• Title/Summary/Keyword: Pt/SS Catalyst

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Low-Temperature Thermal Decomposition of Industrial N-Hexane and Benzene Vapors (산업 발생 노르말헥산과 벤젠 증기의 저온 분해)

  • Jo Wan-Kuen;Lee Joon-Yeob;Kang Jung-Hwan;Shin Seung-Ho;Kwon Ki-Dong;Kim Mo-Geun
    • Journal of Environmental Science International
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    • v.15 no.7
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    • pp.635-642
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    • 2006
  • Present study evaluated the low-temperature destruction of n-hexane and benzene using mesh-type transition-metal platinum(Pt)/stainless steel(SS) catalyst. The parameters tested for the evaluation of catalytic destruction efficiencies of the two volatile organic compounds(VOC) included input concentration, reaction time, reaction temperature, and surface area of catalyst. It was found that the input concentration affected the destruction efficiencies of n-hexane and benzene, but that this input-concentration effect depended upon VOC type. The destruction efficiencies increased as the reaction time increased, but they were similar between two reaction times for benzene(50 and 60 sec), thereby suggesting that high temperatures are not always proper for thermal destruction of VOCs, when considering the destruction efficiency and operation costs of thermal catalytic system together. Similar to the effects of the input concentration on destruction efficiency of VOCs, the reaction temperature influenced the destruction efficiencies of n-hexane and benzene, but this temperature effect depended upon VOC type. As expected, the destruction efficiencies of n-hexane increased as the surface area of catalyst, but for benzene, the increase rate was not significant, thereby suggesting that similar to the effects of the re- action temperature on destruction efficiency of VOCs, high catalyst surface areas are not always proper for economical thermal destruction of VOCs. Depending upon the inlet concentrations and reaction temperatures, almost 100% of both n-hexane and benzene could be destructed, The current results also suggested that when applying the mesh type transition Metal Pt/SS catalyst for the better catalytic pyrolysis of VOC, VOC type should be considered, along with reaction temperature, surface area of catalyst, reaction time and input concentration.

Evaluation of Thermal Catalytic Decomposition of Chlorinated Hydrocarbons and Catalyst-Poison Effect by Sulfur Compound (염소계 탄화수소의 열촉매 분해와 황화합물에 의한 촉매독 영향 평가)

  • Jo, Wan-Kuen;Shin, Seung-Ho;Yang, Chang-Hee;Kim, Mo-Geun
    • Journal of Korean Society of Environmental Engineers
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    • v.29 no.5
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    • pp.577-583
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    • 2007
  • To overcome certain disadvantages of past typical control techniques for toxic contaminants emitted from various industrial processes, the current study was conducted to establish a thermal catalytic system using mesh-type transition-metal platinum(Pt)/stainless steel(SS) catalyst and to evaluate catalytic thermal destruction of five chlorinated hydrocarbons[chlorobenzene(CHB), chloroform(CHF), perchloroethylene (PCE), 1,1,1-trichloroethane(TCEthane), trichloroethylene(TCE)]. In addition, this study evaluated the catalyst poison effect on the catalytic thermal destruction. Three operating parameters tested for the thermal catalyst system included the inlet concentrations, the incineration temperature, and the residence time in the catalyst system. The thermal decomposition efficiency decreased from the highest value of 100% to the lowest value of almost 0%(CHB) as the input concentration increased, depending upon the type of chlorinated compounds. The destruction efficiencies of the four target compounds, except for TCEthane, increased upto almost 100% as the reaction temperature increased, whereas the destruction efficiency for TCEthane did not significantly vary. For the target compounds except for TCEthane, the catalytic destruction efficiencies increased up to 30% to 97% as the residence time increased from 10 sec to 60 sec, but the increase of destruction efficiency for TCEthane stopped at the residence time of 30 sec, suggesting that long residence times are not always proper for thermal destruction of VOCs, when considering the destruction efficiency and operation costs of thermal catalytic system together. Conclusively, the current findings suggest that when applying the transition-metal catalyst for the better destruction of chlorinated hydrocarbons, VOC type should be considered, along with their inlet concentrations, and reaction temperature and residence time in catalytic system. Meanwhile, the addition of high methyl sulfide(1.8 ppm) caused a drop of 0 to 50% in the removal efficiencies of the target compounds, whereas the addition of low methyl sulfide (0.1 ppm), which is lower than the concentrations of sulfur compounds measured in typical industrial emissions, did not cause.

Non-gaseous Plasma Immersion Ion Implantation and Its Applications

  • Han, Seung-Hee;Kim, En-Kyeom;Park, Won-Woong;Moon, Sun-Woo;Kim, Kyung-Hun;Kim, Sung-Min
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.151-151
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    • 2012
  • A new plasma process, i.e., the combination of PIII&D and HIPIMS, was developed to implant non-gaseous ions into materials surface. HIPIMS is a special mode of operation of pulsed-DC magnetron sputtering, in which high pulsed DC power exceeding ~1 kW/$cm^2$ of its peak power density is applied to the magnetron sputtering target while the average power density remains manageable to the cooling capacity of the equipment by using a very small duty ratio of operation. Due to the high peak power density applied to the sputtering target, a large fraction of sputtered atoms is ionized. If the negative high voltage pulse applied to the sample stage in PIII&D system is synchronized with the pulsed plasma of sputtered target material by HIPIMS operation, the implantation of non-gaseous ions can be successfully accomplished. The new process has great advantage that thin film deposition and non-gaseous ion implantation along with in-situ film modification can be achieved in a single plasma chamber. Even broader application areas of PIII&D technology are believed to be envisaged by this newly developed process. In one application of non-gaseous plasma immersion ion implantation, Ge ions were implanted into SiO2 thin film at 60 keV to form Ge quantum dots embedded in SiO2 dielectric material. The crystalline Ge quantum dots were shown to be 5~10 nm in size and well dispersed in SiO2 matrix. In another application, Ag ions were implanted into SS-304 substrate to endow the anti-microbial property of the surface. Yet another bio-application was Mg ion implantation into Ti to improve its osteointegration property for bone implants. Catalyst is another promising application field of nongaseous plasma immersion ion implantation because ion implantation results in atomically dispersed catalytic agents with high surface to volume ratio. Pt ions were implanted into the surface of Al2O3 catalytic supporter and its H2 generation property was measured for DME reforming catalyst. In this talk, a newly developed, non-gaseous plasma immersion ion implantation technique and its applications would be shown and discussed.

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