• Title/Summary/Keyword: Quaternary nitride

Search Result 4, Processing Time 0.021 seconds

Microstructural and Mechanical Characterization of Nanocomposite Ti-Al-Si-N Films Prepared by a Hybrid Deposition System (하이브리드 증착 시스템에 의해 합성된 나노복합체 Ti-Al-Si-N 박막의 미세구조와 기계적 특성)

  • 박인욱;최성룡;김광호
    • Journal of the Korean institute of surface engineering
    • /
    • v.36 no.2
    • /
    • pp.109-115
    • /
    • 2003

  • Quaternary Ti-Al-Si-N films were deposited on WC-Co substrates by a hybrid deposition system of arc ion plating (AIP) method for Ti-Al source and DC magnetron sputtering technique for Si incorporation. The synthesized Ti-Al-Si-N films were revealed to be composites of solid-solution (Ti, Al, Si)N crystallites and amorphous Si3N4 by instrumental analyses. The Si addition in Ti-Al-N films affected the refinement and uniform distribution of crystallites by percolation phenomenon of amorphous silicon nitride, similarly to Si effect in TiN film. As the Si content increased up to about 9 at.%, the hardness of Ti-Al-N film steeply increased from 30 GPa to about 50 GPa. The highest microhardness value (~50 GPa) was obtained from the Ti-Al-Si-N film haying the Si content of 9 at.%, the microstructure of which was characterized by a nanocomposite of nc-(Ti,Al,Si) N/a$-Si_3$$N_4$.

  • PDF KSCI

Effects of Amorphous Si3N4 Phase on the Mechanical Properties of Ti-Al-Si-N Nanocomposite Films Prepared by a Hybrid Deposition System (하이브리드 증착 시스템에 의해 합성된 나노복합체 Ti-Al-Si-N 박막 내 존재하는 Si3N4 비정질상이 기계적 특성에 미치는 영향)

  • An, Eun-Sol;Jang, Jae-Ho;Park, In-Uk;Jeong, U-Chang;Kim, Gwang-Ho;Park, Yong-Ho
    • Proceedings of the Korean Institute of Surface Engineering Conference
    • /
    • 2014.11a
    • /
    • pp.304-304
    • /
    • 2014

  • Quaternary Ti-Al-Si-N films were deposited on WC-Co substrates by a hybrid deposition system of arc ion plating (AIP) method for Ti-Al source and DC magnetron sputtering technique for Si incorporation. The synthesized Ti-Al-Si-N films were revealed to be composites of solid-solution (Ti,Al)N crystallites and amorphous $Si_3N_4$ by instrumental analyses. The Si addition in Ti-Al-N films affected the refinement and uniform distribution of crystallites by percolation phenomenon of amorphous silicon nitride, similarly to Si effect in TiN film. As the Si content increased up to about 9 at.%, the hardness of Ti-Al-N film steeply increased from 30 GPa to about 50 GPa. The highest microhardness value (~50 GPa) was obtained from the Ti-Al-Si-N film having the Si content of 9 at.%, the microstructure of which was characterized by a nanocomposite of $nc-(Ti,Al)N/a-Si_3N_4$.

  • PDF