions of show one peak (1.13) at Jeju but two peaks (0.63 and 1.13) at Anmyeon. In the cases of Anmyeon, one peak around 0.63 corresponds to relatively dust-free cases, and the second peak around 1.13 characterizes the situation when Asian dust is presented. The correlation between AOD and resulted high correlation on the wide range with high values of optical depth at Anmyeon, otherwise a narrow range of with moderate to low AOD at Jeju. In dust free condition SSA decrease with waveleneth while in the presence of Asian dust SSA either stays neutral or increases slightly with wavelength. The change of surface temperature shows the stronger positive correlations with aerosol optical depth increase at Anmyeon than Jeju. In the chemical properties the aerosol are related to high concentrations in inorganic matters, SO$^4$, NO$_3$, CA2+ in fine and coarse.

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Nature of the Interfacial Regions in the Antiferromagnetically-coupled Fe/Si Multilayered Films

  • Moon, J.C.;Y.V. Kudryavtsev;J.Y.Rhee;Kim, K.W.;Lee, Y.P.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.174-174
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    • 2000
  • A strong antiferromagnetic coupling in Fe/Si multilayered films (MLF) had been recently discovered and much consideration has been given to whether the coupling in the Fe/Si MLF system has the same origin as the metal/metal MLF. Nevertheless, the nature of the interfacial ron silicide is still controversial. On one hand, a metal/ semiconductor structure was suggested with a narrow band-gap semiconducting $\varepsilon$-FeSi spacer that mediates the coupling. However, some features show that the nature of coupling can be well understood in terms of the conventional metal/metal multilayered system. It is well known that both magneto-optical (MO) and optical properties of a metal depend strongly on their electronic structure that is also correlated with the atomic and chemical ordering. In this study, the nature of the interfacial regions is the Fe/Si multilayers has been investigated by the experimental and computer-simulated MO and optical spectroscopies. The Fe/Si MLF were prepared by rf-sputtering onto glass substrates at room temperature with the number of repetition N=50. The thickness of Fe sublayer was fixed at 3.0nm while the Si sublayer thickness was varied from 1.0 to 2.0 nm. The topmost layer of all the Fe/Si MLF is Fe. In order to carry out the computer simulations, the information on the MO and optical parameters of the materials that may constitute a real multilayered structure should be known in advance. For this purpose, we also prepared Fe, Si, FeSi2 and FeSi samples. The structural characterization of Fe/Si MLF was performed by low- and high -angle x-ray diffraction with a Cu-K$\alpha$ radiation and by transmission electron microscopy. A bulk $\varepsilon$-FeSi was also investigated. The MO and optical properties were measured at room temperature in the 1.0-4.7 eV energy range. The theoretical simulations of MO and optical properties for the Fe/Si MLF were performed by solving exactly a multireflection problem using the scattering matrix approach assuming various stoichiometries of a nonmagnetic spacer separating the antiferromagnetically coupled Fe layers. The simulated spectra of a model structure of FeSi2 or $\varepsilon$-FeSi as the spacer turned out to fail in explaining the experimental spectra of the Fe/Si MLF in both intensity and shape. Thus, the decisive disagreement between experimental and simulated MO and optical properties ruled out the hypothesis of FeSi2 and $\varepsilon$-FeSi as the nonmagnetic spacer. By supposing the spontaneous formation of a metallic ζ-FeSi, a reasonable agreement between experimental and simulated MO and optical spectra was obtained.

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Purification, and Biochemical and Biophysical Characterization of Cellobiohydrolase I from Trichoderma harzianum IOC 3844

