• 한국자기학회:학술대회 개요집
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• 한국자기학회 1999년도 추계연구발표회 논문개요집
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• pp.68-69
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• 1999

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제52권6호
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• pp.231-234
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• 2003

ZnO thin films on (100) p-type silicon substrates have been deposited by pulsed laser deposition(PLD) technique using an Nd:YAG laser with a wavelength of 266nm. The influence of the deposition parameters, such as oxygen pressure, substrate temperature and laser energy density variation on the properties of the grown film, was studied. The experiments were performed for oxygen gas flow rate of 100~700 sccm and substrate temperatures in the range of 200~$500^{\circ}C$. We investigated the structural and morphological properties of ZnO thin films using X-ray diffraction(XRD), scanning electron microscopy(SEM) and atomic force microscopy(AFM).

• 대한의용생체공학회:학술대회논문집
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• 대한의용생체공학회 1997년도 추계학술대회
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• pp.375-379
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• 1997

Pulsed Er:YAG and $CO_2$ lasers induced temperature rise of tissue are studied using axisymmetric, two-dimensional, and transient Pennes' bio-heat equation or the implications of skin resurfacing. Model results indicate that Er:YAG laser induced temperature has much higher but more shallow distribution in tissue than that of the $CO_2$ laser because of its higher absorption coefficient. The increase of repetition rate does not affect the temperature rise too much because these laser modalities have much shorter heat diffusion time than the temporal length of each off-pulse. This model works as a tool to understand the photothermal effect in the laser-tissue interaction.

• KIEE International Transactions on Electrophysics and Applications
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• 제3C권6호
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• pp.241-245
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• 2003

ZnO thin films on (l00) p-type Si and sapphire substrates have been deposited by a pulsed laser deposition technique using an Nd:YAG laser with a wavelength of 266 nm. The influence of the deposition parameters such as oxygen pressure, substrate temperature and laser energy density on the properties of the grown films was studied. The experiments were performed for substrate temperatures in the range of 200∼50$0^{\circ}C$ and oxygen pressure in the range of 100∼700 sccm. All of the films grown in this experiment show strong c-axis orientation with (002) textured ZnO peak. With increasing substrate temperature, the FWHM (full width at half maximum) and surface roughness were decreased. In the case of using sapphire substrate, the intensity of PL spectra increased with increasing ambient oxygen flow rate. We investigated the structural and morphological properties of ZnO thin films using X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM).

• 한국진공학회지
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• 제17권5호
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• pp.455-460
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• 2008

최근까지 유기박막의 제조에 있어서 진공 증착 혹은 스핀코팅법의 대체방법으로 펄스 레이져 증착법 (PLD: Pulsed laser deposition)에 많은 관심이 되고 있는 실정이다. 본 논문에서는 유기발광소자(OLED)의 제작을 위해 $Alq_3$(aluminato-tris-8-hydroxyquinolate)와 TPD의 유기물을 질소($N_2$)분위기 상태에서 KrF($\lambda$=278 nm) 엑시머 레이저를 이용한 PLD법으로 증착하였고, 증착공정변화에 따른 증착된 박막의 분자 및 광학적 특성의 효과를 PL과 FT-IR등을 이용하여 평가하였다.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제49권9호
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• pp.541-545
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• 2000

We propose a pulsed $CO_2$laser below 30W by the AC(60Hz) switching control of leakage transformer primary which has some advantages of cost and size compared to a typical pulsed power supply. Pulse repetition rate is adjusted from 5 Hz to 60 to Hz control laser output. In this laser a low voltage open loop control for high voltage pulse discharge circuit is employed to aviod the Hv sampling or switching and high voltage leakage transformer is used to convert low voltage pulse rectified from AC to high voltage one. A ZCS(Zero Crossing Switch) circuit and a PIC(programble one-chip microprocessor are used to control gate signal of SCR precisely. The pulse repetition rate is limited by 60Hz due to the frequency of AC line and a high leadkage inductance. The maximum laser output was about 23 W at pulse repetition rate of 60Hz total gas mixture of $CO_2$ : $N_2$ : He=1: 9: 15 and total pressure of 18 Torr

• 한국재료학회:학술대회논문집
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• 한국재료학회 2009년도 추계학술발표대회
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• pp.6.2-6.2
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• 2009

