• Title/Summary/Keyword: Plasma temperature

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Measurement of EUV Emission and its Plasma Parameters Generated from the Coaxial Plasma Focus of Mather and Hypocycloidal Pinched Electrodes

  • Lee, Sung-Hee;Lee, Kyung-Ae;Hong, Young-June;Uhm, Han-Sup;Choi, Eun-Ha
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.332-332
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    • 2011
  • The extreme ultraviolet (EUV) radiation, whose wavelength is from 120 nm down to 10 nm, and the energy from 10 eV up to 124 eV, is widely utilized such as in photoelectron spectroscopy, solar imaging, especially in lithography and soft x-ray microscopy. In this study, we have investigated the plasma diagnostics as well as the debris characteristics between the two types of dense plasma focusing devices with coaxial electrodes of Mather and hypocycloidal pinch (HCP), respectively. The EUV emission intensity, electron temperature and plasma density have been investigated in these cylindrical focused plasma along with the debris characteristics. An input voltage of 5 kV has been applied to the capacitor bank of 1.53 uF and the diode chamber has been filled with Ar gas at pressure ranged from 1 mTorr and 180 mTorr. The inner surface of the cathode was covered by polyacetal insulator. The central anode electrode has been made of tin. The wavelength of the EUV emission has been measured to be in the range of 6~16 nm by a photo-detector (AXUV-100 Zr/C, IRD). The visible emission has also been measured by the spectrometer with the wavelength range of 200~1,100 nm. The electron temperature and plasma density have been measured by the Boltzmann plot and Stark broadening methods, respectively, under the assumption of local thermodynamic equilibrium (LTE).

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The Optical Property of Plasma-treated ZnO Nanorods (플라즈마 처리한 ZnO 나노막대의 광학적 특성)

  • Cho, Hyun-Min;Yu, Se-Gi;Cho, Jae-Won
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.3
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    • pp.230-234
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    • 2009
  • Hydrogen and Oxygen plasma treatments have been done on sonochemical grow ZnO nanorods by varying treatment temperature and time, The changes(position and intensity) in ultraviolet(UV) peaks and green peaks of photoluminescence(PL) spectroscopy have been measured, Experimental results showed; i) in the case of hydrogen plasma treatment, the blue shift of UV peak and the increase of PL intensity of the UV peak were observed as the increase of the process time and temperature, ii) in the case of oxygen plasma treatment, the red shift of green peak was observed and the ratio of $I_{Green}/I_{UV}$ was also increased, as the increase of the process time and the temperature.

Surface Hardening Technology of the Metal by High Temperature Pulsed Plasma Flux (High Temperature Pulsed Plasma Flux 응용 금속 표면경화 공정기술)

  • 권식철;채병규;이건환;백운승
    • Journal of Welding and Joining
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    • v.19 no.4
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    • pp.375-378
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    • 2001
  • The new development of the surface hardening technology has been attracted to machine designer and materials scientist in the view point of improvement in the lifetime and performance of the machine. The heat-treatment process has been a well-known technology to make harden the metal surface despite of its inefficiency in productivity and its inherent environmental pollution problem. Therefore, the plasma technology has been applied to the conventional process to improve the above issues and become successful in diminishing the ecological harmfulness. However, the drastic short processing time has been sought to increase the productivity by means of new plasma technology so-called, high temperature pulsed plasma flux (HTPPF). The basic principle and features of this HTPPF will be introduced and the present status of this technology will be described in this paper.

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Functional Improvement of Poly(Vinyl Alcohol) Polarized Film by $O_2$ Low Temperature Plasma Treatment (산소 저온 플라즈마 처리에 의한 PVA 편광필름의 기능성 개선)

  • Park, Young-Mi;Hwang, Jong-Ho;Gu, Kang
    • Textile Coloration and Finishing
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    • v.16 no.3
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    • pp.14-21
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    • 2004
  • In this research, we accomplished in order to improving color fastness of sublimation for Poly (vinyl alcohol) (PVA)-iodine polarized film. The poor iodine sublimation problem has greatly improved by $O_2$ low temperature plasma treatment. We obtained the followings: (1) plasma treatment has contributed in adhesive ability via peel strength, AFM image and roughness were investigated, But the improvement in adhesive strength was not linearly proportional to the treatment time. (2) $O_2$ plasma treated PVA-iodine polarized film was good enough as to maintain the transmittance and polarization even after iodine cone. of 0.05mol/L and dipping time of 50sec. (3) $O_2$ low temperature plasma treated PVA-iodine polarized film has obtain high durability because of good adhesive strength.

