• Title/Summary/Keyword: RF magnrtron sputtering

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Microstructures of HAp and HAp-Ag Composite Coating Layer Prepared by RS Magnetron Sputtering (RE Magnetron Sputtering에 의해 제조된 HAp와 HAp-Ag복합코팅층의 미세조직)

  • Lee, Hee-Jung;Oh, Ik-Hyun;Park, Sang-Shik;Lee, Byong-Taek
    • Journal of the Korean Ceramic Society
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    • v.41 no.4
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    • pp.328-333
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    • 2004
  • Hydroxyapatite (HAp) and HAp-Ag composite layers were coated on ZrO$_2$and Si wafer substrates by RF magnetron sputtering technique. The thickness of coating layers was in the range of 0.7∼1.0$\mu\textrm{m}$ and its roughness was 3∼4nm. The heat treated HAp coating layers were composed with nano-sized crystallines. However, the HAp-Ag composite layers showed the mixed structure with crystalline and amorphous phases. The Ca/P ratio of the as-received HAp coating layer was 1.9, but, the value was decreased as the Ag content with increased. Also, the Vickers hardness of HAp coating layer decreased as the Ag content increase.