• Title/Summary/Keyword: Power quality compensate

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A Robust Harmonic Compensation Technique using Digital Lock-in Amplifier under the Non-Sinusoidal Grid Voltage Conditions for the Single Phase Grid Connected Inverters (디지털 록인 앰프를 이용한 비정현 계통 전압 하에서 강인한 단상계통 연계 인 버터용 고조파 보상법)

  • Khan, Reyyan Ahmad;Ashraf, Muhammad Noman;Choi, Woojin
    • Proceedings of the KIPE Conference
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    • 2018.11a
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    • pp.95-97
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    • 2018
  • The power quality of Single Phase Grid-Connected Inverters (GCIs) has received much attention with the increasing number of Distributed Generation (DG) systems. However, the performance of single phase GCIs get degraded due to several factors such as the grid voltage harmonics, the dead time effect, and the turn ON/OFF of the switches, which causes the harmonics at the output of GCIs. Therefore, it is not easy to satisfy the harmonic standards such as IEEE 519 and P1547 without the help of harmonic compensator. To meet the harmonic standards a certain kind of harmonic controller needs to be added to the current control loop to effectively mitigate the low order harmonics. In this paper, the harmonic compensation is performed using a novel robust harmonic compensation method based on Digital Lock-in Amplifier (DLA). In the proposed technique, DLAs are used to extract the amplitude and phase information of the harmonics from the output current and compensate it by using a simple PI controller in the feedforward manner. In order to show the superior performance of the proposed harmonic compensation technique, it is compared with those of conventional harmonic compensation methods in terms of the effectiveness of harmonic elimination, complexity, and implementation. The validity of the proposed harmonic compensation techniques for the single phase GCIs is verified through the experimental results with a 5kW single phase GCI. Index Terms -Single Phase Grid Connected Inverter (SPGCI), Harmonic Compensation Method, Total Harmonic Distortion (THD) and Harmonic Standard.

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Fabrication of Diffractive Optical Element for Objective Lens of Small form Factor Data Storage Device (초소형 광정보저장기기용 웨이퍼 스케일 대물렌즈 제작을 위한 회절광학소자 성형기술 개발)

  • Bae H.;Lim J.;Jeong K.;Han J.;Yoo J.;Park N.;Kang S.
    • Transactions of Materials Processing
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    • v.15 no.1 s.82
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    • pp.3-8
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    • 2006
  • The demand fer small and high-capacity optical data storage devices has rapidly increased. The areal density of optical disk is increased by using higher numerical aperture objective lens and shorter wavelength source. A wafer-scale stacked micro objective lens with a numerical aperture of 0.85 and a focal length of 0.467mm for the 405nm blue- violet laser was designed and fabricated. A diffractive optical element (DOE) was used to compensate the spherical aberration of the objective lens. Among the various fabrication methods for micro DOE, the UV-replication process is more suitable fur mass-production. In this study, an 8-stepped DOE pattern as a master was fabricated by photolithography and reactive ion etching process. A flexible mold was fabricated for improving the releasing properties and shape accuracy in UV-replication process. In the replication process, the effects of exposing time and applied pressure on the replication quality were analyzed. Finally, the surface profiles of master, mold and molded pattern were measured by optical scanning profiler. The geometrical deviation between the master and the molded DOE was less than $0.1{\mu}m$. The diffraction efficiency of the molded DOE was measured by DOE efficiency measurement system which consists of laser source, sample holder, aperture and optical power meter, and the measured value was $84.5\%$.

Fabrication of diffractive optical element for objective lens of small form factor data storage device (초소형 광정보저장기기용 웨이퍼 스케일 대물렌즈 제작을 위한 회절광학소자 성형기술 개발)

  • Bae H.;Lim J.;Jeong K.;Han J.;Yoo J.;Park N.;Kang S.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.09a
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    • pp.35-40
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    • 2005
  • The demand for small and high-capacity optical data storage devices has rapidly increased. The areal density of optical disk is increased using higher numerical aperture objective lens and shorter wavelength source. A wafer-scale stacked micro objective lens with a numerical aperture of 0.85 and a focal length of 0.467mm for the 405nm blue- violet laser was designed and fabricated. A diffractive optical element (DOE) was used to compensate the spherical aberration of the objective lens. Among the various fabrication methods for micro DOE, the UV-replication process is more suitable for mass-production. In this study, an 8-stepped DOE pattern as a master was fabricated by photolithography and reactive ion etching process. A flexible mold was fabricated for improving the releasing properties and shape accuracy in UV-molding process. In the replication process, the effects of exposing time and applied pressure on the replication quality were analyzed. Finally, the shapes of master, mold and molded pattern were measured by optical scanning profiler. The deviation between the master and the molded DOE was less than 0.1um. The efficiency of the molded DOE was measured by DOE efficiency measurement system which consists of laser source, sample holder, aperture and optical power meter, and the measured value was $84.5\%$.

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A 0.4-2GHz, Seamless Frequency Tracking controlled Dual-loop digital PLL (0.4-2GHz, Seamless 주파수 트래킹 제어 이중 루프 디지털 PLL)

  • Son, Young-Sang;Lim, Ji-Hoon;Ha, Jong-Chan;Wee, Jae-Kyung
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.45 no.12
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    • pp.65-72
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    • 2008
  • This paper proposes a new dual-loop digital PLL(DPLL) using seamless frequency tracking methods. The dual-loop construction, which is composed of the coarse and fine loop for fast locking time and a switching noise suppression, is used successive approximation register technique and TDC. The proposed DPLL in order to compensate the quality of jitter which follows long-term of input frequency is newly added cord conversion frequency tracking method. Also, this DPLL has VCO circuitry consisting of digitally controlled V-I converter and current-control oscillator (CCO) for robust jitter characteristics and wide lock range. The chip is fabricated with Dongbu HiTek $0.18-{\mu}m$ CMOS technology. Its operation range has the wide operation range of 0.4-2GHz and the area of $0.18mm^2$. It shows the peak-to-peak period jitter of 2 psec under no power noise and the power dissipation of 18mW at 2GHz through HSPICE simulation.

Drone-Based Micro-SAR Imaging System and Performance Analysis through Error Corrections (드론을 활용한 초소형 SAR 영상 구현 및 품질 보상 분석)

  • Lee, Kee-Woong;Kim, Bum-Seung;Moon, Min-Jung;Song, Jung-Hwan;Lee, Woo-Kyung;Song, Yong-Kyu
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.27 no.9
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    • pp.854-864
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    • 2016
  • The use of small drone platform has become a popular topic in these days but its application for SAR operation has been little known due to the burden of the payload implementation. Drone platforms are distinguished from the conventional UAV system by the increased vulnerability to the turbulences, control-errors and poor motion stability. Consequently, sophisticated motion compensation may be required to guarantee the successful acquisition of high quality SAR imagery. Extremely limited power and mass budgets may prevent the use of additional hardwares for motion compensation and the difficulty of SAR focusing is further aggravated. In this paper, we have carried out a feasibility study of mico-SAR drone operation. We present the image acquisition results from the preliminary flight tests and a quality assessment is followed on the experimental SAR images. The in-flight motion errors derived from the unique drone movements are investigated and attempts have been made to compensate for the geometrical and phase errors caused by motions against the nominal trajectory. Finally, the successful operation of drone SAR system is validated through the focussed SAR images taken over test sites.