• Title/Summary/Keyword: R2R XRD

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Electrical Properties of the (Ba,Sr)$TiO_3$Thin Films Prepared by Sol-Gel Method (Sol-Gel법으로 제조한 (Ba,Sr)$TiO_3$박막의 전기적 특성)

  • 이영희;이문기;정장호;류기원
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.7
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    • pp.592-597
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    • 2000
  • In this study (B $a_{0.5}$/S $r_{0.5}$)Ti $O_3$[BST(50/50)] ceramic thin films were prepared by the Sol-Gel method BST(50/50) stock solution was made and spin-coated on the Indium Tin Oxide(ITO)/glass substrate at 4000 rpm for 30 seconds. The coated films were dried at 35$0^{\circ}C$ for 10 minutes and annealed at 650~75$0^{\circ}C$ for 1 hour. The microstructural properties of the BST(50/50) thin film were studied by the XRD and AFM. The ferroelectric perovskite phase was formed at the annealing condition of 75$0^{\circ}C$ for 1 hour. Dielectric constant and loss of this thin were 370, 3.7% at room temperature respectively. The polarization switching voltage showed the good value of 3V. The leakage current density of the BST(50/50) thin film was 10$^{-7A}$c $m^2$with applied voltage of 1.5V. BST(50/50) thin film capacitors having good dielectric and electrical properties are expecting for the application to the dielectric material of DRAM.RAM.M.

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Ferroelectric properties of $Bi_{3.25}La_{0.75}Ti_3O_{12}/LaNiO_3$ thin films prepared by metalorganic decomposition method (MOD법으로 제작한 $Bi_{3.25}La_{0.75}Ti_3O_{12}/LaNiO_3$ 박막의 강유전 특성에 관한 연구)

  • Kim, Kyoung-Tae;Kim, Chang-Il;Kim, Tae-Hyung;Lee, Cheol-In
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.352-355
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    • 2003
  • [ $Bi_{3.25}La_{0.75}Ti_3O_{12}$ ] (BLT) thin films were prepared by using metal organic decomposition method onto the LaNiO3 (LNO) bottom electrode. Both the structure and morphology of the films were analyzed by x-ray diffraction (XRD) and atomic force microscope (AFM). Even at low temperatures ranging from 450 to $650^{\circ}C$, the BLT thin films were successfully deposited on LNO bottom electrode and exhibited (117) orientation. The BLT thin films annealed as low as $600^{\circ}C$ showed excellent ferroelectricity, higher remanent polarization and no significant degradation of switching charge at least up to $5{\times}10^9$ switching cycles at a frequency of 100 kHz and 5 V. For the annealing temperature of $600^{\circ}C$, the remanent polarization $P_r$ and coercive field were $23.5\;{\mu}C/cm^2$ and 120 kV/cm, respectively.

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Synthesis of WC-CrN superlattice film by cathodic arc ion plating system

  • Lee, Ho. Y.;Han, Jeon. G.;Yang, Se. H.
    • Journal of Surface Science and Engineering
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    • v.34 no.5
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    • pp.421-428
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    • 2001
  • New WC-CrN superlattice film was deposited on Si substrate (500$\mu\textrm{m}$) using cathodic arc ion plating system. The microstructure and mechanical properties of the film depend on the superlattice period (λ). In the X-ray diffraction analysis (XRD), preferred orientation of microstructure was changed according to various superlattice periods(λ). During the Transmission Electron Microscope analysis (TEM), microstructure and superlattice period (λ) of the WC - CrN superlattice film was confirmed. Hardness and adhesion of the deposited film was evaluated by nanoindentation test and scratch test, respectively. As a result of nanoindentation test, the hardness of WC - CrN superlattice film was gained about 40GPa at superlattice period (λ) with 7nm. Also residual stress with various superlattice period (λ) was measured on Si wafer (100$\mu\textrm{m}$) by conventional beam-bending technique. The residual stress of the film was reduced to a value of 0.2 GPa by introducing Ti - WC buffer layers periodically with a thickness ratio ($t_{buffer}$/$t_{buffer+superlattice}$ ). To the end, for the evaluation of oxidation resistance at the elevated temperature, CrN single layer and WC - CrN superlattice films with various superlattice periods on SKD61 substrate was measured and compared with the oxidation resistance.

