• 한국표면공학회지
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• 제55권2호
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• pp.120-132
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• 2022

In the non-cyanide-based electroless Au plating solution using thiomalic acid as a complexing agent and aminoethanethiol as a reducing agent, analysis of each component constituting the plating solution is essential for the analysis of the reaction mechanism. And component analysis in the plating solution is important for monitoring component changes in the plating process and optimizing the management method. Capillary Electrophoresis (CE) method is rapid, sensitive and quantitative and could be readily applied to analysis of Auⁿ⁺ ion, complexing agent and reducing agent in electroless Au plating solution. In this study, the capillary electrophoresis method was used to analyze each component in the electroless Au plating solution in order to elucidate the complex bonding form and the plating mechanism of the non-cyanide-based electroless Au plating bath. The purpose of this study was to establish data for optimizing the monitoring and management method of plating solution components to improve the uniformity of precipitation and stability. As a result, it was confirmed that the analysis of thiomalic acid as a complexing agent and Auⁿ⁺ ions and the analysis of aminoethanethiol as a reducing agent were possible by capillary electrophoresis. In the newly developed non-cyanide-based electroless Au plating solution, it was confirmed that Auⁿ⁺ ions exist in the form of Au⁺ having a charge of +1, and that thiomalic acid and Au⁺ are combined in a molar ratio of 2 : 1. In addition, it was confirmed that aminoethanethiol can form a complex by combining with Au⁺ ions depending on conditions as well as acting as a reducing agent.

• 한국정밀공학회지
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• 제26권6호
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• pp.114-121
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• 2009

Mobile phone is a representative personal communication tool among wireless communication devices. Recently, with the miniaturization and light-weight trend of mobile phone, the vibration motor has been replaced by coin type. The required performances of coin type vibration motor needed by user are long life, higher vibration, and thin thickness. Also the most important factor determines the performance of vibration motor is long-term reliability, which is mainly related to PCB plating technique for commutator. In this study, three types of fault were categorized to analyze the cause for malfunction of vibration motor. And, hardness and surface morphology on plating surface are also investigated to optimize the plating method and plating conditions. As a result, new plating method and conditions were proposed to increase the durability of PCB commutator.

• 환경위생공학
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• 제17권3호
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• pp.37-45
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• 2002

The Purpose of this study is to reduce environmental problems caused by landfill of bituminous coal fly ash emitted from the power plant and to reuse it. First of all, we experimented that Al and Si elements were extracted from fly ash and investigated that extracted Al and Si elements night use a coagulant. The extraction was carried out under various conditions ; concentration of the extraction solution, calcination temperature and calcination time. As the results, it was found that the optimum conditions of the extraction of Al and Si elements from fly ash were as follows, concentration of NaOH was 5N for both of them, calcination temperature was $700^{\circ}C$ and $600^{\circ}C$ and calcination time was 1hr and 1.5hr, respectively The extracted solution was used as a coagulant to treat the diluted metal-plating solutions which contained Pb and Cu, respectively. As the result of treatment on the diluted Pb-plating solution with 315NTU, the removal efficiency of turbidity was more than 90%, and the removal efficiency of Pb was about 80%. As for treatment of the non-turbid diluted Cu-plating solution, the removal efficiency of Cu was about 98%.

• 폴리머
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• 제31권3호
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• pp.184-188
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• 2007

산성 도금조에서 차인산나트륨을 환원제로 하는 무전해 도금법을 사용하여 직경 $4{\mu}m$의 PMMA(poly-methylmethacrylate)/HDDA(1,6-hexanedioldiacrylate) 단분산 가교 고분자 미립자에 니켈층을 코팅할 시 1) 전처리 조건변화, 2) 도금조 온도변화, 3) 도금조 pH 변화, 및 4) 초기 도금조 pH 조절 등에 따라서 도금속도, 도금면의 상태 및 도금 재현성을 관찰하였다. 무전해 도금에서의 전처리 과정은 모든 단계가 중요하였으나 특히 conditioning 및 acceleration 과정이 균일한 도금층을 형성하는데 중요하였고, 도금조 온도 및 pH의 상승에 따라서 도금속도가 증가하였으며, 특히 초기 도금조의 pH의 조절이 도금 재현성을 확보하는데 매우 중요하였다.

• 한국추진공학회:학술대회논문집
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• 한국추진공학회 2009년도 제33회 추계학술대회논문집
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• pp.603-607
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• 2009

액체로켓엔진 연소기의 내벽에 사용하기 위한 니켈/크롬 도금 공정 개발을 수행하였다. 열충격 시험을 통해 니켈 도금 조건을 선별하였고 니켈/크롬 도금이 수행된 축소형 연소기의 연소시험을 통해 도금 층의 내구성 검증을 수행하였다. 시험결과 도금 층의 균열 및 박리는 발견되지 않았고, 이 결과로부터 현재 사용중인 대기 플라즈마 용사된 세라믹 코팅의 대안으로 니켈/크롬 도금을 액체로켓엔진 연소기에 사용할 수 있으리라 사료된다.