  • Colussi, Francieli;Serpa, Viviane;Da Silva Delabona, Priscila;Manzine, Livia Regina;Voltatodio, Maria Luiza;Alves, Renata;Mello, Bruno Luan;Nei, Pereira Jr.;Farinas, Cristiane Sanches;Golubev, Alexander M.;Santos, Maria Auxiliadora Morim;Polikarpov, Igor
    • Journal of Microbiology and Biotechnology
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    • 제21권8호
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    • pp.808-817
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    • 2011
  • Because of its elevated cellulolytic activity, the filamentous fungus Trichoderma harzianum has a considerable potential in biomass hydrolysis applications. Trichoderma harzianum cellobiohydrolase I (ThCBHI), an exoglucanase, is an important enzyme in the process of cellulose degradation. Here, we report an easy single-step ion-exchange chromatographic method for purification of ThCBHI and its initial biophysical and biochemical characterization. The ThCBHI produced by induction with microcrystalline cellulose under submerged fermentation was purified on DEAE-Sephadex A-50 media and its identity was confirmed by mass spectrometry. The ThCBHI biochemical characterization showed that the protein has a molecular mass of 66 kDa and pI of 5.23. As confirmed by smallangle X-ray scattering (SAXS), both full-length ThCBHI and its catalytic core domain (CCD) obtained by digestion with papain are monomeric in solution. Secondary structure analysis of ThCBHI by circular dichroism revealed ${\alpha}$- helices and ${\beta}$-strands contents in the 28% and 38% range, respectively. The intrinsic fluorescence emission maximum of 337 nm was accounted for as different degrees of exposure of ThCBHI tryptophan residues to water. Moreover, ThCBHI displayed maximum activity at pH 5.0 and temperature of $50^{\circ}C$ with specific activities against Avicel and p-nitrophenyl-${\beta}$-D-cellobioside of 1.25 U/mg and 1.53 U/mg, respectively.

XAS Studies of Ion Irradaited MgO Thin Films

  • Suk, Jae-Kwon;Gautam, Sanjeev;Song, Jin-Ho;Lee, Jae-Yong;Kim, Jae-Yeoul;Kim, Joon-Kon;Song, Jong-Han;Chae, Keun-Hwa
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.312-312
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    • 2012
  • Magnesium oxide has become focus for research activities due to its use in magnetic tunnel junctions and for understanding of do ferromagnetism. Theoretical investigations on such type of system indicate that the presence of defects greater than a threshold value is responsible for the magnetic behaviour. It has also been shown experimentally that by decreasing the film thickness and size of nanoparticles, enhancement/increase in magnetization can be achieved. Apart from the change in dimension, swift heavy ions (SHI) are well known for creating defects and modifying the properties of the materials. In the present work, we have studied the irradiation induced effects in magnesium oxide thin film deposited on quartz substrate via X-ray absorption spectroscopy (XAS). Magnesium oxide thin films of thickness 50nm were deposited on quartz substrate by using e-beam evaporation method. These films were irradiated by 200 MeV Ag15+ ion beam at fluence of $1{\times}10^{11}$, $5{\times}10^{11}$, $1{\times}10^{12}$, $3{\times}10^{12}$ and $5{\times}10^{12}ions/cm^2$ at Nuclear Science Centre, IUAC, New Delhi (India). The grain size was observed (as studied by AFM) to be decreased from 37 nm (pristine film) to 23 nm ($1{\times}10^{12}ions/cm^2$) and thereafter it increases upto a fluence of $5{\times}10^{12}ions/cm^2$. The electronic structure of the system has been investigated by X-ray absorption spectroscopy (XAS) measurements performed at the high energy spherical grating monochromator 20A1 XAS (HSGM) beamline in the National Synchrotron Radiation Research Center (NSRRC), Taiwan. Oxides of light elements like MgO/ZnO possess many unique physical properties with potentials for novel application in various fields. These irradiated thin films are also studied with different polarization (left and right circularly polarized) of incident x-ray beam at 05B3 EPU- Soft x-ray scattering beamline of NSRRC. The detailed analysis of observed results in the wake of existing theories is discussed.

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소아 흉부검사 시 격자 사용에 따른 영상 화질 평가 (Evaluation of Image Quality When Using Grid During Child Chest X-Ray Examination)

  • 정성훈;한범희;정홍량
    • 대한방사선기술학회지:방사선기술과학
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    • 제40권3호
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    • pp.371-376
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    • 2017
  • 소아의 경우 방사선의 감수성이 성인에 비하여 높고, 잠재적 피폭으로 인한 장해가 발생할 수 있으므로 피폭선량에 대해 관리가 요구된다. 이에 본 연구는 소아 흉부검사 시 산란선을 제거시켜주지만 피폭선량을 증가시키는 격자(Grid)의 사용 유, 무에 따른 영상과 거리와 조건의 변화에 따른 영상을 분석하여 소아 흉부검사에서 적정한 검사조건을 제시하고자 하였다. 연구방법은 Grid를 부착한 상태에서 100 cm, 180 cm에서 측정하였으며, kVp를 70. 90. 110으로 변화하여 측정하였다. 또한 Grid를 미부착한 상태에서 100 cm, 180 cm을 고정 시키고, 선량을 6, 8, 10 mAs로 변화시켜 측정하였으며, 측정항목은 신호 대 잡음비, 대조도 대 잡음비, J.J Vucich를 측정하였다. kVp를 고정시켜 측정한 결과 초점-이미지 수용체간 거리가 100 cm일 때 신호 대 잡음비, 대조도 대 잡음비, J.J Vucich가 모두 높게 나타났다. 또한, 선량(mAs)을 변화시켜 측정한 결과 신호 대 잡음비, 대조도 대 잡음비, J.J Vucich에서 초점-이미지 수용체 간 거리 100 cm에서 높게 나타났다. 현재 국내에서 흉부검사는 일반적으로 180 cm으로 시행하고 있지만 본 연구결과에서는 소아의 흉부 검사 시 초점-이미지수용체간 거리가 100 cm일 때 영상평가에서 화질이 높게 평가되었다.