A study on the physical behavior of arc plasmas in transferred-type Torch (이행형 토치에서의 아크 플라즈마의 물리적 거동에 관한 연구)

  • 김외동;고광철;강형부
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.45 no.3
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    • pp.415-425
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    • 1996
  • This study presents an analytical method of solving the behaviors of arc plasma in a nozzle constricting transferred-type torch and purposes to obtain the basic data for the design of a plasma torch, which can be obtained from the temperature, pressure, velocities and voltage distributions. We have to solve some conservation equations simultaneously and need to know the exact thermal gas properties in order to obtain the correct behaviors of arc plasma. It is also necessary to give the relevant physical or geometric boundary conditions. For the simplicity of analysis, we assumed that (a) the plasma flow is laminar, (b)the local thermodynamic equilibrium, i.e. LTE, prevails over the entire arc column region. The electrode sheath effects were neglected and the nozzle area was excluded from the analysis by assuming that the current flow into the nozzle is zero. We solved the momentum transfer equation including the self-magnetic pinch effect, and obtained the temperature distribution from the energy conservation equation. From this temperature, we could get arc voltage distribution. (author). refs., figs., tabs.

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Development of New High Temperature Plasma Sources for Spectrochemical Analysis: Multivariate Optimization by the Modified Sequential Simplex Method

  • Lee, Gae-Ho
    • Bulletin of the Korean Chemical Society
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    • v.14 no.2
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    • pp.275-281
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    • 1993
  • The new high temperature plasma source for spectrochemical analysis has been developed and characterized. In the development of new high temperature plasma sources for atomic emission spectrocopy, optimization of experimental variables is necessary to achieve the best analytical results. By means of a modified sequential simplex optimization method, six experimental variables were optimized. The line-to-background (L/B) ratio for Ca(II) at 393.37 nm was used as measure of the response function. The optimal experimental conditions were found to be at a current of 27.8 A, a plasma length of 28.8 mm, a sample uptake rate of 1.3 ml/min, a sample carrier gas flow rate of 0.7 ml/min, a plasma gas flow rate of 4.9 l/min, and an observation height of 6.4 mm above the top quartz tube.

Plasma Corrosion and Breakdown Voltage Behavior of Ce Ion Added Sulfuric Acid Anodizing According to Electrolyte Temperature (Ce ion이 첨가된 황산 아노다이징의 온도 변화에 따른 내플라즈마 특성)

  • So, Jongho;Yun, Ju-Young;Shin, Jae-Soo
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.1
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    • pp.37-41
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    • 2021
  • We report on the formation of anodic aluminum oxide (AAO) film using sulfuric acid containing cerium salt. When the temperature of the sulfuric acid containing cerium salt changes from 5 ℃ to 20 ℃, the current density and the thickness growth rate increase. The surface morphology of the AAO film change according to the temperature of the electrolytes. And that affected the breakdown voltage and the plasma etch rate. The breakdown voltage per unit thickness was the highest at 15 ℃, and the plasma etch rate was the lowest at 10 ℃ at 2.80 ㎛/h.

The effect of $Ar\;+\;H_2$ Plasma on the Low Temperature ITO Film Synthesized on Polymer (폴리머 기판상에 합성된 저온 ITO 박막에 미치는 $Ar\;+\;H_2$ 플라즈마의 영향)

  • Moon, Chang-S.;Chung, Yun-M.;Lee, Ho-Y.;Kim, Yong-M.;Kim, Kab-S.;Gaillard, M.;Han, Jeon-G.
    • Journal of the Korean institute of surface engineering
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    • v.39 no.5
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    • pp.206-209
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    • 2006
  • Indium tin oxide (ITO) films were synthesized on polymer (PES, polyethersulfone) at room temperature by pulsed DC magnetron sputtering. By the control of introducing hydrogen to argon atmosphere, the resistivity of ITO films was obtained at $5.27\;{\times}\;10^{-4}\;{\Omega}{\cdot}cm$ without substrate heating in comparison with $2.65\;{\times}\;10{-3}\;{\Omega}{\cdot}cm$ under hydrogen free condition. ITO film synthesized at Ar condition was changed from amorphous to crystalline. These result from the enhancement of electron temperature in $Ar\;+\;H_2$ plasma, which induces the increase of ionization of target materials and argon. The dominant increase of ions such as In II and O II and neutral Sn I was monitored by optical emission spectroscopy (OES). Thermal energy required for the crystalline film formation is compensated by kinetic energy transfer through ion bombardments to substrate.

Influence of Plasma Treatment on The Soil Release Properties of Polyester Fabrics (플라즈마처리가 폴리에스테르 직물의 오염제거성에 미치는 연구)

  • Kwon, Young-Ah
    • Proceedings of the Korean Fiber Society Conference
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    • 2003.04a
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    • pp.434-435
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    • 2003
  • Physicochemical properties of a polymer surface significantly affect adhesion, wetting, and dyeing properties. In recent years, low temperature plasma technology has been widely used for surface modification of polymers. Surface fluorination by low temperature plasma treatment has been employed to improve the water and oily repellency of textile fabrics. However, very few results have been reported on soil release properties of the oxygen plasma treated textile fabrics. (omitted)

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