• Bulletin of the Korean Chemical Society
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• 제26권12호
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• pp.2027-2032
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• 2005

This paper demonstrates details of thermal behavior of Langmuir-Blodgett (LB) film of poly(tert-butyl methacrylate) (PtBMA) by using the principal component analysis based two-dimensional correlation spectroscopy (PCA2D) through eigenvalue manipulating transformation (EMT). By uniformly lowering the power of a set of eigenvalues associated with the original data, the smaller eigenvalues becomes more prominent and the subtle contribution from minor components is now highlighted much more strongly than the original data. Thus, the subtle difference of thermal behavior of LB film of PtBMA from minor components, which is not readily detectable in the conventional 2D correlation analysis, is much more noticeable than the original data. PCA2D correlation spectra with EMT operation for the temperature-dependent IR spectra of LB film of PtBMA reveal the hidden property of phase transition processes during heating.

• 대한화학회지
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• 제48권1호
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• pp.39-45
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• 2004

산에 민감한 작용기를 갖는 tert-butyl methacrylate(tBMA)와 산 증식 기능을 갖는 4-hydroxy-4''p-styrenesulfonyloxyisopropylidene dicyclohexane(HSI)과 4-p-styrenesulfonyloxy-4''-tosyloxyisopropylidene dicyclohexane (STI)를 둘 다 함께 갖고 있는 공중합체를 새로운 고분자 산증식형 포토레지스트로 합성하였다. 산증식형 공중합체인 Poly(HSI-co-tBMA) film과 Poly(STI-co-tBMA) film은 산의 부재 시에는 레지스트 공정 온도에 대하여 충분한 열적 안정성을 나타내었다. Poly(STI-co-tBMA) film의 감도는 tBMA homopolymer에 비교하여 2배 정도 증진되었지만, Poly(HSI-co-tBMA) film은 오히려 2배 정도 감도가 저하되는 결과를 나타내었다. 고분자에 도입한 이러한 산증식 기능을 갖는 그룹의 구조에 따라 광감도 증진 효과가 다르게 나타남을 확인하였다.

• 한국인쇄학회지
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• 제20권2호
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• pp.131-140
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• 2002

Chemically amplified deep UV(CA-DUV) resists are typically based on a combination of an acid labile polymer and a photoacid generator(PAG) but acid amplification type photoresist is formulated by addition of the acid amplifiers to chemically amplified resist system(CAPs). We developed acid amplifiers base on cyclohexanediol such as 1-methacryloyloxy-4-tosyloxy cyclohexane(MTC) and poly(MTC$_{10}$-co-tBMA$_{90}$)(P-1) to enhance photosensitivity. P-1 is a copolymer of tert-butyl methacrylate and MTC as a positive working photoresist based on polymeric acid amplifier in order to enhance photosensitivity and simplify the process of fomulating a photoresist. P-1 exhibited 2X higher photosensitivity compared with PtBMA. The acid amplifiers showed reasonable thermal stability for resist processing temperature and higher photosensitivity compared with chemically amplified resist.

• Korean Membrane Journal
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• 제9권1호
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• pp.57-63
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• 2007

Amphiphilic graft copolymer from poly(vinylidene fluoride) (PVDF) was synthesized using atom transfer radical polymerization (ATRP) for composite nanofiltration membranes. Direct initiation of the secondary fluorinated site of PVDF facilitates grafting of tert-butyl methacrylate (tBMA). Amphiphilic PVDF-g-PMAA graft copolymer with a 51:49 wt ratio was obtained by hydrolyzing poly(tert-butyl methacrylate) (PtBMA) to poly(methacrylic acid) (PMAA). Wide angle X-ray scattering (WAXS) and differential scanning calorimetry (DSC) confirmed the decrease of crystallinity of PVDF upon graft copolymerization. Composite nanofiltration membranes were prepared from PVDF-g-PMAA as a top layer coated onto PVDF ultrafiltration (UF) support membrane. The morphology and hydrophilicity of membranes were characterized using scanning electron microscopy (SEM) and contact angle measurement. The rejections of composite membranes were 80.2% for $Na_2SO_4$ and 28.4% for NaCl, and the solution flux were 9.5 and $14.5\;L/m^2\;h$ at 1.0 MPa pressure.

• 공업화학
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• 제16권5호
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• pp.660-663
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• 2005

새로운 산증식제를 개발하기 위하여 2-hydroxyphenyl-4-methylbenzenesulfonate (1), 3-hydroxyphenyl-4-methylbenzene-sulfonate (2), 4-hydroxyphenyl-4-methylbenzenesulfonate (3)가 우수한 열적 성질을 갖는 방향족 산증식제로서 합성되었다. 이러한 새로운 산증식제들은 광산발생제로부터 생성된 소량의 산에 의해 자동촉매반응으로 p-톨루엔술포산을 생성하였다. 이러한 방향족 술포산 에스터들은 poly(tert-butyl methacrylate, PtBMA) 필름에서 우수한 열적 안정성을 보였고 감도증진제로서 작용하는 최초의 방향성 산증식제임이 증명되었다. 화학 증폭형 포토레지스트에 합성한 방향족 산중식제를 첨가한 경우에 감도가 3~6배 정도 증진되었다.