Poly(2-methacryloyloxyethyl phosphorylcholine/fluorescein O-methacrylate)가 도입된 산화철 나노 입자의 제조 및 발열 특성 연구 (Preparation and characterization of Poly(2-methacryloyloxyethyl phosphorylcholine/fluorescein O-methacrylate)-coated iron oxide nanoparticles)

  • 류성곤;정인우
    • 접착 및 계면
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    • 제19권3호
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    • pp.106-112
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    • 2018
  • 악성 조직의 온열 치료는 성공적인 암 치료 방법의 하나로서 방사선 치료 및 화학 요법에 비해 생체 적합성이 우수하고 비교적 온화한 조건에서 사용할 수 있어 최근 큰 주목을 받고 있다. 본 연구에서는 온열 치료를 목적으로 생체 적합성 고분자인 poly(2-methacryloyloxyethyl phosphorylcholine/fluorescein O-methacrylate) (P(MPC/FOM))를 코팅한 초상자성 산화철 나노 입자 (IONP)를 제조하고 관련 특성을 분석하였다. 15 nm 직경을 갖는 IONP는 먼저 공침법에 의해 제조된 후, 4-cyanopentanoic acid dithiobenzoate (CTP) 을 사용하여 IONP의 표면을 개질하였으며, 이 후 MPC 및 FOM 단량체의 reversible addition-fragmentation chain transfer (RAFT) 공중합을 통해 P(MPC/FOM)의 코로나 층을 형성시켰다. 투과 전자 현미경 (TEM)과 동적 광 산란 (DLS) 분석을 통해 IONP@P(MPC/FOM)의 형태 및 수력학적 크기를 확인할 수 있었으며, 열 중량 분석 (TGA)을 통해 P(MPC/FOM) 코로나 층의 형성을 확인하였다. 또한 교류 자기장을 이용해 IONP 분산액을 노출시킨 결과, 0.2 중량 %의 IONP @ P(MPC / FOM) 수분산액이 온열 치료에 사용될 수 있음을 확인하였다.

UO$_{2}$ 펠릿 산화로의 분말 비산 방지를 위한 최종속도 측정 (Measurement of Terminal Velocity for Scatter Prevention of Powder in the Voloxidizer for Oxidation of UO$_{2}$ Pellet)

  • 김영환;윤지섭;정재후;진재현;홍동희
    • 방사성폐기물학회지
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    • 제3권2호
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    • pp.77-84
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    • 2005
  • 실증용 UO$_{2}$ pellet 산화로의 실증을 위한 제한된 핫셀 공간 안에서 사용후 핵 연료를 취급하는 산화로는 소형화 하여야 하고, 사용후 핵 연료 분말은 UO$_{2}$ pellet 산화로 장치로부터 비산되지 않아야 한다. 본 연구에서는 분말의 최종속도를 구하기 위하여 Stokes식과 밀도비식을 제안하였다. U$_{3}$O$_{8}$ 의 최종속도 SiO$_{2}$ 의 최종속도를 사용하여 예측하였고, 비산방지를 할 수 있는 최적유량을 결정하였다. SiO$_{2}$ 의 이론 최종속도 식을 검증하고, U$_{3}$O$_{8}$ 과 관계식을 예측하기 위하여 아크릴 장치를 만들었다. 목업시설 에 설치 된 산화로에서 제안된 이론최종속도식 인 Stokes식 의 20 L/min과 밀도비식의 14.5 L/min을 적용하여 U$_{3}$O$_{8}$ 분말의 필터감지에 의해 검증하였다. 그 결과 밀도비식에 의한 14.5 L/min은 U$_{3}$O$_{8}$ 이전혀 검출되지 않았고, Stokes식의 20 L/min에서는 평균 7$\mu$m 의 입도분말이 검출되었다. 따라서 UO$_{2}$ pellet 산화로에서 U$_{3}$O$_{8}$이 비산되지 않는 최적유량은 14.5L/min임을 알 수 있었고, 제안된 밀도비식이 바람직함을 알 수 있었다.

