Development of SiGe Heterostructure Epitaxial Growth and Device Fabrication Technology using Reduced Pressure Chemical Vapor Deposition (저압화학증착을 이용한 실리콘-게르마늄 이종접합구조의 에피성장과 소자제작 기술 개발)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.18 no.4
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- pp.285-296
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- 2005