• Journal of the Institute of Electronics Engineers of Korea SD
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• 제41권9호
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• pp.25-30
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• 2004

In this Paper, the 0.1 w InGaAs/InAlAs/GaAs Metamorphic HEMT, which is applicable to MIMIC, and a 100 GHz MIMIC amplifier were designed and fabricated. The DC characteristics of MHEMT are 640 mA/mm of drain current density, 653 mS/mm of maximum transconductance. The current gain cut-off frequency(fT) is 173 GHz and the maximum oscillation frequency(fmax) is 271 GHz. A 100 GHz amplifier was designed using 0.1${\mu}{\textrm}{m}$ MHEMT and CPW technology. The measured results from the 100 GHz MIMIC amplifiers show good S21 gain of 10.1 dB and 12.74 dB at 100 GHz and 97.8 GHz, respectively.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• 제19권1호
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• pp.7-14
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• 2008

In this paper, we propose VATL(Voltage-controlled Artificial Transmission Line) employing periodically loaded diodes for application to on-chip matching components on MMIC. Compared with conventional microstrip line, the VATL showed a much shorter wave length due to periodic capacitance of diodes, and the characteristic impedance of the VATL was easily controlled bγ changing supplied voltage. Concretely, the characteristic impedance of the VATL was changed from $80{\sim}20{\Omega}$ in a range of $0{\sim}1.05V$ and the VATL showed a wavelength of 1.5mm at 20GHz, while conventional microstrip line showed a wavelength of 5.3mm at the same frequency. Using the VATL, a ${\lambda}/4$ impedance transformer was fabricated on GaAs MMIC for application to on-chip matching components on MMIC. Using the ${\lambda}/4$ impedance transformer made it possible to perform impedance matching between RF components with various characteristic impedance of $30{\sim}100{\Omega}$ by adjusting applied Voltage.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• 제21권6호
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• pp.670-680
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• 2010

A low power single-chip CMOS receiver for 60 GHz mobile application are proposed in this paper. The single-chip receiver consists of a 4-stage current re-use LNA with under 4 dB NF, Cgs compensating resistive mixer with -9.4 dB conversion gain, Ka-band low phase noise VCO with -113 dBc/Hz phase noise at 1 MHz offset from 26.89 GHz, high-suppression frequency doubler with -0.45 dB conversion gain, and 2-stage current re-use drive amplifier. The size of the fabricated receiver using a standard 0.13 ${\mu}m$ CMOS technology is 2.67 mm$\times$0.75 mm including probing pads. An RF bandwidth is 6.2 GHz, from 55 to 61.2 GHz and an LO tuning range is 7.14 GHz, from 48.45 GHz to 55.59 GHz. The If bandwidth is 5.25 GHz(4.75~10 GHz) The conversion gain and input P1 dB are -9.5 dB and -12.5 dBm, respectively, at RF frequency of 59 GHz. The proposed single-chip receiver describes very good noise performances and linearity with very low DC power consumption of only 21.9 mW.

• JSTS:Journal of Semiconductor Technology and Science
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• 제15권5호
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• pp.490-496
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• 2015

We have grown AlN/GaN heterostructure which is a promising candidate for mm-wave applications. For the growth of the high quality very thin AlN barrier, indium was introduced as a surfactant at the growth temperature varied from 750 to $1070^{\circ}C$, which results in improving electrical properties of two-dimensional electron gas (2DEG). The heterostructure with barrier thickness of 7 nm grown at of $800^{\circ}C$ exhibited best Hall measurement results; such as sheet resistance of $215{\Omega}/{\Box}$electron mobility of $1430cm^2/V{\cdot}s$, and two-dimensional electron gas (2DEG) density of $2.04{\times}10^{13}/cm^2$. The high electron mobility transistor (HEMT) was fabricated on the grown heterostructure. The device with gate length of $0.2{\mu}m$ exhibited excellent DC and RF performances; such as maximum drain current of 937 mA/mm, maximum transconductance of 269 mS/mm, current gain cut-off frequency of 40 GHz, and maximum oscillation frequency of 80 GHz.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• 제27권8호
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• pp.717-724
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• 2016

This paper presents design of a 40 GHz CMOS PLL frequency synthesizer for a 60 GHz sliding-IF RF transceiver. For stable locking over a wide bandwith for a injection-locked frequency divider, an inductive-peaking technique is employed so that it ensures the PLL can safely lock across the very wide tuning range of the VCO. Also, Injection-locked type LC-buffer with low-phase noise and low-power consumption is added in between the VCO and ILFD so that it can block any undesirable interaction and performance degradation between VCO and ILFD. The PLL is designed in 65 nm CMOS precess. It covers from 37.9 to 45.3 GHz of the output frequency. and its power consumption is 74 mA from 1.2 V power supply.