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The Efficiency of Fe Removal for Pyrophyllite by Ammonia Leaching Solution, and Their Dissolution Kinetics (암모니아 용출용액을 이용한 저 품위 엽납석으로부터 Fe 제거 효율과 용해 동역학)

  • Kim, Bong-Ju;Cho, Kang-Hee;Choi, Nag-Choul;Park, Cheon-Young
    • Journal of the Mineralogical Society of Korea
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    • v.27 no.1
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    • pp.53-62
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    • 2014
  • In order to remove Fe impurity from low-grade pyrophyllite ore, the effect of certain variables such as particle size, concentration of sulfuric acid, amount of ammonium sulfate, added hydrogen peroxide, and temperature were studied. The euhedral cubic pyrites were observed in the low-grade pyrophyllite ore by reflected light microscopy, and quartz and dickite were identified in the sample by XRD analysis. The results of the Fe removal experiments showed that the best Fe removal parameters were when the particle size was at -325 mesh, the addition of $H_2SO_4$, $(NH_4)_2SO_4$ and $H_2O_2$ was at a 2.0 M, 10.0 g/l, and 3.0 M concentration, respectively, and at a $70^{\circ}C$ leaching temperature. In the dissolution kinetics analysis, the dissolution of Fe from the pyrite surface was a controlled chemical reaction, and the Fe dissolution reaction was proportioned to 0.066/R, $[H_2SO_4]^{1.156}$, $[(NH_4)_2SO_4]^{0.745}$, $[H_2O_2]^{0.428}$.

Microwave Dielectric Properties of (Pb,Ca)[(Fe,Nb)Sn]$O_3$ with CuO-$Bi_{2}O_{3}$Additives (CuO-$Bi_{2}O_{3}$첨가에 의한 (Pb,Ca)[(Fe,Nb)Sn]$O_3$세라믹스의 마이크로파 유전 특성)

  • 하종윤;최지원;윤석진;윤기현;김현재
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.11a
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    • pp.563-566
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    • 2000
  • The effect of CuO and CuO-B $i_2$ $O_3$ additives on microwave dielectric properties of (P $b_{0.45}$C $a_{0.55}$)[F $e_{0.5}$N $b_{0.5}$)$_{0.9}$S $n_{0.1}$] $O_3$were investigated to decrease the sintering temperature for usage of Low Temperature Co-firing Ceramics (LTCC). The (P $b_{0.45}$C $a_{0.55}$)[F $e_{0.5}$N $b_{0.5}$)$_{0.9}$S $n_{0.1}$] $O_3$ceramics was sintered at 11$65^{\circ}C$. In order to decrease the sintering temperature, CuO and Cuo-B $i_2$ $O_3$ were added in the (Pb,Ca)[(Fe,Nb)Sn] $O_3$ with CuO-B $i_2$ $O_3$. For the addition of 0.4 wt.% CuO, the sintered density and the dielectric constant of the ceramics were revealed the maximum values of the 6.06g/c $m^2$ and 83 respectively and temperature coefficient of resonance frequency ($\tau$$_{f}$) shifted to the positive value. As increasing B $i_2$ $O_3$to the (Pb,Ca)[(Fe,Nb)Sn] $O_3$ with CuO-B $i_2$ $O_3$with 0.2 wt.% CuO, the sintered density, the $\varepsilon$$_{r}$ and the Q was decreased, and $\tau$$_{f}$ was minimized at 0.2 wt.% CuO, and 0.2 wt.% B $i_2$ $O_3$. For this composition, dielectric properties were $\varepsilon$$_{r}$ of 81, Q. $f_{0}$ of 4400 GHz, and $\tau$$_{f}$ of 5 ppm/$^{\circ}C$ at sintering temperature of 100$0^{\circ}C$. the relationship between the microstructure and properties of ceramics was studied by X-ray diffraction(XRD), scanning electron microscopy(SEM).copy(SEM).oscopy(SEM).copy(SEM).EM).

