• Title/Summary/Keyword: Polisher

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Development of Large-Scale Rice Polisher with Double Polishing Stages (2단계 연마방식 대형 연미기의 개발)

  • 정종훈
    • Journal of Biosystems Engineering
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    • v.24 no.4
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    • pp.309-316
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    • 1999
  • This study was conducted to develop a large-scale rice polisher with double polishing stages for producing clean rice with high quality in rice processing complexs. The performance of the developed rice polisher was evaluated and improved. The results obtained from this study were as followings : 1. A large-scale rice polisher with double polishing stages was developed, which consisted of two polishing chambers(polishing part I and II), two spraying parts, a feeding part, power of 37kW, control panel, etc. Especially, the purpose of polishing part Iwere to uniformly mix white rice sprayed with water and to remove bran particles from the rice. the roller surface of the polishing part I was coated with chromium. 2. The capacity of the developed rice polisher was 4t/h. The broken rice rate of the polisher was less than 0.2%, compared with about 1% of others. 3. The whiteness increment of the developed polisher was 2.6~3.0% compared with about 2.3~2.5% of others. 4. The energy consumption of the developed polisher was 0.5kWh/100kg. 5. The developed polisher was improved with the angle change of screen slot of the polishing chamber I. The broken rice rate was reduced from about 0.5% to about 0.2% as the max. internal pressure of the polishing chamber II decreased by 0.4kg/$\textrm{cm}^2$ due to the increase of resistance in the polishing chamber I. The whiteness of the polisher showed more than 38~39. 6. The developed rice polisher showed high performance, compared with other domestic and foreign polishers.

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Performance Evaluation and Improvement of Medium and Small Scale Rice Polishers(II) - medium scale rice polisher - (중.소형 연미기의 성능평가 및 성능개선에 관한 연구(II) - 중형 연미기에 대하여 -)

  • 정종훈;권홍관
    • Journal of Biosystems Engineering
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    • v.23 no.5
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    • pp.445-456
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    • 1998
  • This study was carried out to evaluate the performance of a medium scale rice polisher of 2.5 t/h and to improve its performance for producing the clean rice with high quality. The maximum internal pressure, broken rice ratio. whiteness in the rice polisher were investigated, and the effects of outlet resistance, water spraying rate, shaft revolution speed and rice moisture content on the polishing performance were analyzed to find out proper operating conditions. The conclusions of this study were as follows: 1. In the performance evaluation of the polisher, the broken rice ratio increment of 0.1%, the max. internal pressure of about 11 N/${cm}^2$, and whiteness increment of 2.2~3.7 resulted at the conditions of 20 PS driving power, 950 rpm, 150 cc/min water spraying rate, 44.1 Nㆍcm outlet resistance and about 15% rice moisture content. 2. Though max. internal pressure and whiteness at the 17% rice moisture content were higher than those at the 15% moisture content under the same operating conditions of the polisher, but the broken rice rate at the 17% moisture content was absolutely low compared with that at 15% moisture content. The water spraying effect to reduce broken rice and to increase whiteness was much significant at the 15% moisture content not significant at 17% moisture content. 3. The main parameter of the performance was outlet resistance, and low resistance of about 44.1 Nㆍcm was recommended at the polisher. 4. The proper water spraying rate in the polisher was about 150 cc/min. 5. As the shaft revolution speed decreased from 950 rpm and 800 rpm to 650 rpm, the broken rice ratio increased and whiteness decreased. 6. As the driving power of the polisher increased from 20 PS to 30 PS, the max. internal pressure decreased by about 1~2.5 N/${cm}^2$ and whiteness increased by about 1~2, but the broken rice rate was not changed. 7. The proper operating conditions of the polisher seemed to be the revolution speed of 800-950 rpm, the water spraying rate of about 150 cc/min, the oulet resistance of about 44.1 N.cm and 30 PS driving power.

