• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.6
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• pp.465-470
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• 2003

The chemical mechanical polishing (CMP) process has been widely used for the global planarization of multi-layer structures in semiconductor manufacturing. The CMP process can be optimized by several parameters such as equipment, consumables (pad, backing film and slurry), process variables and post-CMP cleaning. However, the COO(cost of ownership) is very high, because of high consumable cost. Especially, among the consumables, the slurry dominates more than 40 %. In this paper, we have studied the CMP characteristics of diluted silica slurry by adding of raw alumina abrasives and annealed alumina abrasives. As an experimental result, we obtained the comparable slurry characteristics compared with original silica slurry in the view-point of high removal rate and low non-uniformity. Therefore, we can reduce the cost of consumables(COC) of CMP process for ULSI applications.

• Fashion & Textile Research Journal
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• v.5 no.4
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• pp.399-407
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• 2003

The natural dyeing of silk fabric with Purple-Fleshed Sweet Potato (PSP) was investigated. The colorant was extracted with distilled water, and the color difference (${\Delta}E^*$) was increased with increasing the amount of PSP in extraction. The proper temperature and time for the extracting of colorant with PSP were $60^{\circ}C$ and 60 minutes. The optimum temperature, time and pH for the dyeing of silk with extracted PSP were $60^{\circ}C$, 60 minutes and pH 4 respectively. In various mordanted methods, the color difference values of post-mordanted silk fabric were higher than those of pre- and simultaneous-mordanted method. And the wide range of colors( GY, Y, YR, R, RP) were obtained according to various mordants, mordanting methods and mordant concentrations. Light colorfastness of the mordanted silk fabric was improved. Laundering colorfastness, dry cleaning colorfastness and perspiration colorfastness were shown to be good.

• International Journal of Naval Architecture and Ocean Engineering
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• v.7 no.4
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• pp.770-783
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• 2015

Lately, high production rate welding processes for Al alloys, which are used as LNG FPSO cargo containment system material, have been developed to overcome the limit of installation and high rework rates. In particular, plasma-metal inert gas (MIG) hybrid (PMH) welding can be used to obtain a higher deposition rate and lower porosity, while facilitating a cleaning effect by preheating and post heating the wire and the base metal. However, an asymmetric undercut and a black-colored deposit are created on the surface of PMH weld in Al alloys. For controlling the surface defect formation, the wire feeding speed and nozzle diameter in the PMH weld was investigated through arc phenomena with high-speed imaging and metallurgical analysis.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11a
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• pp.189-192
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• 2001

Recently, STI process is getting attention as a necessary technology for making high density of semiconductor by devices isolation method. However, it does have various problems caused by CMP process, such as torn oxide defects, nitride residues on oxide, damages of si active region, contaminations due to post-CMP cleaning, difficulty of accurate end point detection in CMP process, etc. In this work, the various defects induced by CMP process was introduced and the above mentioned Problems of CMP process was examined in detail. Finally, the guideline of future CMP process was presented to reduce the effects of these defects.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07a
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• pp.389-392
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• 2004

As the integrated circuit device shrinks to the smaller dimension, the chemical mechanical polishing (CMP) process was required for the global planarization of inter-metal dielectric(IMD) layer with free-defect. The effect of alternative commerical slurries pads, and post-CMP cleaning alternatives are discuess, with removal rate, scratch dentisty, surface roughness, dishing, erosion and particulate density used as performance metrics. we investigated the performance of $SnO_2$-CMP process using commonly used silica slurry, ceria slurry, tungsten slurry. This study shows removal rate and non-uniformity of $SnO_2$ thin film used to gas sensor by using Ceria, Silica, W-Slurry after CMP process. This study also shows the relation between particle size and CMP with particle size analysis of used slurry.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.11a
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• pp.184-187
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• 2003

As the integrated circuit device shrinks to the smaller dimension, the chemical mechanical polishing (CMP) process was required for the global planarization of inter-metal dielectric(IMD) lyaer with free-defect. The effect of alternative commerical slurries pads, and post-CMP cleaning alternatives are discuess, with removal rate, scratch dentisty, surface roughness, dishing, erosion and particulate density used as performance metrics. we investigated the performance of $SnO_2-CMP$ process using commonly used silica slurry, ceria slurry, tungsten slurry. This study shows removal rate and nonuniformity of $SnO_2$ thin film used to gas sensor by using Ceria, Silica, W-Slurry after CMP process. This study also shows the relation between partical size and CMP with partical size analysis or used slurry.

