• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.06a
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• pp.264-267
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• 2003

Pitch measurements of 150 nm pitch one-dimensional grating standards were carried out using an contact mode atomic force microscopy(C-AFM) with a high resolution three-axis laser interferometer. It was called as 'Nano-metrological AFM' In Nano-metrological AFM, Three laser interferometers were aligned well to the end of AFM tip. Laser sources of the three-axis laser interferometer in the nano-metrological AFM were calibrated with an I$_2$-stablilzed He-Ne laser at a wavelength of 633 nm. So, the Abbe error was minimized and the result of the pitch measurement using the nano-metrological AFM has a traceability to the length standard directly. The uncertainty in the pitch measurement was estimated in accordance with the Guide to the Expression of Uncertainty in Measurement(GUM). The Primary source of uncertainty in the pitch-measurements was derived from repeatability of pitch-measurement, and its value was approx 0.186 nm. Expanded uncertainty(k=2) of less than 5.23 nm was obtained. It is suggested that the metrological AFM is a useful tool for the nano-metrological standard calibration.

• Journal of the Korean Society for Precision Engineering
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• v.26 no.4
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• pp.91-99
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• 2009

Because of both precise measurement and efficient quality control, coordinate measuring machines(CMMs) have been widely used in the industry. The purpose of this paper is to present a method to estimate the CMM measurement uncertainty using design of experiments. A factorial design is applied to carry out the performance test proposed by ISO 10360 and to investigate CMM measurement errors associated to orientation and length of the length bar. In order to assess the measurement uncertainty for the performance test, an analysis of the uncertainty components that make up the uncertainty budget has been carried out. The procedure for evaluating the uncertainty of it follows GUM ("Guide to the expression of uncertainty in measurement"). The results show that the proposed method is suitable to investigate CMM performance and determine the contribution of machine variables to measurement uncertainty.

• Journal of the Korean Society for Precision Engineering
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• v.34 no.2
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• pp.107-114
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• 2017

In this investigation, we describe a metrological technique for surface and thickness profiles of a silicon (Si) wafer by using a 6 degree of freedom (DOF) stitching method. Low coherence scanning interferometry employing near infrared light, partially transparent to a Si wafer, is adopted to simultaneously measure the surface and thickness profiles of the wafer. For the large field of view, a stitching method of the sub-aperture measurement is added to the measurement system; also, 6 DOF parameters, including the lateral positioning errors and the rotational error, are considered. In the experiment, surface profiles of a double-sided polished wafer with a 100 mm diameter were measured with the sub-aperture of an 18 mm diameter at $10\times10$ locations and the surface profiles of both sides were stitched with the sub-aperture maps. As a result, the nominal thickness of the wafer was $483.2{\mu}m$ and the calculated PV values of both surfaces were $16.57{\mu}m$ and $17.12{\mu}m$, respectively.

• Journal of the Korean Society for Precision Engineering
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• v.16 no.8
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• pp.203-212
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• 1999

This paper describes a deadweight force standard machine with the weight change mechanism which can be used as a primary force standards at a national metrology institute. Since commercial deadweight force machine can generate forces by hanging weights to the weight supporter serially, force steps from deadweight force measuring devices of each having different capacity. In order to increase the force steps, we have specially designed a weight mechanism in which the machine can select the necessary weights and generate the load by hanging the selected weights to the weight supporter. The machine can generate 속 force of the range of 2 kN to 110 kN with force step of 1 kN. All weights have been accurately compensated and calibrated by a mass comparator and its standard uncertainty is less than 2.2 ${\times}\;10^{-6}$. The relative expanded uncertainty of the machine is 1.3 ${\times}\;10^{-5}$.

• Journal of the Korean Society for Precision Engineering
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• v.24 no.9
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• pp.68-75
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• 2007

The pitch and orthogonality of two-dimensional (2D) gratings have been measured by using a metrological atomic force microscope (MAFM) and measurement uncertainty has been analyzed. Gratings are typical standard artifacts for the calibration of precision microscopes. Since the magnification and orthogonality in two perpendicular axes of microscopes can be calibrated simultaneously using 2D gratings, it is important to certify the pitch and orthogonality of 2D gratings accurately for nano-metrology using precision microscopes. In the measurement of 2D gratings, the MAFM can be used effectively for its nanometric resolution and uncertainty, but a new measurement scheme was required to overcome some limitations of current MAFM such as nonnegligible thermal drift and slow scan speed. Two kinds of 2D gratings, each with the nominal pitch of 300 nm and 1000 nm, were measured using line scans for the pitch measurement of each direction. The expanded uncertainties (k = 2) of measured pitch values were less than 0.2 nm and 0.4 nm for each specimen, and those of measured orthogonality were less than 0.09 degree and 0.05 degree respectively. The experimental results measured using the MAFM and optical diffractometer were coincident with each other within the expanded uncertainty of the MAFM. As a future work, we also proposed another scheme for the measurements of 2D gratings to increase the accuracy of calculated peak positions.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.8 s.185
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• pp.72-79
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• 2006