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Performance Evaluation and Improvement of Rice Polishers of Small and Medium Size(I)-rice polisher of small size- (중.소형 연미기의 성능평가 및 성능개선에 관한 연구 (I)-소형연미기에 대하여 -)

  • 정종훈;최영수;권홍관
    • Proceedings of the Korean Society for Agricultural Machinery Conference
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    • 1997.06c
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    • pp.141-149
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    • 1997
  • Structural characteristic of a rice polisher of small size was analyzed to improve its performance and to utilize such data in developing a rice polisher of large size. Spraying characteristic of nozzles which were used for rice polishing was evaluated by a machine vision system. Internal pressure of the polishing chamber was also measured according to outlet resistance, water spraying, and roller shaft speed. In addition, the performance of the polisher was analyzed based on whiteness and broken ratio according to operating conditions.

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Wear for Polisher Brush of EGL Plating Cell using Finite Element Analysis (유한요소해석을 이용한 EGL 도금조 Polisher Brush의 마모예측)

  • Ku, J.K.;Noh, H.G.;Heo, S.C.;Song, W.J.;Ku, T.W.;Kim, J.;Kang, B.S.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2009.10a
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    • pp.342-345
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    • 2009
  • Electro galvanized steel is electroplated cold roller steel for improving corrosion resistance and paintability, and is widely used in automobiles and home appliances. In the electroplating line for manufacturing electro galvanized steel if plating process is carried out with impurity on conductor roll surface, the defects in manufacturing process occurs because of steel fault. For quality, polishing is always required to separate impurity on surface of conductor roll. In this study, finite element analysis of wear for polisher brush is carried out for replaced time of it.

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A Study on the Mo Sputtering and HF Wet Etching for the Fabrication of Polisher (광택기 제조를 목적으로 한 스퍼터링을 이용한 Mo 증착과 불산 습식 식각 특성 연구)

  • Kim, Do-Hyoung;Lee, Ho-Deok;Kwon, Sang-Jik;Cho, Eou-Sik
    • Journal of the Semiconductor & Display Technology
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    • v.16 no.4
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    • pp.16-19
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    • 2017
  • For the economical and environmental-friendly fabrication of polisher, Mo mask layer were sputtered on glass substrate instead of Cr mask material. Mo mask layers were sputtered by pulsed-DC sputtering and Photoresist patterns were formed on Mo mask layer for different develop times and optimized. After Mo mask layer were patterned and exposed glass was wet etched by HF solution for different etching times, the remaining Mo mask was stripped by using Al etchant. Develop time of 30 sec and HF wet etching time of 3 min were selected as optimized process condition and applied to the fabrication of polisher.

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Improvement of CMP and Cleaning Process of Large Size OLED LTPS Thin Film Using Oscar Type Polisher (Oscar형 연마기를 이용한 대면적 OLED용 LTPS 박막의 CMP 처리 및 세정 공정 개선)

  • Shim, Gowoon;Lee, Hyuntaek;Song, Jongkook
    • Journal of the Semiconductor & Display Technology
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    • v.21 no.4
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    • pp.71-76
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    • 2022
  • We evaluated and developed a 6th generation large-size polisher in the type of face-up and Oscar. We removed the hillocks of the low temperature poly-silicon (LTPS) thin film with this polisher. The surface roughness of LTPS was lowered from 7.9 nm to 0.6 nm after CMP(chemical mechanical polishing). The thickness of the LTPS is measured through reflectance in real time during polishing, and the polishing process is completed according to this thickness. The within glass non-uniformity (WIGNU) was 6.2% and the glass-to-glass non-uniformity (GTGNU) was 2.5%, targeting the LTPS thickness of 400Å. In addition, the residual slurry after the CMP process was removed through the Core Flow PVA Brush and alkaline chemical.