Nanostructured materials arecurrently receiving much attention because of their unique structural andphysical properties. Research has been stimulated by the envisagedapplications for this new class of materials in electronics, optics, catalysisand magnetic storage since the properties derived from nanometer-scalematerials are not present in either isolated molecules or micrometer-scalesolids. This study presents the experimental results derived fromthe various functional materials processed in nano-scale using pulsed laserablation, since those materials exhibit new physical phenomena caused by thereduction dimensionality. This presentation consists of three mainparts to consider in pulsed laser ablation (PLA) technique; first nanocrystallinefilms, second, nanocolloidal particles in liquid, and third, nanocoating fororganic/inorganic hybridization. Firstly, nanocrystalline films weresynthesized by pulsed laser deposition at various Ar gas pressures withoutsubstrate heating and/or post annealing treatments. From the controlof processng parameters, nanocystalline films of complex oxides and non-oxidematerials have been successfully fabricated. The excellentcapability of pulsed laser ablation for reactive deposition and its ability totransfer the original stoichiometry of the bulk target to the deposited filmsmakes it suitable for the fabrication of various functionalmaterials. Then, pulsed laser ablation in liquid has attracted muchattention as a new technique to prepare nanocolloidal particles. Inthis work, we represent a novel synthetic approach to directly producehighly-dispersed fluorescent colloidal nanoparticles using the PLA from ceramicbulk target in liquid phase without any surfactant. Furthermore, novel methodbased on simultaneous motion tracking of several individual nanoparticles isproposed for the convenient determination of nanoparticle sizedistributions. Finally, we report that the GaAs nanocrystals issynthesized successfully on the surface of PMMA (polymethylmethacrylate)microspheres by modified PLD technique using a particle fluidizationunit. The characteristics of the laser deposited GaAs nanocrytalswere then investigated. It should be noted that this is the first successfultrial to apply the PLD process nanocrystals on spherical polymermatrices. The present process is found to be a promising method fororganic/inorganic hybridization.

• Journal of Welding and Joining
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• 제14권5호
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• pp.59-68
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• 1996

This study was aimed to characterize the laser cutting process for the cold rolled stainless steel sheet. The principal process parameters of the cutting process were applied to both the continuous wave form and the pulsed wave form for the laser output mode. The laser-oxygen cutting process and the laser-nitrogen cutting process were also considered to characterize the quality and efficiency of the cutting process. The laser-oxygen cutting process revealed the better productivity than the laser-nitrogen cutting process, since the laser energy and the exothermic oxidation energy exerted on the laser-oxygen cutting process simultaneously during the entire cutting process. However, the straightness of the cutting section, which was considered as the most important factors, was inferior to that of the laser-nitrogen cutting process due to the formation of chromum oxide on the cutting surface. Frequency and duration of the pulsed wave form act as the main factors for the better quality, When the frequency increased from 100 Hz to 200 Hz and the duty increased from 20% to 40%, the quality factors such as the height of dross and the surface roughness were improved remarkably. The increase in the frequency from 200 Hz to 300 Hz, on the other hand, revealed the less effective in the cutting quality.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 하계학술대회 논문집
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• pp.362-364
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• 2001

The pulsed laser deposition(PLD) technology was used for the deposition of phosphor substance, Gd$_2$O$_3$on commercial glass. An Nd:YAG laser was employed for the deposition (wavelength 266nm, energy up to 100mJ/pu1se, pulse duration is 5ns and repetition rate 10 Hz). With respect to films grown by conventional PLD, this study exhibited the condition at normal temperature. Experiments were done without any reactive gas at a pressure of 10$^{-5}$ ~10$^{-6}$ Torr using second harmonic(λ=532 nm) and fourth harmonic(λ=266 nm) Nd:YAG laser. Analyses of the deposited material grown are performed by EDX, AFM, SEM, PL meseurements.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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• pp.1030-1033
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• 2002

ZnO thin films on (100)p-type silicon substrates have been deposited by pulsed laser deposition(PLD) technique using an Nd:YGA laser with a wavelength of 266nm. The influence of the deposition parameters, such as oxygen pressure, substrate temperature and laser energy density variation on the properties of the grown film, was studied. The experiments were performed for substrate temperatures in the range of $200{\sim}500^{\circ}C$ and oxygen pressure in the range of $10^{-2}{\sim}10^2mTorr$. We investigated the structural, morphological and optical properties of ZnO thin films using X-ray diffraction(XRD), atomic force microscopy(AFM), photoluminescence(PL).