• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집
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• pp.22-25
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• 2002

In this paper, we deposited MgO buffer layer on p-type (100)Si substrate in the condition of substrate temperature 400$^{\circ}C$, working gas ratio Ar:O$_2$=80:20, RF Power 50W, working pressure 10mtorr, and the thickness of the film was about 300${\AA}$. Then we deposited Ba$\sub$0.5/Sr$\sub$0.5/TiO$_3$ thin film using RF Magnetron sputtering method on the MgO/Si substrate in various RF power of 25W, 50W, 75W. The film deposited in 50W showed the best crystalline from the XRD measurement. To know the electrical properties of the film, we manufactured Al/BSTMgO(300${\AA}$)/Si/Al structure capacitor. In the result of I-V measurement, The leakage current density of the capacitor was lower than 10$\^$-7/A/$\textrm{cm}^2$ at the range of ${\pm}$150kV/cm. From C-V characteristics of the capacitor, can calculate the dielectric constant and it was 305. Finally we deposited BST thin film on bare Si substrate and (100)MgO substrate in the same deposition condition. From the comparate of the properties of these samples, we found the properties of BST thin film which deposited on MgO/Si substrate were better than on bare Si substrate and similar to on MgO substrate.

• 한국항공우주학회지
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• 제33권4호
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• pp.41-46
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• 2005

본 연구에서는 고 전력의 RF 신호용 직접 접촉식 스위치에서 문제가 되고 있는 접촉부위에서의 미소용접에 의한 점착 현상을 감소시키기 위해, 고 융점 금속인 텅스텐(W)과 몰리브덴(Mo)을 스위치 접촉 부위에 코팅하여 스위치의 성능을 분석하였다. 스위치의 삽입손실과 신호격리도, 전력 손실 등의 변화를 네트워크 분석기, 전력 측정기 등을 통하여 측정하였다. 측정결과로부터 RF 신호 전송에 있어서 낮은 입력 전력에서는 고융점 금속이 금(Au)보다 접촉저항이 더 크지만 입력 전력이 커지면 비교적 낮은 비저항의 고융점 금속을 사용하는 것이 고전력 전송 및 수명 연장에 있어서 유리함을 밝혀냈다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.354-355
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• 2013

최근 디스플레이 분야에서 amorphous InGaZnO (a-IGZO) thin film transistors (TFTs)는 a-Si:H에 비해 비정질 상태에서도 비교적 높은 이동도를 가지고 다결정 Si 반도체에 비해 저온공정이 가능하고 대면적화가 용이한 장점 때문에 주목받고 있다. 또한 넓은 밴드갭을 가지기 때문에 가시광선 영역에서 투명하여 투명소자에도 응용이 가능하다. 본 연구에서는 RF magnetron sputtering법을 이용하여 RF power의 변화에 따라 IGZO 박막의 positive bias stress (PBS)에 대한 안정성을 조사하였다. 소결된 타겟으로는 In:Ga:ZnO를 각각 2:2:1 mol%의 조성비로 소결하여 이용하였고, 공정 조건은 초기 압력 Torr, 증착 압력 Torr, Ar：O2=18：12 sccm로 고정하였다. 공정 변수로는 130 W, 150 W, 170 W, 200 W로 변화를 주어 실험을 진행하였다. PBS 측정은 gate bias를 10 V로 고정하여 stress 시간을 각각 0, 30, 100, 300, 1,000, 3,000, 7,000초를 적용하였다. 측정 결과 RF power가 증가할수록 문턱전압의 변화량이 증가하는 것을 보였다. 130 W의 경우 4.47 V의 변화량을 보였지만 200 W의 경우는 10.01 V로 증가되어 나타났다. 따라서 RF power을 낮추어 만들어진 소자의 경우 RF power를 높여 만들어진 소자에 비해 PBS에 대한 안정성이 더 높은 결과를 확인하였다.

• 한국전자파학회논문지
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• 제23권11호
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• pp.1239-1247
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• 2012

본 논문에서는 GaN HEMT 소자를 이용한 X-대역 반도체 전력 증폭 장치(SSPA)의 설계 및 제작에 대하여 논의한다. 반도체 전력 증폭 장치는 안정적인 전원을 공급해 주는 전원공급기, 통신과 내부 모듈을 제어하기 위한 제어부, RF 신호를 증폭하기 위한 RF부로 구성된다. 특히, RF부를 구성하는 능동 소자로 TriQuint사의 GaN HEMT Bare 소자를 이용하였다. RF부는 초단, 드라이브 단, 메인 출력 단으로 구성되어 있으며, 각 앰프는 입 출력 정합을 통하여 구현하였다. 제작된 반도체 전력 증폭 장치는 X-대역(500 MHz 대역폭)에서 duty 26 %, 최장 펄스 100 us 조건에서 300 W 이상의 출력을 얻을 수 있었으며, 향후 선박용 레이더 시스템에 적용할 예정이다.