• Nuclear Engineering and Technology
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• 제55권9호
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• pp.3126-3132
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• 2023

To meet the increasing heating needs of the China Fusion Experimental Tokamak Reactor (CFETR), the output power in each Lower Hybrid Current Drive (LHCD) transmission line should be increased from 250 kW to 500 kW. Therefore, a new high-power water load must be developed for the 4.6 GHz 500 kW LHCD system. This paper aims to report the most recent research progress of the water load: aluminum nitride (AlN) ceramic is used as the media material to isolate the water and vacuum, and the radio frequency (RF) simulation results show that the return loss of the water load is less than -25dB at 4.6 GHz over a wide temperature range. Under 500 kW continuous wave (CW) operation, the maximum temperatures of the ceramic and water are separately 67 ℃ and 62 ℃, resulting in thermal deformation of the ceramic of approximately 0.003 mm. Moreover, the AlN water load was tested on the 4.6 GHz 250 kW high-power test bench and found to work well with low reflected power.

• Journal of the Institute of Electronics and Information Engineers
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• 제50권10호
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• pp.41-49
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• 2013

This paper suggests the dielectric resonator antenna using LTCC process for mm-wave car radar system. In this paper, dielectric resonator antennas (DRA) operated in 76-77 GHz frequency band are designed. And, using the LTCC process, the structures of dielectric resonator with SRR (split ring resonator) inside and those of dielectric resonator with probe inside are suggested. Linear polarization antennas and circular polarization antenna are designed for the DRA with probe inside. Three kinds of the DRA antennas are designed and their characteristics are calculated using CST RF simulation tool. The designed antennas are fabricated and measured and the measured results are compared with calculated results. The measured operating frequencies of DRAs are within 76 GHz to 77 GHz, which are close to the calculated results, and the measured gains are about 8.15 dBi to 10.82 dBi.

• The Journal of Korean Institute of Communications and Information Sciences
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• 제38C권9호
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• pp.813-821
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• 2013

In this paper, a vital signal sensor based on impedance variation of resonator is presented. Proposed vital signal sensor can detect the vital signal, such as respiration and heart-beat signal. System is composed of resonator, oscillator, surface acoustic wave (SAW) filter, and power detector. The cyclical movement of a dielectric such as a human body, causes the impedance variation of resonator within the near-field range. So oscillator's oscillation frequency variation is effected on resonator's resonant frequency. SAW filter's skirt characteristic of frequency response can be transformed a small amount of frequency deviation to a large variation. Aim to enhance the existing sensor detection range, proposed sensor operates in 870 MHz ISM band, and detect respiration and heart-beat signal at distance of 120 mm.

• Proceedings of the Korean Vacuum Society Conference
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• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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• pp.128-128
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• 2000

