• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.29 no.5
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• pp.294-297
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• 2016

Titanium oxide ($TiO_2$) thin films were fabricated by unbalanced magnetron (UBM) sputtering. The fabricated $TiO_2$ films were treated by oxygen plasma under various RF powers. We investigated the characteristics of oxygen plasma treatment on the surface, structural, and physical properties of $TiO_2$ films prepared at various plasma treatment RF powers. UBM sputtered $TiO_2$ films exhibited higher contact angle value, smooth surface, and amorphous structure. However, the rms surface roughness $TiO_2$ films were rough, and the contact angle value was decreased with the increase of the plasma treatment RF power Also, the hardness value of $TiO_2$ film as physical properties was slightly increased with the increase of the plasma treatment RF power. In the results, the performance of $TiO_2$ films for self cleaning critically depended on the with the plasma treatment RF power.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.32A no.1
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• pp.36-44
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• 1995

For a parabolic reflector antenna, a simple method is presented for computing efficiently the average power pattern degradations caused by the surface roughness of the reflector and misalignments between the reflector and the feed. In this procedure, both nonuniform surface errors and nonuniform illuminations are employed. The assumptions to derive the expressions are that in each annular region of the antenna, the rms value of the surface roughness is known, and in a zone in a annular region, the phase error by misalignments is constant, and can be taken to its value at the center of the zone. Detailed parametric studies are performed with derived expressions to determine the effects of those errors and illumination tapers on parameters such as gain and sidelobe levels.

• Journal of the Korean Society for Precision Engineering
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• v.22 no.10 s.175
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• pp.90-98
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• 2005

A monitoring system is necessary to make the polishing process more reliable in order to ensure the high quality and performance of the final products. Generally, AE (Acoustic Emission) is known to be closely related to the material removal rate (MRR). As the surface becomes rougher, the MRR and AE increase. Therefore, the surface roughness can be indirectly estimated using the AE signal measured during the polishing. In this study, an AE sensor-based monitoring system was fabricated to detect the very small AE signal resulting from the friction between a tool and a workpiece during polishing. The performance of this monitoring system was estimated according to polishing conditions, the relation between the level of the AE RMS and the surface roughness during the polishing was investigated.

• Korean Journal of Optics and Photonics
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• v.11 no.5
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• pp.312-316
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• 2000

Vole lllvesnguted the surface roughness charactenstics of the super~polished mirror substrate made by bowl-feed technique. in comparison with the case of fresh-feed technique. Fresh-feed techmque and bowl-feed technique were tried lor substrate surface polishing, and the surface roughne~s was estimated by phase-measunng interferometry. l11e slilface roughness of the substrate after bowl-feed procedure was Improved approxImately three times as fine as that after fresh-feed procedure. and tbe nns roughness of less than $0.5\AA$ and up to $0.3\AA$ at its best was obtained for the bowl-feed procedure. The surface roughness changes by (he bowl-feed technique. compated with tbe fresh-feeclleclmique. were analyzed witb tbe help of both 1 -dimensional roughne,>s profde and rougbness amplItude spect1U1l1 of the polished substrate, whIch ascertained that the final polishing partIcle size of the bowl-feed ptocedure was much smaller than that of the fresh~feed procedure. edure.

• Journal of the Korean institute of surface engineering
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• v.28 no.1
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• pp.55-63
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• 1995

Alkaline solutions such as $NH_4$OH, choline and TMAH (($CH_3$)$_4$NOH) have been introduced in semiconductor wet processing of silicon wafers to control ionic and particulate impurities following etching in acidic solutions. These chemicals usually mixed with hydrogen peroxide and/or surfactants to control the etch rate of silicon. The highest etch rate was observed in $NH_4$OH solutions at a pH in alkaline solutions. It indicates that the etch rate depends on the content of $OH^{-}$ as well as cations of alkaline solutions. STM/AFM techniques were used to characterize the effect of alkaline solutions on silicon surface roughness. In SC1 (mixture of $NH_4$OH : $H_2$$O_2$ : $H_2$O) solutions, the reduction of the ammonium hydroxide proportion from 1 to 0.1 decreased the surface roughness ($R_{rms}$) from 6.4 to $0.8\AA$. The addition of $H_2$$O_2$ and surfactants to choline and TMAH reduced the values of $R_{p-v}$ and $R_{rms}$ significantly. $H_2$$_O2$ and surfactants added in alkaline solutions passivate bare silicon surfaces by the oxidation and adsorption, respectively. The passivation of surfaces in alkaline solutions resulted in lower etch rate of silicon thereby provided smoother surfaces.s.ces.s.

