Comparison of InGaef etching $BCl_3,\;BCl_3/Ar\;and\;BCl_3/Ne$ inductively coupled plasmas
($BCl_3,\;BCl_3/Ar,\;BCl_3/Ne$ 유도결합 플라즈마에 의한 InGaP 건식 식각 비교)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2003.07a
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- pp.361-365
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- 2003