• 한국표면공학회지
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• 제41권5호
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• pp.214-219
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• 2008

Indium tin oxide (ITO) films were deposited on PET substrate by RF superimposed DC magnetron sputtering using ITO (doped with 10 wt% $SnO_2$) target. Substrate temperature was maintained below $750^{\circ}C$ without intentionally substrate heating during the deposition. The discharge voltage of DC power supply was decreased from 280 V to 100 V when superimposed RF power was increased from 0 W to 150 W. The electrical properties of the ITO films were improved with increasing of superimposed RF power. In the result of cyclic bending test, relatively high mechanical property was obtained for the ITO film deposited with RF power of 75 W under DC current of 0.75 A which could be attributed to the decrease of internal stress caused by decrease in both deposition rate and plasma impedance.

• Journal of electromagnetic engineering and science
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• 제3권1호
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• pp.1-6
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• 2003

In this paper, a sub-harmonic dual-gate FET mixer is suggested to improve the isolation characteristic between LO and RF ports of an unbalanced mixer. The mixer was designed by using single-gate FET cascode structure and driven by the second harmonic component of LO signal. A dual-gate FET mixer has good isolation characteristic since RF and LO signals are injected into gatel and gate2, respectively. In addition, the isolation characteristic of a sub-harmonic mixer is better than that of a fundamental mixer due to the large frequency separation between the LO and RF frequencies. As RF power was -30 ㏈m and LO power was 0 ㏈m, the designed mixer yielded the -47.17 ㏈m LO-to-RF leakage power level, 10 ㏈ conversion gain, -2.5 ㏈m OIP3, -12.5 ㏈m IIP3 and -1 ㏈m 1 ㏈ gain compression point. Since the LO-to-RF leakage power level of the designed mixer is as good as that of a double-balanced mixer, the sub-harmonic dual-gate FET mixer can be utilized instead.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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• pp.1123-1126
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• 2003

In this paper, the emission properties of electrodeless fluorescent lamp were discussed using the inductively coupled plasma. To transmit the electromagnetic energy into the chamber, a RF power of 13.56MHz was applied to the antenna and considering the Ar gas pressure and the RF electric power change, the emission spectrum, Ar- I line, luminance were investigated. At this time the input parameter for ICP RF plama, Ar gas pressure and RF power were applied in the range of $10{\sim}60m$ Torr, $10{\sim}300W$ respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.214-215
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• 2008

Zinc-oxide(ZnO) films were deposited on PC(polycarboanate) and PES(polyethersulphone) substrates by using RF(radio-frequency)sputter with various rf sputtering Power at a room temperature. The effects of rf sputtering Power on the structural and optical properties of ZnO films were investigated by using atomic force microscopy, X-ray diffraction, and UV spectrophotometer. The most excellent structural and properties of a ZnO film are obtained in the condition of an rf-power of 150 W. This film shows larger Grain size and lower surface roughness and a higher optical transmittance of over 80 % in the visible range than other films deposited in the different conditions of rf- power. Regardless of substrate types, The presence of a strong diffraction peak indicates that films have a (0 0 2) preferred orientation associated with the hexagonal phase.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제51권4호
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• pp.147-151
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• 2002

The resistances of metal2 contact to metall and poly Si are checked by various RF etch conditions in terms of pre-cleaning. The changes of resistance are evaluated by statistical analysis method(SAS) for the AC bias power, coil power and RF target. The contact area on poly Si is shown by TEM image and the distributions of contact resistance according to ar etch target and RTP are investigated. The RTP groups have larger variations than normal RF etch targets. When the RF etch target becomes lower and coil power becomes higher, the resistances of metal2 contact to metals and poly Si have lower contact resistance. But the condition of AC bias power did not satisfied low meta12 contacts resistance for metall and poly Si simultaneously. The R-square of ststistical analysis was 0.98 for resistances of meta12 contact to poly Si and 0.87 for resistances of meta12 contact to metall.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 하계학술대회 논문집
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• pp.51-54
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• 2000

In this paper, $Ba_{0.5}$Sr$_{0.5}$TiO$_3$ thin films were prepared on Pt/Ti/SiO$_2$/Si substrate by RF magnetron sputtering method. We investigated effect of deposition conditions (especially RF input power) on structural properties of BST thin films. Deposit conditions of BST films were set working gas ratio, Ar:O$_2$= 70 : 30, working pressure 10mTorr, and RF input power 25W, 50W, 75W and 100W. Post-annealing using rapid thermal annealing(RTA) performed at 45$0^{\circ}C$, 55$0^{\circ}C$, $650^{\circ}C$, and 75$0^{\circ}C$ in oxigen ambient for 60 sec, respectively. The structural properties of BST films on Pt/Ti/SiO$_2$/Si substrate analysed by X-ray diffraction(XRD).).).