Performance Evaluation and Improvement of Medium and Small Scale Rice Polishers (I) -small scale rice polisher - (중.소형 연미기의 성능평가 및 성능개선에 관한 연구 (I) -소형 연미기에 대하여 -)

  • 정종훈;최영수;권홍관
    • Journal of Biosystems Engineering
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    • v.23 no.3
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    • pp.245-252
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    • 1998
  • The structural characteristics of a small scale rice polisher was analyzed to improve its performance. Spraying characteristic of nozzles used for rice polishing was also analyzed by a machine vision system. The internal pressure of the polishing chamber was measured according to outlet resistance, water spraying, and roller shaft speed. In addition, the performance of the rice polisher was evaluated to improve it in the basis of internal pressure in polishing chamber, whiteness, and broken rice ratio of clean rice according to the operating conditions. Actual nozzle discharge rate and drop size were 125 cc/min and 86~97 ${\mu}{\textrm}{m}$, respectively. In the case of water spraying on rices, the internal pressure showed 4.9~9.8N/$\textrm{cm}^2$ increase. broken rice ratio decreased, and there was no difference in whiteness. The internal pressure inueased up to two times with the increase of the outlet resistance. Also, the pressure at the upper part of screen was one and half times as high as the pressure at the lower part. In the case of water spraying rate of 150 cc/min, the roller shaft speed of 850 rpm resulted in no difference in whiteness and decrease of 0.3% in broken rice ratio, comparing to the roller shaft speed of 950 rpm.

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The Influence of Plate Structure in Membrane Embedded Head Polisher (Membrane Embedded Polisher Head의 Plate 구조의 영향)

  • Cho, Gyung-Su;Lee, Yang-Won;Kim, Dae-Young;Lee, Jin-Kyu;Kim, Hwal-Pyo;Jeong, Jae-Deok;Ha, Hyeon-U;Jeong, Ho-Seok;Yang, Won-Sik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.11a
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    • pp.136-139
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    • 2004
  • The requirement of planarity, such as with-in-wafer nonuniformity, post thickness range, have become increasingly stringent as critical dimensions of devices are decreased and a better control of a planarity become important. The key factors influencing the planarity capability of the CMP process have been well understood through numerous related experiments. These usually include parameters such as process pressures, relative velocities, slurry temperature, polishing pad materials and polishing head structure. Many study have been done about polishing pad and its groove structure because it's considered as one of the key factors which can decide wafer uniformity directly. But, not many study have been done about polisher head structure, especially about polisher head plate design. The purpose of this paper is to know how the plate structure can affect wafer uniformity and how to deteriorate wafer yield. Furthermore, we studied several new designed plate to improve wafer uniformity and also improve wafer yield.

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Transmission Electron Microscopy Specimen Preparation of Delicate Materials Using Tripod Polisher

  • Cha, Hyun-Woo;Kang, Min-Chul;Shin, Keesam;Yang, Cheol-Woong
    • Applied Microscopy
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    • v.46 no.2
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    • pp.110-115
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    • 2016
  • Transmission electron microscopy (TEM) is a powerful tool for analyzing a broad range of materials and provides localized information about the microstructure. However, the analysis results are strongly influenced by the quality of the thin foil specimen. Sample preparation for TEM analysis requires considerable skill, especially when the area of interest is small or the material of interest is difficult to thin because of its high hardness and its mechanical instability when thinned. This article selectively reviews recent advances in TEM sample preparation techniques using a tripod polisher. In particular, it introduces two typical types (fl at type and wedge type) of TEM sample preparation and the benefits and drawbacks of each method; finally, a method of making better samples for TEM analysis is suggested.

Application of Air-Polisher (Air-Polisher의 응용법)

  • Kim, Min Jung
    • Journal of the Korean Academy of Esthetic Dentistry
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    • v.7 no.1
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    • pp.72-78
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    • 1998
  • Recently, esthetic dentistry has been developed because beauty is pursued by both dentists and patients. A scope of esthetic treatment has been expanded and the roles of hygienists in dental treatment have also become of importance. Generally, we make use of the ultra-sonic scaler to remove the stains attached to teeth surfaces, but when we utilize the rubber cup and pumice in prophylaxis, this increases the hypersensitivity, patient's anxiety, and chairtime. So, we substitute Air-polishing that increases patient's satisfaction and decreases chairtime for above method, Here, I would like to explain indications and contraindications, advantages and disadvantages, and usages of Air-polilshing briefly.

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