박막의 탄성 특성을 평가하는 방법으로 nano-indentation, Brillouin light scattering measurement, ultrasonic surface wave measurement, bulge test, vibration membrane method 등 여러 가지가 제시되어 왔다. 이러한 방법들은 필름의 두께가 일정 두께 이상이 되어야 정확한 측정이 가능한 방법으로 매우 얇은 박막에서도 탄성특성을 평가할 수 있는 freehang, bridge 방법이 제시되었으며, 이 방법은 간단한 식각 공정을 통해 매우 얇은 박막에도 적용시킬 수 있다는 장점을 가지고 있다. 본 연구에서는 아주 얇은 박막에서도 탄성특성을 평가할 수 있는 freehang 방법을 이용하여 순수한 Diamond-like carbon (DLC) 필름과 Sidl 첨가된 DLC 필름의 탄성 특성을 평가하고자 한다. 실험에서 사용한 필름은 rf-PACVD 장비를 이용하여 증착하였다. 이때 전극과 플라즈마 사이의 바이어스 음전압은 -400 Vb로 합성압력은 10mTorr로 고정하였다. 사용한 반응 가스는 벤젠(C6H6), 그리고 벤젠과 희석된 실렌(SiH4 : H2 = 10 : 90)이며, 희석된 실렌의 첨가량을 조절하여 필름 내에 일정량의 Si을 함유시켰다. 각각의 조건에서 증착시간을 조절하여 필름의 두께를 변화시켰으며, KOH(5.6mol) 용액을 이용하여 습식 식각을 함으로써 freehang을 제작하였다. 이때 식각액에 의한 DLC 필름의 손상은 관찰되지 않았다. 필름의 잔류 응력을 측정하기 위해 200$\pm$10 혹은 100$\pm$5$\mu\textrm{m}$ 두께의 얇은 (100) Si wafer를 5$\times$50 mm2의 strip 형태로 절단하여 사용하였다. 필름의 압축 잔류 응력에 의해 발생한 필름/기판 복합체의 곡률은 laser 반사법과 $\alpha$-step profiler를 이용하여 측정하였으며, 이 결과를 Brenner 등에 유도된 식을 이용하여 잔류 응력을 계산하였다. 또한 제작된 frddhang은 광학 현미경과 전자주사현미경에 의해 관찰되었다. 이렇게 제작된 freehang을 이용하여 필름이 기판에 부착되기 위해 필요한 변형률을 측정하고, 독립적으로 측정된 필름의 잔류 응력을 박막의 응력-변형률 관계식에 적용하여 biaxial elastic modulus, E/(1-v)를 구할 수 있었다. 측정 결과 필름의 잔류 응력과 biaxial elastic modulus는 필름의 두께가 감소함에 따라 감소하는 경향을 나타냈으며, 같은 두께의 필름인 경우, 식각 깊이에 따른 biaxial elastic modulus 의 변화를 통해 최적의 식각 깊이를 알 수 있었다.

• Proceedings of the Korean Vacuum Society Conference
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.478-478
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• 2012

Recently, there are many researches in order to increase the deposition rate (D/R) and improve film uniformity and quality in the deposition of microcrystalline silicon thin film. These two factors are the most important issues in the fabrication of the thin film solar cell, and for the purpose of that, several process conditions, including the large area electrode (more than 1.1 X 1.3 (m2)), higher pressure (1 ~ 10 (Torr)), and very high frequency regime (VHF, 40 ~ 100 (MHz)), have been needed. But, in the case of large-area capacitively coupled discharges (CCP) driven at frequencies higher than the usual RF (13.56 (MHz)) frequency, the standing wave and skin effects should be the critical problems for obtaining the good plasma uniformity, and the ion damage on the thin film layer due to the high voltage between the substrate and the bulk plasma might cause the defects which degrade the film quality. In this study, we will propose the new concept of the large-area multi-electrode (a new multi-electrode concept for the large-area plasma source), which consists of a series of electrodes and grounds arranged by turns. The experimental results with this new electrode showed the processing performances of high D/R (1 ~ 2 (nm/sec)), controllable crystallinity (~70% and controllable), and good uniformity (less than 10%) at the conditions of the relatively high frequency of 40 MHz in the large-area electrode of 280 X 540 mm2. And, we also observed the SEM images of the deposited thin film at the conditions of peeling, normal microcrystalline, and powder formation, and discussed the mechanisms of the crystal formation and voids generation in the film in order to try the enhancement of the film quality compared to the cases of normal VHF capacitive discharges. Also, we will discuss the relation between the processing parameters (including gap length between electrode and substrate, operating pressure) and the processing results (D/R and crystallinity) with the process condition map for ${\mu}c$-Si:H formation at a fixed input power and gas flow rate. Finally, we will discuss the potential of the multi-electrode of the 3.5G-class large-area plasma processing (650 X 550 (mm2) to the possibility of the expansion of the new electrode concept to 8G class large-area plasma processing and the additional issues in order to improve the process efficiency.