• Electronics and Telecommunications Trends
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• v.30 no.1
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• pp.154-161
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• 2015

본고에서는 Q-mark 모델의 R&D(Research & Development) 품질 영향 분석을 기술한다. 이를 위해 Q-mark 모델 특징과 종류 그리고 절차를 간략히 기술하고, R&D 품질에 대한 Q-mark 인증 모델 영향에 대해 연구현장 설문조사 내용을 바탕으로 연구결과 완성도 측면, 대외 신뢰도 개선을 통한 과제 수주 측면, 기술 이전과 사업화 측면, 그리고 과제관리 효율화 측면 등에서 분석하여 제시한다. 또 앞으로 Q-mark 모델이 보다 객관적이고 효과적인 R&D 품질관리를 위한 인증 모델로 개선되고 지속적으로 운영되기 위해 보완되어야 할 사항에 대해 설문조사 결과를 바탕으로 인증 측면, 프로세스 범주 측면, 제공 템플릿 측면, 그리고 품질 지원 서비스 및 전문성 측면에서 기술한다.

• Journal of the Korea Institute of Military Science and Technology
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• v.25 no.2
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• pp.160-168
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• 2022

The new IFF mode, Mode-5 replacing Mode-4, has already been established by the US DoD for its allies and NATO forces. A IFF retrofit program for replacing the Mark XII Mode-4 with Mark XIIA Mode-5 is in progress in order to overcome the security limitations of the former in R.O.K. IFF certification test for the new mode, Mode-5, has been performed on medium range surface to air missile platform of the Korean armed forces for the first time in R.O.K and this is regarded as a monumental event in Korean defense industry. The present paper is a discussion on the procedures applied to the IFF system retrofit and integration, lessons learned from AIMS test with the US AIMS PO as observer. The minimum modification from the existing Mark XII Mode-4 to Mark XIIA Mode-5 and evolutional adaption from previous design including interoperability are required for the system retrofit. Letter of Certification was received from the US AIMS PO after the tests. The authors propose that the lessons learned and know-how acquired during the tests are managed by the R.O.K Government as the standard structure of a database. It is expected that the use of the database will reduce the developmental difficulties and risk, also increase efficiency in future developments and other projects.

• Proceedings of the KSME Conference
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• 2001.06d
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• pp.589-595
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• 2001

The present study conducted heat transfer analysis in multi-layer of CD-R. It is necessary to analyze heat transfer during the recording process to find optimum power and write strategy in CD-R. This study investigated effects of several parameters such as recording speed, laser power, layer thickness and thermal property. The calculated results presented temperature distribution in the multi-layer and detailed information of recording characteristics. Optimum laser power was estimated, comparing an optimum mark length with the calculated mark lengths. The results showed that the optimum laser power was influenced significantly by the layer thickness and the thermal properties of the dye.

• Journal of Technologic Dentistry
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• v.33 no.3
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• pp.203-210
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• 2011

Purpose: The purpose of this study was to compare color correspondence of different sizes of Vita Mark II$^{(R)}$ and TriLuxe$^{(R)}$ Feldspar blocks. Methods: The three commercially available shades(1M2, 2M2, 3M2) of Mark II & TriLuxe blocks for the CEREC$^{(R)}$ CAD/CAM system were examined. For each of three colors, three different sizes were tested, 5 blocks each. The measurements were made using a spectrophotometer equipped with an integrating sphere using the CIE $L^*$, $a^*$, $b^*$ colorimetric system. Results: The $L^*$, $a^*$, $b^*$ value of Vita Mark II$^{(R)}$ ceramic block showed significantly higher than TriLuxe$^{(R)}$ ceramic block(p<0.05). In comparing the Vita Mark II$^{(R)}$ specimen of the three different shade, color differences between materials(${\Delta}E^*$) showed the lowest value of 2.09, and the highest was 2.24. ${\Delta}E^*$ values of the materials of Vita Mark II$^{(R)}$ were higher than 2. As the size of ceramic block differed, the color correspondence of Vita Mark II$^{(R)}$ showed statistically significant difference but, this result is clinically acceptable. Conclusion: All the different sizes of the different shades of Vita TriLuxe$^{(R)}$ blocks for the CEREC$^{(R)}$ system showed the high degree of color correspondence necessary in industrially prefabricated CAD/CAM blocks. The results of the present study suggested that it would be necessary to establish the reproducible and constant color specification system for an esthetic restoration.

