• Current Optics and Photonics
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• 제3권5호
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• pp.401-407
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• 2019

Polymeric optical waveguide devices with Bragg gratings have been investigated, for implementing tunable lasers and wavelength filters used in wavelength-division-multiplexed optical communication systems. Owing to the excellent thermo-optic effect of these polymers, wavelength tuning is possible over a wide range, which is difficult to achieve using other optical materials. In this study the phase-mask technology, which has advantages over the conventional interferometeric method, was introduced to facilitate the fabrication of Bragg gratings in polymeric optical waveguide devices. An optical setup capable of fabricating multiple Bragg gratings simultaneously on a 4-inch silicon wafer was constructed, using a 442-nm laser and phase mask. During fabrication, some of the diffracted light in the phase mask was totally reflected inside the mask, which affected the quality of the Bragg grating adversely, so experiments were conducted to solve this issue. To verify grating uniformity, two types of wavelength-filtering devices were fabricated using the phase-mask lithography, and their reflection and transmission spectra were measured. From the results, we confirmed that the phase-mask method provides good uniformity, and may be applied for mass production of polymer Bragg-grating waveguide devices.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 춘계학술대회 논문집 센서 박막재료 반도체재료 기술교육
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• pp.111-118
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• 2002

A new lithium niobate optical modulator with a polymer buffer layer on Ni in-diffused optical waveguide is proposed for the fist time, successfully fabricated and examined at a wavelength of 1.3 mm. By determining the diffusion parameters of Ni in-diffused waveguide to achieve more desirable mode size which is well matched to the mode in the fiber, the detailed results on the achievement of high optical throughput are reported. In addition, the usefulness of polymer buffer layer which can be applicable to a buffer layer in Ni in-diffused waveguide devices is demonstrated. Several sets of channel waveguides fabricated on Z-cut lithium niobate by Ni in-diffusion were obtained and on which coplanar traveling-wave type electrodes with a polymer-employed buffer layer were developed by a conventional fabrication method for characterizing of electro-optical performances of the proposed device. The experimental results show that the measured half-wave voltage is of ~10 V and the total measured fiber-to-fiber insertion loss is of ~6.4 dB for a 40 mm long at a wavelength of =1.3 mm, respectively. From the experimental results, it is confirmed that the polymer-employed buffer layer in LiNbO3 optical modulator can be a substitute material instead of silicon oxide layer which is usually processed at a high temperature of over $300^{\circ}C$. Moreover, the fabrication tolerances by using polymer materials in LiNbO3 optical modulators are much less strict in comparison to the case of dielectric buffer layer.

• ETRI Journal
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• 제24권4호
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• pp.259-269
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• 2002

Polymers are emerging as new alternative materials for optical communication devices. We developed two types of polymer-based devices for optical communications. One type is for ultra high-speed signal processing that uses nonlinear optical (NLO) polymers in such devices as electro-optic (EO) Mach-Z${\ddot{e}} $ hnder (MZ) modulators and EO 2${\times}$2 switches. The other is for WDM optical communications that use low-loss optical polymers in such devices as 1${\times}$2, 2${\times}$2, 4-arrayed 2${\times}$2 digital optical switches (DOSs) and 16${\times}$16 arrayed waveguide grating (AWG) routers. For these devices, we synthesized a polyetherimide-disperse red 1 (PEI-DR1) side chain NLO polymer and a low-loss optical polymer known as fluorinated polyaryleneethers (FPAE). This paper presents the details of our development of these polymeric photonic devices considering all aspects from materials to packaging.

• 한국광학회:학술대회논문집
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• 한국광학회 2007년도 동계학술발표회 논문집
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• pp.221-222
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• 2007

The UV laser trimming can be useful to have an accurate performance specification of the passive waveguide devices. In order to measure the change of the refractive index of polymer overclad layer under the irradiation of uv light in a high precision Bragg grating is fabricated on the silica core of planar waveguide and the corresponding transmittance spectrum was analyzed. An effective refractive index change of $4.7x10^{-5}$ was obtained for a straight waveguide when its $60{\mu}m$-thick overclad was irradiated by UV laser pulses of its total fluence 24 $J/cm^2$.

• 한국광학회지
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• 제14권2호
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• pp.135-141
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• 2003

양의 열광학 계수를 갖는 실리카를 하부클래드 및 코아에 그리고 음의 열광학 계수를 갖는 폴리머를 상부클래드에 적용한 AWG(Arrayed Waveguide Grating) 파장분할 다중화 소자에 대하여 이차원 스칼라 유한차분법(Scalar Finite Difference Method; SFDM)으로 온도의존 특성을 분석한 결과, 클래드의 굴절률을 변화시키거나 실리카 코어 상부에 실리카 박막이 존재하는 구조에서 박막의 두께를 변화시켜 온도의존 특성을 조절할 수 있음을 확인하였다. 이러한 해석결과에 근거하여 폴리머 상부클래드가 적용된 AWG 소자를 제작하였으며 기존의 실리카 AWG 소자와 특성을 비교분석하였다. 폴리머 상부클래드의 도입에 의해 삽입손실 및 크로스톡은 큰 변화가 없었으나 중심파장의 온도의존성은 0.0130 nm/$^{\circ}C$에서 0.0028 nm/$^{\circ}C$ 수준으로 감소하였다.