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Growth and Optical Properties of SnSe/BaF2 Single-Crystal Epilayers (SnSe/BaF2 단결정 박막의 성장과 광학적 특성)

  • Lee, II Hoon;Doo, Ha Young
    • Journal of Korean Ophthalmic Optics Society
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    • v.7 no.2
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    • pp.209-215
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    • 2002
  • This study investigated the crystal growth, crystalline structure and the basic optical properties of $SnSe/BaF_2$ epilayers. The SnSe epilayer was grown on $BaF_2$(111) insulating substrates using a hot wall epitaxy(HWE) technique. It was found from the analysis of X-ray diffraction patterns that $SnSe/BaF_2$ epilayer was growing to single crystal with orthorhombic structure oriented [111] along the growth direction. Using Rutherford back scattering(RBS), the atomic ratios of the SnSe was found to be stoichiometric, almost 50 : 50. The best values for the full width at half maximum (FWHM) of the DCXRD was 163 arcsec for SnSe epilarer. The epilayer-thickness dependence of the FWHM of the DCXRD shows that the quality of the $SnSe/BaF_2$ is as expected. The dielectric function ${\varepsilon}$(E) of a semiconductor is closely related to its electronic energy band structure and such relation can be drawn from features around the critical points in the optical spectra. The real and imaginary parts(${\varepsilon}_1$ and ${\varepsilon}_2$) of the dielectric function ${\varepsilon}$ of SnSe were measured. These data are analyzed using a theoretical model known as the model dielectric function(MDF). The optical constants related to dielectric function such as the complex refractive index(n*-n+ik), absorption coefficient (${\alpha}$) and normal- incidence reflectivity (R) are also presented for $SnSe/BaF_2$.

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Properties of Pb(Zr, Ti)$\textrm{O}_3$ Ferroelectric Thin Films on MgO/Si Substrate by RF Sputtering (RF 스퍼터링에 의해 MgO/Si 기판위에 증착된 Pb(Zr, Ti)$\textrm{O}_3$ 강유전체 박막의 특성연구)

  • Jang, Ho-Jeong;Seo, Gwang-Jong;Jang, Ji-Geun
    • Korean Journal of Materials Research
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    • v.8 no.12
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    • pp.1170-1175
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    • 1998
  • PZT films without lower electrode were deposited on the highly doped Si(100) substrate with MgO buffer layer (Mgo/si) by RF magnetron sputtering method followed by the rapid thermal annealing at $650^{\circ}C$ . We investigated the dependences of the crystalline and electrical properties on the MgO thickness and the RTA post annealing. The PZT films on bare Si (without MgO) showed pyrochlore crystal structure while those on MgO(50 )/Si substrates showed the typical perovskite crystal structures. From SEM and AES analysis, the thickness of PZT films was about 7000 showing relatively smooth interface. The depth profiles indicated that atomic species were distributed homogeneously in the PZT/MgO/Si substrate. The dielectric constant($\varepsilon_{r}$ ) and remanent polarization(2Pr) were about 300 and $14\mu$C/$\textrm{cm}^2$;, respectively. The leakage current was about $3.2\mu$/A$\textrm{cm}^2$.

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Studies on Photocatalytic Thin Films($TiO_2$, TiO-N) Manufactured by DC Magnetron Sputtering Method and it's Characteristics for Removal of Pollutants (DC 마그네트론 스퍼터링법을 이용한 광촉매박막($TiO_2$, TiO-N)제조 및 오염물질 제거에 관한 연구)

  • Jeong, Weon-Sang;Park, Sang-Weon
    • Journal of Korean Society of Environmental Engineers
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    • v.27 no.1
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    • pp.59-66
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    • 2005
  • [ $TiO_2$ ] was deposited by DC magnetron sputtering on glass surface under various sputtering parameters such as discharge power($0.6{\sim}5.2\;kW$, substrate temperature($R.T{\sim}350^{\circ}C$), Ar and $O_2$ flow ratio with $0{\sim}50\;sccm$($Ar+O_2$ 90 sccm) and about 1 mtorr of pressure. TiO-N thin film was prepared under same sputtering conditions for $TiO_2$ thin film except flow ratio($Ar+O_2+N_2$ 90 sccm). The sheet resistance of thin films deposited under these parameters was measured to analyze electronic characteristic and thin film's thickness(${\alpha}$-step), surface roughness(AFM) and formation construction(FE-SEM, XRD) were also measured to draw optimal sputtering parameters. In order to evaluate photo-activity of thin film($TiO_2$, TiO-N) made in optimal parameters for removal of pollutants, toluene among VOCs and Suncion Yellow among reactive dyes were chosen to probe organic compounds for photo-degradation. It was shown that the photo-catalytic thin films had a significant photo-activation for the chosen contaminants and especially TiO-N thin film showed maximum efficiency of 33% for toluene(5 ppm) removal in visible-light range.

