Etching properties of $Na_{0.5}K_{0.5}NbO_2$ thin film using inductively coupled plasma
(유도결합 플라즈마를 이용한 $Na_{0.5}K_{0.5}NbO_2$ 박막의 식각 특성)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2007.06a
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- pp.116-116
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- 2007