• 한국광학회지
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• 제35권4호
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• pp.175-183
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• 2024

근래 광통신, 광센서, 양자광학 등의 다양한 연구 분야에서 광IC 소자를 이용한 광신호 처리 연구가 활발히 진행되고 있으며, 광IC 제작에 이용되는 재료들 중 특히 폴리머 재료는 고유의 특징을 바탕으로 폭넓게 연구개발되고 있다. 폴리머 기반 광IC 소자를 제작하기 위해서는 광도파로 단면 구조를 정확히 제작하기 위한 제작 공정을 확립하는 것이 중요하며, 특히 안정적인 소자 특성을 유지하고 대량생산 시의 수율을 높이기 위해서는 재현성이 높고 오차 수용 범위가 넓은 공정과 제작 조건을 설정하는 것이 필요하다. 본 연구에서는 원자층 증착(atomic layer deposition, ALD) 공정을 도입하여 폴리머 광도파로 소자를 효율적으로 제작할 수 있는 방법을 제안하였으며, 기존의 포토 레지스트나 금속 박막 증착을 이용하는 방법에 비해 광도파로 코어 형상을 더욱 정밀하게 제작할 수 있음을 확인하였다. 본 연구에서는 ALD 공정을 도입하여 코어의 크기가 1.8 × 1.6 ㎛²인 폴리이미드 광도파로를 제작하여 광도파로의 손실을 측정하고, 이와 함께 광파워 분배기인 다중모드 간섭(multi-mode interference) 광도파로 소자를 제작하여 특성을 측정하였다. 이때 기존의 제작과정에서 문제시되었던 에칭 마스크 층의 크랙 현상은 나타나지 않았으며, 광도파로 패턴 단면의 수직성도 우수하였고, 도파로의 전파손실 또한 1.5 dB/cm 이하로 양호하였다. 이로써 ALD 공정이 대량생산을 위한 폴리머 광소자 제작 공정에 적합한 방법임을 확인하였다.

• 한국광학회지
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• 제10권5호
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• pp.419-423
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• 1999

측면 연마된 단일모드 광섬유와 다중모드 폴리머 평면도파로 사이의 소산장 결합을 이용한 광필터를 제작하고 그 특성을 측정하였다. 소자의 편광의존성을 줄일 수 있는 방법 제안하였으며 실험으로 검증하였다. 그리고 광필터의 공진파장과 여과 깊이는 평면도파로의 두께와 연마깊이로서 적절히 선택할 수 있음을 실험으로 보였다. 광섬유 연마과정, 폴리머 평면도파로 제작 등을 포함한 소자제작 공정을 소개하였다. 제작된 광필터의 3㏈대역폭은 15nm, 삽입손실은 0.2㏈, 편광에 따른 공진 파장의 차이는 2nm 이하였다. 그리고 주위온도에 의한 공진파장의 이동거리는 -0.35nm/$^{\circ}C$로 측정되었다.

• Journal of the Optical Society of Korea
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• 제15권4호
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• pp.398-402
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• 2011

In this paper, we have proposed a principle to design wideband, low dispersion and temperature stabilized slow light structure in slotted photonic crystal waveguide (SPCW). The infiltration of the silicon photonic crystal with polymer will enhance the slow light and increase the group index, whereas the different signs of thermo-optic coefficients of polymer and silicon make the proposed structure stable on temperature variation over $60^{\circ}C$ and improves the group index-bandwidth products of the designed structure. The SPCW structure is modified to maximize the slow light effect and minimize the dependence of the group index and hence the group velocity dispersion to temperature.

• 전자공학회논문지A
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• 제32A권12호
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• pp.166-172
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• 1995

A novel passive TE/TM polarization mode converter is fabricated by using poled polymer waveguides. The optic axis of the poling induced waveguide is slowly rotated by using a slowly varying structure of poling electrodes. Thus the polarization conversion is achieved as the guided mode propagates through the waveguide. The proposed device is simulated by a full vectorial beam propagation method (VBPM) for anisotropic medium. For the rotation length of 1 mm, the TE polarization of the guided mode is successfully converted to the TM polarization with negligible loss. Based on the simulation results, we fabricated the polarization converter which is tested by using 1.3 $\mu$m laser diode. TE to TM mode conversion is observed with a polarization extinction ratio higher than 30 dB, and the excess loss is less than 1 dB. The polarization conversion is relatively insensitive to wavelength since the device contains no periodic structures. These devices are easier to fabricate than others containing periodic structures.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2002년도 추계학술대회 논문집 전기물성,응용부문
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• pp.230-233
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• 2002

A new lithium niobate optical modulator with a polymer buffer layer on Ni in-diffused optical waveguide is proposed for the fist time, successfully fabricated and examined at a wavelength of 1.3 ${\mu}m$. The experimental results show that the measured half-wave voltage is of ${\sim}10$ V and the total measured fiber-to-fiber insertion loss is of ${\sim}-6.4$ dB for a 40 mm long waveguide at a wavelength of 1.3 ${\mu}m$, respectively.