We measured grating pitch standards using optical diffractometry and analyzed measurement uncertainty. Grating pitch standards have been used widely as a magnification standard for a scanning electron microscope (SEM) and a scanning probe microscope (SPM). Thus, to establish the meter-traceability in nano-metrology using SPM and SEM, it is important to certify grating pitch standards accurately. The optical diffractometer consists of two laser sources, argon ion laser (488 nm) and He-Cd laser (325 nm), optics to make an incident beam, a precision rotary table and a quadrant photo-diode to detect the position of diffraction beam. The precision rotary table incorporates a calibrated angle encoder, enabling the precise and accurate measurement of diffraction angle. Applying the measured diffraction angle to the grating equation, the mean pitch of grating specimen can be obtained very accurately. The pitch and orthogonality of two-dimensional grating pitch standards were measured, and the measurement uncertainty was analyzed according to the Guide to the Expression of Uncertainty in Measurement. The expanded uncertainties (k = 2) in pitch measurement were less than 0.015 nm and 0.03 nm for the specimen with the nominal pitch of 300 nm and 1000 nm. In the case of orthogonality measurement, the expanded uncertainties were less than $0.006^{\circ}$. In the pitch measurement, the main uncertainty source was the variation of measured pitch values according to the diffraction order. The measurement results show that the optical diffractometry can be used as an effective calibration tool for grating pitch standards.

• Korean Journal of Optics and Photonics
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• v.13 no.6
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• pp.521-529
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• 2002

We have recently proposed the new concept of a phase-measuring volumetric interferometer that enables us to accurately measure the xyz-coordinates of the probe without metrology frames. The interferometer is composed of a movable target and a fixed photo-detector array. The target is made of point diffraction sources to emit two spherical wavefronts, whose interference is monitored by an array of photo-detectors. Phase shifting is applied to obtain the precise phase values of the photo-detectors. Then the measured phases are fitted to a geometric model of multilateration so as to determine the xyz-location of the target by minimizing least square errors. The proposed interferometer has been designed and built with a volumetric uncertainty of less than 1.0 $\mu\textrm{m}$ within a cubic working volume of side 120 mm. Here, in this paper, we also present error sources, an evaluated uncertainty, and test results from the prototype system. The self-calibration of two-dimensional precision metrology stages is applied to test the performance of the interferometer.

• Bulletin of the Korean Chemical Society
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• v.28 no.5
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• pp.737-744
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• 2007

An isotope dilution-liquid chromatography/tandem mass spectrometric method was developed as a candidate reference method for the accurate determination of acrylamide in potato chips, starch-rich foodstuff cooked at high temperature. Sample was spiked with 13C3-acrylamide and then extracted with water. The extract was further cleaned up with an Oasis HLB solid-phase extraction (SPE) cartridge and an Oasis mixed-phase cation exchange (MCX) SPE cartridge. The extract was analyzed by using LC/ESI/Tandem MS in positive ion mode. LC with a medium reversed-phase (C4) column was optimized to obtain adequate chromatographic retention and separation of acrylamide. MS was operated to selectively monitor [M+H]+ ions of the analyte and its isotope analogue at m/z 72 and m/z 75, respectively. Sample was also analyzed by the LC/MS with selectively monitoring the collisionally induced dissociation channels of m/z 72 → m/z 55 and m/z 75 → 58. Compared to the LC/MS chromatograms, the LC/MS/MS chromatograms showed substantially reduced background chemical noises coming from solvent clusters formed during ESI spray processes and interferences from sample matrix. Repeatability and reproducibility studies showed that the LC/MS/MS method is a reliable and reproducible method which can provide a typical method precision of 1.0% while the LC/MS results are influenced by chemical interferences.

• Mass Spectrometry Letters
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• v.9 no.1
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• pp.30-36
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• 2018

A quantitation method for free amino acids in human serum was developed using a stepwise-dilution method and a bimodal cation exchange (CEX)/hydrophilic interaction liquid chromatography (HILIC)-tandem mass spectrometry system equipped with an electrospray ionization source (ESI/MS/MS). This method, which was validated using quality control samples, was optimized for enhanced selectivity and sensitivity. Dithiothreitol (DTT) was used as a reducing agent to prevent the oxidation of a serum sample ($50{\mu}L$), which was then subjected to stepwise dilution using 3, 30, and 90 volumes of acetonitrile containing 0.1% formic acid. Chromatographic separation was performed on an Imtakt Intrada Amino Acid column ($50mm{\times}3mm$, $3{\mu}m$) in mixed mode packed with CEX and HILIC ligands embedded in the stationary phase. Underivatized free amino acids were eluted and separated within 10 min. As a result of the validation, the precision and accuracy for the inter- and intraday assays were determined as 2.11-11.51% and 92.82-109.40%, respectively. The lowest limit of quantification (LLOQ) was $0.5-4.0{\mu}g/mL$ and the matrix effect was 80.22-115.93%. The proposed method was successfully applied to the quantitative analysis of free amino acids in human serum.

• Transactions of the Korean Society of Mechanical Engineers
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• v.17 no.7 s.94
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• pp.1731-1739
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• 1993

An application of Scanning Tunneling Microscopy(STM) is investigated for the measurement of 3-dimensional profiles of the macro-machined patterns of which critical dimensions lie in the range of submicrometers. Special emphasis of this investigation is given to extending the measuring ranges of STM upto the order of several micrometers while maintaining superb nanometer measuring resolution. This is accomplished by correcting hysteresis effects of piezoelectric actuators by using non-linear compensation models. Detailed aspects of design and control of a prototype measurement system are described with some actual measuring examples in which fine It patterns can successfully be traced with a resolution of 1 nanometer over a surface range of $4{\times}2$ micrometers.