• Title/Summary/Keyword: Process simulator

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A Study on the Application of the Real-Time Simulator (실시간 모의시험기의 적용에 관한 연구)

  • 장성욱;이진걸
    • 제어로봇시스템학회:학술대회논문집
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    • 2000.10a
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    • pp.191-191
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    • 2000
  • Hydraulic servo system is difficult to be made up and each component is very expensive, it takes long for actual system to make and test and it costs a high price. Because of these characteristics of hydraulic servo system, a real time simulator that could describe behavior of real system is highly demanded, without composing real hydraulic system. So, many studies have been (lone on these subjects and many simulators are developed with superiority. Since the nonlinearity of a hydraulic system common simulator have composed of many calculative times byusing DSP(Digital Signal processing) and have made it possible to find the situations of the system in real time, calculating hydraulic simulation and controller separately. In this study, we suggest real-time simulator that could describe real system without ordinary DSP card. This simulator is composed of 80196kc and personal computer. DSP card that has calculated complex numerical equation is supplanted by personal computer and 80196kc generates control signals independently out of the personal computer. In all process, personal computer is synchronized with one-board microprocessor within sampling time in the closed loop system. This makes it possible to be described in hydraulic servo system in real time. And to make a comparison between the result of the real-time simulator and a hydraulic servo system.

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Design of Multi-Band GPS/KPS RTK Simulator (다중대역 GPS/KPS 통합 측위 시뮬레이터의 설계)

  • Young-Ho Jung;Taek Geun Lee;Kwangjae Lim;Hyoungsoo Lim;Hyung Keun Lee
    • Journal of Positioning, Navigation, and Timing
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    • v.13 no.3
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    • pp.341-353
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    • 2024
  • This paper presents the design results of a Multi-band Global Positioning System (GPS)/Korean Positioning System (KPS) Real-Time Kinematics (RTK) precise positioning simulator and evaluate its functionalities. The designed simulator consists of a trajectory generation module, a Radio Frequency (RF) signal generation module, a RF signal reception module, a coarse positioning module, a precise positioning module, and an error statistics reporting module. Simulations in realistic scenarios confirm that the proposed baseband simulator works appropriately. The developed simulator can adjust the type, number, band, and Pseudo Random Noise (PRN) code type of the satellite constellation in various ways, and the practical positioning performance can be tested. It can also reflect the channel influence at the actual RF stage and the influence during the initial synchronization and tracking process. Considering such advantages, the proposed simulator would be useful in future researches and developments related to KPS.

Arsenic implantation graph comparing with Dopant diffusion simulation and 1-D doping simulation (performed by synopsys sentaurus process)

  • Im, Ju-Won;Park, Jun-Seong
    • Proceeding of EDISON Challenge
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    • 2016.03a
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    • pp.344-346
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    • 2016
  • 본 논문에서는 3-stream model에 기반한 Dopant diffusion simulator를 사용하여 실리콘 기판 내부의 As이온의 확산을 시뮬레이션한 결과와 Dual-Pearson Analytic model에 기반하여 Ion implantation을 1-D doping simulation한 결과를 토대로 여러 공정 설계에서 diffusion simulator의 사용가능함을 확인하였다.

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On the Development of NC Simulator System for Wire Cut EDM (와이어 컷 방전가공이 효율적인 NC 모의가공 시스템의 개발)

  • 유우식;김남웅;유정호
    • Journal of the Korea Safety Management & Science
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    • v.6 no.1
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    • pp.283-300
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    • 2004
  • This paper describes the NC simulator system for Wire-cut electrodischarge machining. Electrodischarge Wire-cut machining is applicable to all materials including metals, alloys, and most carbides. Although CAM system generate the NC code considering electrodischarge conditions, incorrect Wire-cut tool path bring about fatal results. The simplest way of simulating a EDM process is to display the trajectory of Wire-cutter location by line segments. With this kind of simulation, the programmer can get a general idea about whether the wire is moving as planned but cannot locate gouging or excess material because only the wire location will be seen, not the changes in the workpiece as it is machined. The ideal way of simulating the EDM process is to display the solid model of the workpiece as it is machined. Therefore we propose the ideal NC simulator system for Wire-cut EDM.

Integration and Control Technology of GaAs Bonding System using DeviceNet (DeviceNet 을 채용한 GaAs 본딩 시스템의 통합 제어기술)

  • 송준엽;이승우;임선종;김원경;배영걸
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.1376-1379
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    • 2004
  • This study is designed integration and control system of GaAs bonding system consisted of multi-processing using DeviceNet and GEM-Protocol. Developing bonding system is composed of resin coating, pre-baking pre-aligner, bonding, material handler(flip robot), and wafer cassette, etc. This system has process-fluent of each a process and share information using GEM-protocol. This study devised virtual bonding simulator to control and to monitor bonding system efficiently. Also we can verify optimizing of system previously through a virtual bonding simulator.