Dielectric Properties of (Ba0.7Sr0.3-3x/2Lax)(Ti0.9Zr0.1)O3 Ceramics with La3+ Substitution for Sr2+-Site ((Ba0.7Sr0.3-3x/2Lax)(Ti0.9Zr0.1)O3 세라믹의 Sr2+-자리에 대한 La3+ 치환에 따른 유전 특성)

  • Si Hyun Kim;Ju Hye Kim;Eung Soo Kim
    • Korean Journal of Materials Research
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    • v.33 no.11
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    • pp.465-474
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    • 2023
  • The effects of La3+ substitution for Sr2+-site on the crystal structure and the dielectric properties of (Ba0.7Sr0.3-3x/2Lax) (Ti0.9Zr0.1)O3 (BSLTZ) (0.005 ≤ x ≤ 0.02) ceramics were investigated. The structural characteristics of the BSLTZ ceramics were quantitatively evaluated using the Rietveld refinement method from X-ray diffraction (XRD) data. For the specimens sintered at 1,550 ℃ for 6 h, a single phase with a perovskite structure and homogeneous microstructure were observed for the entire range of compositions. With increasing La3+ substitution (x), the unit cell volume decreased because the ionic size of La3+ (1.36 Å) ions is smaller than that of Sr2+ (1.44 Å) ions. With increasing La3+ substitution (x), the tetragonal phase fraction increased due to the A-site cation size mismatch effect. Dielectric constant (εr) increased with the La3+ substitution (x) due to the increase in tetragonality (c/a) and the average B-site bond valence of the ABO3 perovskite. The BSLTZ ceramics showed a higher dielectric loss due to the smaller grain size than that of (Ba0.7Sr0.3)(Ti0.9Zr0.1)O3 ceramics. BSLTZ (x = 0.02) ceramics met the X7R specification proposed by the Electronic Industries Association (EIA).

Evaluation of Visible-light activation of Cu2O-TiO2 (P-N type) Semiconductor Nanomaterials prepared by Ultrasonic-assisted Synthesis (초음파 합성 적용 Cu2O-TiO2 (P-N 타입) 반도체 나노물질의 가시광 활성 평가)

  • Shin, Seung-ho;Choi, Jeong-Hak;Kim, Ji-hoon;Lee, Joon Yeob
    • Journal of Environmental Science International
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    • v.28 no.11
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    • pp.971-981
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    • 2019
  • This study evaluated the photocatalytic oxidation efficiency of volatile organic compounds by $Cu_2O-TiO_2$ under visible-light irradiation. $Cu_2O-TiO_2$ was synthesized by an ultrasonic-assisted method. The XRD result indicated successful p-n type photocatalysts. However, no diffraction peaks belonging to $TiO_2$ were observed for the $Cu_2O-TiO_2$. The Uv-vis spectra result revealed that the synthesized $Cu_2O-TiO_2$ can be activated under visible-light irradiation. The FE-TEM/EDS result showed the formation of synthesized nanocomposites in the commercial P25 $TiO_2$, the undoped $TiO_2$, and $Cu_2O-TiO_2$ and componential analysis in the undoped $TiO_2$ and $Cu_2O-TiO_2$. The photocatalytic oxidation efficiencies of benzene, toluene, ethylbenzene, and o-xylene with $Cu_2O-TiO_2$ were higher than those of P25 $TiO_2$ and undoped $TiO_2$. These results indicate that the prepared $Cu_2O-TiO_2$ photocatalyst can be applied effectively to control gaseous BTEX.