• Journal of the Korean institute of surface engineering
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• v.53 no.6
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• pp.280-284
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• 2020

Electron beam irradiation is widely used as a type of surface modification technology to advance surface properties. In this study, the effect of electron beam irradiation on properties, such as surface hardness, wear resistance, roughness, and critical load of Titanium Aluminium nitride (TiAlN) films was investigated. TiAlN films were deposited on the SKD-61 substrate by using cathode arc ion plating. After deposition, the films were bombarded with intense electron beam for 10 minutes. The surface hardness was increased up to 4520 HV at electron irradiation energy of 1500 eV. In addition, surface root mean square (RMS) roughness of the films irradiated at 1500 eV shows the lowest roughness of 484 nm in this study.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.30 no.12 s.255
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• pp.1203-1210
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• 2006

The filmwise condensation heat transfer coefficients of R-134a on the horizontal copper and stainless steel tubes were measured and analyzed. The outside diameter of the tubes was 15.88 mm, and the tube thickness ranged from 0.89 to 1.65 mm. The polished stainless steel tube had an RMS surface roughness($R_q$) of 0.37 $\mu$m, and commercial stainless steel tubes had an surface roughness($R_q$) of 1.855 $\mu$m. The tests were conducted at the saturation temperatures of 20 and $30^{\circ}C$, and the liquid wall subcoolings from 0.4 to $2.1^{\circ}C$. The measured condensation heat transfer coefficients were significantly lower than the predicted data by the Nusselt analysis. This trend in the stainless steel tube was explained by the effects of thermal resistance of tube material and surface roughness. Based on the experimental data with respect to wall thickness and surface roughness, it was suggested that the existing correlation on external condensation should be modified by considering material and surface roughness factors. The revised correlation was developed by introducing the effects of wall thickness and surface roughness into the Nusselt equation. The average deviation of the revised correlation was 13.0 %.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 1997.04a
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• pp.832-836
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• 1997

An experimental study on the grinding temperature, surface roughness and Acoustic Emission(AE) signal was conducted with different shapes of wheel. The grinding characteristics by slotted shapes of wheel changed by width and helical angle,were compared with those by general one. Lower grinding temperature was obtained for 30 .deg. helical angel with 10mm width and Root Mean Square(RMS) values of AE signals were lower for slotted shapes rather than general one. Surface roughness characteristic of slotted shapes found to be rough,but the value of roughness for 45 .deg. helical angel with 6mm width, represented to similar tendency general one.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.26 no.3
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• pp.194-197
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• 2013

We investigated the effect of etching time on the surface roughness, and electrical and optical properties of ZnO and 2 wt% Al-doped ZnO (AZO) films. The ZnO and AZO films were deposited on glass substrates by RF magnetron sputtering technique. The etching experiment was carried out using a solution of 5% HCl at room temperature. The surface roughness was characterized by Atomic Force Microscopy. The electrical property was measured by Hall measurement system and 4-point probe. The optical property was characterized by UV-vis spectroscopy. After the wet chemical etching, the surface textures were obtained on the surface of the ZnO and AZO films. With the increase of etching time, the surface roughness (RMS) of the films increased and the transmittance of the films was observed to decrease. For the AZO film, a low resistivity of $1.0{\times}10^{-3}\;{\Omega}{\cdot}cm$ was achieved even after the etching.

• Journal of the Korean Society for Precision Engineering
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• v.12 no.4
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• pp.19-27
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• 1995

Face milling is required to study cutting process with a view of multipoint cutter. This experimental study mainly deals with the single and multi-insert cutting characteristics using coated tool. Because metal cutting of the single and multi-insert has a large relation to the improvement of productivity, the economic cutting process can be achieved by the analysis of proper metal cutting mechanism. Therefore, machining characteristics of face molling in this paper has been studied by investigating the role of different insert number which is concerned with mean cutting force, the RMS values of AE(acoustic emission) signal, tool life and surface roughness in milling SS 41 and SUS 304. The cutting force and AE signal are monitored to make an analysis of cutting process. The surface roughness of the specimens machined by inserts of different numbers is measured at different speeds, feeds and depth of cut. The width of flank wear is also observed.