• Title/Summary/Keyword: Poly(ester-imide)

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Synthesis and Properties of Poly(ester-imide) Resin for High Temperature Resistant Electrical Insulation (고내열성 전기 절연용 Poly(ester-imide) 수지의 합성 및 물성)

  • Huh, Wansoo;Lee, SangWon;Kim, Jeongyeol;Park, Leesoon;Kim, Soonhak;Haw, JungRim
    • Applied Chemistry for Engineering
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    • v.10 no.5
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    • pp.767-771
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    • 1999
  • Poly(ester-imide)(PEI) for the electrical insulation coating was synthesized and evaluated with one-step method as well as two-step method. For the synthesis of poly(ester-imide), imide repeat unit of N,N'-(4,4'-diphenylmethane) bistrimellitimide(DID) was initially made from trimellitic anhydride(TMA) and methylene dianiline(MDA), followed by the second stage reaction of esterification. One-step reaction was performed by reaction of TMA, MDA, dimethyl terephthalate(DMT), ethylene glycol(EG), and 1,3,5-tris-(2-hydroxy ethyl) isocyanurate(THEIC) in m-cresol solvent at a time. The synthesized poly(ester-imide) was cured with xylene, P-5030K(phenol-formaldehyde resin), TK-8(TDI type blocked polyisocyanate) and tetrapropyltitanate(TPT). It was found that the content of hydroxyl group, amount of DMT, and imide repeat unit played important role for the properties of electrical insulation coating film.

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Synthesis and Characterization of New Positive Photosensitive Polyimide Having Photocleavable 4,5-Dimethoxy-2-nitrobenzyl (DMNB) Groups (감광성 DMNB 기를 함유한 새로운 포지형 감광성 폴리이미드의 합성 및 물성)

  • 최옥자;류윤미;정민국;이명훈
    • Polymer(Korea)
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    • v.26 no.6
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    • pp.701-709
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    • 2002
  • To synthesize a new positive photosensitive polyimide precursor, parts of carboxylic acid groups in poly (amic acid) were esterified with 4,5-dimethoxy-2-nitrobenzyl bromide in the presence of K$_2$CO$_3$/HMPA followed by the chemical imidization of residual carboxylic acid units. The chemical structure of resulting polymer was characterized by $^1$H-NMR, UV/vis and FT-IR spectroscopic methods, and its thermal properties were examined by DSC and TGA. Upon UV irradiation, 4,5-dimethoxy-2-nitrobenzyl moiety underwent the photodegradation. As a result, the polymer became soluble in alkaline developer due to the formation of carboxylic acid moiety, which was used to make a micron-sized positive pattern. Sensitivity curves were obtained from the gel fraction experiments with respect to the various 4,5-dimethoxy-2-nitrobenzyl ester contents. From those curves, the sensitivity was ranged iron 4000 to 6000 mJ/㎠, and the contrast was measured to be from 3.1 to 4.9.

Characterizations of Copoly(ester imide)s with New 2,7-Dihydroxynaphthalene Bis(trimellitate anhydride) (새로운 2,7-Dihydroxynaphthalene Bis(trimellitate anhydride) 무수물을 이용한 폴리(에스터 이미드) 공중합체의 특성)

  • Ju, Jieun;Chang, Jin-Hae
    • Polymer(Korea)
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    • v.38 no.5
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    • pp.632-639
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    • 2014
  • 2,7-Dihydroxynaphthalene bis(trimellitate anhydride) (2,7-TA) was synthesized from trimellitic anhydride chloride and 2,7-dihydroxynaphthalene. Copolyimides (Co-PI) containing ester group were synthesized from 2,7-TA, pxylylenediamine, and 2,2'-bis(trifluoromethyl)benzidine (TFB). The Co-PI films were obtained from poly(amic acid) by solution casting through thermal imidization on a glass plate. The thermal property, gas permeation, and optical transparency of the Co-PI films with various TFB monomer contents were investigated. These Co-PIs could be solution-cast into a flexible and tough film. The cast Co-PI films exhibited high optical transparency with a cut-off wavelength of 370~395 nm in UV-vis. absorption and a low yellow index value of 3.55~7.63. The thermal property of Co-PI films increased linearly with increasing TFB content. However, the oxygen permeation and optical transparency of the Co-PI films was found to worsen with increasing TFB content.