• Title/Summary/Keyword: Polymer semiconductor

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Flexible E-Paper Displays Using Low-Temperature Process and Printed Organic Transistor Arrays

  • Jin, Yong-Wan;Kim, Joo-Young;Koo, Bon-Won;Song, Byong-Gwon;Kim, Jung-Woo;Kim, Do-Hwan;Yoo, Byung-Wook;Lee, Ji-Youl;Chun, Young-Tea;Lee, Bang-Lin;Jung, Myung-Sup;Park, Jeong-Il;Lee, Sang-Yoon
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.431-433
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    • 2009
  • We developed 4.8 inch WQVGA e-paper on plastic substrate using organic field effect transistors (OFETs). Polyethylene naphthalate (PEN) film was used as a flexible substrate and arrays of OFETs with bottom-gate, bottom-contact structure were fabricated on it. Lowtemperature curable organic gate insulating materials were employed and polymer semiconductor solutions were ink-jetted on arrays with high-resolution. At all steps, process temperature was limited below $130^{\circ}C$. Finally, we could drive flexible e-paper displays based on OFET arrays with the resolution of 100 dpi.

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The Properties of $Bi_2Mg_{2/3}Nb_{4/3}O_7$ Thin Films Deposited on Copper Clad Laminates For Embedded Capacitor (임베디드 커패시터의 응용을 위해 CCL 기판 위에 평가된 BMN 박막의 특성)

  • Kim, Hae-Won;Ahn, Jun-Ku;Ahn, Kyeong-Chan;Yoon, Soon-Gil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.45-45
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    • 2007
  • Capacitors among the embedded passive components are most widely studied because they are the major components in terms of size and number and hard to embed compared with resistors and inductors due to the more complicated structure. To fabricate a capacitor-embedded PCB for in-line process, it is essential to adopt a low temperature process (<$200^{\circ}C$). However, high dielectric materials such as ferroelectrics show a low permittivity and a high dielectric loss when they are processed at low temperatures. To solve these contradicting problems, we studied BMN materials as a candidate for dielectric capacitors. processed at PCB-compatible temperatures. The morphologies of BMN thin films were investigated by AFM and SEM equipment. The electric properties (C-F, I-V) of Pt/BMN/Cu/polymer were evaluated using an impedance analysis (HP 4194A) and semiconductor parameter analyzer (HP4156A). $Bi_2Mg_{2/3}Nb_{4/3}O_7$(BMN) thin films deposited on copper clad laminate substrates by sputtering system as a function of Ar/$O_2$ flow rate at room temperature showed smooth surface morphologies having root mean square roughness of approximately 5.0 nm. 200-nm-thick films deposited at RT exhibit a dielectric constant of 40, a capacitance density of approximately $150\;nF/cm^2$, and breakdown voltage above 6 V. The crystallinity of the BMN thin films was studied by TEM and XRD. BMN thin film capacitors are expected to be promising candidates as embedded capacitors for printed circuit board (PCB).

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Non-volatile Molecular Memory using Nano-interfaced Organic Molecules in the Organic Field Effect Transistor

  • Lee, Hyo-Young
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.31-32
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    • 2010
  • In our previous reports [1-3], electron transport for the switching and memory devices using alkyl thiol-tethered Ru-terpyridine complex compounds with metal-insulator-metal crossbar structure has been presented. On the other hand, among organic memory devices, a memory based on the OFET is attractive because of its nondestructive readout and single transistor applications. Several attempts at nonvolatile organic memories involve electrets, which are chargeable dielectrics. However, these devices still do not sufficiently satisfy the criteria demanded in order to compete with other types of memory devices, and the electrets are generally limited to polymer materials. Until now, there is no report on nonvolatile organic electrets using nano-interfaced organic monomer layer as a dielectric material even though the use of organic monomer materials become important for the development of molecularly interfaced memory and logic elements. Furthermore, to increase a retention time for the nonvolatile organic memory device as well as to understand an intrinsic memory property, a molecular design of the organic materials is also getting important issue. In this presentation, we report on the OFET memory device built on a silicon wafer and based on films of pentacene and a SiO2 gate insulator that are separated by organic molecules which act as a gate dielectric. We proposed push-pull organic molecules (PPOM) containing triarylamine asan electron donating group (EDG), thiophene as a spacer, and malononitrile as an electron withdrawing group (EWG). The PPOM were designed to control charge transport by differences of the dihedral angles induced by a steric hindrance effect of side chainswithin the molecules. Therefore, we expect that these PPOM with potential energy barrier can save the charges which are transported to the nano-interface between the semiconductor and organic molecules used as the dielectrics. Finally, we also expect that the charges can be contributed to the memory capacity of the memory OFET device.[4]

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Development of Volatile Organic Compound Pretreatment Device for Removing Exhaust Gas from Display Manufacturing Process (Display 제조공정 배출가스 처리를 위한 휘발성 유기화합물 전처리 장치 개발)

  • Moon, Gi-Hak;Kim, Jae-Yong
    • Applied Chemistry for Engineering
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    • v.30 no.5
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    • pp.523-529
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    • 2019
  • In this study, we investigated the pretreatment technologies of volatile organic compounds (VOCs) which is a problem as the semiconductor and display industry develops recently. The conventional concentrator used in the direct combustion system, is easily contaminated by the exhaust gas in the manufacturing process of the display, resulting in the low treatment efficiency of generated VOCs. Physical/Chemical analyses of the exhaust gas showed high boiling point and viscosity in addition to a large amount of molecular weight alcohols and oil components. In this study, we tried to treat degrading materials by using the heat exchanger in a pretreatment facility and some materials degrading the concentrator were condensed more than 90%. In addition, it was also confirmed that an auxiliary device of the grease filter could remove the redispersion polymer oil from the heat exchanger.