• 한국표면공학회지
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• 제25권4호
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• pp.189-206
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• 1992

The effect of activation and electroless nickel plating conditions on contact properties was investi-gated for selective electroless nickel plating of Si wafers in order to obtain an optimum condition of con-tact hole filling. According to RCA prosess, p-type silicon (100) surface was cleaned out and activated. The effects of temperature, DMAB concentration, time, and strirring were investigated for activation of p-type Si(100) surface. The optimal activation condition was 0.2M HF, 1mM PdCl2, 2mM EDTA,$ 70^{\circ}C$, and 90sec under ultrasonic vibration. In electroless nickel plating, the effect of temperature, DMAB concentra-tion, pH, and plating time were studied. The optimal plating condition found was 0.10M NiSO4.H2O, 0.11M Citrate, pH 6.8, $60^{\circ}C$, 30minutes. The contact resistance of films was comparatively low. It took 30minutes to obtain 1$\mu\textrm{m}$ thick film with 8mM DMAB concentration. The film surface roughness was improved with decreasing temperature and decreasing pH of the plating solution. The best quality of the film was obtained at the condition of temperature $60^{\circ}C$ and pH 6.0. The micro-vickers hardness of film was about 800Hv. Plating rate of nickel on the hole pattern was slower than that of nickel on the line pattern.

• 마이크로전자및패키징학회지
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• 제22권1호
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• pp.51-54
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• 2015

An electro-plating technology on a cured isotropic conductive pattern with a hybrid Cu paste composed of resin matrix, copper, and solder powders has been developed. In a conventional technology, Ag paste was used to perform a conductive pattern on a PCB or silicon substrate. From previous research, the electrical conductive mechanism and principle of the hybrid Cu paste were concisely investigated. The isotropic conductive pattern on the PCB substrate was performed using screen-printing technology. The optimum electro-plating condition was experimentally determined by processing parameters such as the metal content of the hybrid Cu paste, applied current density, and time for the electroplating in the plating bath. The surfaces and cross-sections were observed using optical and SEM photographs. In conclusion, the optimized processing conditions for Cu electro-plating technology on the conductive pattern were a current density of $40mA/cm^2$ and a plating time of 20min on the hybrid Cu paste with a metal content of 44 vol.%. More details of the mechanical properties and processing conditions will be investigated in further research.

• 한국융합학회논문지
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• 제8권11호
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• pp.307-312
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• 2017

산업계에서는 희생양극의 원리를 이용한 아연도금이 사용되고 있다. 순수아연도금보다 내식성을 증가시키기 위한 방안의 하나로 Zn-Ni 합금도금이 개발되었다. 합금 도금층은 순 아연 도금층에 비하여 4-5배의 내식성을 가지고 있어서 도금 단가가 높음에도 불구하고 고내식성을 요구하는 자동차 부품 등에 적용이 증가되고 있다. Zn-Ni 합금도금액은 황산욕, 염화욕, 알칼리욕과 암모니아욕 등이 사용되고 있다. 여기에서는 염화욕에서 합금도금의 조성에 미치는 전해조건의 영향을 조사하였다. 그 결과는 음극 과전압 및 확산계수에 의해 설명하였다. 일반적으로 음극의 과전압이 증가함에 따라 활성화분극보다 농도분극이 중요하게 된다. 농도분극은 확산 층 내의 원소 확산에 의해 결정된다. 즉 음극의 과전압이 증가함에 따라 확산계수가 큰 Zn 함량이 증가한다.

• 한국표면공학회지
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• 제32권4호
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• pp.487-495
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• 1999

In order to form metallic electrodes on PZT (Pb (Zr, Ti)O$_3$) ceramics, plating conditions for optimal electroless Ni deposition were investigated. Pb in PZT is the major component to inhibit the electroless deposition, because it plays a active role of catalytic poison in plating solution. Adhesion of the electroless Ni deposits is measured by push-pull scale test and peel test. Results such as deposition ability, deposition rate, and thickness of deposits showed in terms of concentration of etchant, composition of catalyzing solution, and composition and pH of electroless bath solution.

• 산업경영시스템학회지
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• 제26권1호
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• pp.1-6
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• 2003

In this paper, we proposed the optimal process conditions on the electro-gilding process. The responses are plating thickness and Sn proportion. The factors are temperature, current density, and addition. We minimized the total number of experiments based on the principle of dividing into small part. We grouped the factors using the plating process information which we already knew. We did Hull Cell test to find relationship between plating solution and electric effects, and applied ANOVA and RSM to estimate the optimal process conditions.