• The Journal of Advanced Prosthodontics
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• v.4 no.1
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• pp.7-12
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• 2012

PURPOSE. Articulation paper mark size is widely accepted as an indicator of forceful tooth contacts. However, mark size is indicative of contact location and surface area only, and does not quantify occlusal force. The purpose of this study is to determine if a relationship exists between the size of paper marks and the percentage of force applied to the same tooth. MATERIALS AND METHODS. Thirty dentate female subjects intercuspated into articulation paper strips to mark occlusal contacts on their maxillary posterior teeth, followed by taking photographs. Then each subject made a multi-bite digital occlusal force percentage recording. The surface area of the largest and darkest articulation paper mark (n = 240 marks) in each quadrant (n = 60 quadrants) was calculated in photographic pixels, and compared with the force percentage present on the same tooth. RESULTS. Regression analysis shows a bi-variant fit of force % on tooth (P<.05). The correlation coefficient between the mark area and the percentage of force indicated a low positive correlation. The coefficient of determination showed a low causative relationship between mark area and force ($r^2$ = 0.067). The largest paper mark in each quadrant was matched with the most forceful tooth in that same quadrant only 38.3% of time. Only 6 2/3% of mark surface area could be explained by applied occlusal force, while most of the mark area results from other factors unrelated to the applied occlusal force. CONCLUSION. The findings of this study indicate that size of articulation paper mark is an unreliable indicator of applied occlusal force, to guide treatment occlusal adjustments.

• 대한생식의학회:학술대회논문집
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• 2006.06a
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• pp.76-77
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• 2006

• The Journal of the Korea Contents Association
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• v.16 no.9
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• pp.443-450
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• 2016

Korean biopharmaceutical industry is a high value-added industries of the country as a key business strategy of the country. The overseas market is accelerating rapidly due to drug demand according to population aging, new drug R&D investment performance visualization, changes in biopharmaceutical R&D center, strategic foreign technology exports, and the active support of government. Therefore, the domestic pharmaceutical companies also should enhance the competitiveness as global pharmaceutical companies and need to build the image of their own company that can be trusted by consumers. This study compared and analyzed visual characteristics shown in the CI symbol mark and age-specific preferences of domestic pharmaceutical companies recognizing the importance of CI as a marketing tool. As a result, preference for the symbol mark had been shown to be significantly higher preference of the old logotype as the age group is higher being proportional to awareness. In addition, the picture-type symbol mark was totally preferred rather than the word mark. Among the picture-type symbol mark, the form of the nature was strongly preferred rather than abstract form. The company also requires a sense of responsibility for recognizing changes in the mass to the globalization. It is hoped that this study will help to develop symbol mark direction as the basis for the identity strategies to improve the image of domestic pharmaceutical companies with global competitiveness.

• Journal of the Semiconductor & Display Technology
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• v.22 no.4
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• pp.108-112
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• 2023

Precision manufacturing technology is rapidly developing due to the extreme miniaturization of semiconductor processes to comply with Moore's Law. Accurate and precise alignment, which is one of the key elements of the semiconductor pre-process and post-process, is very important in the semiconductor process. The center detection of wafer align marks plays a key role in improving yield by reducing defects and research on accurate detection methods for this is necessary. Methods for accurate alignment using traditional image sensors can cause problems due to changes in image brightness and noise. To solve this problem, engineers must go directly into the line and perform maintenance work. This paper emphasizes that the development of AI technology can provide innovative solutions in the semiconductor process as high-resolution image and image processing technology also develops. This study proposes a new wafer center detection method through variable thresholding. And this study introduces a method for detecting the center that is less sensitive to the brightness of LEDs by utilizing a high-performance object detection model such as YOLOv8 without relying on existing algorithms. Through this, we aim to enable precise wafer focus detection using artificial intelligence.

• Proceedings of the Safety Management and Science Conference
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• 2008.11a
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• pp.611-622
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• 2008

It is hot issue to get the competitiveness of product through reliability-growth as well as availability and safety in almost high-technology industry including military, chemistry, nuclear, telecommunication, transportation service and so on. In advanced countries, worldwide leading companies have tried to improve and develop high-reliability product as well as reliability management system(IEC60300). We investigate reliability certification systems for product and management system. Additionally, we study the feasibility on the adoption of dependability management system(IEC60300) by empirical survey on companies with product-reliability certification(R-mark) in Korea.

• The Microorganisms and Industry
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• v.33 no.3
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• pp.4-7
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• 2007