High-sensitivity Nitrogen Dioxide Gas Sensor Based on P3HT-doped Lead Sulfide Quantum Dots (P3HT가 도핑된 황화납 양자점 기반의 고감도 이산화질소 가스 센서)

  • JinBeom Kwon;YunTae Ha;SuJi Choe;Soobeen Baek;Daewoong Jung
    • Journal of Sensor Science and Technology
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    • v.32 no.3
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    • pp.169-173
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    • 2023
  • With the increasing concern of global warming caused by greenhouse gases owing to the recent industrial development, there is a growing need for advanced technology to control these emissions. Among the various greenhouse gases, nitrogen dioxide (NO2) is a major contributor to global warming and is mainly released from sources, such as automobile exhaust and factories. Although semiconductor-type NO2 gas sensors, such as SnO2, have been extensively studied, they often require high operating temperatures and complicated manufacturing processes, while lacking selectivity, resulting in inaccurate measurements of NO2 gas levels. To address these limitations, a novel sensor using PbS quantum dots (QDs) was developed, which operates at low temperatures and exhibits high selectivity toward NO2 gas owing to its strong oxidation reaction. Furthermore, the use of P3HT conductive polymer improved the thin film quality, reactivity, and reaction rate of the sensor. The sensor demonstrated the ability to accurately measure NO2 gas concentrations ranging from 500 to 100 ppm, with a 5.1 times higher sensitivity, 1.5 times higher response rate, and 1.15 times higher recovery rate compared with sensors without P3HT.

Fabrication of Polysulfone Hollow Fiber Membranes for N2/NF3 Separation (N2/NF3 분리용 폴리썰폰 중공사막 제조 연구)

  • Lim, Min Su;Kim, Seong-Joong;Kang, Ha Sung;Park, Ho Bum;Nam, Seung Eun;Park, Ho Sik;Lee, Pyung Soo;Park, You In
    • Membrane Journal
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    • v.26 no.1
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    • pp.76-85
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    • 2016
  • Fabrication of polysulfone (PSf) hollow fiber membranes was investigated for the separation of $N_2/NF_3$ gas mixtures, which are emitted from the display and the semiconductor industries. A combination of the non-solvent induced phase separation (NIPS) and the vapor-induced phase separation (VIPS) technique was applied to develop high flux hollow fiber membranes. Thin polymer layers were further coated onto the surface of the hollow fiber membranes by using polydimethylsiloxiane (PDMS) or Teflon AF1600(R), which contributes to improve the $N_2/NF_3$ selectivity. The $N_2/NF_3$ separation performances of our PSf hollow fiber membranes were determined by the intrinsic properties of coating materials. Especially, the PSf hollow fiber membrane coated with Teflon AF 1600(R) exhibited a higher $N_2/NF_3$ selectivity (> 14) with a slightly lower $N_2$ permeance (4.5 GPU), as compared to the commercial PSf counterparts. This feature provides a good potential as a membrane structure to separate $N_2/NF_3$.

UV-nanoimprint Patterning Without Residual Layers Using UV-blocking Metal Layer (UV 차단 금속막을 이용한 잔류층이 없는 UV 나노 임프린트 패턴 형성)

  • Moon Kanghun;Shin Subum;Park In-Sung;Lee Heon;Cha Han Sun;Ahn Jinho
    • Journal of the Microelectronics and Packaging Society
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    • v.12 no.4 s.37
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    • pp.275-280
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    • 2005
  • We propose a new approach to greatly simplify the fabrication of conventional nanoimprint lithography (NIL) by combined nanoimprint and photolithography (CNP). We introduce a hybrid mask mold (HMM) made from UV transparent material with a UV-blocking Cr metal layer placed on top of the mold protrusions. We used a negative tone photo resist (PR) with higher selectivity to substrate the CNP process instead of the UV curable monomer and thermal plastic polymer that has been commonly used in NIL. Self-assembled monolayer (SAM) on HMM plays a reliable role for pattern transfer when the HMM is separated from the transfer layer. Hydrophilic $SiO_2$ thin film was deposited on all parts of the HMM, which improved the formation of SAM. This $SiO_2$ film made a sub-10nm formation without any pattern damage. In the CNP technique with HMM, the 'residual layer' of the PR was chemically removed by the conventional developing process. Thus, it was possible to simplify the process by eliminating the dry etching process, which was essential in the conventional NIL method.

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