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효율을 적용한 마리넬리 비이커에서 HPGe 감마선 분광분석법의 동시합성보정 (Coincidence Summing Corrections in HPGe Gamma Ray Spectrometry in Marinelli-beakers with Efficiency)

  • 장은성;이효영
    • 한국방사선학회논문지
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    • 제12권5호
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    • pp.557-563
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    • 2018
  • 동시 합성 보정 효과는 검출기의 효율이 향상할 때 그리고 선원과 검출기 사이의 거리가 가까울수록 크게 나타나는 것으로 알려져 있다. 점 선원($^{60}Co$)을 사용하여 검출기 중심축 방향 및 방사상 방향에서 거리에 따른 변화를 주어 P/T 비를 구하여 동시합성 보정을 하였다. 따라서 본 연구에서는 중심축 및 방사상 방향에서 동시합성 보정한 값들을 혼합부피선원(450 mL CRM source)에 적용하여 P/T에 따른 전체 피크효율 변화를 Geant4과 비교하였다. 또한 검출기와 시료가 아주 밀착된 상태에서 맵핑법에서 구한 효율을 환경시료 중에서 해양 시료인 미역에 적용하여 P/T 비의 적합성을 평가하고자 한다. 500 keV 이상의 효율의 영향을 받는 에너지 영역에 1,836 keV로 보정한 효율을 적용한 결과 측정값과 보정값의 상대오차는 3.2 % peak 효율이 보정되어 잘 일치하였다. 450 mL CRM source처럼 부피가 커질수록 P/T 비는 ${\pm}5%$까지 감소하였다. 이것은 검출기로부터 선원이 멀어짐에 따라 방출된 감마선의 산란이 많아지기 때문이며, 이처럼 P/T 변화는 동시합성 보정 피크 효율에 영향을 줌을 확인하였다.

High-k ZrO2 Enhanced Localized Surface Plasmon Resonance for Application to Thin Film Silicon Solar Cells

  • Li, Hua-Min;Zang, Gang;Yang, Cheng;Lim, Yeong-Dae;Shen, Tian-Zi;Yoo, Won-Jong;Park, Young-Jun;Lim, Jong-Min
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.276-276
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    • 2010
  • Localized surface plasmon resonance (LSPR) has been explored recently as a promising approach to increase energy conversion efficiency in photovoltaic devices, particularly for thin film hydrogenated amorphous silicon (a-Si:H) solar cells. The LSPR is frequently excited via an electromagnetic (EM) radiation in proximate metallic nanostructures and its primary con sequences are selective photon extinction and local EM enhancement which gives rise to improved photogeneration of electron-hole (e-h) pairs, and consequently increases photocurrent. In this work, high-dielectric-constant (k) $ZrO_2$ (refractive index n=2.22, dielectric constant $\varepsilon=4.93$ at the wavelength of 550 nm) is proposed as spacing layer to enhance the LSPR for application to the thin film silicon solar cells. Compared to excitation of the LSPR using $SiO_2$ (n=1.46, $\varepsilon=2.13$ at the wavelength of 546.1 nm) spacing layer with Au nanoparticles of the radius of 45nm, that using $ZrO_2$ dielectric shows the advantages of(i) ~2.5 times greater polarizability, (ii) ~3.5 times larger scattering cross-section and ~1.5 times larger absorption cross-section, (iii) 4.5% higher transmission coefficient of the same thickness and (iv) 7.8% greater transmitted electric filed intensity at the same depth. All those results are calculated by Mie theory and Fresnel equations, and simulated by finite-difference time-domain (FDTD) calculations with proper boundary conditions. Red-shifting of the LSPR wavelength using high-k $ZrO_2$ dielectric is also observed according to location of the peak and this is consistent with the other's report. Finally, our experimental results show that variation of short-circuit current density ($J_{sc}$) of the LSPR enhanced a-Si:H solar cell by using the $ZrO_2$ spacing layer is 45.4% higher than that using the $SiO_2$ spacing layer, supporting our calculation and theory.

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