• Journal of Korean Society of Occupational and Environmental Hygiene
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• v.8 no.2
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• pp.289-295
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• 1998

Used gasoline engine oils(UGEO) are carcinogenic in long term studies and capable of increasing the number of carcinogen-DNA adducts in short term studies when dermally applied to mice. The carcinogenic risk of UGEO has been attributed to the concentration of polycyclic aromatic hydrocarbons(PAH) which accumulate in the lubricating system during the combustion of gasoline. When dermally exposed to UGEO, the use of hand cleanser was commonly recommended for removing it. But generally workers who dermally exposed oils, use kerosene as cleaner which make skin trouble. During this study, female mice aged 4-6 weeks were utilized to evaluate the efficiency of kerosene, as solvent-based cleanser, following dermal exposure to UGEO. DNA adduct were detected at skin and lung tissues by using the $^{32}P$-postlabeling method. Washing with cleansers were done at two different interval times following dermal application of UGEO. The total DNA adducts in skin and lung tissues were statistically significantly increased in positive control groups, and of which the total adduct level in skin tissues was statistically significant higher than those in lung tissues(p=0.005). When washing kerosene, the DNA adduct level in skin tissues was statistically significantly decreased(p=0.0001). But DNA adducts in lung tissue was statistically increased(p=0.0039), and that washed at 8hr post exposure was more severly increase(p<0.05). The slope of regression between DNA adducts of lung between skin tissues was 1.0802. In conclusion, skin cleaning with kerosene facilitates passage of carcinogens to the lungs of animals dermally treated with used gasoline engine oils(UGEO).

• Journal of the Korean Vacuum Society
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• v.5 no.3
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• pp.239-244
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• 1996

We firstly report that formation of $SiO_2$ layer on Si surface can be effectively prevented by flowing the $Si_2H_6$ gas during the heating-up procedure for amorphous Si depositions. In this way, amorphously deposited Si layer onto crystalline Si substrates can be grown epitaxially during the post-deposition heat treatments. The suppression of surface $SiO_2$ can be explained in terms of adsorption of SiHx adspecies, instead of oxygen from residual gases in the reactors, to Si surfaces after desorption of hydrogen from H-passivated Si surfaces. Employing $Si_2H_6$ flowing and soild phase epitaxial growth, high-quality epitaxial Si layer can be obtained at low temperatures below $600^{\circ}C$ without conventional high temperature cleaning procedures.

• Journal of the Korean Society of Clothing and Textiles
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• v.37 no.7
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• pp.874-881
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• 2013

Dansam (Salvia miltiorrhiza Bunge) is a perennial plant that belongs to the Labiatae family and is characterized by red pigment found in the epidermis of its roots. Research on the dyeability of Dansam extract was performed with repeated trials under various conditions such as temperature, time, and mordant treatment. Silk fabrics were dyed with Dansam extract and mordanted with various agents such as Al, Fe, Cu, and Sn to evaluate the dyeability and functionality of Dansam extract; subsequently, the K/S value and the change of surface color were analyzed using a colorimeter. In addition, the dyeability of dyed fabrics (such as color fastness to washing, dry cleaning fastness, rubbing fastness and light fastness) and functionality (such as antibacterial activity and deodorization) were analyzed. The surface colors of all dyed fabrics were recorded and the results showed the presence of mostly YR series of colors; in addition, a GY color series appeared in the Fe pre-mordants of the silk fabric. The highest K/S values were recorded in Fe post-mordants. The washing fastness were Level 3 and Level 4; in addition, the dry-cleaning fastness showed excellent results at Level 4 and Level 5. The rubbing fastness was satisfactory at Level 3 and Level 4 and the light fastness was satisfactory at Level 4. The results of the measurements (that pertained to the antibacterial activity of fabrics dyed with Dansam extract) showed a 99.9% bacteria reduction rate of Staphylococcus aureus and Klebsiella pneumoniae. In regards to deodorization ability, dyed fabrics were found to have higher deodorization rates than those not dyed. The dyed fabric demonstrated exceptional deodorization qualities.

• Textile Coloration and Finishing
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• v.28 no.3
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• pp.219-229
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• 2016

The purpose of this study was to investigate the dyeability of silk fabrics with sweet potato stem leaf extract. To obtain the optimal dyeing conditions it was examined at various dyeing conditions(temperature, pH, time and bath ratio). The dyeability and the depths of shade which were evaluated in terms of K/S and CIELAB color difference values of the dyed and mordanted fabrics were also investigated. After dyeing, various color fastness(wash fastness, dry cleaning fastness, light fastness, rub fastness, and perspiration fastness) was measured and reviewed for UV protective, deodorant and antimicrobial functionality. The optimun output, as a result, was shown at 100% of dye concentration, $90^{\circ}C$ of dyeing temperature and 80 minutes of dyeing time while in terms of dye uptake depending on the kind of mordants and mordanting, it was found that among four mordants of $Alk(SO_4)_2$, $CuSO_4$, $SnCl_2$, and $FeSO_4$, post-mordanting with $SnCl_2$ showed the best results. Color fastness to dry cleaning, washing and rubbing was found strong at grade 4-5 and the grade to perspiration was as good as 3 while to light fastness was good at 4 as well. In aspects of functional properties, it showed excellent results of 98.3% UV protection rate and 88% deodorization rate. Antibacterial activity was 99.9% against staphylococcus aureus and 73.3% against klebisella pneumoniae. In conclusion, we validated that the dyestuffs from the disused sweet potato stem leaf extract would be useful as a natural dye material using the optimized conditions and dyeability for silk dyeing.