• Transactions on Electrical and Electronic Materials
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• v.8 no.6
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• pp.241-245
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• 2007

[ $(Ba_{0.9-x}Sr_xCa_{0.10})TiO_3$ ] (x=0.33, 0.36) powders were prepared by sol-gel method. $(Ba,Sr,Ca)TiO_3$(BSCT) thick films, undoped and doped with $MnCO_3$ and $Yb_2O_3(0.1{\sim}0.7mol%)$, were fabricated by the screen printing method on the alumina substrate. The coating and drying procedure was repeated 6-times. The Pt bottom electrode was screen printing method on the alumina substrate. These BSCT thick films were annealed at $1420^{\circ}C$ for 2 hr in atmosphere. The upper electrodes were fabricated by screen printing the Ag paste and then firing at $590^{\circ}C$ for 10 min. And then the structured and dielectric properties as a function of the doping amount of $Yb_2O_3$ were studied. As a result of the TG-DTA, exothermic peak was observed at around $670^{\circ}C$ due to the formation of the polycrystalline perovskite phase. All BSCT thick films showed XRD patterns of typical cubic peroveskite structure. The average thickness of BSCT thick films was about $70^{\mu}m$. The curie temperature and the dielectric constant decreased with increasing $Yb_2O_3$ doped content and the relative dielectric constant of the specimen, doped with 0.5 mol% $Yb_2O_3$ at BSCT(54/36/10), showed a best value of 5018 at curie temperature.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.282.2-282.2
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• 2014

Cr의 함량과 주입 가스의 유량 비율을 변화하여 ZnCrO 박막의 구조적 특성에 미치는 영향과 그것이 자기적 특성에 관여하는 상관관계 등에 관하여 조사하였다. ZnCrO 박막을 Pt/Ti/Al2O3 기판 위에 Sputter법으로 증착하였으며, 이 때 양질의 ZnCrO 박막을 제작하기 위하여 산소 분압 변화에 따른 박막의 표면 및 구조적 특성을 관찰하였다. 아르곤과 산소 분압이 1 : 1 (Ar : O2=15 sccm : 15 sccm) 이었을 경우, 가장 매끄러운 표면을 갖고 또한 구조적으로도 안정된 ZnCrO 박막을 얻을 수 있었다. 동일한 조건에서 Cr 함량을 변화시켜 본 결과, Cr 함량이 작아질수록 자기적 특성이 향상되는 것이 관측되었다. 즉, Cr의 함량이 감소할수록 Cr 입자 1개 당 유효 자화도가 증가하는 것이 관측되었는데, 이러한 결과는 Cr 함량 변화에 따는 ZnCrO 박막의 결정 자기이방성 변화에 따른 것이다.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.38-38
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• 2003

PTO/PZO 초격자 박막은 박막 계면에 응력이 발생하여 기존의 박막처럼 size effect가 적용되지 않고 두께가 감소해도 높은 유전상수를 갖는다. Antiferroelectric PbZrO$_3$(PZO)와 ferroelectric PbTiO$_3$(PTO)를 적층 성장시킨 초격자는 400도에서 성장한 (100) Pt/SiO$_2$기판 위에 rf magnetron sputtering으로 증착하였다. PTO/PZO의 증착 주기는 30(PTO $_{4unti cells}$/PZO $_{4unti cells}$) 에서 1(PTO $_{125unti cells}$/PZO $_{125unti cells}$)까지 두께의 변화를 주어 준비했고 초격자 박막의 전체두께는 100nm로 고정시켰다. XRD결과, PTO/PZO는 주기에 따라 초격자의 특성인 main peak과 satellite peak을 관찰 할 수 있었다. 초격자의 주기가 감소함에 따라 2$\theta$값이 증가하고 평균 d 값이 감소되면서 PTO층에 뒤틀림이 증가하였다. PTO층의 뒤틀림 증가로 인해 superlattice의 주기가 증가함에 따라 초격자의 유전율이 증가하였고 강유전성이 향상되었다.향상되었다.

• Journal of the Korean Ceramic Society
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• v.37 no.2
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• pp.168-173
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• 2000

YMnO3 thin films were prepared on Pt/Ti/SiO2/Si substrate by chemical solution deposition method. The films were crystallized by heat-treatment at 85$0^{\circ}C$ for 1 hour. Effects of an annealing atmosphere(O2, Ar, vacuum) on the crystallization behavior and electridcal properties were investigated. YMnO3 thin films annealed under Ar atmosphere showed a superior crystallinity and a very strong c-aix preferred-orientation which was a polar axis. Leakage current density of the films decreased with lowering oxygen partial pressure of the annealing atmosphere. C-V and P-E ferroelectric hysteresis were observed only in the thin film heat-treated under Ar atmosphere.In order to prepare YMnO3 thin films having both low leakage current and ferroelectricity, the annealing atmsphere should be kept under a proper oxygen partial pressure which was about 1 Pa in this work. Leakage current density at 1 volt, dielectric constant($\varepsilon$r), remanent polarization(Pr), and coercive field(Ec) were 1.7$\times$10-8 A/$\textrm{cm}^2$, 25, 1.08$\mu$C/$\textrm{cm}^2$, and 100 kV/cm, respectively.