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A study on AR, HR coating simulations for the high power laser diode (고출력 laser diode를 위한 AR, HR coating simulation에 관한 연구)

  • 류정선;윤영섭
    • Electrical & Electronic Materials
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    • v.9 no.5
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    • pp.498-505
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    • 1996
  • In the present work, we have developed the simulator to optimize the process conditions of the AR(antireflection) and HR(high-reflection) coatings for the high power laser diode. The simulator can run on the PC. After making the simple optical model, we establish the Maxwell equations for the model by the operator conversion. By using the Mathematica, we derive a matrix for the multilayer system by applying the equations to the model and optimize the AR and HR coating process conditions by obtaining the reflection rate from the matrix. We also prove the validity of the simulator by comparing the simulation with the characteristics of the laser diode which is AR and HR coated according to the optimized conditions.

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A Study for the Development of NC Simulator System of Wire Cut EDM (와이어 컷 방전가공의 효율적인 NC 모의가공 시스템 개발에 관한 연구)

  • 유우식;김남웅
    • Proceedings of the Safety Management and Science Conference
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    • 2003.11a
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    • pp.285-290
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    • 2003
  • This paper describes the NC simulator system for Wire-cut electrodischarge machining. Electrodischarge Wire-cut machining is applicable to all materials including metals, alloys, and most carbides. Although CAM system generate the NC code considering electrodischarge conditions, incorrect Wire-cut tool path bring about fatal results. The simplest way of simulating a EDM process is to display the trajectory of Wire-cutter location by line segments. With this kind of simulation, the programmer can get a general idea about whether the wire is moving as planned but cannot locate gouging or excess material because only the wire location will be seen, not the changes in the workpiece as it is machined. The ideal way of simulating the EDM process is to display the solid model of the workpiece as it is machined. Therefore we propose the ideal NC simulator system for Wire-cut EDM.

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Modeling and Simulation of Electron-beam Lithography Process for Nano-pattern Designs using ZEP520 Photoresist (ZEP520 포토리지스트를 이용한 나노 패턴 형성을 위한 전자빔 리소그래피 공정 모델링 및 시뮬레이션)

  • Son, Myung-Sik
    • Journal of the Semiconductor & Display Technology
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    • v.6 no.3
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    • pp.25-33
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    • 2007
  • A computationally efficient and accurate Monte Carlo (MC) simulator of electron beam lithography process, which is named SCNU-EBL, has been developed for semiconductor nanometer pattern design and fabrication. The simulator is composed of a MC simulation model of electron trajectory into solid targets, an Gaussian-beam exposure simulation model, and a development simulation model of photoresist using a string model. Especially for the trajectories of incident electrons into the solid targets, the inner-shell electron scattering of an target atom and its discrete energy loss with an incident electron is efficiently modeled for multi-layer resists and heterogeneous multi-layer targets. The simulator was newly applied to the development profile simulation of ZEP520 positive photoresist for NGL(Next-Generation Lithography). The simulation of ZEP520 for electron-beam nanolithography gave a reasonable agreement with the SEM experiments of ZEP520 photoresist.

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Comparison of Collision Avoidance Algorithm for a Mobile Robot using a Simulation (시뮬레이션을 이용한 이동 로봇의 충돌회피 알고리즘 비교)

  • Kim, Kwang-Jin;Ko, Nak-Yong;Park, Se-Seung
    • The Journal of the Korea institute of electronic communication sciences
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    • v.7 no.1
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    • pp.187-194
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    • 2012
  • This paper compares two collision avoidance algorithms using a simulator. The collision avoidance is vital for autonomous navigation of a mobile robot. Artificial potential field method and elastic force method are major approaches for the collision avoidance. The two algorithms are compared in the respect of the time for motion completion and the length of the motion path. The simulator is developed based on IPC(Inter Process Communication) and a differential drive mobile robot is used for the comparison.

Development of Desk top Tug-barge Simulator and Evaluation Module

  • Jeong, Tae-Gwoen;Song, Chae-Uk;Chen, Chao;Lee, Shin-Geol;Lee, Jeong-Jin
    • Journal of Navigation and Port Research
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    • v.35 no.2
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    • pp.113-119
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    • 2011
  • This paper is a part of the development on the safe navigation model of tugs and barges in Korea waters. desk-top tug-barge simulator is to train the crew of tugs and barges, especially tugs' crew. It is connected with steering and engine telegraph console and winch control console, and can describe three types of operation mode for a tug-barge working unit, towing mode, side by side and push mode. It can also record and assess each simulation run. The evaluation module can confirm the result of a finished simulation run and help trainees to find and correct their faults, and it is composed of result evaluation and process evaluation.