• Electrical & Electronic Materials
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• v.9 no.7
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• pp.668-673
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• 1996

In this paper, (P $b_{1-x}$ L $a_{x}$)(Z $r_{0.52}$ $Ti_{0.48}$) $O_{3}$ (X=0-13[at%]) thin film were prepared by the Sol-Gel method, Multiple PLZT thin films were spin-coated on the Pt/Ti/ $SiO_{2}$Si substrate. The electrical properties of the films were investigated for varying the annealing temperature. In the PLZT(11/52/48) specimens, the dielectric ocnstant of 1236 and the polarization reversal time of 460[nm] were obtained and the breakdown of the film did not occur up to 1*10$^{10}$ cycles at the voltage of 7[V] by the bipolar acceleration. The remanent polarization and coercive field decreased with increasing the content of La in the range of 0-13[at%] and thin film of the PLZT(11/52/48) showed the value of 2.56[.mu.C/c $m^{2}$] and 21.1[kV/cm], respectively.ly.y.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.439-439
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• 2011

기존의 고온에서 제작되는 TiO2 나노 입자를 이용한 염료감응형 태양전지를 저온에서 제작하기 위해 전자 이동층으로 ZnO 나노 입자를 사용하여, 저온($200^{\circ}C$)에서 염료감응태양전지(DSSC)를 제작하였다[1,2]. 상대전극(counter electrode)으로는 RF magnetron sputtering을 사용하여 ITO/glass위에 Pt를 증착하여 태양전지의 특성을 측정하였다. $180^{\circ}C$ 이상에서 hydropolymer가 증발되는 것을 이용하여, ZnO 나노입자와 hydropolymer 혼합한 paste 제작하여 소결 후 ZnO 나노입자 사이에 다공성을 생성시켜 Dye가 잘 침투하여 ZnO 나노입자 표면에 잘 흡착 되도록 하였다[3]. 20 nm 및 60 nm 크기의 ZnO 나노 입자를 사용하여 실험 해본 결과, 20 nm에 비하여 60 nm ZnO 나노입자의 경우 IPCE 값이 약 7% 정도로 높은 전환효율 값을 보였다. 60 nm ZnO 나노입자를 전자 수송층으로 사용한 DSSC 소자에서 단위면적당 흐르는 전류(Jsc), 전압 (Voc), fill factor (ff), 그리고 효율(${\eta}$)의 최대값은 4.93 mA/$cm^2$, 0.56V, 0.40, and 1.12%, 로 보였다.

• Proceedings of the IEEK Conference
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• 2004.06b
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• pp.363-366
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• 2004

PZT thin films were formed by rf-magnetron sputtering on $Pt/Ti/SiO_2/Si$ substrate. Bulk PZT target containing $5\%$ excess PbO was used. They were formed with in-situ process at $650^{\circ}C$ as total thickness of 175 and 250 nm after the depositing of thin PZT films at room temperature, i. e. 2-step Sputtering. It was found that the ferroelectric perovskite phase is formed at $650^{\circ}C$ by XRD and the interface between room temp.-layer and $650^{\circ}C$ -layer is not existent. In the samples undergoing 2-step sputtering the dielectric constant was 600 or more and the leakage current density was $2{\times}10^{-7}A/cm^2$. So, we found that the room temp.-layer on the bottom electrode stabilize the underlaid layers.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.60 no.6
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• pp.1175-1177
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• 2011

The SBN thin films were deposited on Pt/Ti/$SiO_2$/Si and p-type Si(100) substrate by rf magnetron sputtering method using $Sr_{0.7}Bi_{2.3}Nb_2O_9$ ceramic target. SBN thin films deposited were annealed at 600~800[$^{\circ}C$] by furnace in oxygen atmosphere during 40min. The polarization characteristics have been investigated to confirm the possibility of the SBN thin films for the application to destructive read out ferroelectric random access memory. The maximum remanent polarization and the coercive voltage are 0.6[${\mu}C/cm^2$], 1.2[V] respectively at annealing temperature of 800[$^{\circ}C$]. The leakage current density was the $2.57{\times}10^{-6}[A/cm^2]$ at an applied voltage of 5[V] at annealing temperature of 650[$^{\circ}C$]. Also, the fatigue characteristics of SBN thin films did not change up to $10^8$ switching cycles.

• Journal of the Korean Ceramic Society
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• v.41 no.1
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• pp.30-35
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• 2004

PMW-PZT thick films of about $30{\mu}m$ thickness were fabricated on Pt/$TiO_2$/$SiN_x$Si substrate by the hybrid method of screen printing and PZT sol application. With the increase of the number of the sol application times, the sintered density and electrical properties of PMW-PZT thick films were evidently increased. For the PMW-PZT thick film with PZT sol application of 10-times, the dielectric constant ($\varepsilon_r$) was 745 at the frequency of 100 KHz and thepiezoelectric coefficient ($d_33$) was 155 pC/N at the applied pressure of 1 atm.

• Journal of Advanced Marine Engineering and Technology
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• v.30 no.8
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• pp.927-933
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• 2006

The structural and electrical characteristics of PLZT thin films fabricated onto $Pt/IrO_2/Ir/Ti/SiO_2/Si$ substrates by a pulsed laser deposition were investigated to develop the high dielectric thin films for capacitor layer of semiconductor memory devices The slim region 14/50/50 PLZT thin films were fabricated by PLD and estimated the characteristics for memory application 14/50/50 PLZT thin films have crystallize into perovskite structure at the $600^{\circ}C$ deposition temperature, 200 mTorr of oxygen pressure, and 2 $J/cm^2$ of laser energy density. In this condition PLZT thin films had the dielectric constant as high as 985, storage charge density 8.17 ${\mu}C/cm^2$ and charging time 0.20 ns. Leakage current density was less than $10^{-10}A/cm^2$ up to 5 V bias voltage.